| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/03/2008 | US20080081298 Form a large grain crystal region in an end region in a major-axis direction of laser light by having high energy intensity distribution in the end region in the major-axis direction of the laser light |
| 04/03/2008 | US20080081297 Forming a hard mask layer over a semiconductor substrate and forming a photoresist film pattern over the hard mask layer; silylation; can form relatively micro patterns |
| 04/03/2008 | US20080081295 Developing solution for lithographic printing plates and production method of lithographic printing plate |
| 04/03/2008 | US20080081283 Structure for pattern formation, method for pattern formation, and application thereof |
| 04/03/2008 | US20080081281 Negative-tone photoresist material well suited to the EB lithography or the EUV (extreme ultraviolet light) lithography; high sensitivity, high resolution, and low line edge roughness |
| 04/03/2008 | US20080081271 Method of real time dynamic cd control |
| 04/03/2008 | US20080081270 Photo-curable composition, color filter and method for producing the same, and solid state imager |
| 04/03/2008 | US20080081269 Azo dye compound, coloring composition, ink sheet for thermal transfer recording, thermal transfer recording method, color toner, ink for inkjet, and color filter |
| 04/03/2008 | US20080081264 Optical Components Made From An Inorganic/Organic Hybrid Material For The Production Of Refractive Index Gradient Layers With Rapid Kinetics And Method For The Production Thereof |
| 04/03/2008 | US20080080782 Graphics engine for high precision lithography |
| 04/03/2008 | US20080079923 Methods, Systems, and Computer Program Products for Printing Patterns on Photosensitive Surfaces |
| 04/03/2008 | US20080079922 Pattern generator |
| 04/03/2008 | US20080079917 Developing method and developing unit |
| 04/03/2008 | US20080079866 Optical element and illuminating device, display device, and electronic device, using the optical element |
| 04/03/2008 | US20080078960 Pattern generation methods and apparatuses |
| 04/03/2008 | US20080078741 Method for manufacturing optical element |
| 04/03/2008 | DE202008000805U1 Verbesserung der Luftführung an Innentrommelbelichtern für ablative Druckplatten Improve air guide on internal drum for ablative pressure plates |
| 04/03/2008 | DE102007046419A1 Optical system`s i.e. projection lens for microlithography, imaging characteristics improving method, involves arranging optical correction arrangement in proximity of pupil level of optical system |
| 04/03/2008 | DE102007038704A1 Substrate e.g. color filter substrate of LCD, exposure device, has projection system projecting light, which is reflected from two dimensional optical space modulator, to exposed substrate that is arranged on table |
| 04/03/2008 | DE102007035766A1 Resiststruktur-Verdickungsmarerial, Verfahren zum Ausbilden einer Resiststruktur, Halbleitervorrichtung und Verfahren zum Herstellen derselben Verdickungsmarerial resist pattern, A method of forming a resist pattern, the semiconductor device and method of manufacturing the same |
| 04/03/2008 | DE102006047666A1 Projection lens for micro lithography, has multiple lenses with local optical axis, where one lens is assigned to manipulator with actuators, and input force or input torque is attained by former actuators |
| 04/03/2008 | DE102006047665A1 Optical system e.g. lighting system, for microlithography system, has optical unit supported by retaining units, and actuator incorporating force and/or moment to trigger isotropy-stress voltages to produce voltage birefringence in unit |
| 04/03/2008 | DE102006046675A1 Micro-lithographic projection illumination system for manufacturing e.g. highly integrated electrical circuit, has correction device including correction unit that is attached and demounted in objective without dismantling objective |
| 04/03/2008 | DE102006046200A1 Optical element e.g. mirror, positioning method for microlithography, involves superimposing positioning movement of actuator with oscillatory movement, and changing oscillatory movement during and/or after completion of movement of element |
| 04/03/2008 | DE102006045075A1 Steuerbares optisches Element Controllable optical element |
| 04/03/2008 | DE102006044591A1 Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination The optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination |
| 04/03/2008 | DE102006042987A1 Cleaning method for reflective optical element, particularly for soft X-ray and extreme ultraviolet wavelength range, and for operation of extreme ultraviolet lithography device, involves heating reflective optical element |
| 04/02/2008 | EP1906437A1 Exposure method, exposure device, and device manufacturing method |
| 04/02/2008 | EP1906258A1 Watermark defect reduction in immersion lithographic processing by resist optimisation |
| 04/02/2008 | EP1906257A2 Substrate, method of exposing a subsrate, machine readable medium |
| 04/02/2008 | EP1906256A1 Watermark defect reduction in immersion lithographic processing by resist optimisation |
| 04/02/2008 | EP1906255A1 Immersion lithographic processing using an acid component source for reducing watermarks |
| 04/02/2008 | EP1906254A1 Methods and systems for water uptake control by resist layers |
| 04/02/2008 | EP1906253A1 Projection objective of a microlithographic projection exposure apparatus |
| 04/02/2008 | EP1906252A1 Instrument for measuring the angular distribution of light produced by an illumination system of a microlithographic projection exposure apparatus |
| 04/02/2008 | EP1906251A1 Projection exposure method and projection exposure system |
| 04/02/2008 | EP1906250A2 Method for preparation of photosensitive lithographic printing plate |
| 04/02/2008 | EP1906249A2 Antireflective coating compositions for photolithography |
| 04/02/2008 | EP1906248A1 Resist composition and pattern forming method using the same |
| 04/02/2008 | EP1906247A1 Resist composition and pattern forming method using the same |
| 04/02/2008 | EP1906246A2 Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device |
| 04/02/2008 | EP1906245A1 Photopolymerization type photosensitive lithographic printing plate precursor |
| 04/02/2008 | EP1906244A2 Photopolymerizable lithographic printing plate precursor |
| 04/02/2008 | EP1906243A1 Alkaline-developable photosensitive colored composition |
| 04/02/2008 | EP1906242A1 Photosensitive resin composition |
| 04/02/2008 | EP1906241A1 Resist composition and pattern forming method using the same |
| 04/02/2008 | EP1906240A2 Resist composition and pattern forming method using the same |
| 04/02/2008 | EP1906239A2 Positive resist composition and pattern forming method using the same |
| 04/02/2008 | EP1906238A2 Photosensitive composition and pattern forming method using the same |
| 04/02/2008 | EP1906237A2 Nanostructured pattern method of manufacture |
| 04/02/2008 | EP1906236A2 Imprinting apparatus and method for forming residual film on a substrate |
| 04/02/2008 | EP1905800A1 Copolymer, composition for forming banks, and method for forming banks using the composition |
| 04/02/2008 | EP1905787A2 Polymer latex of high acrylonitrile content, film, pattern forming material and lithographic printing plate precursor using the same, and method for production of polymer latex |
| 04/02/2008 | EP1904899A1 Removing solution for photosensitive composition |
| 04/02/2008 | EP1904898A1 Method for fine line resist stripping |
| 04/02/2008 | EP1904897A2 A passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool |
| 04/02/2008 | EP1904896A1 Active reticle tool and lithographic apparatus |
| 04/02/2008 | EP1904895A1 Lithographic projection system and projection lens polarization sensor |
| 04/02/2008 | EP1904894A1 Pellicle for use in a microlithographic exposure apparatus |
| 04/02/2008 | EP1904878A1 Folded radial brewster polariser |
| 04/02/2008 | EP1904818A2 Systems and methods for euv light source metrology |
| 04/02/2008 | EP1904437A1 Radiation crosslinker |
| 04/02/2008 | EP1800187B1 Method and device for the production of photopolymerisable cylindrical jointless flexographic printing elements |
| 04/02/2008 | EP1787167B1 Laser projection system |
| 04/02/2008 | EP1782127B1 Lithographic printing plate precursor |
| 04/02/2008 | EP1749230A4 Catadioptric imaging system employing immersion liquid for use in broad band microscopy |
| 04/02/2008 | CN101156232A Composition for cleaning ion implanted photoresist in front end of line applications |
| 04/02/2008 | CN101156227A Process for the formation of miniaturized getter deposits and getterdeposits so obtained |
| 04/02/2008 | CN101156226A Exposure method, exposure apparatus, method for manufacturing device, and film evaluation method |
| 04/02/2008 | CN101156111A Remover composition for photoresist of semiconductor device |
| 04/02/2008 | CN101156110A Projection head focus position measurement method and exposure method |
| 04/02/2008 | CN101156109A Pattern forming method |
| 04/02/2008 | CN101154569A Plasma processing method |
| 04/02/2008 | CN101154056A Description point data acquiring method and device, description method and device |
| 04/02/2008 | CN101154055A Method and apparatus for angular-resolved spectroscopic lithography characterization |
| 04/02/2008 | CN101154054A Substrate exposure apparatus and illumination apparatus |
| 04/02/2008 | CN101154053A Resonant scanning mirror |
| 04/02/2008 | CN101154052A Light source for exposure, exposure device, exposure method and method for manufacturing panel substrate |
| 04/02/2008 | CN101154051A Method for forming photo-etching pattern |
| 04/02/2008 | CN101154050A Method for online regulating silicon slice of photo-etching machine to optimum exposure position |
| 04/02/2008 | CN101154049A Method for producing photoresist pattern |
| 04/02/2008 | CN101154048A Method for forming double-mosaic structure |
| 04/02/2008 | CN101154047A Reworking processing method |
| 04/02/2008 | CN101154046A Manufacturing method for double-mosaic structure |
| 04/02/2008 | CN101154045A Photopolymerization type photosensitive lithographic printing plate precursor |
| 04/02/2008 | CN101154044A Solvent-free type flexible photosensitive resin printing plate |
| 04/02/2008 | CN101154043A High-resolution negative-type photoresist |
| 04/02/2008 | CN101154042A Curing composition for nano-imprint lithography and pattern forming method using the same |
| 04/02/2008 | CN101154041A Radiation sensitive resin composition, and formation of interlayer insulating film and microlens |
| 04/02/2008 | CN101154040A Photoresist composition, its coating method and method of forming photoresist pattern |
| 04/02/2008 | CN101154039A Curable composition, color filter and manufacturing method thereof |
| 04/02/2008 | CN101154038A Curing colouration composition, color filtering device and liquid crystal display using the color filtering device |
| 04/02/2008 | CN101154037A Materials for photoresist, photoresist composition and method of forming resist pattern |
| 04/02/2008 | CN101154036A Method for controlling glass etching depth with optical-controlling method |
| 04/02/2008 | CN101154035A Fine mold and method for regenerating fine mold |
| 04/02/2008 | CN101154034A Hologram recording material and hologram recording medium |
| 04/02/2008 | CN101154033A Method of manufacturing display device |
| 04/02/2008 | CN101154032A Photo mask blank material, photo mask and manufacture method, photo mask midbody, pattern copy method of the same |
| 04/02/2008 | CN101154031A Method of forming hardmask pattern of semiconductor device |
| 04/02/2008 | CN101154030A Reticle and method of manufacturing method the same |