| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/06/2008 | US7368390 Photolithographic patterning process using a carbon hard mask layer of diamond-like hardness produced by a plasma-enhanced deposition process |
| 05/06/2008 | US7368229 Composite layer method for minimizing PED effect |
| 05/06/2008 | US7368228 applying a layer of photoresist onto the lower layer to form a multilayer microelectromechanical systems (MEMS) device |
| 05/06/2008 | US7368227 electron beam lithography, forming a photoresist pedestal in the conventional way, followed by flood exposing with electrons and then a second development treatment to remove additional material from the sidewalls; write pole for vertical magnetic recording |
| 05/06/2008 | US7368226 Method for forming fine patterns of semiconductor device |
| 05/06/2008 | US7368225 Exposing isolated regions in photoresist layer through a second mask different from the first mask using second focus; etching the first layer using the patterned photoresist layer as a mask |
| 05/06/2008 | US7368224 Photopolymerizable composition |
| 05/06/2008 | US7368218 Containing a polymer having exo-form ester units from a norbornanyl (meth)acrylate derivative and units from an ester having two hexafluoroisopropanol groups; minimized in line edge roughness by swelling during development and residue after development, and improved in adhesion |
| 05/06/2008 | US7368217 Multilayer image, particularly a multicolor image |
| 05/06/2008 | US7368216 Photosensitive resin composition and manufacturing method of semiconductor device using the same |
| 05/06/2008 | US7368215 onium salt and an infrared radiation (IR) absorber; a polymerizable material; and a polymeric binder comprising polyethylene oxide segments, such as a graft copolymer of methacrylated polyethylene glycol with allyl methylacrylate |
| 05/06/2008 | US7368209 Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device |
| 05/06/2008 | US7368208 Measuring phase errors on phase shift masks |
| 05/06/2008 | US7368206 Forming first separated features on a surface, forming second separated features on surface interleaved between first separated features, and illuminating first and second separated features and detecting an interference pattern |
| 05/06/2008 | US7368205 Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device |
| 05/06/2008 | US7368064 Hydrofluoric acid, ammonium fluoride, or amine fluoride; chelating agent (ammonium malonate, glycolate, tartrate or citrate); carboxylic ammonium salt having acid dissociation constant pKan of 2.5 or greater at 25 degrees C.; water; for cleaning a substrate on which a nickel silicide layer is formed |
| 05/06/2008 | US7367725 Method for removing developing solution |
| 05/06/2008 | US7367710 Developing solution supply nozzle with stirrer |
| 05/06/2008 | US7367345 Apparatus and method for providing a confined liquid for immersion lithography |
| 05/06/2008 | CA2283446C Photoactivatable nitrogen-containing bases based on .alpha.-amino alkenes |
| 05/02/2008 | WO2008051432A2 Patterning of ionic polymers |
| 05/02/2008 | WO2008050886A1 Bis(aminophenol) derivative, process for producing the same, polyamide resin, positive photosensitive resin compositions, protective film, interlayer dielectric, semiconductor device, and display element |
| 05/02/2008 | WO2008050835A1 Volume hologram optical recording medium, composition for volume hologram recording layer formation, and volume hologram recording material |
| 05/02/2008 | WO2008050796A1 Adamantane derivative, process for production thereof, resin composition, and cured product of the resin composition |
| 05/02/2008 | WO2008050785A1 Liquid composition for removing photoresist residue and polymer residue |
| 05/02/2008 | WO2008050768A1 Photocurable/thermocurable solder resist composition, and printed circuit board using the same |
| 05/02/2008 | WO2008050653A1 Photosensitive resin composition and photosensitive element using the same |
| 05/02/2008 | WO2008050477A1 Copolymer and composition for semiconductor lithography and process for producing the copolymer |
| 05/02/2008 | WO2008049926A2 Method and device for replacing objective parts |
| 05/02/2008 | WO2008049844A1 High resolution imaging process using an in-situ image modifying layer |
| 05/02/2008 | WO2008049574A2 Method and apparatus for connecting an optical element to a mount |
| 05/02/2008 | WO2008049332A1 A cleaning compound for removing photoresist |
| 05/02/2008 | WO2008031514A3 A collector optical system |
| 05/02/2008 | WO2008013443A3 Lithography system, method of heat dissipation and frame |
| 05/02/2008 | WO2007137763A3 Illumination system for a microlithography projection exposure apparatus and projection exposure |
| 05/02/2008 | WO2007134000A3 Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns |
| 05/02/2008 | WO2007039346A3 Low activation energy dissolution modification agents for photoresist applications |
| 05/02/2008 | WO2007017013A3 Arrangement for mounting an optical component |
| 05/02/2008 | WO2006082103A3 NOVEL CATIONlC COMPOSITIONS AND METHODS OF MAKING AND USING THE SAME |
| 05/02/2008 | WO2006013475A3 Photoresist compositions |
| 05/01/2008 | US20080103078 Hydroxylated organic amine(s), and corrosion inhibitor of arabitol, erythritol, xylitol, mannitol, sorbitol, ethylene glycol, glycerol,1,2-cyclopentanediol, 1,2-cyclohexanediol, and/or methylpentanediol; polar solvent; amino acid-free; photoresist strippers; copper or aluminum metallization |
| 05/01/2008 | US20080102406 Light sensitive layer containing spectral sensitizer, polymerization initiator, polymerizable monomer and polymeric binder; nonionic surfactant of polyoxyalkylene glycol monoalkyl ether or polyoxyalkylene glycol alkylamine; storage stability |
| 05/01/2008 | US20080102382 applying photoresists to layers, multilayer stacks, or masking substrates, then exposing , developing and etching |
| 05/01/2008 | US20080100930 Optical measuring system, and a projection objective |
| 05/01/2008 | US20080100899 Mirror Device, Mirror Array, Optical Switch, Mirror Device Manufacturing Method, and Mirror Substrate Manufacturing Method |
| 05/01/2008 | US20080100817 Printing A Mask With Maximum Possible Process Window Through Adjustment Of The Source Distribution |
| 05/01/2008 | US20080100810 Exposure Apparatus, Supply Method And Recovery Method, Exposure Method, And Device Producing Method |
| 05/01/2008 | US20080099941 Imprint Apparatus, Imprint Method, And Mold for Imprint |
| 04/30/2008 | EP1916568A2 Developing solution for lithographic printing plates and production method of lithographic printing plate |
| 04/30/2008 | EP1916567A1 Mixed manufacturing method for parts by photolithography, adding inserts and electroforming |
| 04/30/2008 | EP1916101A2 Method for postbaking a lithographic printing plate |
| 04/30/2008 | EP1915888A2 Method and composition for adhering materials together |
| 04/30/2008 | EP1915411A1 New organic bottom antireflective polymer compositions |
| 04/30/2008 | EP1915255A1 Printing plate registration using a camera |
| 04/30/2008 | EP1668679A4 Illumination optical system and exposure apparatus using the same |
| 04/30/2008 | DE112005003585T5 Verfahren und System für die Fotolithografie A method and system for lithography |
| 04/30/2008 | DE102006050363A1 Photo mask production, with resist materials on a structured substrate surface, illuminates the resist stack at different doses in a single stage |
| 04/30/2008 | DE102006049924A1 Contamination cleaning system for semiconductor lithography, has reflective unit arranged such that surfaces are irradiated with microwave radiation, where contaminations from surfaces are transported away and removed by gas flows |
| 04/30/2008 | DE102006049612A1 Beleuchtungseinrichtung und Maske für eine Mikrolithographie-Projektionsbelichtungsanlage sowie Verfahren zur lithographischen Belichtung eines Gegenstandes Illumination means and a mask for a microlithography projection exposure apparatus and method for lithographic exposure of an object |
| 04/30/2008 | CN201054071Y Ultraviolet computer digital print system |
| 04/30/2008 | CN101171668A Exposure apparatus, exposure method and device manufacturing method |
| 04/30/2008 | CN101171667A Projection optical system, exposure apparatus and exposure method |
| 04/30/2008 | CN101171666A Stabilized photoresist structure for etching process |
| 04/30/2008 | CN101171551A Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist |
| 04/30/2008 | CN101171550A Method for enhancing optical stability of three-dimensional micromolded product |
| 04/30/2008 | CN101171549A Reticle alignment and overlay for multiple reticle process |
| 04/30/2008 | CN101171548A Exposure device for printing plates |
| 04/30/2008 | CN101171547A Microlithography exposure apparatus using polarized light and microlithography projection system having concave primary and secondary mirrors |
| 04/30/2008 | CN101171546A Optical system for a lithographic device |
| 04/30/2008 | CN101171142A Method and device for transferring a pattern from a stamp to a substrate |
| 04/30/2008 | CN101170086A Method for preparing thin film transistor substrate |
| 04/30/2008 | CN101170054A Device and method for processing substrate and method for supplying plasma |
| 04/30/2008 | CN101169908A Process for preparing metal globe |
| 04/30/2008 | CN101169602A Focusing leveling measuring method and device |
| 04/30/2008 | CN101169601A Focusing leveling measuring system |
| 04/30/2008 | CN101169600A Method for removing photoresist of titanium or titanium nitride layer in semiconductor production |
| 04/30/2008 | CN101169599A Removing photoresist from substrates by means of treatment liquid, and processing treatement liquid with ozone |
| 04/30/2008 | CN101169598A Photoresist detergent |
| 04/30/2008 | CN101169597A Photoresist detergent |
| 04/30/2008 | CN101169596A Whole-wet photoresist removing method |
| 04/30/2008 | CN101169595A Calibration device for aligning system of stepper and its calibration method |
| 04/30/2008 | CN101169594A Photo-etching machine imaging quality measuring method |
| 04/30/2008 | CN101169593A Metal lithographic mask box |
| 04/30/2008 | CN101169592A On-line spherical aberration measuring method |
| 04/30/2008 | CN101169591A Lens imaging system for overlay accuracy and its feeding and calibration method |
| 04/30/2008 | CN101169590A Light solidifying heat curing resin composition and printing circuit board using the same |
| 04/30/2008 | CN101169589A Method for manufacturing light guide plate cavity |
| 04/30/2008 | CN101169588A Automatic liquid flexible platemaking apparatus |
| 04/30/2008 | CN101168509A Polyatomic phenol compound and chemical amplification type photoresist composition containing the same |
| 04/30/2008 | CN100385901C Plotter head unit, plotter and plotting method |
| 04/30/2008 | CN100385704C Production method of structured electrodes |
| 04/30/2008 | CN100385662C Semiconductor structure, and quality control method of manufacturing semiconductor structure |
| 04/30/2008 | CN100385622C Method for forming fine pattern |
| 04/30/2008 | CN100385610C Substrate processing method, heat processing device |
| 04/30/2008 | CN100385535C Method and device for irradiating spots on a layer |
| 04/30/2008 | CN100385328C Liquid crystal display device and producing method thereof |
| 04/30/2008 | CN100385277C Method for apodizing a planar waveguide grating |
| 04/30/2008 | CN100385269C Radiation-ray sensitive composition for colour-filtering piece, colour filtering piece and colour liquid crystal display device |
| 04/30/2008 | CN100385268C Micro-integrated narrow-band filter array and preparing method thereof |
| 04/30/2008 | CN100385267C Thin film patterning apparatus and method of fabricating color filter array substrate using the same |