| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/21/2008 | EP1412262B1 Smif container including an electrostatic dissipative reticle support structure |
| 05/21/2008 | EP1373985B1 Lithography system with beam guidance and method for producing digital holograms in a storage medium |
| 05/21/2008 | CN201063094Y Modularized laser straight nicking device |
| 05/21/2008 | CN101185034A Method for fine line resist stripping |
| 05/21/2008 | CN101185033A Cleaning liquid for lithography |
| 05/21/2008 | CN101185032A Image processor |
| 05/21/2008 | CN101185031A Drawing processing circuit, drawing apparatus using the same, and drawing method |
| 05/21/2008 | CN101185030A Antireflective hardmask composition and methods for using same |
| 05/21/2008 | CN101185029A On-press developable imageable element comprising tetraarylborate salt |
| 05/21/2008 | CN101185028A Photosensitive resin composition, photosensitive element employing the same, method of forming resist pattern, and process for producing printed wiring board |
| 05/21/2008 | CN101185027A Method of forming graft pattern and method of forming conductive pattern |
| 05/21/2008 | CN101185026A Photosensitive resin composition and color filters |
| 05/21/2008 | CN101185025A Photosensitive dry film for production of three-dimensional micro-molded product, and photosensitive resin composition |
| 05/21/2008 | CN101185024A Method of forming graft pattern, graft pattern material obtained thereby, and lithographic process using the same |
| 05/21/2008 | CN101185010A Process for producing color filter, color filter, liquid crystal element, and liquid crystal display device |
| 05/21/2008 | CN101184988A Surface inspection apparatus and surface inspection method |
| 05/21/2008 | CN101184631A Image recording material and image formation process thereof |
| 05/21/2008 | CN101183632A Image forming device and image forming method |
| 05/21/2008 | CN101183224A Decompression drying device |
| 05/21/2008 | CN101183223A Lithographic apparatus and device manufacturing method |
| 05/21/2008 | CN101183222A Measurement method of focusing levelling light spot horizontal position |
| 05/21/2008 | CN101183221A Multiple exposing device |
| 05/21/2008 | CN101183220A Apparatus for suppling chemical agent supply |
| 05/21/2008 | CN101183219A Alkali developable paste composition |
| 05/21/2008 | CN101183218A Photosensitive composition |
| 05/21/2008 | CN101183217A Photosensitive composition |
| 05/21/2008 | CN101183216A Photosensitive composition |
| 05/21/2008 | CN101183215A Black paste composition, black matrix pattern forming method, black matrix pattern |
| 05/21/2008 | CN101183214A Method and system for tone inverting of residual layer tolerant imprint lithography |
| 05/21/2008 | CN101183212A Optical tool and method for forming soldering-resistant pattern |
| 05/21/2008 | CN101182366A Alkali soluble resin, and composition containing the resin and capable of sensing optical activity |
| 05/21/2008 | CN100389480C Exposure device and exposure method |
| 05/21/2008 | CN100389334C Method of manufacturing rare earth element doped polymer waveguide |
| 05/21/2008 | CN100389085C Synthetic quartz glass for optical member, projection exposure device, and projection exposure method |
| 05/21/2008 | CN100389017C Differentaially cured materials and process for forming same |
| 05/20/2008 | US7376930 Method, program product and apparatus for generating assist features utilizing an image field map |
| 05/20/2008 | US7376759 Apparatus for performing device communication and method for operating the same |
| 05/20/2008 | US7376543 Simulation method and system for design of aperture in exposure apparatus and recording medium in which the simulation method is recorded |
| 05/20/2008 | US7376260 Method for post-OPC multi layer overlay quality inspection |
| 05/20/2008 | US7375831 Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit |
| 05/20/2008 | US7375823 Interferometry systems and methods of using interferometry systems |
| 05/20/2008 | US7375805 Reticle and optical characteristic measuring method |
| 05/20/2008 | US7375798 Projection system for EUV lithography |
| 05/20/2008 | US7375797 Utilities transfer system in a lithography system |
| 05/20/2008 | US7375796 Lithographic apparatus and device manufacturing method |
| 05/20/2008 | US7375793 Apparatus for photolithographic processing |
| 05/20/2008 | US7375479 Apparatus for processing an object with high position accurancy |
| 05/20/2008 | US7375353 Lithographic apparatus and device manufacturing method |
| 05/20/2008 | US7375346 Positioning device and method of initializing a positioning device |
| 05/20/2008 | US7374869 Lithographic processing method and device manufactured thereby |
| 05/20/2008 | US7374868 Uniform photoresist pattern; fine pattern for semiconductors ; photosensitive acid generator |
| 05/20/2008 | US7374867 treating photoresists with electricity, to reduce the horizontal extent of aggregates and line edge roughness; improving quality of patterns transferred to semiconductor wafers |
| 05/20/2008 | US7374866 System and method for exposure of partial edge die |
| 05/20/2008 | US7374865 Lithography using light sources through optics to project images on layers of photoresists to form contactors on semiconductor substrates |
| 05/20/2008 | US7374863 Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light |
| 05/20/2008 | US7374862 Photosensitive resin composition and curing product thereof |
| 05/20/2008 | US7374861 composed of a polyimide having pendant carboxyl groups, wherein a portion of the carboxyl groups reacted with glycidyl (meth)acrylate monomers to form covalent bonds; photosensitizer |
| 05/20/2008 | US7374860 Positive resist composition and pattern forming method using the same |
| 05/20/2008 | US7374859 Protective layers compatible with thick film pastes |
| 05/20/2008 | US7374858 resist includes at least one unsaturated, polymerizable monomer; has at least one silicon atom and at least one carbonyl group |
| 05/20/2008 | US7374857 Such as 5,5'-bis[2-nonafluorobutanesulfonyloxy-1H-isoindole-1,3(2H)-dione]; efficiency, solubility, stability, photosensitivity |
| 05/20/2008 | US7374856 high heat resistance, high transparency and low dielectric constant may be used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide; siloxane polymer, quinonediazide compound and solvent |
| 05/20/2008 | US7374844 Photomask for uniform intensity exposure to an optical near-field |
| 05/20/2008 | US7374806 Optical information medium |
| 05/20/2008 | US7374799 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens |
| 05/20/2008 | US7374701 Organometallic precursor composition and method of forming metal film or pattern using the same |
| 05/20/2008 | US7374417 Stamper and transfer apparatus |
| 05/20/2008 | US7374415 Apparatus to control displacement of a body spaced-apart from a surface |
| 05/20/2008 | US7374167 Method and apparatus for controlling the vacuum distribution in an exposer for printing originals |
| 05/20/2008 | US7373733 Heavy machine and method for assisting in aligning a heavy machine |
| 05/15/2008 | WO2008056819A1 Color filter, and liquid crystal display device and ccd device each using the color filter |
| 05/15/2008 | WO2008056796A1 Radiation-sensitive resin composition |
| 05/15/2008 | WO2008056795A1 Polymerizable sulfonic acid onium salt and resin |
| 05/15/2008 | WO2008056750A1 Photosensitive resin composition |
| 05/15/2008 | WO2008056672A1 Method of neutralizing waste developing solution containing tetraalkylammonium hydroxide |
| 05/15/2008 | WO2008056671A1 Method of neutralizing developer waste liquid containing tetraalkylammonium hydroxide |
| 05/15/2008 | WO2008056614A1 Reflow method, pattern-forming method, and method for manufacturing tft |
| 05/15/2008 | WO2008056588A1 Precursor for waterless lithographic printing plate |
| 05/15/2008 | WO2008056506A1 Photosensitive printing plate material and method for manufacture of printing plate |
| 05/15/2008 | WO2008056437A1 Copolymer for immersion lithography and compositions |
| 05/15/2008 | WO2008055589A2 Method for determination of residual errors |
| 05/15/2008 | WO2008010981A3 A process for enhancing the resolution of a thermally transferred pattern |
| 05/15/2008 | US20080114139 From a monomer having a hydroxyl group and a monomer having no hydroxyl group, hydroxyl group-containing repeating unit in a low molecular weight region is controlled; improving a resist pattern shape |
| 05/15/2008 | US20080114089 Photocurable acrylated oligomer; second acrylated oligomer having a viscosity less than the first; wax; acrylated monomer; photoinitiators |
| 05/15/2008 | US20080113518 Wet etching method using ultraviolet light and method of manufacturing semiconductor device |
| 05/15/2008 | US20080113304 Pattern formation method |
| 05/15/2008 | US20080113303 Multilayer Coatings For EUV Mask Substrates |
| 05/15/2008 | US20080113302 Pattern Forming Process |
| 05/15/2008 | US20080113301 Forming electrodes on substrate surface; paste of carbon nanotubes and a metal-ligand complex; metal has gas adsorption selectivity for specific gases; chemical reduction of metal-ligand complex; pattern paste by photolithography |
| 05/15/2008 | US20080113299 Photosensitive polymeric binder, free radical polymerizable (meth)acrylate monomer or oligomer, free radical initiator, sensitizing dye and water soluble overcoat are exposed and hardened; rinsing; removing overcoat; developing exposed and deactivated plate with both ink and fountain solution; durability |
| 05/15/2008 | US20080113298 Method of preparing lithographic printing plates |
| 05/15/2008 | US20080113297 Photosensitive composition |
| 05/15/2008 | US20080113295 Hydrophilic support, image formation layer, oxygen shielding layer; photopolymerization initiator; water-soluble polymeric binder; polymerizable ethylenically unsaturated compound; sensitizing dye; copper-free phthalocyanine colorant; high sensitivity, printing durability; minimized environmental load |
| 05/15/2008 | US20080113292 Transfer substrate, transfer method, and method of manufacturing display device |
| 05/15/2008 | US20080113281 Filter Device for the Compensation of an Asymmetric Pupil Illumination |
| 05/15/2008 | US20080113157 Method for fabricating master stamper/imprinters for patterned recording media utilizing hybrid resist |
| 05/15/2008 | US20080113099 controlling deposition from scanning probe microscope tips to substrates, using electrical, magnetic, chemical or analogous forces |
| 05/15/2008 | US20080112045 Projection optical system, exposure apparatus and device fabricating method |
| 05/15/2008 | US20080111980 Exposure apparatus equipped with interferometer and exposure apparatus using the same |
| 05/15/2008 | US20080111260 Lithographic method for forming mold inserts and molds |