| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 02/19/2008 | US7333178 Lithographic apparatus and device manufacturing method |
| 02/19/2008 | US7333173 Method to simplify twin stage scanner OVL machine matching |
| 02/19/2008 | US7332734 Lithography apparatus and pattern forming method using the same having an liquid crystal panel for a photo mask function |
| 02/19/2008 | US7332732 Alignment systems and methods for lithographic systems |
| 02/19/2008 | US7332616 Polymerizable compound, polymer, positive-resist composition, and patterning process using the same |
| 02/19/2008 | US7332444 Method for smoothing areas in structures by utilizing the surface tension |
| 02/19/2008 | US7332273 Multilayer dielectrics for solid phase synthesis |
| 02/19/2008 | US7332266 Coating that prevents effectively reflection particularly when an irradiating light with a wavelength of 193 nm is used for microfabrication, and that can be rapidly removed; for use in manufacture of a semiconductor device |
| 02/19/2008 | US7332264 Photo-definable self-assembled materials |
| 02/19/2008 | US7332262 Forming amorphous carbon layer on semiconductor stack; etching; elimination of intermediate layer |
| 02/19/2008 | US7332259 Aluminum support for planographic printing plate, its manufacturing process, and planographic printing plate material |
| 02/19/2008 | US7332258 mixture a copolymer or terpolymer that is insoluble or slightly soluble in an alkali developer and becoming soluble in an alkali developer by an action of an acid, and acid generators, used in microlithography for production high capacity microelectronics |
| 02/19/2008 | US7332257 Composition for optical film, and optical film |
| 02/19/2008 | US7332255 enables the user to measure process line shortening on an overlay tool; means for determining the misalignment, means for determining total line shortening, means for determining the equipment line shortening, and means for determining process line shortening |
| 02/19/2008 | US7332254 an alkali soluble resin, a compound having a quinonediazide group, and an epoxy resin having a softening point of not lower than 30 degrees C; cured product is excellent in resolution, electrical insulation, thermal shock resistance and adhesion, and exhibits reduced deformation after post-baking |
| 02/19/2008 | US7332253 Shelf life, do not require the presence of a coated oxygen impermeable overcoat, avoids the use of a preheat step before development without any loss in imaging properties |
| 02/19/2008 | US7332249 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
| 02/19/2008 | US7331288 Apparatus for pulling a sleeve on and off |
| 02/19/2008 | US7331250 Sensor device for non-intrusive diagnosis of a semiconductor processing system |
| 02/19/2008 | CA2397070C X-ray measuring and testing complex |
| 02/14/2008 | WO2008019249A1 Long length flexible circuits and method of making same |
| 02/14/2008 | WO2008018749A1 Resin composition for forming fine patterns, method for fabricating semiconductor device using the composition and semiconductor device fabricated by the method |
| 02/14/2008 | WO2008018580A1 Positive resist processing liquid composition and liquid developer |
| 02/14/2008 | WO2008018530A1 Production method and production device of cylindrical print substrate |
| 02/14/2008 | WO2008018352A1 Photosensitive polyimide composition, positive photosensitive resin composition, and fpc |
| 02/14/2008 | WO2008018272A1 Photosensitive lithographic plate material |
| 02/14/2008 | WO2008017954A2 Antireflective composition for photoresists |
| 02/14/2008 | WO2008017490A2 Optical filter and method for the production of the same, and device for the examination of electromagnetic radiation |
| 02/14/2008 | WO2007117808A3 Method of forming nanoscale features using soft lithography |
| 02/14/2008 | WO2006048443A3 Photopolymerizable composition |
| 02/14/2008 | US20080039354 Method of manufacturing a thin film transistor substrate and stripping composition |
| 02/14/2008 | US20080038935 Aperture masks for circuit fabrication |
| 02/14/2008 | US20080038678 ArF excimer laser beam (193 nm); lithography; photoresist; organic copolymer of pyrimidinetrione, imidazolidinedione, imidazolidinetrione or triazinetrione units and a diepoxide, and also a diacid to form a copolyester; solvent |
| 02/14/2008 | US20080038676 Top coat material and use thereof in lithography processes |
| 02/14/2008 | US20080038675 Exposure Method, Exposure Apparatus, Exposure System and Device Manufacturing Method |
| 02/14/2008 | US20080038673 Method for adjusting a critical dimension in a high aspect ratio feature |
| 02/14/2008 | US20080038669 Non-truly-spherical high-molecular fine particles, process for producing the same, inkjet ink composition containing fine particles, lithographic printing plate using the same, process for producing printing plate, and electrophoretic particles-containing composition containing fine particles |
| 02/14/2008 | US20080038668 High speed violet or ultraviolet laser sensitive; exposed plate is preferably developed on a processor with an alkaline developer coupled with a replenisher having higher pH |
| 02/14/2008 | US20080038666 Positive-Working Photoimageable Bottom Antireflective Coating |
| 02/14/2008 | US20080038665 Photosensitive Resin Composition Having a High Refractive Index |
| 02/14/2008 | US20080038664 Silsesquioxane compound mixture, method of making, resist composition, and patterning process |
| 02/14/2008 | US20080038542 Method for high resolution patterning using soft X-ray, process for preparing nano device using the method |
| 02/14/2008 | US20080037905 Method and apparatus for determining the influencing of the state of polarization by an optical system, and an analyser |
| 02/14/2008 | US20080037858 Simultaneous computation of multiple points on one or multiple cut lines |
| 02/14/2008 | US20080037111 Catadioptric Projection Objective |
| 02/14/2008 | US20080037017 Generic interface for an optical metrology system |
| 02/14/2008 | US20080036988 Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby |
| 02/14/2008 | US20080036986 Photomask, method and apparatus that uses the same, photomask pattern production method, pattern formation method, and semiconductor device |
| 02/14/2008 | US20080036982 Method For Structuring A Substrate Using Multiple Exposure |
| 02/14/2008 | US20080036981 Stage Device And Exposure Apparatus |
| 02/14/2008 | US20080036949 Substrate for a display apparatus |
| 02/14/2008 | US20080035863 Single scan irradiation for crystallization of thin films |
| 02/14/2008 | US20080035851 Processing method, manufacturing method of semiconductor device, and processing apparatus |
| 02/14/2008 | DE102007034089A1 Synthetic quartz glass lens for micro-lithographic process |
| 02/14/2008 | DE102007005780A1 Verbundstruktur für die Mikrolithographie und optische Anordnung Composite structure for microlithography and optical assembly |
| 02/13/2008 | EP1887841A1 Plasma generating apparatus and plasma generating method |
| 02/13/2008 | EP1887615A1 Sensor calibration method, exposure method, exposure device, device fabrication method, and reflection type mask |
| 02/13/2008 | EP1887614A1 Patterning method |
| 02/13/2008 | EP1887425A1 Photocuring/thermosetting resin composition, curing/setting product thereof and printed wiring board obtained using the same |
| 02/13/2008 | EP1887424A1 Method for making a processless lithographic printing plate |
| 02/13/2008 | EP1887423A1 Laser-decomposable resin composition and pattern-forming material using the same |
| 02/13/2008 | EP1886989A1 Calixresorcinarene compound, photoresist base comprising the same, and composition thereof |
| 02/13/2008 | EP1886829A1 Image recording material and image forming method of image recording material |
| 02/13/2008 | EP1886191A2 Optical imaging arrangement |
| 02/13/2008 | EP1886190A1 Microlithography projection objective |
| 02/13/2008 | EP1886189A2 A method of nanopatterning, a cured resist film use therein, and an article including the resist film |
| 02/13/2008 | EP1886187A2 Novel photosensitive resin compositions |
| 02/13/2008 | EP1768846A4 Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing |
| 02/13/2008 | EP1725330B1 Microfluidic chip |
| 02/13/2008 | EP1428075A4 Method for high resolution patterning using low-energy electron beam, process for preparing nano device using the method |
| 02/13/2008 | EP1428074A4 Method for high resolution patterning using soft x-ray, process for preparing nano device using the method |
| 02/13/2008 | CN201021972Y Roller special for emulating PVC yarn product |
| 02/13/2008 | CN101124859A Clamping apparatus and image forming apparatus |
| 02/13/2008 | CN101124658A Developing device and developing method |
| 02/13/2008 | CN101124653A Discharge lamp |
| 02/13/2008 | CN101124521A 固态浸没透镜微影术 Solid immersion lens lithography |
| 02/13/2008 | CN101124520A Single- and multi-photon polymerizable pre-ceramic polymeric compositions |
| 02/13/2008 | CN101124519A Ink-jet recording head, manufacturing method of the head and composition for ink-jet recording head |
| 02/13/2008 | CN101124518A Radiation-sensitive resin composition and color filter |
| 02/13/2008 | CN101124517A Photosensitive resin composition and photosensitive dry film by the use thereof |
| 02/13/2008 | CN101124516A Pattern formation material, pattern formation device, and pattern formation method |
| 02/13/2008 | CN101124089A 纳米级电子光刻 Nanoscale electron lithography |
| 02/13/2008 | CN101123192A Method of fabricating lateral double diffused metal oxide semiconductor field effect transistor |
| 02/13/2008 | CN101123182A Pattern forming method and apparatus |
| 02/13/2008 | CN101123181A Pattern forming method and apparatus |
| 02/13/2008 | CN101122954A Method for diffuse reflection processing on metal cladding high polymer film |
| 02/13/2008 | CN101122801A Exhaust control apparatus for gumming machine |
| 02/13/2008 | CN101122752A Centering device and exposure device |
| 02/13/2008 | CN101122751A Liquid reclamation device for developing machine platform and the developing machine platform comprising same |
| 02/13/2008 | CN101122750A Exposure device |
| 02/13/2008 | CN101122749A Method of forming photoresist pattern |
| 02/13/2008 | CN101122748A Photo-etching machine off-axis level and focusing detection control system and its implement method |
| 02/13/2008 | CN101122747A Slit coating apparatus |
| 02/13/2008 | CN101122746A Photoresist coating system |
| 02/13/2008 | CN101122745A Positive printing heat-sensitive lithographic printing planography and its preparation method |
| 02/13/2008 | CN101122744A Light solidifying coloring composition and color filter using the same |
| 02/13/2008 | CN101122743A Light solidifying coloring composition and color filter using the same |
| 02/13/2008 | CN101122742A Superbranched poly-siloxane base photoresist |
| 02/13/2008 | CN101122741A Photosensitive composition and imaging element comprising vinyl polymer |
| 02/13/2008 | CN101122740A Photosensitive resin composition for layer insulation film and forming method for the layer insulation film |