| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/15/2008 | US20080110358 Non-Attenuating Light Collimating Articles for Graphic Arts |
| 05/15/2008 | DE19753655B4 α-Aminoacetophenonverbindungen, Massen, die diese Verbindungen enthalten und deren Verwendung als Photostarter α-Aminoacetophenonverbindungen, compositions containing these compounds and their use as photoinitiators |
| 05/15/2008 | DE19637923B9 Unter Verwendung von lichtempfindlichem Material zum Orientieren des Flüssigkristalls hergestellte Flüssigkristallanzeige Vorrichtung Using of photosensitive material for orienting the liquid crystal produced liquid crystal display device |
| 05/15/2008 | DE102007026753A1 Holder for e.g. projection objective, supports optical element over multiple support surfaces, where outer rings are fixed in holder and are partially made of ceramic material having high elasticity modulus of preset value |
| 05/15/2008 | DE102006053074A1 Semiconductor wafer structuring method for semiconductor process technology, involves performing texture illumination and exposure of photo-resist layer in section with ultra violet light with spectrum below threshold frequency |
| 05/15/2008 | CA2668612A1 Waterless planographic printing plate precursor |
| 05/14/2008 | EP1921721A1 Injection-locked laser, interferometer, exposure apparatus, and device manufacturing method |
| 05/14/2008 | EP1921505A1 Lithography apparatus and device manufacturing method |
| 05/14/2008 | EP1921504A2 Liquid-immersion exposure method and liquid-immersion exposure apparatus |
| 05/14/2008 | EP1921503A2 Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system |
| 05/14/2008 | EP1921502A1 Combined motion control system |
| 05/14/2008 | EP1921501A2 Planographic printing plate precursor and stack thereof |
| 05/14/2008 | EP1921500A1 UV-sensitive elements with triarylamine derivatives as sensitizers |
| 05/14/2008 | EP1920942A1 Original plate for lithography, and resin composition for photosensitive layer in original plate for lithography |
| 05/14/2008 | EP1920295A2 Methods of using a nanotransfer printing stamp having conductively coated sidewalls |
| 05/14/2008 | EP1766477B1 Method and apparatus for the drying of the printing plates for flexography |
| 05/14/2008 | EP1629046B1 Curable polymer compound |
| 05/14/2008 | EP1424210B1 Photosensitive resin composition and laser engravable printing element |
| 05/14/2008 | EP1207959B1 Individually addressable micro-electromagnetic unit array chips |
| 05/14/2008 | CN101180707A Exposure apparatus and method for manufacturing device |
| 05/14/2008 | CN101180706A Exposure apparatus and exposure method |
| 05/14/2008 | CN101180582A Lithographic apparatus and device manufacturing method |
| 05/14/2008 | CN101180581A Optical system of a microlithographic projection exposure apparatus |
| 05/14/2008 | CN101180580A Coating-type underlayer film forming composition containing naphthalene resin derivative for lithography |
| 05/14/2008 | CN101180579A Polysilane compound-containing lower layer film forming composition for lithography |
| 05/14/2008 | CN101180578A Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board |
| 05/14/2008 | CN101180577A Photosensitive resin composition |
| 05/14/2008 | CN101180419A Etchant solutions and additives therefor |
| 05/14/2008 | CN101180324A Polymerizable compound for photoresist, polymer thereof, and photoresist composition containing such polymer |
| 05/14/2008 | CN101179613A Technique for manufacturing stainless push-button of mobile phone |
| 05/14/2008 | CN101179018A SONOS structure corrode process used for memory cell |
| 05/14/2008 | CN101178549A Method for removing photoresist layer and method for forming opening |
| 05/14/2008 | CN101178548A Alkaline-based developer composition |
| 05/14/2008 | CN101178547A Lithography apparatus and device manufacturing method |
| 05/14/2008 | CN101178546A Image portrayal device and method |
| 05/14/2008 | CN101178545A Position detecting method and device, patterning device, and subject to be detected |
| 05/14/2008 | CN101178544A Alignment unit and image recording apparatus using the same |
| 05/14/2008 | CN101178543A Absorption workbench and base plate treating apparatus |
| 05/14/2008 | CN101178542A Photoresist heating control system used for photoresist film build |
| 05/14/2008 | CN101178541A Photosensitive resin compsition |
| 05/14/2008 | CN101178540A Green photosensitive resin compsition, photosensitive transprint material, color filter substrate and display device |
| 05/14/2008 | CN101178539A 可光固化树脂组合物 The photocurable resin composition |
| 05/14/2008 | CN101178538A Pattern modifying apparatus |
| 05/14/2008 | CN101178537A Asymmetric high-pressure MOS component grid oxidizing layer protection method and uses thereof |
| 05/14/2008 | CN101178527A Semi-penetrate through type liquid crystal display board and pixel structure thereof |
| 05/14/2008 | CN101178455A Thin film pattern layer and manufacturing method therefor |
| 05/14/2008 | CN101178454A Preparation method of filling type sub-wavelength guide mode resonance optical filter |
| 05/14/2008 | CN101178453A Color filter as well as liquid crystal display device and CCD device |
| 05/14/2008 | CN101178452A Color filter and liquid crystal display device employing the same |
| 05/14/2008 | CN100388067C Conductor structure and manufacturing method thereof |
| 05/14/2008 | CN100388026C Patterned grid element polarizer |
| 05/14/2008 | CN100387442C Combination mask |
| 05/13/2008 | US7373213 Management system and apparatus, method therefor, and device manufacturing method |
| 05/13/2008 | US7372634 Reticle-masking objective with aspherical lenses |
| 05/13/2008 | US7372624 8-mirror microlithography projection objective |
| 05/13/2008 | US7372548 Levitated reticle-masking blade stage |
| 05/13/2008 | US7372547 Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography |
| 05/13/2008 | US7372544 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| 05/13/2008 | US7372543 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| 05/13/2008 | US7372542 Immersion exposure technique |
| 05/13/2008 | US7372539 Method for distortion correction in a microlithographic projection exposure apparatus |
| 05/13/2008 | US7372538 Apparatus and method for maintaining immerison fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 05/13/2008 | US7372478 Pattern exposure method and pattern exposure apparatus |
| 05/13/2008 | US7372250 Methods and apparatus for determining a position of a substrate relative to a support stage |
| 05/13/2008 | US7372048 Source multiplexing in lithography |
| 05/13/2008 | US7372047 Charged particle system and a method for measuring image magnification |
| 05/13/2008 | US7371800 Derivatized novolak polyhydroxystyrene from hydroxyphenylmethylcarbinol |
| 05/13/2008 | US7371783 Ionizing radiation curable terpolymer comprising monomers of N-cyclohexylmaleimide, N-benzylmaleimide and/or a substituted N-benzylmaleimide; (meth)acrylic acid; and (meth)acrylic acid ester; blue pigment dispersion containing phthalocyanine; color filters; photopolymerization; discoloration inhibition |
| 05/13/2008 | US7371703 To be used in near ultraviolet region |
| 05/13/2008 | US7371690 Dry etching method and apparatus |
| 05/13/2008 | US7371625 Semiconductor device and manufacturing method thereof, liquid crystal television system, and EL television system |
| 05/13/2008 | US7371510 Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern |
| 05/13/2008 | US7371509 reflow stabilizing solution polymer is applied after the photoresist material has been developed and patterned; integrated circuit semiconductors |
| 05/13/2008 | US7371508 Plasma display panel and method for fabricating the same |
| 05/13/2008 | US7371507 Multilayer; electroconductive layer, dielectrics, antireflectivity layer; forming photoresist pattern; dry etching using photoresist pattern as mask |
| 05/13/2008 | US7371506 comprising a polyamic acid, a 1,4-dihydropyridine derivative and an amine compound; low elasticity, high heat resistance, and high resolution |
| 05/13/2008 | US7371505 Photosensitive composition and method for forming pattern using the same |
| 05/13/2008 | US7371504 Lithographic printing plate precursor |
| 05/13/2008 | US7371503 excelling in transparency to deep ultraviolet rays at wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability; nonafluoro-n-butanesulfonates such as 1-(naphthalen-2-yl)tetrahydrothiophenium nonafluoro-n-butanes |
| 05/13/2008 | US7371502 Methods of fabricating organic light emitting display and donor substrate |
| 05/13/2008 | US7371501 Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same |
| 05/13/2008 | US7371500 Alkali soluble resin with phenolic hydroxyl group, quinonediazide, crosslinked fine particles, compound containing alkyletherified amino groups, and solvent; resolution, thermal shock, bonding strength |
| 05/13/2008 | US7371499 Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same |
| 05/13/2008 | US7371484 Photomask blank and method of fabricating a photomask from the same |
| 05/13/2008 | US7371483 Monitoring apertures in radiation transparent substrate; masking; halftone film; stacks of radiation transparent materials and opacque film ; etching |
| 05/13/2008 | US7371467 Process chamber component having electroplated yttrium containing coating |
| 05/13/2008 | US7371434 Liquid film forming method and solid film forming method |
| 05/13/2008 | US7371331 Method of creating a patterned monolayer on a surface |
| 05/13/2008 | US7371023 Apparatus for processing substrates and method therefor |
| 05/13/2008 | US7370659 Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines |
| 05/13/2008 | US7370582 Method for handling printing plates |
| 05/08/2008 | WO2008054513A2 Appararus and method for the calibration of laser ablateable printing plates |
| 05/08/2008 | WO2008054003A1 Optical element, liquid immersion exposure apparatus, liquid immersion exposure method, and method for producing micro device |
| 05/08/2008 | WO2008053985A1 Photosensitive resin composition, cured product thereof, and method for producing photosensitive resin |
| 05/08/2008 | WO2008053974A1 Radiation-sensitive composition |
| 05/08/2008 | WO2008053918A1 Liquid holding apparatus, liquid holding method, exposure apparatus, exposure method and device manufacturing method |
| 05/08/2008 | WO2008053881A1 Dimmer plate, exposure apparatus, method of exposure and process for manufacturing device |
| 05/08/2008 | WO2008053877A1 Polymer, resist composition, and method for producing substrate provided with pattern |
| 05/08/2008 | WO2008053757A1 Gravure printing plate |
| 05/08/2008 | WO2008053698A1 Compound and polymeric compound |