Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2014
07/08/2014US8771917 Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns
07/08/2014US8771916 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
07/08/2014US8771907 Positive photosensitive resin composition and method of forming cured film from the same
07/08/2014US8770958 Pattern forming method and pattern forming apparatus in which a substrate and a mold are aligned in an in-plane direction
07/08/2014CA2696076C Plate supply and discharge device, printing plate forming device using same, plate supply table, and plate discharge table
07/08/2014CA2384070C Improved aperture plate and methods for its construction and use
07/03/2014WO2014104544A1 Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
07/03/2014WO2014104496A1 Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
07/03/2014WO2014104491A1 Photosensitive resin composition for insulation film for display device, and insulation film and display device using same
07/03/2014WO2014104487A1 Composition for resist underlayer film and pattern forming method
07/03/2014WO2014104486A1 Photosensitive resin composition for display device insulation film, and display device insulation film and display device using same
07/03/2014WO2014104480A1 Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition
07/03/2014WO2014104400A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
07/03/2014WO2014104217A1 Photosensitive resin laminate roll
07/03/2014WO2014104195A1 Adhesion-improving agent and silane compound
07/03/2014WO2014104192A1 Resist-removing liquid and resist-stripping method
07/03/2014WO2014104126A1 Novolak resin containing hexafluoroisopropanol group, method for producing same, and composition of same
07/03/2014WO2014104107A1 Exposure device, exposure method, device production method, program, and recording medium
07/03/2014WO2014104090A1 Energy-sensitive resin composition
07/03/2014WO2014104009A1 Mask blank substrate processing device, mask blank substrate processing method, mask blank substrate fabrication method, mask blank fabrication method, and transfer mask fabrication method
07/03/2014WO2014104001A1 Spatial light modulator and method for driving same, and exposure method and device
07/03/2014WO2014103997A1 Photosensitive resin composition, method for producing cured film, cured film, organic el display device and liquid crystal display device
07/03/2014WO2014103868A1 Nanostructure and method for producing same
07/03/2014WO2014103761A1 Color filter, black matrix, or curable resin composition for circuit formation
07/03/2014WO2014103714A1 Attachment member and attachment device using the same
07/03/2014WO2014103644A1 Actinic-ray-sensitive or radiation-sensitive resin composition, resist film formed using said composition, method for forming pattern using said composition, process for producing electronic device, and electronic device
07/03/2014WO2014103628A1 Composition for color filter, infrared transmission filter and method for manufacturing infrared transmission filter, and infrared sensor
07/03/2014WO2014103523A1 Treatment device, exhaust switching device therefor, exhaust switching unit and switching valve box
07/03/2014WO2014103516A1 Photosensitive resin composition, photosensitive film, and method for forming resist pattern
07/03/2014WO2014103325A1 Photosensitive conductive ink, cured substance made of same, and conduction-patterned laminate
07/03/2014WO2014102187A2 Lithography method and lithography device for components and circuits having microscale and nanoscale structural dimensions
07/03/2014WO2014101795A1 Warped silicon-chip adsorption device and adsorption method thereof
07/03/2014WO2014101686A1 Work station cable apparatus
07/03/2014US20140187460 Removal of masking material
07/03/2014US20140186777 Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
07/03/2014US20140186776 Phenolic resin and material for forming underlayer film for lithography
07/03/2014US20140186775 Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
07/03/2014US20140186774 Acid-strippable silicon-containing antireflective coating
07/03/2014US20140186773 Coating material and method for photolithography
07/03/2014US20140186772 Photoresist pattern trimming methods
07/03/2014US20140186771 Radiation-sensitive resin composition, polymer, compound, and method for producing compound
07/03/2014US20140186770 Dendritic compounds, photoresist compositions and methods of making electronic devices
07/03/2014US20140186769 Resist composition, method for forming resist pattern, and high-molecular weight compound
07/03/2014US20140186768 Photosensitive Resin Composition for Insulating Film of Display Device, Insulating Film Using the Same, and Display Device Using the Same
07/03/2014US20140186767 Acid generators and photoresists comprising same
07/03/2014US20140186766 Resin composition for masks
07/03/2014US20140186765 Photosensitive Resin Composition And Cured Product Thereof
07/03/2014US20140186755 Exposure apparatus and method of device fabrication
07/03/2014US20140186595 Method of fabricating display device using maskless exposure apparatus and display device
07/03/2014US20140186592 Photo-sensitive resin composition for bezel of touch screen module and bezel for touch screen module using the same
07/03/2014US20140185030 Asymmetric reticle heating of multilayer reticles eliminated by dummy exposures and related methods
07/03/2014US20140185028 Lithography system, method of clamping and wafer table
07/03/2014US20140185027 Illumination optics and projection exposure apparatus
07/03/2014US20140185026 Exposure apparatus and device fabrication method
07/03/2014US20140185025 System And Method For Lithography Alignment
07/03/2014US20140185024 Projection objective of a microlithographic projection exposure apparatus
07/03/2014US20140185023 Apparatus for removing solvent and photolithography apparatus using the same
07/03/2014US20140183701 Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns
07/03/2014US20140183425 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same
07/03/2014US20140183358 Phase Plate and Method of Fabricating Same
07/03/2014US20140183162 Photoresist composition and method for forming a metal pattern
07/03/2014US20140182471 Method for producing planographic printing plate and planographic printing plate
07/03/2014DE102012224537A1 Lithographieverfahren und Lithographievorrichtung für Bauteile und Schaltungen mit Strukturabmessungen im Mikro- und Nanobereich Lithography process and lithography apparatus for components and circuits with feature sizes in the micro- and nanoscale
07/02/2014EP2749948A1 Interference exposure device and method
07/02/2014EP2749947A1 Lithographic printing plate precursor and process for producing lithographic printing plate
07/02/2014EP2749946A1 Positive-type resist composition, microlens and planarization film formed therefrom
07/02/2014EP2748679A1 Exposure apparatus and method of confining a liquid
07/02/2014EP2748678A1 Method for preparing a relief printing form
07/02/2014EP2748677A2 Process for dry-coating of flexographic surfaces
07/02/2014EP2748676A2 Solid imaging systems, components thereof, and methods of solid imaging
07/02/2014CN203689009U 用于曝光机的对位晒架 Exposure to the position for drying rack
07/02/2014CN203689006U Pcb板干膜显影不净的检测装置 Pcb board dry film developing a detection device without a net
07/02/2014CN203689005U 一种显影胶杯 A developing plastic cups
07/02/2014CN203689004U 一种圆网显影机的驱动辊间距调节装置 One kind of rotary developing device driving roll gap adjusting means
07/02/2014CN203689003U 一种圆网显影机 One kind of rotary developing machine
07/02/2014CN203689002U Ccd移动装置 Ccd mobile devices
07/02/2014CN203689001U 一种pcb自动曝光设备的风帘装置 One kind of air curtain device pcb automatic exposure equipment
07/02/2014CN203689000U Led曝光机外设高效过滤供气系统 Led exposure machine peripherals efficient filtration air supply system
07/02/2014CN203688999U 半自动led曝光机 Led semi-automatic exposure machine
07/02/2014CN203688998U 一种led灯调节装置 One kind of led lights regulating device
07/02/2014CN203688997U 曝光机 Exposure Machine
07/02/2014CN103907062A 制版处理废液的再循环方法 Plate processing method for recycling waste
07/02/2014CN103907061A 微透镜阵列以及使用该微透镜阵列的扫描曝光装置 The microlens array and a scanning exposure apparatus using the microlens array
07/02/2014CN103907060A 形成抗蚀剂下层膜的组合物所用的添加剂及包含该添加剂的形成抗蚀剂下层膜的组合物 The resist underlayer film forming composition used and the composition comprises an additive forming a resist underlayer film of the additive
07/02/2014CN103907059A 感光化射线性或感放射线性树脂组成物、感光化射线性或感放射线性膜、空白屏蔽及图案形成方法 Of ray photosensitive or radiation-sensitive resin composition, a photosensitive or radiation of the radiation-sensitive film, and the pattern forming method shield blank
07/02/2014CN103907058A 纳米复合正型光敏性组合物及其用途 Nanocomposite positive photosensitive composition and use thereof
07/02/2014CN103907057A 纳米复合负型光敏性组合物及其用途 Nanocomposite negative type photosensitive compositions and uses
07/02/2014CN103907056A 独立自支撑膜的制造及其在纳米颗粒图案合成中的应用 Independent self-supporting production of a film and its application in the synthesis of nanoparticles pattern
07/02/2014CN103906740A 酚类单体、含有该酚类单体的用于形成抗蚀剂下层膜的聚合物以及含有该聚合物的用于制备抗蚀剂下层膜的组合物 Phenolic monomers containing the phenolic monomer for forming a resist underlayer film containing a polymer and the polymer compositions for the resist underlayer film
07/02/2014CN103903959A 减压干燥装置以及减压干燥方法 Vacuum drying equipment and vacuum drying method
07/02/2014CN103901832A 串行同步控制系统 Serial Synchronous Control System
07/02/2014CN103901740A 光刻对准标记的放置方法 Placement photolithography alignment marks
07/02/2014CN103901739A 用于去除溶剂的装置和使用该装置的光刻装置 The solvent was removed and the means for the device using a lithographic apparatus
07/02/2014CN103901738A 一种采用压缩感知技术的光源优化方法 One kind of light sensing technology using compression optimization method
07/02/2014CN103901737A 用于euv掩模版的表膜和多层反射镜 Tables for euv reticle and multilayer mirror film
07/02/2014CN103901736A 一种曝光机中工作软片深度贴紧的方法 A machine working film exposure depth into close contact
07/02/2014CN103901735A 硅片推顶机构 Wafer ejector mechanism
07/02/2014CN103901734A 一种工件台线缆装置 A work station cable system
07/02/2014CN103901733A 曝光装置 Exposure device
07/02/2014CN103901732A 硅片交接装置 Wafer transfer device
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