| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/02/2008 | CN101153977A Manufacturing method for cholesterol LCD element and its products |
| 04/02/2008 | CN101153969A Manufacturing method for reflection mirror of silicon-based LCD device |
| 04/02/2008 | CN101153927A Method for manufacturing optical element |
| 04/02/2008 | CN101153919A Microlens, method of manufacturing microlens, and photomask used for manufacturing method |
| 04/02/2008 | CN101152919A Mask shell, mask box, pattern trasscription mehod and method for manufacturing display device |
| 04/02/2008 | CN100379324C Wet filming method of flexible printed circuit |
| 04/02/2008 | CN100378983C Semiconductor unit |
| 04/02/2008 | CN100378910C Pattern control system |
| 04/02/2008 | CN100378578C Solvents and photoresist compositions for short wavelength imaging |
| 04/02/2008 | CN100378565C Gray mask and manufacturing method thereof |
| 04/02/2008 | CN100378513C Liquid crystal panel and method of exposing the same |
| 04/02/2008 | CN100378468C Waveguide compositions and waveguides formed therefrom |
| 04/01/2008 | USRE40211 Generates an acid by irradiating with KrF excimer laser light (248.4 nm), ArF excimer laser light (193 nm), electron beams, X-rays; photoresist, photosensitive material |
| 04/01/2008 | US7353145 Method for correcting a mask pattern, a computer program product, a method for producing a photomask, and method for manufacturing a semiconductor device |
| 04/01/2008 | US7352478 Assessment and optimization for metrology instrument |
| 04/01/2008 | US7352475 Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method |
| 04/01/2008 | US7352473 Lithographic apparatus, device manufacturing method, and computer program |
| 04/01/2008 | US7352472 Lithographic apparatus, device manufacturing method, and method for determining z-displacement |
| 04/01/2008 | US7352453 Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| 04/01/2008 | US7352442 Aligner, exposing method, method for manufacturing thin-film transistor, display device, and electronic device using shading means |
| 04/01/2008 | US7352435 Lithographic apparatus and device manufacturing method |
| 04/01/2008 | US7352434 Lithographic apparatus and device manufacturing method |
| 04/01/2008 | US7352433 Lithographic apparatus and device manufacturing method |
| 04/01/2008 | US7352431 Liquid crystal display and manufacturing method thereof |
| 04/01/2008 | US7352384 Method for printing a near field photoinduced stable structure, and optical fibre tip for implementing same |
| 04/01/2008 | US7351521 Photoresist composition for deep ultraviolet lithography |
| 04/01/2008 | US7351518 Crosslinking a mixture of resin, organic compound that can be crosslinked to form a second electrically conductive substance (thiophene), oxidative or reductive crosslinking agent and solvent on patterned electroconductive layer; producing structures in resist layer with electrically charged particles |
| 04/01/2008 | US7351517 Lithographic printing with printing members including an oleophilic metal and plasma polymer layers |
| 04/01/2008 | US7351515 mixture of a resin capable of increasing solubility alkali developers, acid generators and hydroxyl amines, for use in the manufacturing of semiconductors, integrated circuit substrates, liquid crystals and print heads; excellent resolution |
| 04/01/2008 | US7351514 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer |
| 04/01/2008 | US7351513 Planographic printing plate precursor, substrate for the same and surface hydrophilic material |
| 04/01/2008 | US7351294 Photocatalytic; degrading soils; semiconductors; coating surface with a photocatalyst selected from the group consisting of titania and zinc oxide and a ruthenium bi- or ter-pyridyl or phenanthroline-based sensitizer, exposing the surface to visible or infra-red light |
| 04/01/2008 | CA2218434C Fluorinated ionic sulfonylmethylides and sulfonylimides, preparation process and use as photoinitiators |
| 03/27/2008 | WO2008036496A1 Method for double patterning a developable anti-reflective coating |
| 03/27/2008 | WO2008036170A1 Negative-working radiation-sensitive compositions and imageable materials |
| 03/27/2008 | WO2008035785A1 Inorganic-particle-containing resin composition, transfer film, and process for producing member for display panel |
| 03/27/2008 | WO2008035676A1 Method for forming resist pattern |
| 03/27/2008 | WO2008035672A1 Method for manufacturing transparent cured film using positive-working photosensitive resin layer for half exposure |
| 03/27/2008 | WO2008035671A1 Photosensitive coloring composition and color filter |
| 03/27/2008 | WO2008035641A1 Composition for formation of resist protection film, and method for formation of resist pattern using the same |
| 03/27/2008 | WO2008035640A1 Composition for formation of resist protection film, and method for formation of resist pattern using the same |
| 03/27/2008 | WO2008035620A1 Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film |
| 03/27/2008 | WO2008035552A1 Heat treatment apparatus |
| 03/27/2008 | WO2008035542A1 Positive photosensitive lithographic printing plate material |
| 03/27/2008 | WO2008035059A2 Exposure and patterning process for forming multi-layer resist structures |
| 03/27/2008 | WO2008035046A1 Exposure tool and method |
| 03/27/2008 | WO2008035043A1 Method for thermally curing thin films on moving substrates |
| 03/27/2008 | WO2008034636A2 Optical element and method |
| 03/27/2008 | WO2008034592A1 Method for developing and sealing of lithographic printing plates |
| 03/27/2008 | WO2008034582A2 Optical arrangement, in particular projection exposure apparatus for euv lithography, as well as reflective optical element with reduced contamination |
| 03/27/2008 | WO2008016763A3 Patterning and treatment methods for organic light emitting diode devices |
| 03/27/2008 | WO2008007134A3 Method of controlling contamination of a surface |
| 03/27/2008 | WO2007098935A3 Platforms, apparatuses, systems and methods for processing and analyzing substrates |
| 03/27/2008 | WO2007092919A3 Removal of metal residue in integrated circuit manufacture |
| 03/27/2008 | US20080076260 Separation-material composition for photo-resist and manufacturing method of semiconductor device |
| 03/27/2008 | US20080076255 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device |
| 03/27/2008 | US20080076077 Apparatus and method for heating semiconductor wafers with improved temperature uniformity |
| 03/27/2008 | US20080076076 manufacturing an integrated circuit: forming resist layer on circuit layer; subjecting resist layer to a rework process that includes exposing said resist layer to an organic wash; exposing substrate to a mild plasma ash to substantially remove portions of the resist layer but leave the priming layer |
| 03/27/2008 | US20080076075 thin films: computer program; photoresist on the ARC layer; Once the layer of photoresist is optionally removed, a double patterned ARC layer remains for etching the underlying thin film |
| 03/27/2008 | US20080076074 Method for double patterning a developable anti-reflective coating |
| 03/27/2008 | US20080076073 Method for double imaging a developable anti-reflective coating |
| 03/27/2008 | US20080076072 Method for forming fine pattern of semiconductor device |
| 03/27/2008 | US20080076071 highly integrated semiconductor device can be manufactured by forming fine patterns using, for example, a self-alignment double patterning (SADP) process; simplified by reducing process steps and defects of fine pattern are decreased |
| 03/27/2008 | US20080076070 Methods of Forming Fine Patterns In Integrated Circuits Using Atomic Layer Deposition |
| 03/27/2008 | US20080076068 selectively hard masking a semiconductor wafer; baking to drive out solvents in first resist; first resist exposed to and exposing an edge of the wafer to radiation; hard baking and coating; exposing select portions of the wafer edge having the second resist thereon to the second radiation |
| 03/27/2008 | US20080076067 Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution |
| 03/27/2008 | US20080076058 Luminescent photoresist |
| 03/27/2008 | US20080076044 Compound or its tautomer, metal complex compound, colored photosensitive curing composition, color filter, and production |
| 03/27/2008 | US20080076042 Design and Layout of Phase Shifting Photolithographic Masks |
| 03/27/2008 | US20080074700 Graphics engine for high precision lithography |
| 03/27/2008 | US20080074656 Defining a pattern on a substrate |
| 03/27/2008 | US20080074634 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 03/27/2008 | US20080074633 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 03/27/2008 | US20080074632 Illumination optical system, exposure apparatus, and exposure method |
| 03/27/2008 | US20080073982 Magnetic Guide Apparatus, Stage Apparatus, Exposure Apparatus, and Device Manufacturing Method |
| 03/27/2008 | US20080072421 Molded Substrate for Topography Based Lithography |
| 03/27/2008 | DE112006001073T5 Reinigungssystem und -verfahren für eine Immersionsbelichtungsanlage Cleaning system and method for an immersion exposure |
| 03/27/2008 | DE112004002073T5 Bilden von Interferenzen Form of interference |
| 03/27/2008 | DE10318847B4 Verfahren zur Herstellung einer integrierten Schaltung mit zwei Schaltungsteilen A method of fabricating an integrated circuit having two circuit parts |
| 03/27/2008 | DE102007044064A1 Method for producing mirror assembly for semiconductor lithography, particularly for extreme ultraviolet lithography, involves processing of front side of substrate, before applying optical layers in processing step |
| 03/27/2008 | DE102007043635A1 Microlithography projection illumination system for illuminating semiconductor wafer, has collector to determine position of multiplied electrical charge, and radiation detector for position-dissolved detection of electromagnetic radiation |
| 03/27/2008 | DE102007042047A1 Teilsystem einer Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage Subsystem of an illumination device of a microlithography projection exposure apparatus |
| 03/27/2008 | DE102007041455A1 Groove type pattern generating method for substrate i.e. glass substrate, involves radiating ultra-short pulse laser on substrate by positioning point of focus of laser with boundary surface between substrate and photo-sensitive unit |
| 03/27/2008 | DE102006043874A1 Verfahren und Vorrichtung zur Reparatur von Photolithographiemasken Method and apparatus for repair of photolithography masks |
| 03/27/2008 | DE102006043407A1 Optical projection system for UV radiation, has multiple lenses, for projection of object level in image level, where lenses include slightly conductive surface and objective housing electrically contacting lens at conductive surface |
| 03/27/2008 | DE102006042095A1 Basismaterial für fotostrukturierbare Resists und Dielektrika Base material for photo-patternable resist and dielectrics |
| 03/26/2008 | EP1903595A2 Writing data processing control apparatus, writing method, and writing apparatus |
| 03/26/2008 | EP1903400A1 A method to remove resist layers from a substrate |
| 03/26/2008 | EP1903399A1 Method for developing and sealing of lithographic printing plates |
| 03/26/2008 | EP1903398A1 Lithographic apparatus and device manufacturing method |
| 03/26/2008 | EP1903397A2 Method and apparatus for angular-resolved spectroscopic lithography characterization |
| 03/26/2008 | EP1903395A1 Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition |
| 03/26/2008 | EP1903394A1 Resist composition, resin for use in the resist composition, and pattern-forming method using the resist composition |
| 03/26/2008 | EP1903393A2 Curable composition, color filter and manufacturing method thereof |
| 03/26/2008 | EP1903392A2 Fine mold and method for regenerating fine mold |
| 03/26/2008 | EP1903391A2 Composition for holographic recording medium, holographic recording medium, and method for producing the same |
| 03/26/2008 | EP1903390A2 Mask data generation program, mask data generation method, mask fabrication method, exposure method, and device manufacturing method |
| 03/26/2008 | EP1903389A1 Mask data generation program, mask data generation method, mask fabrication method, exposure method, and device manufacturing method |
| 03/26/2008 | EP1903370A1 An optical reduction system for use in photolithography |
| 03/26/2008 | EP1902829A1 Three-dimensional shaped item with smoothed molding end face |