Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2008
03/12/2008CN100375230C Transfer chamber for cluster system
03/12/2008CN100374956C A composition containing a photoacid generator monomer and carrier coated with the same and application thereof
03/12/2008CN100374948C Copper conducting wire structure and mfg. method thereof
03/12/2008CN100374944C Liquid crystal display device and method of fabricating the same
03/12/2008CN100374917C Method for forming pattern of liquid crystal display device and method for fabricating thin film transistor array substrate
03/12/2008CN100374622C Lithographic apparatus and method to determine beam size and divergence
03/12/2008CN100374506C 辐射敏感树脂组合物 The radiation-sensitive resin composition of the
03/12/2008CN100374475C Acrylic polymers and radiation-sensitive resin compositions
03/12/2008CN100374296C Lithographic process developed on printerand presensitized planographic plate
03/12/2008CN100374213C Applying method of liquid and its resin coating forming method
03/11/2008US7343271 Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare
03/11/2008US7342646 Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model
03/11/2008US7342598 Apparatus and method for recording image on printing plate
03/11/2008US7342053 Resin composition, adhesive film using the same and multilayer printed circuit board
03/11/2008US7341937 Semiconductor device and method of manufacturing same
03/11/2008US7341828 Thiol compound, photopolymerization initiator composition and photosensitive composition
03/11/2008US7341827 Separation-material composition for photo-resist and manufacturing method of semiconductor device
03/11/2008US7341826 only one semiconductor process having an exposing, a developing and an etching step is needed to fabricate the desired core having fine concentric double-circle patterns; reduced cost
03/11/2008US7341825 Method for producing high resolution nano-imprinting masters
03/11/2008US7341823 System and method for printing a pattern
03/11/2008US7341822 capable of specifying a trajectory characterized as a mathematical smooth function to be followed by a substrate relative to a radiation beam comprising a position and/or an orientation as a function of time
03/11/2008US7341821 Method for manufacture of lithographic printing plate precursor no dampening water
03/11/2008US7341818 Ring opening metathesis of substituted norbornene copolymers; photoresists, photolithography
03/11/2008US7341817 Acid generator of a specified fluoro-substituted arylsulfonic acid upon irradiation with an actinic ray or radiation; small post-exposure bake (PEB) temperature dependency and giving a good profile
03/11/2008US7341816 e.g., homopolymer of alpha, alpha -bis(trifluoromethyl)bicyclo[2.2.1]hept-5-ene-2-ethanol or copolymers with ethylene or 5-norbornene-2-hydroxyethylether
03/11/2008US7341815 Planographic printing plate precursor
03/11/2008US7341809 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation
03/11/2008US7341808 Method and system for contiguous proximity correction for semiconductor masks
03/11/2008US7341791 Photo-crosslinkable multi-coating system having improved gas barrier properties
03/11/2008US7341441 Nanoprint equipment and method of making fine structure
03/06/2008WO2008028051A1 High-index uv opitcal materials for immersion lithography
03/06/2008WO2008027262A1 Liquid supramolecular nanostamping (lisuns)
03/06/2008WO2008027227A1 Method of imaging and developing negative-working elements
03/06/2008WO2008026759A1 Drawing method, drawing device, and information recording medium
03/06/2008WO2008026742A1 Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
03/06/2008WO2008026739A1 Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
03/06/2008WO2008026732A1 Mobile body drive system and mobile body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision method
03/06/2008WO2008026593A1 Exposure apparatus, device production method, cleaning method, and cleaning member
03/06/2008WO2008026468A1 Resist underlayer film forming composition containing liquid additive
03/06/2008WO2008026465A1 Photosensitive lithographic printing plate material
03/06/2008WO2008026424A1 Lithographic printing plate material
03/06/2008WO2008026422A1 Compound, positive-type resist composition, and method for formation of resist pattern
03/06/2008WO2008026421A1 Compound, positive-type resist composition, and method for formation of resist pattern
03/06/2008WO2008026408A1 Photoresist-removing solution, and method for treatment of substrate using the same
03/06/2008WO2008026406A1 Photosensitive insulating resin composition, hardening product thereof, and circuit board equipped therewith
03/06/2008WO2008026401A1 Photosensitive insulation resin composition and cured product thereof
03/06/2008WO2008026397A1 Radiation-sensitive insulation resin composition, cured article, and electronic device
03/06/2008WO2008025832A1 Method and apparatus for manufacturing an electronic module
03/06/2008WO2008025508A1 Process for preparing a polymeric relief structure
03/06/2008WO2008025492A1 A method and a system for reducing overlay errors within exposure fields by apc control strategies
03/06/2008WO2008007952A3 Getter and cleaning arrangement for a lithographic apparatus
03/06/2008WO2008005208A3 Printing form precursor and process for preparing a stamp from the precursor
03/06/2008WO2008002393A3 Negative-working radiation-sensitive compositions and imageable element
03/06/2008WO2007116000A3 Device and method for microstructuring a storage medium and storage medium comprising a microstructured region
03/06/2008WO2001022162A3 Radiation sensitive copolymers, photoresist compositions thereof and deep uv bilayer systems thereof
03/06/2008US20080059939 Performance in model-based opc engine utilizing efficient polygon pinning method
03/06/2008US20080059141 Method and system for measuring patterned structures
03/06/2008US20080059129 Method and system for measuring patterned structures
03/06/2008US20080059096 Electromagnetic Radiation Pulse Timing Control
03/06/2008US20080058542 used in formulating photoresist compositions; microlithography; for imaging negative and positive patterns in the production of semiconductor devices; e.g. 4-hydroxy-3,5-dimethyl phenyl dimethyl sulphonium nonaflate
03/06/2008US20080058238 Includes cosolvent and additional active agents; efficienct removal of unexposed photoresist, metal oxides, chemical mechanical polishing residue
03/06/2008US20080057442 photolithography; hologram lithography to produce a smaller size without the need of a mask; reducing the wafer chip size
03/06/2008US20080057440 illuminators, supports and projectors arranged to transfer pattern onto substrates, and liquid supply system comprising tanks and fluid flow controllers; non-contact gas seal forms; using immersion lithography to increase throughput
03/06/2008US20080057408 Photomask and pattern forming method employing the same
03/06/2008US20080057407 Computer-generated hologram and its fabrication method
03/06/2008US20080057406 Hologram recording medium
03/06/2008US20080057405 Silicon-tantalum/zirconium oxide complex and photopolymerizable compound; green lasers; high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, and low shrinkage
03/06/2008US20080057217 For stereolithography, allow for variation in color, opacity, and surface properties, form opaque white or colored objects
03/06/2008US20080055740 Catadioptric projection objective with adaptive mirror and projection exposure method
03/06/2008US20080055609 Method and system for measuring patterned structures
03/06/2008US20080055578 Roll printer with decomposed raster scan and X-Y distortion correction
03/06/2008US20080055577 Lithographic apparatus and method
03/06/2008US20080054195 Substrate cover, and charged particle beam writing apparatus and method
03/06/2008US20080054190 Radiation pulse energy control system, lithographic apparatus and device manufacturing method
03/06/2008US20080054189 Lithographic apparatus and device manufacturing method
03/06/2008US20080053953 Production method for color filter
03/06/2008US20080053326 Inkjet composite stereographic printing plate and method for producing such printing plate
03/06/2008DE102007039407A1 Composite body manufacturing method for use in area of immersion lithography, involves treating contact surfaces, such that contact surfaces are free from mono-layered or multi-layered layer of water molecules
03/06/2008DE102006043776A1 Filtersystem für eine Lichtquelle Filter system for a light source
03/05/2008EP1895576A1 Pattern coating material and pattern forming method
03/05/2008EP1895571A1 Exposure apparatus, exposure method, maintenance method and device manufacturing method
03/05/2008EP1895570A1 Exposure method, exposure apparatus and device manufacturing method
03/05/2008EP1895365A1 Method and system for measuring contamination of a lithographical element
03/05/2008EP1895189A1 Active vibration isolation system having a hysteresis free pneumatic bearing
03/05/2008EP1894972A2 Photosensitive resin composition for flexible circuit board and flexible circuit board using the same
03/05/2008EP1894063A1 A double-facetted illumination system with attenuator elements on the pupil facet mirror
03/05/2008EP1894062A1 Exposure method and tool
03/05/2008EP1592752B1 Radiation curable aqueous compositions
03/05/2008EP1095313B1 Photopolymerizable thermosetting resin compositions
03/05/2008EP0876631B1 System for producing 3-dimensional photon crystals
03/05/2008CN201032516Y Mask box
03/05/2008CN101138070A Stage apparatus and exposure apparatus
03/05/2008CN101137989A Image processing method, image processor and image drawing system
03/05/2008CN101137939A Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings
03/05/2008CN101137938A Lithographic method
03/05/2008CN101137937A Pattern forming material, pattern forming apparatus, and pattern forming method
03/05/2008CN101137936A System and a method for synthesizing nanoparticle arrays in-situ
03/05/2008CN101137935A Photosensitive laminated original printing plate for letterpress printing and process for producing letterpress printing plate using the photosensitive laminated original printing plate
03/05/2008CN101137927A Apparatus for multiple beam deflection and intensity stabilization
03/05/2008CN101137620A Base multiplying agents and base-reactive curable compositions