| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/26/2008 | US7335324 Color filter manufacturing method for a plastic substrate |
| 02/26/2008 | US7335319 Semiconductor stress buffer coating edge bead removal compositions and method for their use |
| 02/26/2008 | US7335268 Inorganic compound for removing polymers in semiconductor processes |
| 02/26/2008 | US7334929 Method of producing multicolor pixel sheet and color filter using the same |
| 02/21/2008 | WO2008021208A2 Sensitizer dyes for photoacid generating systems using short visible wavelengths |
| 02/21/2008 | WO2008020631A1 Method for producing original plate, method for producing microneedle patch, microneedle patch, and exposure apparatus |
| 02/21/2008 | WO2008020573A1 Positive photosensitive resin composition |
| 02/21/2008 | WO2008020558A1 Method of processing material for photosensitive lithographic printing plate |
| 02/21/2008 | WO2008020469A1 Positive photosensitive resin composition, method of pattern preparation and electronic part |
| 02/21/2008 | WO2008019936A2 Microlithographic projection exposure apparatus and microlithographic exposure method |
| 02/21/2008 | WO2008019860A1 Optical system for semiconductor lithography |
| 02/21/2008 | WO2008019803A1 Catadioptric projection objective with pupil mirror. projection exposure apparatus and method |
| 02/21/2008 | WO2007144125A3 Imaging device |
| 02/21/2008 | WO2007103172A3 Curable compositions for providing a cured composition with enhanced water resistance |
| 02/21/2008 | US20080045005 Pattern formation method and method for forming semiconductor device |
| 02/21/2008 | US20080044775 Method for Aligning or Assembling Nano-Structure on Solid Surface |
| 02/21/2008 | US20080044772 Anti-reflective imaging layer for multiple patterning process |
| 02/21/2008 | US20080044766 Photoresist composition and method of manufacturing a color filter substrate by using the same |
| 02/21/2008 | US20080044765 Ir Radical Polymerization-Type Photopolymer Plate Using Specific Binder Polymer |
| 02/21/2008 | US20080044764 used for producing a permanent film, capable of forming a resin layer which is good in fluidity upon heat bonding after pattern, formation and also has good adhesion as well as bonding properties and/or sealing properties |
| 02/21/2008 | US20080044763 Resin composition and thermo/photosensitive composition |
| 02/21/2008 | US20080044745 Process for production of pattern-forming body |
| 02/21/2008 | US20080044742 Method of correcting critical dimension in photomask and photomask having corrected critical dimension using the method |
| 02/21/2008 | US20080044737 Data storage medium comprising colloidal metal and preparation process thereof |
| 02/21/2008 | US20080044597 comprises photo-initiator, photosensitive polymerizable monomers or oligomers selected from the groups consisting of double-bond compounds, compounds having epoxy functional group; photosensitive material can surround liquid crystal display cell and separate from assisting substrates |
| 02/21/2008 | US20080044575 Patterning of solid state features by direct write nanolithographic printing |
| 02/21/2008 | US20080044556 In-line deposition processes for circuit fabrication |
| 02/21/2008 | US20080043909 X-Ray Alignment System For Fabricating Electronic Chips |
| 02/21/2008 | US20080043345 Refractive Projection Objective for Immersion Lithography |
| 02/21/2008 | US20080043337 Structure for pattern formation, method for pattern formation, and application thereof |
| 02/21/2008 | US20080043229 Monitoring apparatus and method particularly useful in photolithographically |
| 02/21/2008 | US20080043215 Optimized polarization illumination |
| 02/21/2008 | US20080043212 Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method |
| 02/21/2008 | US20080043210 Exposure Apparatus and Device Manufacturing Method |
| 02/21/2008 | US20080042079 Collector with fastening devices for fastening mirror shells |
| 02/21/2008 | US20080042068 Exposure apparatus, exposure method, and method for producing device |
| 02/21/2008 | US20080042044 Light Detecting Apparatus, Illumination Optical Apparatus, Exposure Apparatus and Exposure Method |
| 02/21/2008 | US20080041257 Device and method for treating lithographic printing plate |
| 02/21/2008 | DE102007038183A1 Resist pattern formation on semiconductor chip or circuit board, uses first and second photohardenable resist films sensitive to light in different wavelength regions to reduce illumination time |
| 02/21/2008 | DE102006038634A1 Halteeinrichtung für ein optisches Element mit Stützkraftausgleich Holding means for an optical element with supporting force balance |
| 02/21/2008 | DE102006038455A1 Optical system for semiconductor lithography, has adjusting unit positioning optical component, where contact points of adjusting unit at optical component is selected, such that no moments develop at optical component |
| 02/21/2008 | DE102006038398A1 Projection objective for microlithographic projection exposure apparatus, has lens composed of lens elements which are arranged to follow each other along optical axis, where lens has curved lens surfaces put together by elements |
| 02/20/2008 | EP1890193A1 Projection objective of a microlithographic projection exposure apparatus |
| 02/20/2008 | EP1890192A1 Metrology systems and methods for lithography processes |
| 02/20/2008 | EP1890191A1 Catadioptric projection objective with pupil mirror |
| 02/20/2008 | EP1889195A2 Manufacturing aware design and design aware manufacturing |
| 02/20/2008 | EP1889125A2 Printing element with an integral printing surface |
| 02/20/2008 | EP1889110A1 A six-mirror euv projection system with low incidence angles |
| 02/20/2008 | EP1888516A1 Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers |
| 02/20/2008 | EP1888455A2 An article, and a method for creating the article, with a chemically patterned surface |
| 02/20/2008 | EP1398309B1 Novel adamantane derivative |
| 02/20/2008 | EP1374310A4 Nanofabrication |
| 02/20/2008 | EP1292361B1 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 02/20/2008 | CN101128917A Exposure method and apparatus, and electronic device manufacturing method, illumination optical device |
| 02/20/2008 | CN101128916A Immersion exposure system, and recycle method and supply method of liquid for immersion exposure |
| 02/20/2008 | CN101128777A Image data storage method, control device, and program; frame data preparing method, device, and program; data acquisition method and device; and drawing method and device |
| 02/20/2008 | CN101128776A Image-drawing method, image-drawing apparatus, image-drawing system, and correction method |
| 02/20/2008 | CN101128775A Immersion liquid, exposure apparatus, and exposure process |
| 02/20/2008 | CN101128774A Photosensitive resin composition for forming light shielding layer, light shielding layer and color filter |
| 02/20/2008 | CN101128544A Resin composition for recording material |
| 02/20/2008 | CN101127322A Pixel structure and its making method |
| 02/20/2008 | CN101126909A Polymer residue removing method in semiconductor process posterior segment process |
| 02/20/2008 | CN101126908A Multi-platform photolithographic machine silicon chip horizontal control and automatic focusing system and its implement method |
| 02/20/2008 | CN101126907A Projection objective of a microlithographic projection exposure apparatus |
| 02/20/2008 | CN101126906A Secondary exposure method using two photomasks in semiconductor production process |
| 02/20/2008 | CN101126905A Direct-writing lithography device with focusing device |
| 02/20/2008 | CN101126904A Sub-wavelength lithography method and system with reflection type optical system |
| 02/20/2008 | CN101126903A Holographic eliminating aberration method and its projection lithography system |
| 02/20/2008 | CN101126902A Photosensitive resin composition |
| 02/20/2008 | CN101126901A Method for pattern formation |
| 02/20/2008 | CN101126900A Photolithography method based on metal local effect |
| 02/20/2008 | CN101126899A Sub-wavelength continuous surface micro-structure preparation method based on dry method etching loading effect |
| 02/20/2008 | CN101126898A Method for shrinking pi phase migration lithographic feature size using metal layer |
| 02/20/2008 | CN101126897A Continuous surface micro-structure forming method based on microlens array |
| 02/20/2008 | CN101126896A Super resolution lithography method based on PDMS template and silver board material |
| 02/20/2008 | CN101126895A Process for forming corrosion-resisting pattern, semiconductor device and manufacturing method for the same |
| 02/20/2008 | CN101126894A Systems and methods for manufacturing wire grid polarizers |
| 02/20/2008 | CN101126893A Forming method for protecting image |
| 02/20/2008 | CN101126892A Mask for forming contact hole |
| 02/20/2008 | CN101126879A Liquid crystal display and method for fabricating the same |
| 02/20/2008 | CN101126876A Thin-film transistor LCD pixel structure and its making method |
| 02/20/2008 | CN101126849A Condenser type contact screen and its manufacture method |
| 02/20/2008 | CN101126641A Production method for novel gyroscope signal reading graph |
| 02/20/2008 | CN101126502A Light source device |
| 02/20/2008 | CN101125824A 锍化合物 Sulfonium compounds |
| 02/20/2008 | CN101125823A Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same |
| 02/20/2008 | CN101125475A UV solid luminous membrane and its preparing process |
| 02/20/2008 | CN100370582C Substrate processing apparatus |
| 02/20/2008 | CN100370533C Liquid removal in a method and device for irradiating spots on a layer |
| 02/20/2008 | CN100370361C Detergent for removing resist and method for making semiconductor |
| 02/20/2008 | CN100370360C Silicate-contg. alkaline compositions for cleaning microelectronic substrates |
| 02/20/2008 | CN100370347C Transverse electric-field type liquid crystal display device, its making method and scanning exposure device |
| 02/20/2008 | CN100370330C Color filter substrate, liquid crystal display apparatus including color filter substrate, and method of manufacturing color filter substrate |
| 02/20/2008 | CN100370322C Method of manufacturing LCOS spacers |
| 02/20/2008 | CN100369955C Polymer type hexaryl diimidazole photoinitiator and its prepn process |
| 02/19/2008 | US7334205 Optimization of die placement on wafers |
| 02/19/2008 | US7333278 Manufacturing method of color wheel, and color wheel fabricated thereby and incorporated in color wheel assembly and image display apparatus |
| 02/19/2008 | US7333216 Apparatus for wavefront detection |
| 02/19/2008 | US7333200 Overlay metrology method and apparatus using more than one grating per measurement direction |
| 02/19/2008 | US7333180 Positioning apparatus and exposure apparatus using the same |