| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 03/26/2008 | EP1902019A1 Sulphonium salt initiators |
| 03/26/2008 | EP1805137B1 Thiol compound and photosensitive composition using the same |
| 03/26/2008 | EP1730592A4 Permanent resist composition, cured product thereof, and use thereof |
| 03/26/2008 | EP1690133A4 Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide |
| 03/26/2008 | EP1609618B1 Lithographic printing plate original form and plate making method |
| 03/26/2008 | EP1280664B1 Chemical imaging of a lithographic printing plate |
| 03/26/2008 | CN101151580A Flame-retardant composition for solder resist and cured product thereof |
| 03/26/2008 | CN101151579A Photosensitive resin composition and circuit substrate employing the same |
| 03/26/2008 | CN101151559A Transfer material, and process for producing liquid crystal cell substrate and liquid crystal display device using the same |
| 03/26/2008 | CN101151338A Colorant dispersion, coloring resin composition, color filter, and liquid-crystal display device |
| 03/26/2008 | CN101150052A Method of patterning an anti-reflective coating by partial etching |
| 03/26/2008 | CN101150048A Method for forming patterns using single mask |
| 03/26/2008 | CN101149570A Process for reclaiming light shield |
| 03/26/2008 | CN101149569A Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method |
| 03/26/2008 | CN101149568A Detector and its detection method |
| 03/26/2008 | CN101149567A Step scan projection stepper synchronous controller |
| 03/26/2008 | CN101149566A Step scan projection stepper synchronous control system |
| 03/26/2008 | CN101149565A Asymmetric transmission mark combination and its aligning method |
| 03/26/2008 | CN101149564A Alignment mark and its imaging optical system and imaging method |
| 03/26/2008 | CN101149563A Electron beam alignment mark manufacture method and its uses |
| 03/26/2008 | CN101149562A Photosensitive composition, photosensitive film, permanent pattern forming method and printing circuit board |
| 03/26/2008 | CN101149561A Main body film forming resin for photoresist and its preparation method and uses |
| 03/26/2008 | CN101149560A Micro structure mold core and its manufacture method |
| 03/26/2008 | CN101149559A Method for preparing ball-shaped bump biological microelectrode array |
| 03/26/2008 | CN101149546A Liquid crystal display device with thin-film transistor on color film and its manufacture method |
| 03/26/2008 | CN101149542A Liquid crystal display device with color film on thin-film transistor and its manufacture method |
| 03/26/2008 | CN101149541A Liquid crystal display device with color film on thin-film transistor and its manufacture method |
| 03/26/2008 | CN101149536A Liquid crystal display panel and method of making the same |
| 03/26/2008 | CN101149513A Block layer structure for a display panel and method for producing same |
| 03/26/2008 | CN101149505A Liquid crystal display device and manufacturing method thereof |
| 03/26/2008 | CN100377305C Method for producing semiconductor integrated circuit |
| 03/26/2008 | CN100377304C Method for improving the critical dimension uniformity of patterned features on wafers |
| 03/26/2008 | CN100377303C Reflection mirror apparatus, exposure apparatus and device manufacturing method |
| 03/26/2008 | CN100377298C Substrate processing apparatus and substrate processing method |
| 03/26/2008 | CN100377004C Image forming material and ammonium compound |
| 03/26/2008 | CN100376992C Manufacturing method for common electrode of liquid crystal display device |
| 03/26/2008 | CN100376953C Method for manufacturing light guiding plate core |
| 03/26/2008 | CN100376917C Programmable optical component for spatially controlling the intensity of beam of radiation |
| 03/26/2008 | CN100376905C Radiation-ray sensitive composition for colour-filtering piece, colour filtering piece and colour liquid crystal display device |
| 03/25/2008 | US7350181 Set of masks, method of generating mask data and method for forming a pattern |
| 03/25/2008 | US7349101 Lithographic apparatus, overlay detector, device manufacturing method, and device manufactured thereby |
| 03/25/2008 | US7349090 Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography |
| 03/25/2008 | US7349072 Lithographic apparatus and device manufacturing method |
| 03/25/2008 | US7349070 Multiple level photolithography |
| 03/25/2008 | US7349067 Lithographic apparatus and device manufacturing method |
| 03/25/2008 | US7349065 Exposure apparatus and device fabrication method |
| 03/25/2008 | US7349064 Immersion exposure technique |
| 03/25/2008 | US7349063 Reflection mirror apparatus, exposure apparatus and device manufacturing method |
| 03/25/2008 | US7349050 Ultraviolet irradiating device and method of manufacturing liquid crystal display device using the same |
| 03/25/2008 | US7348695 Linear motor, moving stage system, exposure apparatus, and device manufacturing method |
| 03/25/2008 | US7348582 Light source apparatus and exposure apparatus having the same |
| 03/25/2008 | US7348565 Illumination system particularly for microlithography |
| 03/25/2008 | US7348300 polyether surfactants used to reduce surface tension of aqueous or nonaqueous process solutions |
| 03/25/2008 | US7348133 Method of manufacturing solid-state image sensing device |
| 03/25/2008 | US7348132 Exposing oleophilic photosensitive layer comprising polymeric binder, urethane (meth)acrylate monomer, nonurethane (meth)acrylate monomer, free radical initiator, and sensitizing dye, and water soluble or dispersible overcoat; hardening; removing non-exposed areas with aqueous developer or ink |
| 03/25/2008 | US7348131 Photosensitive polymeric binder, free radical polymerizable (meth)acrylate monomer or oligomer, free radical initiator, sensitizing dye and water soluble overcoat are exposed and hardened; rinsing; removing overcoat; developing exposed and deactivated plate with both ink and fountain solution; durability |
| 03/25/2008 | US7348130 Electron exposure to reduce line edge roughness |
| 03/25/2008 | US7348128 Storage stability, affinity, miscibility; acetalized high cure-related sensitivity; flexibility, uniformity; photocurable hydrogel or pattern formation by use of an aqueous developer |
| 03/25/2008 | US7348127 Topcoats for use in immersion lithography |
| 03/25/2008 | US7348126 Negative working, heat-sensitive lithographic printing plate precursor |
| 03/25/2008 | US7348123 Imagewise exposing to actinic radiation a photopolymerizable elastomeric layer on support having a thermoplastic binder; an addition polymerizable compound; and a photoinitiator; heat treating to remove unpolymerized material to form a relief image; rheology |
| 03/25/2008 | US7348122 Photosensitive resin composition and method for manufacturing semiconductor device using the same |
| 03/25/2008 | US7348111 Reduction of imaging artifacts in a platesetter having a diffractive modulator |
| 03/25/2008 | US7348109 increases the number of semiconductor dice obtained from one semiconductor; dicing line is not formed through the Test Element Group die pattern |
| 03/25/2008 | US7348108 Design and layout of phase shifting photolithographic masks |
| 03/25/2008 | US7348107 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
| 03/25/2008 | US7348104 Performing multilevel alignment; forming resist areas of different thicknesses using varied exposure characteristics; producing large focusing element arrays |
| 03/25/2008 | US7347894 Pigment dispersants and their use |
| 03/25/2008 | US7347683 Mold and molding apparatus using the same |
| 03/20/2008 | WO2008033407A1 Methods for purifying alkane liquids |
| 03/20/2008 | WO2008032863A1 Immersion exposure apparatus and immersion exposure method, and device manufacturing method |
| 03/20/2008 | WO2008032819A1 Mask blank and method for manufacturing transfer mask |
| 03/20/2008 | WO2008032736A1 Dye-containing resist composition containing photoacid generator, and cyclohexadiene-type oxime sulfonate compound |
| 03/20/2008 | WO2008032716A1 Resist material for lithography and method for formation of resist pattern |
| 03/20/2008 | WO2008032714A1 Coating/developing apparatus, coating/developing apparatus control method and storage medium |
| 03/20/2008 | WO2008032675A1 Black-colored photosensitive resin composition, method for formation of black matrix, method for production of color filter, and color filter |
| 03/20/2008 | WO2008032674A1 Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board |
| 03/20/2008 | WO2008032522A1 Positive-type resist composition and method for formation of resist pattern |
| 03/20/2008 | WO2008032512A1 Positive-type resist composition and method for formation of resist pattern |
| 03/20/2008 | WO2008032440A1 Image recording device |
| 03/20/2008 | WO2008031576A1 Optical arrangement for immersion lithography with a hydrophobic coating and projection exposure apparatus comprising the same |
| 03/20/2008 | WO2008031514A2 A collector optical system |
| 03/20/2008 | WO2008013798A3 Alignment for contact lithography |
| 03/20/2008 | WO2008012111B1 Multi-reflection optical systems and their fabrication |
| 03/20/2008 | WO2008011970A3 Movable workpiece support for a machine, and machining system comprising a corresponding workpiece support |
| 03/20/2008 | WO2007142988A3 Uv and visible laser systems |
| 03/20/2008 | US20080070416 Phase shift mask including a substrate with recess |
| 03/20/2008 | US20080070165 Patterning photoresist; transferring to a hardmask layer underlying the photoresist layer and a temporary amorphous or transparent carbon layer; forming spacers on sidewalls; reducing widths by isotropically etching before forming spacers; integrated circuits; photolithography; computers, flash memory |
| 03/20/2008 | US20080070163 Processless lithographic printing plate precursor |
| 03/20/2008 | US20080070160 Negative-working photosensitive resin composition and photosensitive resin plate using the same |
| 03/20/2008 | US20080070156 Structure for pattern formation, method for pattern formation, and application thereof |
| 03/20/2008 | US20080070155 Inclusion complex, photoresist composition having the inclusion complex and method of forming a pattern using the photoresist composition |
| 03/20/2008 | US20080070125 laminates comprising sheet substrates provided with a resin layer and hologram formation layer provided between a radiation transparent sheet provided with receptive layers; image colorfastness and transfer accuracy |
| 03/20/2008 | US20080070124 optical recording media comprising a mixture of polymers, photoinitiators and binder comprising a polymer capable of forming a three-dimensional crosslinked structure by non-polymerization reaction |
| 03/20/2008 | US20080069606 Image forming method and image forming apparatus |
| 03/20/2008 | US20080068724 Projection optical system and method for photolithography and exposure apparatus and method using same |
| 03/20/2008 | US20080068695 Tracing Method And Apparatus |
| 03/20/2008 | US20080068614 Methods and systems for interferometric analysis of surfaces and related applications |
| 03/20/2008 | US20080068611 Method and system for measuring patterned structures |
| 03/20/2008 | US20080068599 Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements |