| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/05/2008 | CN101137513A Material of lithographic printing plate, process for producing material of lithographic printing plate, and method of printing |
| 03/05/2008 | CN101137493A Apparatus and method for making microreplicated article |
| 03/05/2008 | CN101137481A Apparatus and method for producing two-sided patterned web in registration |
| 03/05/2008 | CN101136319A Substrate processing method and substrate processing apparatus |
| 03/05/2008 | CN101136315A Device of processing substrate |
| 03/05/2008 | CN101136206A Method for connecting magnetic head rectangular bar in photoetching technology |
| 03/05/2008 | CN101135865A Strip preparation method of graphics ferroelectric lead zirconate titanate film |
| 03/05/2008 | CN101135864A Exposure method and apparatus and device manufacturing method |
| 03/05/2008 | CN101135863A Drawing apparatus |
| 03/05/2008 | CN101135862A Drawings device and drawing method |
| 03/05/2008 | CN101135861A Method and apparatus for performing dark field double dipole lithography |
| 03/05/2008 | CN101135860A Light scribing device and Aligning system and aligning method used for light scribing device |
| 03/05/2008 | CN101135859A Transmission aligning mark combination and alignment method of light scribing device |
| 03/05/2008 | CN101135858A Objective glass testing device and method thereof |
| 03/05/2008 | CN101135857A Photo-etching machine exposal image forming apparatus |
| 03/05/2008 | CN101135856A Laser directly writing device and laser directly writing method |
| 03/05/2008 | CN101135855A Slit coating apparatus |
| 03/05/2008 | CN101135854A Positive light sensitivity composition |
| 03/05/2008 | CN101135853A Hetero-substituted aryl acetic acid co-initiators for ir-sensitive compositions |
| 03/05/2008 | CN101135852A Pattern forming material and method |
| 03/05/2008 | CN101135851A Resin composition and transprinting material, filter sheet and display device using the same |
| 03/05/2008 | CN101135850A Image forming member having bluish purple laser photosensitive resist material layer and method for forming resist image |
| 03/05/2008 | CN101135849A Resistdeckfilm ausbildendes material, ausbildungsverfahren f¿˜r resiststruktur, und elektronische vorrichtung und verfahren zum herstellen derselben |
| 03/05/2008 | CN101135848A Radiation sensitive resin composition for forming a colored layer and color filter |
| 03/05/2008 | CN101135847A Process for manufacturing Colorful filtering substrates |
| 03/05/2008 | CN101135846A Hologram recording material, process for producing the same and hologram recording medium |
| 03/05/2008 | CN101135845A Hologram recording medium |
| 03/05/2008 | CN101135844A Hologram recording medium |
| 03/05/2008 | CN101135843A Method of manufacturing a stamper |
| 03/05/2008 | CN101135842A Method for copying nano autogram formwork |
| 03/05/2008 | CN101135841A Method of manufacturing a broad stamper |
| 03/05/2008 | CN101135840A Method of forming a mask structure and method of forming a minute pattern using the same |
| 03/05/2008 | CN101135780A Zero-order diffractive filter |
| 03/05/2008 | CN101135772A variable focal point micro-flat mirror driven by electrostatic and method of manufacturing the same |
| 03/05/2008 | CN101134930A Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 03/05/2008 | CN101134800A Pigment dispensing composition, optical solidified composition, color filter and manufacturing mmethod thereof |
| 03/05/2008 | CN100373993C Method for obtaining an extraeme ultraviolet radiation source, radiation source and use in lithography |
| 03/05/2008 | CN100373571C Method of evaluating solution for coating film of semiconductor |
| 03/05/2008 | CN100373537C Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device |
| 03/05/2008 | CN100373529C Apparatus and methodsfor dispensing fluids with rotatable dispense arms |
| 03/05/2008 | CN100373528C Laser assisted direct imprint lithography |
| 03/05/2008 | CN100373474C Disk master producing method, disk master producing device,method for detecting difference in disk master travel distance, and device for detecting difference in disk master travel distance |
| 03/05/2008 | CN100373260C Fluoropolymer-coated photomasks for photolithography |
| 03/05/2008 | CN100373259C Printing and carving process for preparing pattern of minimum size in nano level |
| 03/05/2008 | CN100373219C Method for making display board and reflection light diffusing structure |
| 03/05/2008 | CN100373182C Holographic grating etching method used for intermediate infrared distributed feedback quanta cascaded laser |
| 03/05/2008 | CN100373173C Monitoring marking layout for microlens baking process |
| 03/05/2008 | CN100372833C Aryl sulfonium salt, polymerizable composition and polymerization method of the same |
| 03/05/2008 | CN100372676C Heat sensitive composition not necessory to remove unexposed region, female pattern flat-plate printing plate coated with said composition and method for forming negative picture on said plate |
| 03/05/2008 | CN100372667C Stamper, imprinting method, and method of manufacturing an information recording medium |
| 03/04/2008 | US7339743 Very-high aperture projection objective |
| 03/04/2008 | US7339697 Apparatus for and method of recording image based on detected recording duty ratio |
| 03/04/2008 | US7339662 Exposure apparatus and a device manufacturing method using the same |
| 03/04/2008 | US7339653 System for a pellicle frame with heightened bonding surfaces |
| 03/04/2008 | US7339650 Immersion lithography fluid control system that applies force to confine the immersion liquid |
| 03/04/2008 | US7339602 Image-drawing device and image-drawing method |
| 03/04/2008 | US7339282 Topographically indexed support substrates |
| 03/04/2008 | US7339272 Semiconductor device with scattering bars adjacent conductive lines |
| 03/04/2008 | US7339247 Semiconductor device manufacturing method and semiconductor manufacturing apparatus |
| 03/04/2008 | US7339181 High flux, high energy photon source |
| 03/04/2008 | US7339014 A copolymer comprising (meth)acrylated 8 or 9-methacryloyloxy-4-oxatricyclo[5.2.1.02,6]decane-3-one monomer; chemically amplified photoresist composition comprising photoacid generator; transparency to ultraviolet light, solubility in solvents; photolithography; not from Diels-Alder reaction |
| 03/04/2008 | US7338755 Forming a photosensitive layer on a substrate, selectively irradiating the photosensitive layer with at least one of an ultraviolet ray and an ionizing radiation; heat treatment; developing the photosensitive layer to remove irradiated area |
| 03/04/2008 | US7338754 Patterning the photosensitive resin applied on micro-lens array by irradiation of ultraviolet light or visible light; forming a second micro-lens array using the patterned photosensitive resin as a mask |
| 03/04/2008 | US7338753 Forming a resin mold, interposing a photosensitive polymer forming layers, exposing the layered structure with an electron beam, ultraviolet radiation or visible radiaton, removing an exposed photosensitive polymer, and filling the vacant portion with a metal |
| 03/04/2008 | US7338751 Process for producing printed wiring board and photosensitive resin composition used in the same |
| 03/04/2008 | US7338750 Capable of efficiently forming a resist pattern reduced in thickness |
| 03/04/2008 | US7338749 Forming image mask; discharging oil-based ink by ink jets; exposure, development |
| 03/04/2008 | US7338748 Polymerizable composition and planographic printing plate precursor |
| 03/04/2008 | US7338747 photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization; control light reaction efficiency to obtain a high resolution pattern |
| 03/04/2008 | US7338746 Actinic radiation absorber, polymerization initiator and a polymerzation monomer to form polymer layer that will carry ink that can be removed and forming images with exposure to laser beams |
| 03/04/2008 | US7338745 Positive-working imageable radiation absorbing compound and substrate with hydrophilic surface having alkaline developer removable interior layer copolymer comprising N-(hydroxyalkyl)(meth)acrylamide monomer; ink receptive exterior layer; solvent resistance, bakeability; lithographic printing plates |
| 03/04/2008 | US7338744 Acid generator upon irradiation; alicyclic hydrocarbon resin that decomposes under the action of an acid to increase the alkali solubility; and acyclic chain compound with 1 or 2 OH groups that may be substituted; excellent line edge roughness performance and no pattern falling and development defect |
| 03/04/2008 | US7338742 Photoresist polymer and photoresist composition containing the same |
| 03/04/2008 | US7338741 Multilayer; aluminum support, alkali silicate and image recording layer which contains infrared absorber and photoinitiator |
| 03/04/2008 | US7338740 Mixture of acrylated ester and acid generator; irradiation with actinic radiation |
| 03/04/2008 | US7338737 Akali-soluble resin, quinone diazide, surfactant (3-perfluoroalkylpropane epoxide and polyethersilicone), and a solvent mixture of a di-C1-5 alkyl ether of diethylene glycol, a C3-8 alkyl acetate, and a C1-6 alkyl lactate; high-quality display panels with uniformly-coated insulating layers. |
| 03/04/2008 | US7338613 System and process for automated microcontact printing |
| 03/04/2008 | US7338223 Developing method and apparatus for performing development processing properly and a solution processing method enabling enhanced uniformity in the processing |
| 02/28/2008 | WO2008024792A1 Low-k damage avoidance during bevel etch processing |
| 02/28/2008 | WO2008024573A1 System and method for performing high flow rate dispensation of a chemical onto a photolithographic component |
| 02/28/2008 | WO2008024263A1 System and method for vortex condensation trapping in purge gas humidification |
| 02/28/2008 | WO2008023816A1 Optical element, method for manufacturing master for manufacturing optical element, and photoelectric conversion device |
| 02/28/2008 | WO2008023754A1 Solution for removing residue after semiconductor dry process and method of removing the residue using the same |
| 02/28/2008 | WO2008023753A1 Solution for removing residue after semiconductor dry process and method of removing the residue using the same |
| 02/28/2008 | WO2008023750A1 Method of ion implantation and radiation-sensitive resin composition for use therein |
| 02/28/2008 | WO2008023712A1 Photosensitive resin composition, photosensitive film, and method for formation of pattern |
| 02/28/2008 | WO2008023693A1 Coating developing machine, resist pattern forming device, coating developing method, resist pattern forming method, and storage medium |
| 02/28/2008 | WO2008023614A1 Composition for removal of resist comprising poly(cyanoalkyl)ethyleneamine and method for removal of resist using the composition |
| 02/28/2008 | WO2008023612A1 Photosensitive composition comprising organic-zirconia composite microparticle |
| 02/28/2008 | WO2008023603A1 Thiourethane compound and photosensitive resin composition |
| 02/28/2008 | WO2008023555A1 Resist composition for liquid immersion lithography, and method for formation of resist pattern |
| 02/28/2008 | WO2008023460A1 Method for preventing contamination of reflection mirror for extreme ultraviolet light source, and exposure apparatus |
| 02/28/2008 | WO2008023071A1 Method and system for correcting image changes |
| 02/28/2008 | WO2008022952A1 Uv-dosis indicators |
| 02/28/2008 | WO2008022797A1 Projection exposure apparatus and optical system |
| 02/28/2008 | WO2008022683A1 Illumination system with a detector for recording a light intensity |
| 02/28/2008 | WO2008022680A1 Illumination system for a microlithography projection exposure apparatus |
| 02/28/2008 | WO2008022560A1 Compositions for removal of etching residues |
| 02/28/2008 | WO2008022485A1 Exposure device for producing screen printing stencils |
| 02/28/2008 | WO2007148968A3 Lithographic apparatus, device manufacturing method and radiation collector |