| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/13/2008 | WO2008029758A1 Mobile body driving method, mobile body driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method |
| 03/13/2008 | WO2008029757A1 Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus, device manufacturing method and calibration method |
| 03/13/2008 | WO2008029673A1 Radiation-sensitive composition and process for producing low-molecular compound for use therein |
| 03/13/2008 | WO2008029611A1 Mask pattern design method, mask pattern design device, and semiconductor device manufacturing method |
| 03/13/2008 | WO2008029315A2 Method of cleaning a surface region covered with contaminant or undesirable material |
| 03/13/2008 | WO2008028458A2 Lithography method for producing a feature |
| 03/13/2008 | WO2008004048A3 Methods and apparatus for applying patterns of non-contiguous features |
| 03/13/2008 | WO2008004047A3 Methods and apparatus for selecting and applying non-contiguous features in a pattern |
| 03/13/2008 | WO2008002134A3 Arrangement for cleaning a surface in a lithographic apparatus |
| 03/13/2008 | WO2007031803A3 Molecular resists based on functionalized polycarbocycles |
| 03/13/2008 | WO2004012854A3 Method for preparing photosensitive barrier rib paste composition for fabricating plasma display pannel |
| 03/13/2008 | US20080065339 Method and system for measuring patterned structures |
| 03/13/2008 | US20080064780 cationically curable component having epoxy group containing component; oxetane group containing component, multifunctional acrylate and a radical photoinitiator and a cationic photoinitiator; use in stereolithography; flexibility, elongation, tensile strength, curl resistance, water resistance |
| 03/13/2008 | US20080064226 Method of processing a substrate, heating apparatus, and method of forming a pattern |
| 03/13/2008 | US20080063988 Exposure method and method for manufacturing semiconductor device |
| 03/13/2008 | US20080063984 Process Solutions Containing Surfactants |
| 03/13/2008 | US20080063983 Methods of fabricating a electronic device and a sililation polyvinyl phenol for a dielectric layer of an electronic device |
| 03/13/2008 | US20080063982 disposing a fluid between the workpiece and projection lens system, containing first atoms( carbon, carbonitrides, boronitrides, halides) arranged in the shape of a fullerene, desposing ro doping second atom(salt, oxide, halide, metal, acid) being disposed within the fullerene-shaped first atoms |
| 03/13/2008 | US20080063981 Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate |
| 03/13/2008 | US20080063980 Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element |
| 03/13/2008 | US20080063978 Photo-curable resin composition, method of patterning the same, and ink jet head and method of fabricating the same |
| 03/13/2008 | US20080063975 Polymer, Positive Resist Composition and Method for Forming Resist Pattern |
| 03/13/2008 | US20080063974 Reduced defects; improved shape and stability of latent image; comprised of acrylate copolymer having lactone ring and polycyclic ring containing monomers; increased alkali solubility under action of acid generator upon exposure |
| 03/13/2008 | US20080063955 Flame retardancy; halogen free; curing shrinkage and solder resistance; resin comprised of linear polymer containing ethylenic unsaturated compound with carboxyl groups, multifunctional ethylenic unsaturated monomers, photopolymerization initiator and phosphorated epoxy resin |
| 03/13/2008 | US20080063953 Process for producing dye-containing negative curable composition, color filter, and color filter production process |
| 03/13/2008 | US20080063880 Ultra-large scale integrated (ULSI); film stack; hydrosilation |
| 03/13/2008 | US20080063851 Elastomeric mask and use in fabrication of devices |
| 03/13/2008 | US20080063786 Method for changing concentration of treatment solution and treatment solution supply apparatus |
| 03/13/2008 | US20080063258 Defect inspection apparatus |
| 03/13/2008 | US20080062406 Method and system for measuring patterned structures |
| 03/13/2008 | US20080062398 Pattern writing apparatus and pattern writing method |
| 03/13/2008 | US20080062389 Method and apparatus for personalization of semiconductor |
| 03/13/2008 | US20080061247 Lithography system |
| 03/13/2008 | US20080061246 Apparatus for Blanking a Charged Particle Beam |
| 03/13/2008 | DE10341594B4 Anordnung zur hochgenauen Positionierung und Messung von auf Objekttischen angeordneten Ojekten Arrangement for high accuracy positioning and measurement of arrayed on object tables ojects |
| 03/13/2008 | DE102007041160A1 Substratabdeckung, und Einrichtung und Verfahren zum Schreiben mit einem Strahl geladener Teilchen Substrate cover, and device and method for writing with a beam of charged particles |
| 03/13/2008 | DE102006040728A1 Verfahren und Vorrichtung zum Herstellen eines elektronischen Moduls Method and apparatus for producing an electronic module |
| 03/13/2008 | DE102006039895A1 Verfahren zur Korrektur von durch Intensitätsverteilungen in optischen Systemen erzeugten Abbildungsveränderungen sowie entsprechendes optisches System A method of correcting by intensity distributions in optical systems generated illustration changes and corresponding optical system |
| 03/13/2008 | DE102006039821A1 Projection exposure apparatus for microlithography, has manipulator with linear drive, which is designed as direct drive such that lens is displaced up to specific micrometers with accuracy of ten millimeters in two degrees of freedom |
| 03/13/2008 | DE102006039760A1 Beleuchtungssystem mit einem Detektor zur Aufnahme einer Lichtintensität Lighting system with a detector for receiving a light intensity |
| 03/13/2008 | DE102004052994B4 Multistrahlmodulator für einen Partikelstrahl und Verwendung des Multistrahlmodulators zur maskenlosen Substratsstrukturierung Multibeam modulator for a particle beam and using the multibeam modulator for maskless patterning substrate |
| 03/13/2008 | DE102004020744B4 Testlayout zur präzisen Überwachung von 3-Foil Linsenaberrationseffekten Test layout for precise monitoring of 3-Foil Linsenaberrationseffekten |
| 03/12/2008 | EP1898451A1 Electrode patterning layer comprising polyamic acid or polyimide and electronic device using the same |
| 03/12/2008 | EP1898448A1 Exposure apparatus, substrate processing method, and device producing method |
| 03/12/2008 | EP1898241A1 Optical element, optical element holding apparatus, exposure apparatus and device manufacturing method |
| 03/12/2008 | EP1897869A1 Novel compound, polymer and radiation-sensitive resin composition |
| 03/12/2008 | EP1897679A1 Apparatus for producing customized contact lenses |
| 03/12/2008 | EP1896904A2 Method of cleaning optical surfaces of an irradiation unit in a two-step process |
| 03/12/2008 | EP1896903A2 Debris mitigation system with improved gas distribution |
| 03/12/2008 | EP1896902A1 Method for a multiple exposure beams lithopraphy tool |
| 03/12/2008 | EP1896901A1 Image enhancement technique |
| 03/12/2008 | EP1896899A2 Methods and devices for characterizing polarization of illumination system |
| 03/12/2008 | EP1896811A2 Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals |
| 03/12/2008 | EP1896197A1 Method of cleaning and after treatment of optical surfaces in an irradiation unit |
| 03/12/2008 | EP1573402B1 Illumination system having a more efficient collector optic |
| 03/12/2008 | CN201035369Y Micro computer controlling exposure machine |
| 03/12/2008 | CN201035322Y Printed plate-making mechanism |
| 03/12/2008 | CN201035321Y Light shield rack used for storing light shield |
| 03/12/2008 | CN201035320Y Gleam device high speed paralleling direct writing manufacturing system |
| 03/12/2008 | CN201035319Y device for processing obsolete photoresist |
| 03/12/2008 | CN201035318Y Nano silver emulsion photoengraving forming optical coded disc |
| 03/12/2008 | CN201035317Y Modified type light blockage bottle device |
| 03/12/2008 | CN101142534A Exposure apparatus and exposure method |
| 03/12/2008 | CN101142533A Process of imaging a photoresist with multiple antireflective coatings |
| 03/12/2008 | CN101142532A Photolithographic patterning of polymeric materials |
| 03/12/2008 | CN101142531A Lithographic printing plates with high print run stability |
| 03/12/2008 | CN101142530A Positive-working photoresist composition for thick film formation |
| 03/12/2008 | CN101142529A 感光性树脂组合物 The photosensitive resin composition |
| 03/12/2008 | CN101142528A Photosensitive resin composition, printed wiring board, and semiconductor package substrate |
| 03/12/2008 | CN101142527A Photosensitive composition containing organic fine particles |
| 03/12/2008 | CN101142526A Photocurable resin composition for forming black matrix, photosensitive film using the same, method for forming black matrix, black matrix and plasma display panel having the black matrix |
| 03/12/2008 | CN101142525A Pattern formation material, pattern formation device, and pattern formation method |
| 03/12/2008 | CN101142252A (meth)acryloyl group-containing aromatic isocyanate compound and production process thereof |
| 03/12/2008 | CN101140883A Method of manufacturing flash memory device |
| 03/12/2008 | CN101140882A Through-hole etching method |
| 03/12/2008 | CN101140881A Through-hole etching method |
| 03/12/2008 | CN101140863A Method of manufacturing semiconductor device |
| 03/12/2008 | CN101140854A Method for forming fine pattern of semiconductor device |
| 03/12/2008 | CN101140761A Method for joining magnetic head rectangular bar in photoetching technology |
| 03/12/2008 | CN101140428A Photoresist stripper composition |
| 03/12/2008 | CN101140427A Method and apparatus for measuring drawing position, and method and apparatus for drawing image |
| 03/12/2008 | CN101140426A Lithographic apparatus and device manufacturing method |
| 03/12/2008 | CN101140425A Exposing device, exposing method and method for manufacturing display panel substrate |
| 03/12/2008 | CN101140424A Subsection interleaving aligning mark combined and aligning thereof |
| 03/12/2008 | CN101140423A Transmission aligning mark combination used for mask alignment and mask alignment method thereof |
| 03/12/2008 | CN101140422A Mask alignment making and aligning used for light scribing device |
| 03/12/2008 | CN101140421A Method for forming a photoresist pattern |
| 03/12/2008 | CN101140420A Photoresist composition and method of forming a resist pattern |
| 03/12/2008 | CN101140419A Method and apparatus for manufacturing band stop filter |
| 03/12/2008 | CN101140418A Filter sheet, display device component and manufacturing method thereof |
| 03/12/2008 | CN101140417A Semiconductor device with a bulb-type recess gate |
| 03/12/2008 | CN101140398A Method for manufacturing liquid crystal display panel and liquid crystal display panel |
| 03/12/2008 | CN101140378A Manufacturing method of color filter substrate |
| 03/12/2008 | CN101140333A Colorful optical filter and LCD device |
| 03/12/2008 | CN101139712A Stripping method |
| 03/12/2008 | CN101138757A Nozzle device and nozzle cleaning device thereof |
| 03/12/2008 | CN100375250C Composition for removing sidewall residues |
| 03/12/2008 | CN100375247C Plasma processing method and plasma processing device |
| 03/12/2008 | CN100375239C Method for forming corrosion-resisting pattern and distribution pattern, and method for making semiconductor device |
| 03/12/2008 | CN100375238C Exposure apparatus and device fabrication method using the same |