| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/13/2008 | CN101122739A Sub-wavelength continuous surface micro-structure preparation method based on negative refractive rate lens |
| 02/13/2008 | CN101122738A Photo-etching carrying-away moulding method |
| 02/13/2008 | CN101122737A Photomask registration errors of which have been corrected and method of correcting registration errors of photomask |
| 02/13/2008 | CN101122736A An improved CPL mask and a method and program product for generating the same |
| 02/13/2008 | CN101122735A Photomask, exposing method and instrument, image manufacturing and forming method, and semiconductor device |
| 02/13/2008 | CN101122724A Liquid crystal display and its manufacture method |
| 02/13/2008 | CN101122719A Array substrate for liquid crystal display device and method of fabricating the same |
| 02/13/2008 | CN101122645A Stacked body for color filter and color filter |
| 02/13/2008 | CN101121679A Salt adapted for acid generating agent and chemical enlargement type positive corrosion-resisting agent composition containing the same |
| 02/13/2008 | CN101121351A Reusable printing form |
| 02/13/2008 | CN100369195C Emitter for electronic beam project micromovie system and manufacture thereof |
| 02/13/2008 | CN100369040C Variable deviation etching simulating method under sub wavelength light etching condition |
| 02/13/2008 | CN100368920C Thin film transistor substrate using a horizontal electric field type liquid crystal display device and fabricating method thereof |
| 02/13/2008 | CN100368910C Method for manufacturing pixel structure |
| 02/13/2008 | CN100368872C Method for fabricating cliche and method for forming pattern using the same |
| 02/13/2008 | CN100368443C High molecular compound, photo anti-corrosion agent material and pattern forming method |
| 02/12/2008 | US7330261 Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus |
| 02/12/2008 | US7330240 Imaging system for thermal transfer |
| 02/12/2008 | US7330237 Exposure apparatus equipped with interferometer and method of using same |
| 02/12/2008 | US7330236 Exposure apparatus, and device manufacturing method using the same |
| 02/12/2008 | US7330203 Compact multibeam laser light source and interleaving raster scan |
| 02/12/2008 | US7330202 Method for correcting skewed recording when exposing printing originals |
| 02/12/2008 | US7330093 Alignment apparatus, exposure apparatus, and device manufacturing method |
| 02/12/2008 | US7329972 Coil support unit, motor and exposure apparatus using the same, and device manufacturing method |
| 02/12/2008 | US7329888 Alignment systems and methods for lithographic systems |
| 02/12/2008 | US7329886 EUV illumination system having a plurality of light sources for illuminating an optical element |
| 02/12/2008 | US7329881 Charged-particle beam system |
| 02/12/2008 | US7329692 Combination of an organoammonium or organophosphonium arylsulfinate and a diaryliodonium salt and/or a hexaarylbisimidazole having an oxidation potential in N,N-dimethylformamide of 0.0 to +0.4 volts versus a silver/silver nitrate reference electrode; photoinitiators for acrylic monomers |
| 02/12/2008 | US7329619 Method for patterning thin film, method and apparatus for fabricating flat panel display |
| 02/12/2008 | US7329496 Sequencing of surface immobilized polymers utilizing microflourescence detection |
| 02/12/2008 | US7329483 First phase of carbon dioxide, second phase of polyol and water, optional surfactant in one or both phases; positive tone lithography; preferential removal of light-field regions used to form patterned regions on microelectronic substrates |
| 02/12/2008 | US7329482 Dampening water composition for lithographic printing |
| 02/12/2008 | US7329480 Polyol-initiated resin containing ethylene oxide-substituted 1,2-cyclohexanedioxy units; radiation-sensitive cationic polymerization initiator; high pattern precision, a great thickness, and a high aspect ratio |
| 02/12/2008 | US7329479 Process for production of electroluminescent element and electroluminescent element |
| 02/12/2008 | US7329478 Alkali soluble copolymer have optionally alkylated styrene and hydroxystyrene units; bisvinyloxyalkylene or polyvinyl ether curing agent; photoacid generator; organic solvent; high sensitivity, heat resistance and resolution; undulation suppression |
| 02/12/2008 | US7329477 Amine contamination protecting top coating, amino acids, amines, urethanes, ureas or salts for photoresists in top coats |
| 02/12/2008 | US7328885 Plasma radiation source and device for creating a gas curtain for plasma radiation sources |
| 02/07/2008 | WO2008016270A1 Photoresist composition and patterning method thereof |
| 02/07/2008 | WO2008016061A1 Electronic circuit device and method for fabricating the same |
| 02/07/2008 | WO2008015983A1 Photosensitive resin composition and laminate |
| 02/07/2008 | WO2008015969A1 Method of forming pattern, composition for forming upper-layer film, and composition for forming lower-layer film |
| 02/07/2008 | WO2008015878A1 Photosensitive lithographic plate material |
| 02/07/2008 | WO2008015876A1 Polymerizable compound having adamantane structure, process for production of the same, and resin composition |
| 02/07/2008 | WO2008015848A1 Pattern forming method, metal oxide film forming material and method for using the metal oxide film forming material |
| 02/07/2008 | WO2008015754A1 Photosensitive resin composition |
| 02/07/2008 | WO2008015635A2 Photolithography |
| 02/07/2008 | WO2008015230A1 Device for characterizing unique objects |
| 02/07/2008 | WO2008014845A1 A method of applying a material on a substrate |
| 02/07/2008 | WO2008014630A1 Photosensitive materials and uses thereof |
| 02/07/2008 | WO2006011607A8 Material for forming resist protective film and method for forming resist pattern using same |
| 02/07/2008 | US20080032437 Exposure method for upper layer of hole of semiconductor device |
| 02/07/2008 | US20080032244 Method and apparatus for forming crystalline portions of semiconductor film |
| 02/07/2008 | US20080032242 Method of Forming Plated Product Using Negative Photoresist Composition and Photosensitive Composition Used Therein |
| 02/07/2008 | US20080032235 Fabrication method of active device array substrate |
| 02/07/2008 | US20080032234 Exposure Apparatus, Exposure Method, and Method for Producing Device |
| 02/07/2008 | US20080032232 Novel resins and photoresist compositions comprising same |
| 02/07/2008 | US20080032231 acid generator is added to a resist lower layer material whereby the acid does not volatize even during baking, and in a resist pattern process, the amine contaminant from the substrate can be neutralized; possible to reduce a harmful effect such as trailing skirts of the upper layer resist |
| 02/07/2008 | US20080032230 Substrate used for immersion lithography process, method of manufacturing substrate used for immersion lithography process, and immersion lithography |
| 02/07/2008 | US20080032229 Bottom antireflective coatings |
| 02/07/2008 | US20080032211 photomasks; photolithography; semiconductors; prevent line-end shortening |
| 02/07/2008 | US20080032209 Long length flexible circuits and method of making same |
| 02/07/2008 | US20080032202 comprises at least a fluoropolymer, a solvent and a fluorocarbon compound; transparency to an exposure light beam, insolubility in water; and alkali-solubility |
| 02/07/2008 | US20080030869 Objectives as a microlithography projection objective with at least one liquid lens |
| 02/07/2008 | US20080030733 Mark position measuring method and apparatus |
| 02/07/2008 | US20080030708 Device manufacturing method |
| 02/07/2008 | US20080030704 Environmental system including a transport region for an immersion lithography apparatus |
| 02/07/2008 | US20080030703 Projection exposure apparatus, device manufacturing method, and sensor unit |
| 02/07/2008 | US20080030700 Device and method for lithography |
| 02/07/2008 | US20080030699 Wiring technique |
| 02/07/2008 | US20080030698 Liquid jet and recovery system for immersion lithography |
| 02/07/2008 | US20080030697 Exposure apparatus and device fabrication method |
| 02/07/2008 | US20080030696 Exposure apparatus and method for producing device |
| 02/07/2008 | US20080030695 Exposure apparatus and method for producing device |
| 02/07/2008 | US20080030694 Projection exposure apparatus, projection exposure method, and method for producing device |
| 02/07/2008 | US20080030692 Novel photoresist materials and photolithography process |
| 02/07/2008 | US20080029769 Provides two-block laser mask capable of preventing or minimizing a shot mark by sequential irradiation of each block with two different lasers; liquid crystal displays, light emitting diodes; Flat panel displays having a polycrystalline silicon thin film transistor as a switching device |
| 02/07/2008 | DE10245204B4 Maskenrohling Mask blank |
| 02/07/2008 | DE102006036488A1 Optical system i.e. projection lens, for use in microlithography, has housing including two individual housing parts provided with optical unit, where flushing gas e.g. neon, flows via inlet opening into housing |
| 02/07/2008 | DE102006036064A1 Beleuchtungssystem für eine Projektionsbelichtungsanlage mit Wellenlängen ≦ 193 nm Illumination system for a projection exposure apparatus having wavelengths ≦ 193 nm |
| 02/07/2008 | DE102004035595B4 Verfahren zur Justage eines Projektionsobjektives Method for adjusting a projection objective |
| 02/06/2008 | EP1884989A2 Semiconductor device and method of manufacturing the same |
| 02/06/2008 | EP1884928A1 Settling judgement method and position control device |
| 02/06/2008 | EP1884832A1 Clean stocker and method of storing articles |
| 02/06/2008 | EP1884831A2 Illumination system for a projection exposure apparatus with wavelengths < 193 nm |
| 02/06/2008 | EP1884830A1 A method of applying a material on a substrate |
| 02/06/2008 | EP1883863A2 Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist |
| 02/06/2008 | EP1883862A2 Spatial light modulator device, lithographic apparatus, display device, method of producing a light beam having a spatial light pattern and method of manufacturing a device |
| 02/06/2008 | EP1883861A2 Method for improving the imaging properties of a projection objective, and such a projection objective |
| 02/06/2008 | EP1883860A1 Optical system of a microlithographic projection exposure apparatus |
| 02/06/2008 | EP1883859A2 On-press developable imageable element comprising tetraarylborate salt |
| 02/06/2008 | EP1883858A2 Making relief image using removable film |
| 02/06/2008 | EP1883841A1 Optical scattering disk, use thereof, and wavefront measuring apparatus |
| 02/06/2008 | EP1883534A1 Regeneratable, structured plate comprising oxidation catalysts |
| 02/06/2008 | EP1502335B1 Automatic gas control system for a gas discharge laser |
| 02/06/2008 | CN201017176Y Liquid supplying and recycling seal control device in immersed photolithography system |
| 02/06/2008 | CN201017175Y Large damping precision flexible supporting mechanism |
| 02/06/2008 | CN201017174Y Vertical boat locking apparatus of photo-etching machine |
| 02/06/2008 | CN201017173Y Inter space inspecting and correcting device |
| 02/06/2008 | CN201017172Y Light blockage supply piping installation |
| 02/06/2008 | CN101120434A Temperature setting method for heat treating plate, temperature setting device for heat treating plate, program and computer-readable recording medium recording program |