| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/23/2008 | CN101167019A Convey error measuring method, calibration method, plotting method, exposure plotting method, plotting device, and exposure plotting device |
| 04/23/2008 | CN101167018A Exposure method and tool |
| 04/23/2008 | CN101167017A Photosensitive lithographic printing plate |
| 04/23/2008 | CN101165598A Lithography apparatus, lithography apparatus and processing module combination and device production method |
| 04/23/2008 | CN101165597A Bi-directional beam divider, aligning system using same and lithography device using the system |
| 04/23/2008 | CN101165596A Lithography device sensor and detection method |
| 04/23/2008 | CN101165595A Precision balance vibration-damping wafer stage movement system |
| 04/23/2008 | CN101165594A Illuminating optic system for microlithography |
| 04/23/2008 | CN101165593A Photosensitive composition and image forming method |
| 04/23/2008 | CN101165592A Dry film, micro-lens and manufacturing method thereof |
| 04/23/2008 | CN101165591A Method for producing two-dimensional polymer photon crystal using flexible offset printing |
| 04/23/2008 | CN101165579A Array substrate for liquid crystal display device and method of fabricating the same |
| 04/23/2008 | CN101165533A High speed variable attenuator |
| 04/23/2008 | CN100383977C Method for making solid camera device |
| 04/23/2008 | CN100383927C Substrate making method and apparatus |
| 04/23/2008 | CN100383913C Method of processing substrate and chemical used in the method |
| 04/23/2008 | CN100383667C Semiconductor element pattern transferring method |
| 04/23/2008 | CN100383666C Photoresist composition and method for forming photoresist pattern |
| 04/23/2008 | CN100383665C Onium salts and the use therof as latent acids |
| 04/23/2008 | CN100383664C Low cost photo etching technique |
| 04/23/2008 | CN100383646C Method for manufacturing liquid crystal display device array substrate |
| 04/23/2008 | CN100383629C Device for manufacturing mesh points of a light conducting plate |
| 04/23/2008 | CN100383627C Manufacturing method of light board |
| 04/23/2008 | CN100383565C Radioactive ray sensitive composition for forming coloring layer, color filter and color liquid crystal display plate |
| 04/23/2008 | CN100383195C Method for synthesizing polymeric azo dyes |
| 04/23/2008 | CN100382871C Special defoamer for printed circuit board |
| 04/22/2008 | US7363611 Printing a mask with maximum possible process window through adjustment of the source distribution |
| 04/22/2008 | US7362556 Combination current sensor and relay |
| 04/22/2008 | US7362520 Device for the low-deformation mounting of a rotationally asymmetric optical element |
| 04/22/2008 | US7362508 Projection optical system and method for photolithography and exposure apparatus and method using same |
| 04/22/2008 | US7362447 Low walk-off interferometer |
| 04/22/2008 | US7362436 Method and apparatus for measuring optical overlay deviation |
| 04/22/2008 | US7362414 Optical system having an optical element that can be brought into at least two positions |
| 04/22/2008 | US7362387 Programmable mask and method for fabricating biomolecule array using the same |
| 04/22/2008 | US7362347 Image recording apparatus having a recording drum rotatable with a recording medium mounted peripherally thereof |
| 04/22/2008 | US7362013 Linear motor, exposure apparatus using the same, and device manufacturing method |
| 04/22/2008 | US7361918 High repetition rate laser produced plasma EUV light source |
| 04/22/2008 | US7361910 Movable stage apparatus |
| 04/22/2008 | US7361718 Alkali-soluble gap fill material forming composition for lithography |
| 04/22/2008 | US7361709 Colored composition, method of manufacturing color filter, and method of manufacturing black matrix substrate |
| 04/22/2008 | US7361631 corrosion resistance; removing photoresist residues; using aqueous solution containing fluoride compound |
| 04/22/2008 | US7361609 Mask patterns for semiconductor device fabrication and related methods |
| 04/22/2008 | US7361604 Method for reducing dimensions between patterns on a hardmask |
| 04/22/2008 | US7361600 Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
| 04/22/2008 | US7361530 Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light |
| 04/22/2008 | US7361457 Hardware and software for directing a beam through a mask onto a wafer surface to outline a circuit pattern; photolithography system including an exposure tool, a mask, array of micromechanical mirrors capable of real time configurable imaging, and addressing circuitry |
| 04/22/2008 | US7361456 Method of manufacturing master disk, apparatus of manufacturing master disk, method of detecting moving distance difference of master disk, and apparatus of detecting moving distance difference of master disk |
| 04/22/2008 | US7361455 Anti-reflective coatings |
| 04/22/2008 | US7361454 Exposing a resist film formed on semiconductor substrate to a light using photomask in which patterns are arranged two-dimensionally at a predetermined altitude; development; reducing an opening size; setting a reflow start temperature, heating; coating with water soluble resin; crosslinking; etching |
| 04/22/2008 | US7361453 using a first and a second pattern, the patterns being identical but displaced over a distance with respect to each other; second pattern is created on the upper mask layer or on the lower mask layer at locations where the upper mask layer has been removed |
| 04/22/2008 | US7361452 Methods for forming a metal line in a semiconductor manufacturing process |
| 04/22/2008 | US7361451 Lithographic printing plate precursor and lithographic printing method using the same |
| 04/22/2008 | US7361450 optical waveguide for use in photoelectronic substrates; cured products excellent in workability, transparency, developability, adhesiveness and solder heat resistance |
| 04/22/2008 | US7361448 resist pattern thickening material contains a resin and a polyhydric alcohol; water-soluble or alkali-soluble; using the thickened resist pattern as a mask, a high-quality, high-performance semiconductor device having an extremely fine pattern can be produced |
| 04/22/2008 | US7361447 Photoresist polymer and photoresist composition containing the same |
| 04/22/2008 | US7361446 Positive resist composition |
| 04/22/2008 | US7361445 Mixture of alkali soluble resin, quinonediazide compound and alcohol |
| 04/22/2008 | US7361444 tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks; high resolution, residue free lithography; do not interact with the resist limiting interfacial mixing and contamination of resist by an outgassing product |
| 04/22/2008 | US7361437 Thermal transfer donor element with a carboxylated binder and a hydroxylated organic compound |
| 04/22/2008 | US7361436 Light shield zones; chromium film and phase shifting mask on radiation transparent substrate; design masking pattern |
| 04/22/2008 | US7361435 Alternating phase shifting masking; generating destructive interference |
| 04/22/2008 | US7361432 Composition for hologram-recording material, hologram-recording medium, and process for producing the same |
| 04/22/2008 | US7361285 Method for fabricating cliche and method for forming pattern using the same |
| 04/22/2008 | US7361234 Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines |
| 04/22/2008 | US7360953 Light guiding device |
| 04/17/2008 | WO2008045545A2 Deformation-based contact lithography systems, apparatus and methods |
| 04/17/2008 | WO2008044925A2 Lithographic apparatus, and device manufacturing method |
| 04/17/2008 | WO2008044924A2 Cleaning method, apparatus and cleaning system |
| 04/17/2008 | WO2008044921A1 Method for regenerating a surface of an optical element in an xuv radiation source and xuv radiation source |
| 04/17/2008 | WO2008044741A1 Resist composition for use in lithography method utilizing electron beam, x-ray or euv light |
| 04/17/2008 | WO2008044612A1 Exposure apparatus, exposure method, and device manufacturing method |
| 04/17/2008 | WO2008044479A1 Electron beam lithography system and electron beam lithography |
| 04/17/2008 | WO2008044326A1 Positive- or negative-working chemical amplification-type photoresist composition for low-temperature dry etching, and method for photoresist pattern formation using the same |
| 04/17/2008 | WO2008044319A1 Euv light generating apparatus and euv exposure apparatus |
| 04/17/2008 | WO2008043577A1 Coated mirrors and their fabication |
| 04/17/2008 | WO2008043351A1 Method for producing holograms and documents containing a hologram |
| 04/17/2008 | WO2008021125A3 Method of preparing a patterned film with a developing solvent |
| 04/17/2008 | WO2008019936A3 Microlithographic projection exposure apparatus and microlithographic exposure method |
| 04/17/2008 | WO2008008344A3 Microphotonic maskless lithography |
| 04/17/2008 | WO2007147782A3 Oxime sulfonates and the use therof as latent acids |
| 04/17/2008 | WO2006133907A8 Passive reticle tool, lithographic apparatus and method of patterning a device |
| 04/17/2008 | US20080090185 Method and apparatus for rinsing a substrate during lithographic development processing |
| 04/17/2008 | US20080090184 copolymer containing monomers selected from acrylic acid, methacrylic acid, vinyl alcohol, hydroxystyrenes, acrylic ester of chromophore group or 1,1,1,3,3,3-hexafluoro-2-propanol group; vinyl ether terminated crosslinking agent; solvent resistant, impervious to interdiffusion of photoresist |
| 04/17/2008 | US20080090183 depositing a catalyst aluminum oxide and iron on a substrate, flowing a mixture of argon, hydrogen, and ethylene over the catalyst, heating in a furnace and chemical vapor deposition to grow carbon at accurate position; use in interconnect applications |
| 04/17/2008 | US20080090182 Method for manufacturing microlens |
| 04/17/2008 | US20080090181 Method For Producing Submicron Structures |
| 04/17/2008 | US20080090180 increase adhesion between photoresist layer and wafer, by first depositing hexamethyldisilazane on wafer, heating to induce silylation chemical reaction between HMDS and photoresist material that generates siloxane (Si O Si) bonding |
| 04/17/2008 | US20080090175 aluminum support, a lower light sensitive layer and an upper light sensitive layer, each contains carbon black pigment chemically combined with the development inhibitor polyoxyethylene glycol; development latitude, chemical resistance, and safelight property |
| 04/17/2008 | US20080090173 alkali-soluble acrylate copolymer for use in photoresists, having a weight average molecular weight of 1,000 to 500,000; prevents water penetration during immersion lithography; fluoropolymers; photolithography for the microfabrication of semiconductor devices |
| 04/17/2008 | US20080090172 Resist composition and patterning process |
| 04/17/2008 | US20080090170 nano-imprinting pattern having concave and convex portions; Dummy grooves are formed in the template to absorb the liquid overflow for suppress friction force; photolithography method for semiconductor devices |
| 04/17/2008 | US20080090058 Thin-film layer structure and method for manufacturing same |
| 04/17/2008 | US20080090054 Thin film device having thin film elements and thin film pattern on thin film elements, and method of fabricating the same |
| 04/17/2008 | US20080090052 Nanoimprint Mold, Method of Forming a Nonopattern, and a Resin-Molded Product |
| 04/17/2008 | US20080089073 Dynamic Liquid Crystal Gel Holograms |
| 04/17/2008 | US20080088816 Microlithograph system |
| 04/17/2008 | US20080088813 Pattern Forming Material, Pattern Forming Apparatus and Pattern Forming Process |
| 04/17/2008 | US20080087548 Mandrels for Electroforming Printing Screens, and Electroforming Apparatus |
| 04/17/2008 | US20080087215 Method and system of coating polymer solution on a substrate in a solvent saturated chamber |
| 04/17/2008 | DE19924182B4 Träger für zu bearbeitende, aufzubewahrende und/oder zu transportierende Halbleiterwafer Support for to be processed, to be stored and / or transported semiconductor wafer |