| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/17/2008 | DE112006001320T5 Verfahren und Vorrichtung zum Nachtempern eines Resists nach dem Belichten Method and apparatus for annealing of a resist after exposure |
| 04/17/2008 | DE102007047299A1 Image quality measuring device for extreme UV-wavelength range, has sensor support structure with bearing system for storing sensor carrier, where bearing system is partially arranged outside of vacuum container |
| 04/17/2008 | DE102007041151A1 F-dotiertes Quarzglas und Verfahren zur Herstellung desselben F-doped silica glass and process for production thereof |
| 04/16/2008 | EP1912099A2 Plate drum loadable as a sleeve for an imaging device |
| 04/16/2008 | EP1912098A1 Unit magnification projection objective |
| 04/16/2008 | EP1910898A1 Polarization analyzer, polarization sensor and method for determining a polarization property of a lithographic apparatus |
| 04/16/2008 | EP1910897A2 Imageable printing plate for on-press development |
| 04/16/2008 | EP1910896A2 Photopolymer composition suitable for lithographic printing plates |
| 04/16/2008 | EP1794656B1 Healing algorithm |
| 04/16/2008 | EP1785771A4 Method for producing an image on a material sensitive to a used radiation, method for obtaining a binary hologram (variants) and methods for producing an image by using said hologram |
| 04/16/2008 | EP1695146B1 COATING MATERIALS CONTAINING alpha-(1 -HYDROXYALKYL)ACRYLATES |
| 04/16/2008 | EP1554346B1 Polymer for heat-sensitive lithographic printing plate precursor |
| 04/16/2008 | EP1551936A4 Composition and process for wet stripping removal of sacrificial anti-reflective material |
| 04/16/2008 | CN101164146A Exposure apparatus |
| 04/16/2008 | CN101164144A Exposure method, exposure device, and device manufacturing method |
| 04/16/2008 | CN101164142A Method of adjusting lighting optical device, lighting optical device, exposure system, and exposure method |
| 04/16/2008 | CN101164111A Device for directing radiation to a layer, apparatus with such device and method using such apparatus |
| 04/16/2008 | CN101164016A Non-aqueous photoresist stripper that inhibits galvanic corrosion |
| 04/16/2008 | CN101164015A Liquid immersion lithography system comprising a tilted showerhead |
| 04/16/2008 | CN101164014A Composition for resist underlayer film formation for forming photocrosslinking cured resist underlayer film |
| 04/16/2008 | CN101162725A Image sensors and methods of fabricating image sensors |
| 04/16/2008 | CN101162379A Hologram recording apparatus, hologram recording medium and hologram recording method |
| 04/16/2008 | CN101162369A Low etching photoresist cleaning agent and cleaning method thereof |
| 04/16/2008 | CN101162368A Method, an alignment mark and use of a hard mask material |
| 04/16/2008 | CN101162367A Stage device |
| 04/16/2008 | CN101162366A Method of forming lithographic and sub-lithographic dimensioned structures |
| 04/16/2008 | CN101162365A Photosensitive resin composition and method of making the same and film build method |
| 04/16/2008 | CN101162364A Photosensitive resin composition and method of making the same and film build method |
| 04/16/2008 | CN101162363A Alternating phase shift mask inspection using biased inspection data |
| 04/16/2008 | CN101162314A Display device and method for manufacturing mask plate and display device |
| 04/16/2008 | CN101162313A Method for making cholesterin liquid crystal display device and products thereof |
| 04/16/2008 | CN101162312A LCD photoelectric film containing high surface area grain and preparation method thereof |
| 04/16/2008 | CN101162306A Liquid crystal display device and manufacturing method thereof |
| 04/16/2008 | CN100382269C Method and device for defining substrate position prelatively to supporting table |
| 04/16/2008 | CN100382242C Method for manufacturing semiconductor device |
| 04/16/2008 | CN100382241C Exposure apparatus and method for producing device |
| 04/16/2008 | CN100381935C Direct write-in method and apparatus of parallel laser based on harmonic resonance method |
| 04/16/2008 | CN100381931C Liquid crystal display device having structure of color filter on tft and using in plane switching mode |
| 04/16/2008 | CN100381927C Method for producing array board of liquid crystal display device |
| 04/16/2008 | CN100381925C Liquid crystal display device and method for manufacturing bottom substrate thereof |
| 04/16/2008 | CN100381923C Liquid crystal display apparatus and fabrication method of the same |
| 04/15/2008 | USRE40239 Illumination device for projection system and method for fabricating |
| 04/15/2008 | US7359598 Surface plasmon optic devices and radiating surface plasmon sources for photolithography |
| 04/15/2008 | US7359054 Overlay target and measurement method using reference and sub-grids |
| 04/15/2008 | US7359037 Drive for reticle-masking blade stage |
| 04/15/2008 | US7359034 Exposure apparatus and device manufacturing method |
| 04/15/2008 | US7359033 Exposure method and apparatus |
| 04/15/2008 | US7359032 Lithographic apparatus and device manufacturing method |
| 04/15/2008 | US7359031 Lithographic projection assembly, load lock and method for transferring objects |
| 04/15/2008 | US7359030 Lithographic apparatus and device manufacturing method |
| 04/15/2008 | US7358982 Imaging device for a printing press |
| 04/15/2008 | US7358597 UV-activated dielectric layer |
| 04/15/2008 | US7358582 Planar optical waveguide assembly |
| 04/15/2008 | US7358507 Liquid removal in a method and device for irradiating spots on a layer |
| 04/15/2008 | US7358408 photoacid generators comprising arylsulfonium, aryliodonium, arylsulfonates or aryldisulfonyl compounds useful in photoresists in the field of microlithography; useful for imaging in deep UV (ultraviolet radiation) |
| 04/15/2008 | US7358302 Copolymer of a first ethylenically unsaturated monomer containing fluorine with a second ethylenically unsaturated monomer containing no fluorine and no hydrophilic group; and transparent polymer: polyfluorenes |
| 04/15/2008 | US7358111 Imageable bottom anti-reflective coating for high resolution lithography |
| 04/15/2008 | US7358089 Process for producing a substrate for attachment of cells |
| 04/15/2008 | US7358037 Binder diffusion transfer patterning of a thick film paste layer |
| 04/15/2008 | US7358036 Reactive siloxane oligomer having both aryl and alkyl components, polymerization initiator and crosslinking agent; processability, low birefringence, transparency, heat and moisture resistance; simple, high speed mass production |
| 04/15/2008 | US7358035 Forming a photoresist over a substrate; applying a topcoat comprising fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat; exposing said photoresist to radiation, removing topcoat material and the exposed regions of the photoresist |
| 04/15/2008 | US7358033 Dye-containing curable composition, color filter, and producing process thereof |
| 04/15/2008 | US7358032 Alloy supports having recording multilayers including water insoluble and alkaline soluble polyurethanes, development inhibitors and light to heat conversion dyes, having durability and chemical resistance |
| 04/15/2008 | US7358030 Allowing a compound having a hydroxyl group to react with an alkenyl ether compound in presence of an acid catalyst; forming a protected hydroxy compound; chemical amplification type resist |
| 04/15/2008 | US7358029 Low activation energy dissolution modification agents for photoresist applications |
| 04/15/2008 | US7358028 Slightly alkali-soluble or alkali-insoluble novolak or polyhydroxystyrenic resin ; bisvinyloxyalkylene or polyvinyl ether curing agent; photoacid generator; organic solvent; high sensitivity, heat resistance and resolution; undulation suppression |
| 04/15/2008 | US7358027 Copolymer for use in chemical amplification resists |
| 04/15/2008 | US7358026 Heating exterior surface to cause a portion of the layer to liquefy; pressing development medium and exterior surface into contact at a pressure sufficient for liquefied material to be removed by absorbent material; using a continuous web of development medium that does not stretch, distort, or break |
| 04/15/2008 | US7358025 Photoresist undercoat-forming material and patterning process |
| 04/15/2008 | US7357864 Microfluidic device |
| 04/15/2008 | US7357846 Substrate processing apparatus and substrate processing method |
| 04/15/2008 | CA2350243C Compact multibeam laser light source and interleaving raster scan line method for exposing printing plates |
| 04/10/2008 | WO2008042079A2 Method to form a pattern of functional material on a substrate |
| 04/10/2008 | WO2008041664A1 Apparatus and method for manufacturing photosensitive laminate, photosensitive transfer material, rib and method for forming the same, method for manufacturing laminate, member for display device, color filter for display device, method for manufacturing color filter, and display device |
| 04/10/2008 | WO2008041630A1 Polyorganosiloxane composition |
| 04/10/2008 | WO2008041625A1 Film coating apparatus |
| 04/10/2008 | WO2008041575A1 Stage device and exposure device |
| 04/10/2008 | WO2008041476A1 Resist protective film forming composition and process for the formation of resist patterns |
| 04/10/2008 | WO2008041468A1 Method of forming pattern |
| 04/10/2008 | WO2008041123A1 Photoactive compounds |
| 04/10/2008 | WO2008040650A2 Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type |
| 04/10/2008 | WO2008040648A1 Sulphonium salt photoinitiators |
| 04/10/2008 | WO2008040494A1 Method for improving the imaging properties of an optical system, and such an optical system |
| 04/10/2008 | WO2008040410A1 Microlithographic projection exposure apparatus |
| 04/10/2008 | WO2008017954A3 Antireflective composition for photoresists |
| 04/10/2008 | US20080085850 present invention provides a photoresist stripper including about 5 wt % to about 20 wt % alcohol amine, about 40 wt % to about 70 wt % glycol ether, about 20 wt % to about 40 wt % N-methyl pyrrolidone, and about 0.2 wt % to about 6 wt % chelating agent. |
| 04/10/2008 | US20080085480 Method to remove resist layers from a substrate |
| 04/10/2008 | US20080085479 Pattern forming method and device production process using the method |
| 04/10/2008 | US20080085478 Structure for pattern formation, method for pattern formation, and application thereof |
| 04/10/2008 | US20080085476 inkjet printheads; forming filler structures on a substrate and laminating a dry film which defines a barrier layer around the filler and an orifice layer above the filler; filler structures are removed to form voids within the barrier layer |
| 04/10/2008 | US20080085474 Exposure method using near field light and pattern formation method using the method |
| 04/10/2008 | US20080085473 lithographic photoresist; deep UV, x-ray, electon beam: alpha-cyano- or an alpha-trifluoro methacrylate monomer and a vinyl ether monomer; 157 nm. |
| 04/10/2008 | US20080085472 Method of fabricating semiconductor device |
| 04/10/2008 | US20080085471 cost effective enhanced critical dimensional control, in particular as related to location dependent critical dimension variability; a two-photoexposure apparatus method for photoexposing a photosensitive photoresist material layer |
| 04/10/2008 | US20080085466 Polymer, resist protective coating material, and patterning process |
| 04/10/2008 | US20080085457 Exposure mask and method of manufacturing a film pattern |
| 04/10/2008 | US20080084728 Semiconductor device |
| 04/10/2008 | US20080084550 High throughput wafer stage design for optical lithography exposure apparatus |
| 04/10/2008 | US20080084122 Moving apparatus, exposure apparatus, and device manufacturing method |
| 04/10/2008 | US20080083928 Crystallization apparatus and method, manufacturing method of electronic device, electronic device, and optical modulation element |