| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/28/2008 | CN100390667C Error correction method for yellow light making process of diversified products |
| 05/28/2008 | CN100390637C Semi-penetration and semi-reflection LCD panel,its prodn.method and method for improving backlight effifiency |
| 05/28/2008 | CN100390232C Composition for forming organic insulating film and organic insulating film formed from the same |
| 05/28/2008 | CN100389956C Radiation-sensitive component, imaging element, positive-action photo-etching print front body and preparation method thereof |
| 05/28/2008 | CN100389886C Coating film drying method, coating film forming method and coating film forming apparatus |
| 05/27/2008 | US7379785 Substrate processing system, coating/developing apparatus, and substrate processing apparatus |
| 05/27/2008 | US7379579 Imaging apparatus |
| 05/27/2008 | US7379251 Optical element, optical system, laser device, exposure device, mask testing device and high polymer crystal processing device |
| 05/27/2008 | US7379190 Stage alignment in lithography tools |
| 05/27/2008 | US7379183 Apparatus and methods for detecting overlay errors using scatterometry |
| 05/27/2008 | US7379162 Substrate-holding technique |
| 05/27/2008 | US7379161 Printer and a method for recording a multi-level image |
| 05/27/2008 | US7379160 Optical integrator, illumination optical device, exposure apparatus, and exposure method |
| 05/27/2008 | US7379159 Lithographic apparatus and device manufacturing method |
| 05/27/2008 | US7379158 Exposure apparatus and method for producing device |
| 05/27/2008 | US7379157 Exposure apparatus and method for manufacturing device |
| 05/27/2008 | US7379154 Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle |
| 05/27/2008 | US7379153 Lithographic apparatus and device manufacturing method |
| 05/27/2008 | US7378738 Method for producing self-aligned mask, articles produced by same and composition for same |
| 05/27/2008 | US7378669 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/27/2008 | US7378666 Irradiation device for testing objects coated with light-sensitive paint |
| 05/27/2008 | US7378548 Michael addition of an acrylic acid ester to a secondary amine such as diethanolamine; additives in chemical amplification photolithography giving photoresists with high resolution and excellent focus margin |
| 05/27/2008 | US7378456 Directly photodefinable polymer compositions and methods thereof |
| 05/27/2008 | US7378230 Photoresist composition for multi-micro nozzle head coater |
| 05/27/2008 | US7378229 Pattern formation method |
| 05/27/2008 | US7378228 using a multilayer insulating coating of an epoxy resin having two or more epoxy groups in one molecule, a modified phenolic resin having a triazine ring, a basic curing agent such as imidazole compound, a photosensitive acid generator, heat curing; fireproofing; dilution wtih MEK or other solvents |
| 05/27/2008 | US7378227 Reduces the tendency of the copper etch step from under-cutting the nickel/gold to cause slivers that cause short circuiting by providing a conforming nickel/gold layer that extends down the side of the traces |
| 05/27/2008 | US7378226 mask layers are formed symmetrically on each other, each layer having a novel dog-bone shape, lower mask layer being substantially undercut relative to the upper mask layer, central portion of the lower mask layer forms a narrow ridge that maintains the upper mask layer at a fixed height |
| 05/27/2008 | US7378225 Method of forming a metal pattern on a substrate |
| 05/27/2008 | US7378224 Method for forming pattern, and optical element |
| 05/27/2008 | US7378223 Photoresist resin composition |
| 05/27/2008 | US7378222 Antihalation compositions |
| 05/27/2008 | US7378218 fluoro-copolymer contains monomers of trifluoromethacrylic acid esters and norbornane or adamantane ring; photolithography, sensitive to high-energy radiation, resolution, and etching resistance |
| 05/27/2008 | US7378217 Antireflective hardmask composition and methods for using same |
| 05/27/2008 | US7378216 Resist material and pattern formation method |
| 05/27/2008 | US7378215 fluorinated organosilicon compound or modified to a polyethers of polyoxyethylene glycol or ethylene glycol and propylene glycol copolymer as surfactant providing hydrophilic-lipophilic balance; uniform coatings |
| 05/27/2008 | US7378201 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
| 05/27/2008 | US7378196 Method of manufacturing mask for correcting optical proximity effect |
| 05/27/2008 | US7378025 Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method |
| 05/27/2008 | US7377992 Method and apparatus for detecting end point |
| 05/27/2008 | US7377974 Use of a pigment preparation based on C.I. pigment yellow 74 |
| 05/27/2008 | US7377925 Fragmentation and extraction basket |
| 05/27/2008 | US7377305 Method and apparatus for production of a cast component |
| 05/22/2008 | WO2008060876A2 Solvent-assisted embossing of flexographic printing plates |
| 05/22/2008 | WO2008060592A2 Micropatterning of conductive graphite particles using microcontact printing |
| 05/22/2008 | WO2008060406A2 Method of preparing lithographic printing plates |
| 05/22/2008 | WO2008060266A2 Nanotemplate arbitrary-imprint lithography |
| 05/22/2008 | WO2008060011A1 Photosensitive resin composition for forming column spacer of liquid crystal display, method for forming column spacer using the composition, column spacer formed by the method, and display device comprising the column spacer |
| 05/22/2008 | WO2008059988A1 Surface treatment method and surface treatment apparatus |
| 05/22/2008 | WO2008059935A1 Photocurable/thermosetting resin composition, cured product and printed wiring board |
| 05/22/2008 | WO2008059918A1 Composition for upper surface antireflection film, and method for pattern formation using the same |
| 05/22/2008 | WO2008059808A1 Photosensitive resin composition, insulating film, protective film, and electronic equipment |
| 05/22/2008 | WO2008059679A1 Compound, acid generator, resist composition, and resist pattern formation method |
| 05/22/2008 | WO2008059670A1 Photocurable/thermosetting resin composition, cured object, and printed wiring board |
| 05/22/2008 | WO2008059440A2 Double patterning for lithography to increase feature spatial density |
| 05/22/2008 | WO2008058939A2 Uv-sensitive elements with triarylamine derivatives as sensitizers for ctp exposure |
| 05/22/2008 | WO2008058460A1 A low etching property cleaning solution for thicker photoresist |
| 05/22/2008 | WO2008058459A1 Low etched photoresist cleaning agent and cleaning method of using same |
| 05/22/2008 | WO2008042079A3 Method to form a pattern of functional material on a substrate |
| 05/22/2008 | WO2007146031A3 Imprint lithography apparatus and methods |
| 05/22/2008 | WO2007135379A3 Method and unit for micro-structuring a moving substrate |
| 05/22/2008 | WO2007094849A3 Antireflective coating material |
| 05/22/2008 | US20080119956 Personalized hardware |
| 05/22/2008 | US20080119371 Antireflective coatings for high-resolution photolithographic synthesis of dna arrays |
| 05/22/2008 | US20080118875 Organosilicon copolymer having a component that provides increased storage stability in combination with a component having a linking group which may enhance etch resistance and increase hydrophilicity of the copolymer; for semiconductor integrated circuit devices |
| 05/22/2008 | US20080118874 Methanofullerene derivative being chemically amplified by including in the coating layer at least one additional component which increases the sensitivity of the exposed layer to actinic radiation which is subsequently used to pattern the layer |
| 05/22/2008 | US20080118873 Printing plate is exposed with radiation, deactivated, and then on-press developed with ink and/or fountain solution; deactivation of exposed plate allows handling of plate under regular office light or any other light without causing hardening of non-exposed areas of photosensitive layer |
| 05/22/2008 | US20080118871 Resist Pattern Forming Method |
| 05/22/2008 | US20080118870 Sulfur Atom-Containing Anti-Reflective Coating Forming Composition For Lithography |
| 05/22/2008 | US20080118869 Exposing oleophilic photosensitive layer comprising polymeric binder, urethane (meth)acrylate monomer, nonurethane (meth)acrylate monomer, free radical initiator, and sensitizing dye, and water soluble or dispersible overcoat; hardening; removing non-exposed areas with aqueous developer or ink |
| 05/22/2008 | US20080118868 Making an imaged lithographic element by imagewise exposing an imageable element using a source of infrared radiation to provide both exposed and non-exposed regions and developing imagewise exposed imageable element with a developer having a pH of 7-11 to remove exposed regions; minimal residue |
| 05/22/2008 | US20080118867 Comprising support and photosensitive layer wherein photosensitive layer comprises a polymerization inhibitor, a binder, a polymerizable compound, and a photopolymerization initiator, the photosensitive layer being exposed by means of laser beam and developed by means of developer to form pattern; wiring |
| 05/22/2008 | US20080118866 Method for forming a tunable deep-ultrviolet dielectric antireflection layer for image transfer processing |
| 05/22/2008 | US20080118865 Silver paste composition, method of forming conductive pattern by using the same, and the conductive pattern formed |
| 05/22/2008 | US20080118864 Black paste composition, method of forming black matrix pattern by using the same, and the black matrix pattern formed |
| 05/22/2008 | US20080118863 Resin comprising monomers of cyclopentyl- or cyclohexyl (meth)acrylate; hydroxyadamantyl (meth)acrylate; 3,8-epoxy-6-oxabicyclo[3.2.1]octyl (meth)acrylat;, and/or fluoroalkyl (meth)acrylate; ArF lithography; resolution contact hole pattern with mask fidelity, sphericity and rectangularity |
| 05/22/2008 | US20080118862 Sheeting with composite image that floats |
| 05/22/2008 | US20080118860 Polymer, resist composition, and patterning process |
| 05/22/2008 | US20080118739 Blackmatrix for color filter and its method of manufacture |
| 05/22/2008 | US20080118666 Radiation curable resin composition for making colored three dimensional objects |
| 05/22/2008 | US20080118644 Templated Monolayer Polymerization and Replication |
| 05/22/2008 | US20080117512 Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit |
| 05/22/2008 | US20080117396 Exposure apparatus |
| 05/22/2008 | US20080117394 Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
| 05/22/2008 | US20080115614 Article transfer system |
| 05/21/2008 | EP1923744A2 Immersion exposure apparatus |
| 05/21/2008 | EP1923743A2 Lithographic apparatus and device manufacturing method |
| 05/21/2008 | EP1923742A1 Positive photosensitive resin composition |
| 05/21/2008 | EP1923741A2 Photosensitive composition |
| 05/21/2008 | EP1922589A2 Method of developing lithographic printing plate precursors |
| 05/21/2008 | EP1922588A1 Pattern exposure method and pattern exposure apparatus |
| 05/21/2008 | EP1922587A1 Method for determining intensity distribution in the focal plane of a projection exposure arrangement |
| 05/21/2008 | EP1922586A2 Replacement device for an optical element |
| 05/21/2008 | EP1922585A1 Photosensitive composition comprising triazine-based photoactive compound containing oxime ester |
| 05/21/2008 | EP1687406A4 Nucleic acid detection method having increased sensitivity |
| 05/21/2008 | EP1682941B1 Varying feature size in resist |
| 05/21/2008 | EP1673480A4 Use of photopolymerization for amplification and detection of a molecular recognition event |
| 05/21/2008 | EP1668420B1 Exposure method as well as projection exposure system for carrying out the method |
| 05/21/2008 | EP1490732B1 Sensitivity enhancement of radiation-sensitive elements |
| 05/21/2008 | EP1454192B1 Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |