| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/10/2008 | US20080083840 Edge remover having a gas sprayer to prevent a chemical solvent from splashing |
| 04/10/2008 | DE19937742B4 Übertragung eines Musters hoher Strukturdichte durch multiple Belichtung weniger dichter Teilmuster Transferring a pattern of high structural density by multiple exposure less dense partial pattern |
| 04/10/2008 | DE112007000015T5 Schmutzvorrichtung, System und Verfahren Dirt device, system and method |
| 04/10/2008 | DE10304674B4 Verfahren zum Belichten eines Substrates mit einem den optischen Proximity-Effekt ausgleichenden Strukturmuster A method for exposing a substrate with an optical proximity effect equalizing structure pattern |
| 04/10/2008 | DE10260610B4 Vorrichtung und Verfahren zum Ausbilden von Mustern Apparatus and method for forming patterns |
| 04/10/2008 | DE102007043846A1 Re-imageable printing plate treating method, involves modifying surface working as printing surface, of plate in nanoscopic range while changing chemical end groups of surface, and applying absorbing layer on surface |
| 04/10/2008 | DE102007042515A1 Lighting system used in microlithography installation, has folding mirrors arranged within range of intermediate image plane or field level for touching beam of light |
| 04/10/2008 | DE102006050889A1 Waferbelichtungseinrichtung und Verfahren Wafer exposure device and method |
| 04/10/2008 | DE102006047387A1 Kompaktes 3-Spiegel-Objektiv Compact 3 Mirror Lens |
| 04/10/2008 | DE102005002434B4 Absorbermaske für die lithographische Strukturierung von Beugungsgittern und Verfahren zu ihrer Herstellung Absorber mask for the lithographic structuring of diffraction gratings, and methods for their preparation |
| 04/10/2008 | DE102004025202B4 Fotolackverarbeitungsverfahren Photoresist processing method |
| 04/10/2008 | DE102004013161B4 Mikrofluidik-Chip Microfluidic chip |
| 04/10/2008 | DE102004012191B4 Stabiler stark alkalischer Entwickler Stable strongly alkaline developer |
| 04/10/2008 | DE10022786B4 Auf der Druckmaschine entwickelbare Druckplatte In press developable printing plate |
| 04/09/2008 | EP1909310A1 Exposure apparatus and method for manufacturing device |
| 04/09/2008 | EP1909142A1 Photosensitive resin composition and adhesion enhancer |
| 04/09/2008 | EP1909141A1 Positive type resist composition and resist pattern formation method using same. |
| 04/09/2008 | EP1909140A1 Positive type resist composition and resist pattern formation method using same. |
| 04/09/2008 | EP1909119A1 Reflective member, optical member, interferometer system, stage device, exposure device, and device manufacturing method |
| 04/09/2008 | EP1907902A2 A method of building a sensor structure |
| 04/09/2008 | EP1907788A2 Methods and systems for ultra-precise measurement and control of object motion in six degrees of freedom by projection and measurement of interference fringes |
| 04/09/2008 | EP1907192A1 Rapid-prototyping method and radiation-hardenable composition of application thereto |
| 04/09/2008 | EP1556896B1 Anti-reflective compositions comprising triazine compounds |
| 04/09/2008 | EP1546811B1 Lithographic printing members and a method and a system for preparation of lithographic printing members |
| 04/09/2008 | CN101160549A Composition comprising polymer having ethylene-dicarbonyl structure for use in forming anti-reflective coating for lithography |
| 04/09/2008 | CN101158820A Method and apparatus for rinsing a substrate during lithographic development processing |
| 04/09/2008 | CN101158819A Method and system for performing development processing during photolithography |
| 04/09/2008 | CN101158818A Alignment apparatus, alignment method and imagery quality detecting method |
| 04/09/2008 | CN101158817A Novel direct-write light scribing device having focusing mechanism |
| 04/09/2008 | CN101158816A Time sharing alignment apparatus and alignment method |
| 04/09/2008 | CN101158815A Air-float magnetic controlled precision movement platform |
| 04/09/2008 | CN101158814A Marker for photo-etching machine aligning and aligning using the same |
| 04/09/2008 | CN101158813A Positive photoresist consumed reactive compound and light sensitive complexes thereof |
| 04/09/2008 | CN101158812A Radiation sensitive resin composition and color filter |
| 04/09/2008 | CN101158811A Radiation sensitive resin composition and color filter |
| 04/09/2008 | CN101158810A Photosensitive resin composition and method of making the same and colorful optical filter preparation method |
| 04/09/2008 | CN101158809A Sub-wavelength micro-nano structure using polystyrol ball to focused photoetching form |
| 04/09/2008 | CN101158808A Light shield capable of improving aerial image alignment checking precision degree and photolithography method |
| 04/09/2008 | CN101158776A Colorful optical filter structure and preparation method thereof |
| 04/09/2008 | CN101158769A Liquid crystal display panel and method for producing same |
| 04/09/2008 | CN101158747A Flexible cantilever micro-mechanical-optical switch preparation method |
| 04/09/2008 | CN101157758A Copolymer, composition for forming banks, and method for forming banks using the composition |
| 04/09/2008 | CN100380691C Method for roughening a surface of a body, and optoelectronic component |
| 04/09/2008 | CN100380604C Method for removing photoresist and etch residues |
| 04/09/2008 | CN100380585C Stage device, exposure apparatus, and method of manufacturing devices |
| 04/09/2008 | CN100380584C Coating device and coating film forming method |
| 04/09/2008 | CN100380583C Method of dividing circuit pattern, method of manufacturing stencil mask, stencil mask and method of exposure |
| 04/09/2008 | CN100380582C Mask and producing method, producing method for semiconductor device with this mask |
| 04/09/2008 | CN100380485C Method of manufacturing original disk for optical disks, and method of manufacturing optical disk |
| 04/09/2008 | CN100380381C Photomask and method for qualifying the same with a prototype specification |
| 04/09/2008 | CN100380235C Exosure method and device |
| 04/09/2008 | CN100380234C Method of measuring critical dimension and overlay in single step |
| 04/09/2008 | CN100380233C Method for raising processing range with eliminating auxiliary characteristic |
| 04/09/2008 | CN100380232C Photosensitive composition for sand milling and photosensitive film laminate containing same |
| 04/09/2008 | CN100380231C Optical etching method |
| 04/09/2008 | CN100380216C Color filter on thin film transistor type liquid crystal display device and method of fabricating the same |
| 04/09/2008 | CN100380143C Colour optical filtering substrate and producing method thereof |
| 04/09/2008 | CN100380141C Dyed layer forming radiation linear combination, colour filter and liquid crystal display screen |
| 04/09/2008 | CN100379897C Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium |
| 04/09/2008 | CN100379807C Organic bottom anti-reflective composition and patterning method using the same |
| 04/09/2008 | CN100379581C Lithographic printing plate original form and plate making method |
| 04/08/2008 | USRE40225 Two-dimensional beam deflector |
| 04/08/2008 | US7355791 Optical system and photolithography tool comprising same |
| 04/08/2008 | US7355678 Projection system for EUV lithography |
| 04/08/2008 | US7355676 Environmental system including vacuum scavenge for an immersion lithography apparatus |
| 04/08/2008 | US7355673 Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout |
| 04/08/2008 | US7355291 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 04/08/2008 | US7355190 Debris mitigation device |
| 04/08/2008 | US7354865 Method for removal of pattern resist over patterned metal having an underlying spacer layer |
| 04/08/2008 | US7354700 Developing exposed photosensitive resin layer, exposure; insulating resin layer is transformed into an insulating material that is extremely transparent |
| 04/08/2008 | US7354698 Imprint lithography |
| 04/08/2008 | US7354697 Forming conductor pattern on dielectric; overcoating with photosensitive solders photoresists, then transparent protective coating; exposure to light |
| 04/08/2008 | US7354693 Polymer, resist protective coating material, and patterning process |
| 04/08/2008 | US7354692 Photoresists for visible light imaging |
| 04/08/2008 | US7354683 Lithography mask for imaging of convex structures |
| 04/08/2008 | US7354681 Scattering bar OPC application method for sub-half wavelength lithography patterning |
| 04/08/2008 | US7354168 Facet mirror having a number of mirror facets |
| 04/08/2008 | CA2364858C Banding-reduced imaging of a printing form |
| 04/03/2008 | WO2008039705A1 Method of creating photolithographic structures with developer-trimmed hard mask |
| 04/03/2008 | WO2008039068A2 Radiation system and lithographic apparatus comprising the same |
| 04/03/2008 | WO2008039060A1 Lithographic apparatus and device manufacturing method |
| 04/03/2008 | WO2008038863A1 Novel organosilane polymer, hardmask composition for resist underlayer film comprising the organosilane polymer, and process of producing semiconductor integrated circuit device using the hardmask composition |
| 04/03/2008 | WO2008038751A1 Line width measuring method, image forming status detecting method, adjusting method, exposure method and device manufacturing method |
| 04/03/2008 | WO2008038602A1 Method of forming pattern |
| 04/03/2008 | WO2008038590A1 Superstratum film forming composition and method of forming photoresist pattern |
| 04/03/2008 | WO2008038550A1 Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film |
| 04/03/2008 | WO2008038544A1 Method for resist lower layer film formation, composition for resist lower layer film for use in the method, and method for pattern formation |
| 04/03/2008 | WO2008038526A1 Method of forming pattern, and material for coating film formation |
| 04/03/2008 | WO2008038460A1 Photosensitive resin composition |
| 04/03/2008 | WO2008038448A1 Negative-type resist composition for electron beam, and method for formation of resist pattern |
| 04/03/2008 | WO2008038131A1 Antireflective coating compositions |
| 04/03/2008 | WO2008037496A2 Projection objective for a microlithography apparatus with improved imaging properties and method for improving the imaging properties of the projection objective |
| 04/03/2008 | WO2008037384A2 Projection exposure method and projection exposure system |
| 04/03/2008 | WO2008037131A1 Dual stage positioning and switching system |
| 04/03/2008 | WO2008021208A3 Sensitizer dyes for photoacid generating systems using short visible wavelengths |
| 04/03/2008 | WO2008012734A3 Device and method for patterning a surface of a polymer layer |
| 04/03/2008 | WO2008010710A3 Correction of spatial instability of an euv source by laser beam steering |
| 04/03/2008 | WO2007098453A3 Method and apparatus for determining focus and source telecentricity |
| 04/03/2008 | WO2007093797A3 Methods and means relating to photopolymer printing plates |
| 04/03/2008 | US20080081385 Methods and systems for inspection of wafers and reticles using designer intent data |