Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2008
03/20/2008US20080068595 Measurement Method, Exposure Method, and Device Manufacturing Method
03/20/2008US20080068577 Lithographic apparatus and device manufacturing method
03/20/2008US20080068576 Projection optical system and method for photolithography and exposure apparatus and method using same
03/20/2008US20080068574 Helical Optical Pulse Stretcher
03/20/2008US20080068573 Projection optical system and method for photolithography and exposure apparatus and method using same
03/20/2008US20080068572 Exposure method and apparatus, and method for fabricating device
03/20/2008US20080068567 Exposure Apparatus, Exposure Method, and Method for Producing Device
03/20/2008US20080067454 Contamination barrier and lithographic apparatus
03/20/2008US20080067453 Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
03/20/2008US20080067424 Lithographic apparatus, beam delivery systems, prisms and device manufacturing method
03/20/2008DE102007039671A1 Projection exposure apparatus for semiconductor lithography, has temperature regulating element i.e. Peltier element, regulating temperature of regions of optical elements, where sensor is placed in edge region of optical elements
03/20/2008DE102007035767A1 Material comprising an organosiloxane polymer with alkali-soluble groups in a solvent, used for making a cover film to protect the resist film during production of electronic devices by the immersion exposure technique
03/20/2008DE102007033632A1 Systeme und Verfahren zum Messen von Leistung in Lithographiesystemen Systems and methods for measuring power in lithography systems
03/20/2008DE102006041774A1 Lithographieverfahren zur Herstellung einer Struktur Lithography process for manufacturing a structure
03/20/2008DE102006039655A1 Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostruktuierten Bauelements mit einer derartigen Projektionsbelichtungsanlage sowie durch dieses Verfahren hergestelltes mikrostrukturiertes Bauelement Illumination system for a microlithography projection exposure apparatus, projection exposure system with such an illumination system, method for producing a mikrostruktuierten device with such a projection exposure apparatus and produced by this method microstructured component
03/19/2008EP1901339A1 Exposure apparatus, exposure method, device manufacturing method, and system
03/19/2008EP1901338A1 Exposure apparatus and method, exposure apparatus maintenance method, and device manufacturing method
03/19/2008EP1901336A1 Exposure apparatus
03/19/2008EP1901126A1 A collector optical system
03/19/2008EP1901125A1 Optical system for radiation in the EUV-wavelenght range and method for measuring a contamination status of EUV-reflective elements
03/19/2008EP1901124A1 Image recording material
03/19/2008EP1901123A1 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part
03/19/2008EP1901122A2 Method and apparatus for performing model-based OPC for pattern decomposed feature
03/19/2008EP1901117A1 Method for producing photosensitive laminate original printing plate for letterpress printing, photosensitive laminate original printing plate for letterpress printing, and method for producing letterpress printing plate
03/19/2008EP1901101A1 Optical element unit and method of supporting an optical element
03/19/2008EP1901027A2 Exposure apparatus and device manufacturing method
03/19/2008EP1899768A1 Toner, and toner production process
03/19/2008EP1899766A2 Thermal development system and method of using the same
03/19/2008EP1899756A2 Arrangement for mounting an optical component
03/19/2008EP1899697A2 Euv light source collector lifetime improvements
03/19/2008EP1899641A1 Reflector
03/19/2008EP1899115A2 Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an euv light source
03/19/2008EP1573366A4 Continuous direct-write optical lithography
03/19/2008EP1521990A4 Compensator for radially symmetric birefringence
03/19/2008EP1314725B1 Sulfonium salt compound
03/19/2008EP1000371A4 Ultra-broadband uv microscope imaging system with wide range zoom capability
03/19/2008CN201039570Y Energy saving control circuit for plate burning exposal lamp
03/19/2008CN101146683A Method and apparatus for laminated substrate assembly
03/19/2008CN101146408A Wiring forming system and wiring forming method for forming wiring on wiring board
03/19/2008CN101145515A Method for forming a fine pattern of a semiconductor device
03/19/2008CN101145514A Method of forming fine pattern of semiconductor device
03/19/2008CN101145513A Method for forming fine pattern of semiconductor device
03/19/2008CN101144988A Temperature gradient controllable wafer front-drying method and its hot plate type front drying device
03/19/2008CN101144987A Chemical solution and method for processing substrate by using the same
03/19/2008CN101144986A Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
03/19/2008CN101144985A Projection aligner including correction filters
03/19/2008CN101144984A Exposure device
03/19/2008CN101144983A Method for fabricating a thin film pattern, liquid crystal display panel and its production method
03/19/2008CN101144982A Method for correcting photomask figure, system and storage medium for using same
03/19/2008CN101144981A Laminated board comprising photopolymer
03/19/2008CN101144980A Photosensitive resin plate support and process for preparing the same
03/19/2008CN101144979A Solvent for photoresist and photoresist composition for slit coating by using the same
03/19/2008CN101144978A Method for forming microlens array structure
03/19/2008CN101144977A Mold for nano-imprinting and method of manufacturing the same
03/19/2008CN101144974A Photomask having self-masking layer and methods of etching same
03/19/2008CN101144973A Method of etching extreme ultraviolet light photomasks
03/19/2008CN101144971A Phase shifting photomask and a method of fabricating thereof
03/19/2008CN101144864A Method for producing optical member and method for producing molding die for optical member
03/19/2008CN100376037C Method of manufacturing fine T-shaped electrode
03/19/2008CN100376016C A method for preventing side lobe from being transferred to substrate when etching
03/19/2008CN100375914C Micro-optic device
03/18/2008US7346886 Method and apparatus for determining chip arrangement position on substrate
03/18/2008US7346882 Pattern forming method, mask manufacturing method, and LSI manufacturing method
03/18/2008US7346414 Moving mechanism and stage system in exposure apparatus
03/18/2008US7346235 Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device
03/18/2008US7346093 DUV light source optical element improvements
03/18/2008US7345865 Magnetic guiding apparatus
03/18/2008US7345742 Environmental system including a transport region for an immersion lithography apparatus
03/18/2008US7345741 Illumination optical system and exposure apparatus
03/18/2008US7345739 Lithographic alignment system and device manufacturing method
03/18/2008US7345737 Exposure method and apparatus having a projection optical system in which a projection gap is filled with liquid
03/18/2008US7345736 Lithographic apparatus and device manufacturing method
03/18/2008US7345735 Apparatus for aberration detection and measurement
03/18/2008US7345727 Substrate for a liquid crystal display device and fabricating method thereof
03/18/2008US7345443 Motor control apparatus
03/18/2008US7345311 Semiconductor substrate, method of manufacturing the semiconductor substrate, semiconductor device and pattern forming method
03/18/2008US7345290 Lens array for electron beam lithography tool
03/18/2008US7345140 Phenol-reacted non-ester alicyclic diepoxides
03/18/2008US7345002 Replication and transfer of microstructures and nanostructures
03/18/2008US7344970 Plating method
03/18/2008US7344827 Fine contact hole forming method employing thermal flow process
03/18/2008US7344826 Method for forming a capacitor
03/18/2008US7344825 Method of fabricating semiconductor device, and developing apparatus using the method
03/18/2008US7344824 Alternating aperture phase shift photomask having light absorption layer
03/18/2008US7344822 Incompletely oxidized transition metal having oxygen content lower than stoichiometric oxygen content; selectively exposed and developed to pattern; resolution
03/18/2008US7344821 having high sensitivity and high resolution and being excellent in the pattern profile, line edge roughness, dissolution contrast, surface roughness and prevention of negative conversion
03/18/2008US7344820 novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto; high resolution and excellent etching resistance
03/18/2008US7344805 Mask and method for producing thereof and a semiconductor device using the same
03/18/2008US7344756 Method for scanning probe contact printing
03/18/2008US7344600 Substrate treatment apparatus
03/18/2008US7344322 Drying device and drying method
03/18/2008US7343960 Method and apparatus for production of a cast component
03/18/2008US7343857 Imprint apparatus and method for imprinting
03/18/2008US7343856 Apparatus for controlling the temperature of an exposure drum in a printing plate exposer
03/13/2008WO2008030092A2 Apparatus for illuminating a surface
03/13/2008WO2008029917A1 Mask, exposure apparatus and device manufacturing method
03/13/2008WO2008029884A1 Cleaning member, cleaning method and device manufacturing method
03/13/2008WO2008029852A1 Optical device, exposure apparatus, and method for manufacturing device
03/13/2008WO2008029816A1 Photosensitive resin composition, method for control of refractive index, and optical waveguide and optical component using the same
03/13/2008WO2008029777A1 Photosensitive resin composition
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