| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/30/2008 | CN100385262C Optical sheet and process for producing the same |
| 04/30/2008 | CN100384910C Optical devices made from radiation curable fluorinated compositions |
| 04/30/2008 | CN100384799C Fluorinated compound, fluoropolymer and process for its production method |
| 04/29/2008 | US7366342 Simultaneous computation of multiple points on one or multiple cut lines |
| 04/29/2008 | US7365909 Fabrication methods for micro compounds optics |
| 04/29/2008 | US7365901 Pattern generator |
| 04/29/2008 | US7365861 Method and apparatus for determining telecentricity and microlithography projection exposure apparatus |
| 04/29/2008 | US7365860 System capable of determining applied and anodized coating thickness of a coated-anodized product |
| 04/29/2008 | US7365829 Method and apparatus for image formation |
| 04/29/2008 | US7365826 Projection optical system, exposure apparatus and method using the same |
| 04/29/2008 | US7365456 Positioning apparatus and charged-particle-beam exposure apparatus |
| 04/29/2008 | US7365408 Structure for photolithographic applications using a multi-layer anti-reflection coating |
| 04/29/2008 | US7365115 Composition for antireflection coating and method for forming pattern |
| 04/29/2008 | US7365103 Compositions for dark-field polymerization and method of using the same for imprint lithography processes |
| 04/29/2008 | US7365024 Chemical solution coating method and chemical solution coating apparatus |
| 04/29/2008 | US7365023 Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating |
| 04/29/2008 | US7365014 Reticle fabrication using a removable hard mask |
| 04/29/2008 | US7365002 Method of manufacturing a semiconductor device |
| 04/29/2008 | US7364840 Latent imaging; lithography; post development ultraviolet radiation treatment reduces manufacturable feature-size to be below resolution limit; magneto-resistive (MR) heads |
| 04/29/2008 | US7364839 Method for forming a pattern and substrate-processing apparatus |
| 04/29/2008 | US7364838 Gray level imaging masks, optical imaging apparatus for gray level imaging masks and methods for encoding mask and use of the masks |
| 04/29/2008 | US7364837 Method for pattern formation using photoresist cleaning solution |
| 04/29/2008 | US7364836 formation of self-aligned dual damascene interconnects and vias, which incorporates two positive photoresist systems, which have different wavelength sensitivities, to form trench/via openings with only a two-step etching process |
| 04/29/2008 | US7364835 Developer-soluble materials and methods of using the same in via-first dual damascene applications |
| 04/29/2008 | US7364834 Functional polymer |
| 04/29/2008 | US7364833 coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer |
| 04/29/2008 | US7364832 An extremely thin photoresist layer is coated on top of a photosensitive and anti-reflective protective layer of organometallic polymer; stack of the films is selectively exposed to actinic radiation and the latent images on the layers are developed with a common alkaline developer |
| 04/29/2008 | US7364831 Positive resist composition and resist pattern formation method |
| 04/29/2008 | US7364829 a resin; a crosslinking agent; and a nitrogen-containing compound; manufacturing a semiconductor |
| 04/29/2008 | US7364822 Semiconductors, liquid crystal displays; patterning any size or shape by exposure using only one photomask; the mask pattern has a light-shielding film and a phase shifter |
| 04/29/2008 | US7364151 Plate supplying apparatus |
| 04/29/2008 | US7363857 Cylindrical outer surface scanning apparatus |
| 04/29/2008 | US7363856 Flat bed platesetter system |
| 04/29/2008 | US7363854 System and method for patterning both sides of a substrate utilizing imprint lithography |
| 04/24/2008 | WO2008048491A2 Contact lithography apparatus, system and method |
| 04/24/2008 | WO2008048215A2 Contact lithography apparatus, system and method |
| 04/24/2008 | WO2008047905A1 Method of forming resist pattern and negative resist composition |
| 04/24/2008 | WO2008047817A1 Pattern forming method |
| 04/24/2008 | WO2008047733A1 Near field exposure mask, method of forming resist pattern using the mask, and method of producing device |
| 04/24/2008 | WO2008047729A1 Resist composition for immersion exposure and method of forming resist pattern |
| 04/24/2008 | WO2008047720A1 Solution for treatment of resist substrate after development processing, and method for treatment of resist substrate using the same |
| 04/24/2008 | WO2008047719A1 Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method |
| 04/24/2008 | WO2008047715A1 Method for manufacturing semiconductor device using quadruple-layer laminate |
| 04/24/2008 | WO2008047678A1 Composition for formation of upper layer film, and method for formation of photoresist pattern |
| 04/24/2008 | WO2008047654A1 Composition for formation of film, method for production of patterned film, and insulation film for electronic device |
| 04/24/2008 | WO2008047638A1 Process for semiconductor device production using under-resist film cured by photocrosslinking |
| 04/24/2008 | WO2008047623A1 Chemically amplified positive resist composition for thermal lithography and method for formation of resist pattern |
| 04/24/2008 | WO2008047587A2 Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element |
| 04/24/2008 | WO2008047572A1 Oxide material, patterning substrate, pattern forming method, method for producing transfer template for imprint, method for producing recording medium, transfer template for imprint, and recording medium |
| 04/24/2008 | WO2008047541A1 Film coating apparatus and film coating method |
| 04/24/2008 | WO2008047539A1 Positive-working photosensitive lithographic printing plate material, and method for manufacturing lithographic printing plate |
| 04/24/2008 | WO2008047144A1 Methods and apparatus for the manufacture of microstructures |
| 04/24/2008 | WO2008046777A1 Optical storage medium comprising tracks with positive and negative marks, and stampers and production methods for manufacturing of the optical storage medium |
| 04/24/2008 | WO2008046305A1 A low etched photoresist cleaning agent and cleaning method of using same |
| 04/24/2008 | WO2008030092A3 Apparatus for illuminating a surface |
| 04/24/2008 | WO2007131161A3 Symmetrical objective having four lens groups for microlithography |
| 04/24/2008 | WO2007121006A3 Low thermal distortion silicone composite molds |
| 04/24/2008 | US20080097000 Photosensitive resin composition for flexible circuit board and flexible circuit board using the same |
| 04/24/2008 | US20080096142 Baking apparatus, substrate heat treatment method and semiconductor device manufacturing method for using baking apparatus, pattern forming method and semiconductor device manufacturing method for using pattern forming method |
| 04/24/2008 | US20080096138 Method of reducing critical dimension bias during fabrication of a semiconductor device |
| 04/24/2008 | US20080096136 Coating a semiconductor substrate with photoresist, controlling, depending on a mask target critical dimension, a mask bias for a mask writer, exposing, developing photoresist based on the controlled mask bias, forming a photoresist pattern; etching an underlying layer using photoresist pattern as mask |
| 04/24/2008 | US20080096135 Methods for forming patterns of a filled dielectric material on substrates |
| 04/24/2008 | US20080096132 mixing a polymerizable monomer in which acrylonitrile accounts for 70% by weight or more of a total of the polymerizable monomer, water and an alkali metal persulfate polymerization initiator to conduct emulsion polymerization; distilling off unpolymerized monomers; chemical resistance film, gas barrier |
| 04/24/2008 | US20080096130 Positive resist composition |
| 04/24/2008 | US20080096127 olefinic cyclic/non-aromatic or aromatic or heterocyclic methacrylate copolymers; photoacid generators comprising arylsulfonium, aryliodonium, arylsulfonates or aryldisulfonyl compounds useful in photoresists in the field of microlithography; useful for imaging in deep UV (ultraviolet radiation) |
| 04/24/2008 | US20080096126 copolymer of an acrylate monomer containing a 20 membered cyclic group, an acrylate monomer of alpha-alkyl acrylate estre having a lactone containing monocyclic or polycyclic group, a lower alkylate ester having an aliphatic cyclic group containing non acid dissociable dissociation inhibiting group |
| 04/24/2008 | US20080096115 For resist applications; thermostability, storage stability; color filters |
| 04/24/2008 | US20080095981 Molecular Electronic Device Fabrication Methods and Structures |
| 04/24/2008 | US20080095878 Imprint Lithography Template Having a Feature Size Under 250 nm |
| 04/24/2008 | US20080094872 Use of polyimide with maleic anhydride end groups, and units of a heteroaryl-substituted monomer such as 2,2-bis(3-amino-4-(3-pyrid-4ylpropoxy)phenyl)hexafluoropropane, a crosslinking agent such as dipentaerythritol hexaacrylate, and a photoinitiator; form a fine pattern, without complicated photoresist |
| 04/24/2008 | US20080094696 Projection optical system and method for photolithography and exposure apparatus and method using same |
| 04/24/2008 | US20080094694 Fabrication Methods for Micro Compound Optics |
| 04/24/2008 | US20080094674 Holographic Lithography |
| 04/24/2008 | US20080094641 Position sensor |
| 04/24/2008 | US20080094630 Apparatus and methods for detecting overlay errors using scatterometry |
| 04/24/2008 | US20080094602 Illumination optical system, exposure apparatus, and exposure method |
| 04/24/2008 | US20080094601 Providing a Pattern of Polarization |
| 04/24/2008 | US20080094599 Projection System with Compensation of Intensity Variations and Compensation Element Therefor |
| 04/24/2008 | US20080094598 Printing a Mask with Maximum Possible Process Window Through Adjustment of the Source Distribution |
| 04/24/2008 | US20080094596 Methods and systems to compensate for a stitching disturbance of a printed pattern |
| 04/24/2008 | US20080094595 Methods and systems to compensate for a stitching disturbance of a printed pattern |
| 04/24/2008 | US20080093339 Processing apparatus and device manufacturing method |
| 04/24/2008 | US20080092763 Method for Making a Lithographic Plate |
| 04/23/2008 | EP1914794A1 Laser projection device |
| 04/23/2008 | EP1914596A2 Dissolution inhibitors in photoresist compositions for microlithography |
| 04/23/2008 | EP1914595A1 Method and apparatus for product design evaluation |
| 04/23/2008 | EP1914530A1 Exposure apparatus mounted with measuring apparatus |
| 04/23/2008 | EP1913623A1 Maskless lithography system with improved reliability |
| 04/23/2008 | EP1913448A1 Photoresist stripper composition for semiconductor manufacturing |
| 04/23/2008 | EP1913447A2 Systems and methods for retrieving residual liquid during immersion lens photolithography |
| 04/23/2008 | EP1913446A2 Composition and use thereof |
| 04/23/2008 | EP1913445A1 Imaging system, in particular projection lens of a microlithographic projection exposure unit |
| 04/23/2008 | EP1913444A2 Photoresist composition for imaging thick films |
| 04/23/2008 | EP1913443A2 Radiation-sensitive compositions and imageable materials |
| 04/23/2008 | EP1913339A2 Cationic ink formulations |
| 04/23/2008 | EP1258059B1 Bandwidth control technique for a laser |
| 04/23/2008 | CN201051210Y Flexible connection device |
| 04/23/2008 | CN101167162A Exposure apparatus, method for processing substrate, and method for manufacturing device |
| 04/23/2008 | CN101167021A Pattern forming method |
| 04/23/2008 | CN101167020A Exposure device |