| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/28/2008 | WO2007118989A3 Embossing device, such as a cylinder or a sleeve |
| 02/28/2008 | WO2007093536A3 Blue colour filters with enhanced contrast |
| 02/28/2008 | WO2006086841A8 Photolithographic patterning of polymeric materials |
| 02/28/2008 | US20080052334 Original data producing method and original data producing program |
| 02/28/2008 | US20080051308 Cleaning Compositions for Microelectronic Substrates |
| 02/28/2008 | US20080050681 Immersion fluid for immersion lithography |
| 02/28/2008 | US20080050680 Lithography systems and methods |
| 02/28/2008 | US20080050677 Processing method, manufacturing method of semiconductor device, and processing apparatus |
| 02/28/2008 | US20080050676 Semiconductor device manufacturing method, data generating apparatus, data generating method and recording medium readable by computer recoded with data generating program |
| 02/28/2008 | US20080050662 Process for production of pattern-forming body |
| 02/28/2008 | US20080050615 CPP head with parasitic shunting reduction |
| 02/28/2008 | US20080050564 Method of Forming a Nano-Structure and the Nano-Structure |
| 02/28/2008 | US20080049336 Projection optical system and method for photolithography and exposure apparatus and method using same |
| 02/28/2008 | US20080049320 Projection objective for microlithography |
| 02/28/2008 | US20080049307 Multilayer mirror, method for manufacturing the same, and exposure equipment |
| 02/28/2008 | US20080049306 Projection optical system and method for photolithography and exposure apparatus and method using same |
| 02/28/2008 | US20080049226 Apparatus and methods for detecting overlay errors using scatterometry |
| 02/28/2008 | US20080049205 Imaging system for thermal transfer |
| 02/28/2008 | US20080047679 Method and apparatus for production of a cast component |
| 02/28/2008 | US20080047445 Exposure device for the production of screen print stencils |
| 02/28/2008 | DE112006001192T5 Photoempfindlicher Trockenfilm für die Herstellung von dreidimensionalen mikrogeformten Produkten und photoempfindliche Harzzusammensetzung The photosensitive dry film for the manufacture of three-dimensional micro-molded products and photosensitive resin composition |
| 02/28/2008 | DE10328525B4 Verwendung von Siebdrucklacken bei der Herstellung von Abziehbildern zur Dekoration von keramischen Substraten, Porzellan und Glas The use of screen printing in the manufacture of paints decals for decorating ceramic substrates, porcelain and glass |
| 02/28/2008 | DE102007037100A1 High-index fluid, useful e.g. in immersion lithography system, comprises a liquid, first type of atoms comprising a cluster of first atoms aligned in the form of a fullerene and a second atom located in the interior space of the cluster |
| 02/28/2008 | DE102007001796A1 Verfahren zum Ausbilden von Resiststruktur, Halbleitervorrichtung und Herstellungsverfahren dafür A method of forming resist pattern, the semiconductor device and manufacturing method thereof |
| 02/28/2008 | DE102006058795A1 Verfahren zun Ausbilden von Resiststruktur, Halbleiter-Vorrichtung und Herstellungsverfahren dafür The method initially forming resist pattern, the semiconductor device and manufacturing method thereof |
| 02/28/2008 | DE102006038643A1 Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren Microlithographic projection exposure apparatus and microlithographic exposure method |
| 02/28/2008 | DE102006037433A1 Verfahren zur Herstellung mindestens eines Mehrschichtkörpers sowie Mehrschichtkörper A process for preparing at least one multi-layer body as well as multi-layer body |
| 02/28/2008 | DE102004034572B4 Verfahren zum Herstellen einer Struktur auf der Oberfläche eines Substrats A method of producing a structure on the surface of a substrate |
| 02/27/2008 | EP1892576A1 Exposure device for producing printing screen |
| 02/27/2008 | EP1892575A1 Positive resist composition and pattern forming method using the same |
| 02/27/2008 | EP1892574A1 Photosensitive insulating resin composition, cured product thereof and electronic component having the same |
| 02/27/2008 | EP1892573A1 Photopolymerizable composition comprising fine particles of organic pigment |
| 02/27/2008 | EP1892572A1 Lithographic printing plate precursor and method for preparation of lithographic printing plate |
| 02/27/2008 | EP1892562A1 Production method for color filter |
| 02/27/2008 | EP1891662A1 Imprinting apparatus for forming pattern at uniform contact by additional constant pressure |
| 02/27/2008 | EP1891482A1 Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition |
| 02/27/2008 | EP1891481A1 Projection objective having a high aperture and a planar end surface |
| 02/27/2008 | EP1891480A2 Lithographic apparatus and cleaning method therefor |
| 02/27/2008 | EP1891479A1 Sub-micron decal transfer lithography |
| 02/27/2008 | EP1890887A2 Method and device for transferring a pattern from a stamp to a substrate |
| 02/27/2008 | EP1850972A4 Thermal control of deposition in dip pen nanolithography |
| 02/27/2008 | EP1765593B1 Imageable element with solvent-resistant polymeric binder |
| 02/27/2008 | EP1695139A4 Real time image resizing for dynamic digital photolithography |
| 02/27/2008 | CN101133366A Developer composition, process for producing the same, and method of forming resist pattern |
| 02/27/2008 | CN101133365A Exposure method, method for forming irregular pattern, and method for manufacturing optical element |
| 02/27/2008 | CN101133364A Composition for underlayer film of resist and process for producing the same |
| 02/27/2008 | CN101133363A Colored alkali-developable photosensitive resin composition and color filters made by using the same |
| 02/27/2008 | CN101133096A Carboxyl group-containing polyurethane and thermosetting resin composition using the same |
| 02/27/2008 | CN101131547A Apparatus and method for treating substrates |
| 02/27/2008 | CN101131546A Wet etching solution |
| 02/27/2008 | CN101131545A Drawing device and its contraposition method |
| 02/27/2008 | CN101131544A Method for improving silicon scraps contamination when back grinding |
| 02/27/2008 | CN101131543A Manufacturing process method for partial silicon oxidization and isolation |
| 02/27/2008 | CN101131542A Peripheral exposure processing unit |
| 02/27/2008 | CN101131541A Photographic emulsion supplying device |
| 02/27/2008 | CN101131540A Photonasty composition and shading film of display using the same |
| 02/27/2008 | CN101131539A LCD panel, LCD light reflection structure and their manufacturing method |
| 02/27/2008 | CN101131538A Method for producing micro-optical element by hot imprint technology |
| 02/27/2008 | CN101131537A Accurately digitized micro-nano imprint method |
| 02/27/2008 | CN101131521A Manufacturing method for pixel structure of LCD |
| 02/27/2008 | CN101131511A Polymer having unsaturated side chain, radiation-sensitive resin composition and spacer for liquid crystal display element |
| 02/27/2008 | CN101131178A Hydrodynamic bearing and manufacturing method thereof |
| 02/27/2008 | CN101130596A Colophony diacid ester aldehyde acetal polyalcohol, synthesis method and uses of the same |
| 02/27/2008 | CN101130577A Polymer, radiation sensitive resin composition and spacer for liquid crystal display element |
| 02/27/2008 | CN101130518A Ionic liquid photo generated base alkaline agent, preparing method and uses of the same |
| 02/27/2008 | CN101130510A Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same |
| 02/27/2008 | CN100372354C Cylindrical outer surface scanning apparatus and method for use the same |
| 02/27/2008 | CN100372041C Method for manufacturing component figure, distributing structure, and image display device |
| 02/27/2008 | CN100371834C Method for accurately controlling density of scribed lines during plane holographic grating fabricating process |
| 02/27/2008 | CN100371827C Immersion photolithography system and method using microchannel nozzles |
| 02/27/2008 | CN100371826C Sulfonate and photoresist composition |
| 02/27/2008 | CN100371817C Semi-penetration, semi-reflective pixel structure and its manufacturing method |
| 02/27/2008 | CN100371816C TFT array substrate of liquid crystal display, liquid crystal display panel and its manufacturing method |
| 02/27/2008 | CN100371814C Manufacture of pixel electrode contacting point of thin-membrane transistor liquid crystal displaying device |
| 02/27/2008 | CN100371813C Liquid crystal display panel of horizontal electronic field applying type and fabricating method thereof |
| 02/27/2008 | CN100371738C Method for melting and forming micro lens array utilizing halftone mask photo etching |
| 02/27/2008 | CN100371357C Catalyst complexes for polymerization and co-polymerization of cyclic olefins |
| 02/26/2008 | US7337426 Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded therein |
| 02/26/2008 | US7337423 Mask pattern generating method and mask pattern generating apparatus |
| 02/26/2008 | US7336420 Diffractive optical element, illumination system comprising the same, and method of manufacturing semiconductor device using illumination system |
| 02/26/2008 | US7336391 Multi-exposure drawing method and apparatus therefor |
| 02/26/2008 | US7336352 Position detection apparatus |
| 02/26/2008 | US7336344 Positioning system, exposure apparatus using the same, and device manufacturing method |
| 02/26/2008 | US7336342 Projection method including pupillary filtering and a projection lens therefor |
| 02/26/2008 | US7336341 Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer program for simulator |
| 02/26/2008 | US7336340 Method of exposure error adjustment in photolithography for multiple products |
| 02/26/2008 | US7336012 Motor, robot, substrate loader, and exposure apparatus |
| 02/26/2008 | US7335782 Thioxanthone derivatives, and their use as cationic photoinitiators |
| 02/26/2008 | US7335585 Method for preventing the formation of a void in a bottom anti-reflective coating filling a via hole |
| 02/26/2008 | US7335579 Nanometer-scale memory device utilizing self-aligned rectifying elements and method of making |
| 02/26/2008 | US7335465 Developer composition for resists and method for formation of resist pattern |
| 02/26/2008 | US7335464 A vinylpyrrolidone-vinylimidazole copolymer; triethylamine of paratoulenesulfonates as acid generator capable of generating an acid by heating, solvent containing water; used for coating the resist pattern with a resistance to an electron beam |
| 02/26/2008 | US7335462 Method of depositing an amorphous carbon layer |
| 02/26/2008 | US7335461 Three dimensional topologies without multiple photolithography layers; mono-molecular layer enables very high spatial resolution; azomonochlorosilane initiator layer; radiating to selectively reduce density, polymerized monomers as a mask; miniature steps, slopes or surface variations; semiconductors |
| 02/26/2008 | US7335460 Photosensitive thermosetting resin composition, and photosensitive cover lay and flexible printed wiring board using the composition |
| 02/26/2008 | US7335458 2,4,6-Triisopropylbenzenesulfonate compound capable of generating an acid upon exposure to radiation or electron beams, polymer which changes solubility in alkaline developer under action of acid, and basic compound having high sensitivity, contrast, resolution, storage stability |
| 02/26/2008 | US7335457 Positive-tone radiation-sensitive resin composition |
| 02/26/2008 | US7335456 Top layer over the photoresist layer containing a copolymer of fluorosulfonamide monomer unit having a polymerzable unsaturated ester, ketone, vinyl ester goups; imaging, developing, patterning, transferring patterned layer to the material layer |
| 02/26/2008 | US7335455 Method of forming an underlayer of a bi-layer resist film and method of fabricating a semiconductor device using the same |
| 02/26/2008 | US7335454 Fluorine group- containing resin, which is substituted with a group that is decomposed by the action of an acid to increase solubility in an alkali developer; and an acid generator capable of generating an acid upon irradiation |