| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 05/08/2008 | WO2008053697A1 Positive resist composition and method for formation of resist pattern |
| 05/08/2008 | WO2008053691A1 Photosensitive surface printing plate material and method for manufacture of surface pringing plate by using the same |
| 05/08/2008 | WO2008053418A2 Relief layer and imprint method for making the same |
| 05/08/2008 | WO2008052600A1 Registration method and apparatus therefor |
| 05/08/2008 | WO2008052424A1 A cleaning compound for removing photoresist |
| 05/08/2008 | WO2008052405A1 Alignment system used in lithography apparatus and diffraction orders-combining system used in alignment system |
| 05/08/2008 | WO2008033886A3 Method and system for dry etching a hafnium containing material |
| 05/08/2008 | WO2008013778A3 Compensation for distortion in contact lithography |
| 05/08/2008 | WO2007142809A3 Nanoparticle patterning process |
| 05/08/2008 | WO2007097907A3 Radiation-sensitive compositions and imageable materials |
| 05/08/2008 | WO2005066714A3 Photoresist composition |
| 05/08/2008 | US20080108831 Used in electrooptical systems such as TV screens, liquid crystal displays, charge coupled devices, plasma displays or electroluminescent displays; do not tend to aggregate, show very good dispersibility; high transparence and pure hue |
| 05/08/2008 | US20080108726 Polycarboxylic acid resins, their compositions, and their cured products |
| 05/08/2008 | US20080108720 Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product |
| 05/08/2008 | US20080107997 Anti-Reflective Coating Containing Sulfur Atom |
| 05/08/2008 | US20080107994 Creating photoresist composition by applying to substrate surface coating of DNA polymers capable of self-assembling into photonic crystal, allowing DNA polymers to form crystalline structure, and applying coating of photoresist polymer and compound capable of generating an acid on exposure to radiation |
| 05/08/2008 | US20080107976 Hardware and software for directing a beam through a mask onto a wafer surface to outline a circuit pattern; photolithography system including an exposure tool, a mask, array of micromechanical mirrors capable of real time configurable imaging, and addressing circuitry |
| 05/08/2008 | US20080107972 Halftone mask and method for making pattern substrate using the halftone mask |
| 05/08/2008 | US20080107971 Silylphenylene Polymer Composition For The Formation Of Interlayers And Process For The Formation Of Patterns By Using The Same |
| 05/08/2008 | US20080106712 Liquid recovery member, substrate holding member, exposure apparatus and device manufacturing method |
| 05/08/2008 | US20080106707 Exposure Apparatus, Exposure Method, and Method for Producing Device |
| 05/08/2008 | US20080106221 Field emission backlight unit, method of driving the backlight unit, and method of manufacturing lower panel |
| 05/08/2008 | US20080106003 Methods and apparatus of pressure imprint lithography |
| 05/08/2008 | US20080105950 Semiconductor substrate, method of manufacturing the semiconductor substrate, semiconductor device and pattern forming method |
| 05/08/2008 | US20080105875 Modifying a surface of a subject by adding (mixing) a light-absorbing material; high-performance and highly reliable display device |
| 05/08/2008 | DE102007053226A1 Optical device for use in projection illumination system for semiconductor lithography, has optical unit manipulated in degrees of freedom, where one degree of freedom is selected from group of x, y and z- displacements and transitions |
| 05/08/2008 | DE102007052885A1 Reflector for illumination device of extreme ultraviolet projection illumination system, has cooling device integrated into reflector, and sealing rings for gas and liquid-tight sealing arranged between pipe connections and support |
| 05/08/2008 | DE102006051766A1 Structured photo resist layer, on a substrate, uses selective illumination with separate acids and bakings before developing |
| 05/08/2008 | DE102006051764A1 Photo resist layer developer, has amine, where mass fraction of amine amounts in developer between certain percentages, and developer is formed of chemically reinforced photo resist |
| 05/08/2008 | DE102006050835A1 Verfahren und Vorrichtung zum Austausch von Objetkivteilen Method and apparatus for exchanging Objetkivteilen |
| 05/08/2008 | DE102006040729A1 Layout transferring method for electronic module, involves transferring layout to photo-sensitive foil from plastic material by selective exposure of photo-sensitive foil, and applying selectively exposed foil on surface of substrate |
| 05/08/2008 | DE102005062618B4 Optische Abbildungseinrichtung und Abbildungsverfahren mit Bestimmung von Abbildungsfehlern Optical imaging device and method of imaging with determination of imaging errors |
| 05/07/2008 | EP1918778A2 Compositions and processes for immersion lithography |
| 05/07/2008 | EP1918777A1 Lithographic apparatus and method |
| 05/07/2008 | EP1918776A1 Etching of nano-imprint templates using an etch reactor |
| 05/07/2008 | EP1917340A1 Aqueous solution and method for removing ionic contaminants from the surface of a workpiece |
| 05/07/2008 | EP1917299A1 Dual-wavelength positive-working radiation-sensitive elements |
| 05/07/2008 | EP1800188B1 Device for generating extreme ultraviolet light and application to an extreme ultraviolet radiation lithography source |
| 05/07/2008 | EP1766737A4 Laser output beam wavefront splitter for bandwidth spectrum control |
| 05/07/2008 | EP1344109B1 Onium salts and the use therof as latent acids |
| 05/07/2008 | EP1275676B1 Hydrogenated ring-opening metathesis copolymer and process for producing the same |
| 05/07/2008 | CN101176042A Spatial light modulator device, lithographic apparatus, display device, method of producing a light beam having a spatial light pattern and method of manufacturing a device |
| 05/07/2008 | CN101176041A Positive resist composition and method of forming resist pattern |
| 05/07/2008 | CN101176040A Adjustable solubility in sacrificial layers for microfabrication |
| 05/07/2008 | CN101176039A Method of making an article bearing a relief image using a removable film |
| 05/07/2008 | CN101175777A (methyl)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and method for forming pattern |
| 05/07/2008 | CN101175695A Modified silica particles, photosensitive composition containing same, and photosensitive lithography plate |
| 05/07/2008 | CN101175641A Image formation process and planographic printing plate material |
| 05/07/2008 | CN101174573A Testing wafer and testing method for edge bead removal |
| 05/07/2008 | CN101174108A Plasma for resist removal and facet control of underlying features |
| 05/07/2008 | CN101174107A Method and apparatus for photomask plasma etching |
| 05/07/2008 | CN101174106A Method and apparatus for photomask plasma etching |
| 05/07/2008 | CN101174105A Lithographic apparatus and method |
| 05/07/2008 | CN101174104A Method and correlated device for confirming optimum object plane and optimum image plane of photo-etching projection device |
| 05/07/2008 | CN101174103A Pattern writing apparatus and pattern writing method |
| 05/07/2008 | CN101174102A Exposure device |
| 05/07/2008 | CN101174101A Immersion lithography system using a sealed wafer bath |
| 05/07/2008 | CN101174100A Immersion lithography system using a sealed wafer bath |
| 05/07/2008 | CN101174099A Graded arc for high na and immersion lithography |
| 05/07/2008 | CN101174098A Workpiece rotation apparatus for a plasma reactor system |
| 05/07/2008 | CN101174097A Mask etch plasma reactor with variable process gas distribution |
| 05/07/2008 | CN101174096A Mask etch plasma reactor with cathode providing a uniform distribution of etch rate |
| 05/07/2008 | CN101174095A Method and apparatus for removing particles in immersion lithography |
| 05/07/2008 | CN101174094A Circle center locating method and apparatus |
| 05/07/2008 | CN101174093A Photo-etching illumination system |
| 05/07/2008 | CN101174092A Method for reducing image deformation caused by lens coma aberration |
| 05/07/2008 | CN101174091A Coating equipment and its device for preventing joint not being pulled out |
| 05/07/2008 | CN101174090A Photo-polymerization type lithographic printing plate |
| 05/07/2008 | CN101174089A Radiation sensitive resin composition for forming space body, space body and its forming method |
| 05/07/2008 | CN101174088A Polymethyl methacrylate-TiO2 hybrid material preparation and minute pattern production |
| 05/07/2008 | CN101174087A Method and system for making photo-resist patterns |
| 05/07/2008 | CN101174086A Etching of nano-imprint templates using an etch reactor |
| 05/07/2008 | CN101174085A Nanostructured pattern method of manufacture |
| 05/07/2008 | CN101174084A Solution for silver surface transplant of the hologram and method for silver surface transplant of the hologram |
| 05/07/2008 | CN101174083A Protective film assembly container |
| 05/07/2008 | CN101174082A Endpoint detection for photomask etching |
| 05/07/2008 | CN101174081A Mask etch process |
| 05/07/2008 | CN101174066A LCD and making method thereof |
| 05/07/2008 | CN100386886C Process for preparing active matrix LCD arrangement with pattern active layers |
| 05/07/2008 | CN100386854C Wiring forming system and wiring forning method for wiring on wiring board |
| 05/07/2008 | CN100386843C Mask protective layer for photoetching and its manufacturing method |
| 05/07/2008 | CN100386807C Making process of pattern on wafer and its application |
| 05/07/2008 | CN100386701C Method and system for improving trajector planning and execution |
| 05/07/2008 | CN100386689C Liquid crystal display picture element structure and manufacturing method thereof and liquid crystal display panel |
| 05/07/2008 | CN100386674C Method for manufacturing down base plate for liquid crystal display device |
| 05/07/2008 | CN100386669C Liquid crystal display device and manufacturing method thereof |
| 05/06/2008 | US7369962 Method and device for data integrity checking |
| 05/06/2008 | US7369703 Method and apparatus for circuit pattern inspection |
| 05/06/2008 | US7369332 Closing module for an optical arrangement |
| 05/06/2008 | US7369217 Method and device for immersion lithography |
| 05/06/2008 | US7369213 Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same |
| 05/06/2008 | US7368781 Contactless flash memory array |
| 05/06/2008 | US7368755 Array substrate of liquid crystal display and fabrication method thereof |
| 05/06/2008 | US7368741 Extreme ultraviolet light source |
| 05/06/2008 | US7368738 Advanced pattern definition for particle-beam exposure |
| 05/06/2008 | US7368732 Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program |
| 05/06/2008 | US7368544 Polymerizable composition and planographic printing plate precursor using the same |
| 05/06/2008 | US7368520 Chromophore with the structure D- pi -A where D is a tertiary amine, pi is a thiophene group and A has crosslinkers; and a polyether with pendant crosslinking groups; protective coatings, electronics, optics, electro-optics, and polymer light emitting diodes |
| 05/06/2008 | US7368403 Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method |
| 05/06/2008 | US7368399 Methods of forming patterned photoresist layers over semiconductor substrates |