| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/03/2008 | US7381506 Substrate coated with a mixture of a solvent and an imaging layer containing a photochromic material exhibiting a reversible homogeneous-heterogeneous transition between a dispersed colorless state and a colored state that separates out of the solvent in the form of opaque, polydisperse crystals. |
| 06/03/2008 | US7381502 Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle |
| 06/03/2008 | US7381272 Processing apparatus |
| 06/03/2008 | US7380499 Image recording apparatus and printing plate material |
| 05/29/2008 | WO2008063387A1 Multilayer element with low ph developer solubility |
| 05/29/2008 | WO2008063134A1 Method of producing a pattern of discriminative wettability |
| 05/29/2008 | WO2008063056A2 Gas analyzing system, lithographic apparatus and method of improving the sensitivity of a gas analyzing system |
| 05/29/2008 | WO2008063016A1 Hardmask composition for processing resist underlayer film, process for producing semiconductor integrated circuit device using the hardmask composition, and semiconductor integrated circuit device produced by the process |
| 05/29/2008 | WO2008062888A1 Composition for resist lower layer film formation and method for pattern formation |
| 05/29/2008 | WO2008062707A1 Curable composition containing hydroxyl group-containing thiol compound and cured product thereof |
| 05/29/2008 | WO2008062513A1 Electron-beam exposing device, and electron-beam exposing method |
| 05/29/2008 | WO2008061954A1 Novel co-initiators |
| 05/29/2008 | WO2008061690A1 Method for removing contamination on optical surfaces and optical arrangement |
| 05/29/2008 | WO2008061681A2 Illumination lens system for projection microlithography, and measuring and monitoring method for such an illumination lens system |
| 05/29/2008 | WO2008045504A3 Hydraulic-facilitated contact lithography apparatus, system and method |
| 05/29/2008 | WO2008035965A3 Apparatus comprising a rotating contaminant trap |
| 05/29/2008 | WO2008021291A3 Fluorinated polymers for use in immersion lithography |
| 05/29/2008 | WO2007069222A3 Analysis device with an array of focusing microstructures |
| 05/29/2008 | US20080125903 Semiconductor production system |
| 05/29/2008 | US20080125870 Nerve regeneration device |
| 05/29/2008 | US20080124942 Method for forming thin film heads using a bi-layer anti-reflection coating for photolithographic applications and a device thereof |
| 05/29/2008 | US20080124833 Applying solution of hydrazine-based precursor to a metal chalcogenide to hydrophilic surface to fill holes; annealing to convert precursor to metal chalcogenide; quality |
| 05/29/2008 | US20080124663 Microfluidic systems including three-dimensionally arrayed channel networks |
| 05/29/2008 | US20080124662 Wafer stage module of twin scan exposure system and method of controlling the same |
| 05/29/2008 | US20080124661 Photochemical and photothermal rearrangements for optical data and image recording |
| 05/29/2008 | US20080124660 HIGHLY PURIFIED LIQUID PERFLUORO-n-ALKANES AND METHOD FOR PREPARING |
| 05/29/2008 | US20080124658 Rotary apertured interferometric lithography (rail) |
| 05/29/2008 | US20080124657 Liquid photopolymer adapted to form a polymer printing plate and containing a photoinitiator which is activated by light at a wavelength of at least 370 nm; uses ambient light instead of UV radiation; cheaper to manufacture, operate and maintain |
| 05/29/2008 | US20080124656 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
| 05/29/2008 | US20080124655 Comprising polymer matrix, labeling dye which absorbs electromagnetic radiation in visible range of 400-700 nm to provide visible coloration, wherein labeling dye forms reaction product upon exposure to radiation energy at wavelength of 400-900 nm, and where product has color different from labeling dye |
| 05/29/2008 | US20080124654 Positive Type Dry Film Photoresist And Composition For Preparing The Same |
| 05/29/2008 | US20080124653 Positive resist compositions and patterning process |
| 05/29/2008 | US20080124652 Positive resist composition and patterning process |
| 05/29/2008 | US20080124651 Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers |
| 05/29/2008 | US20080124650 Tuned underlayers functioning as antireflective coatings, planarizing layers, and etch resistant hard masks; high resolution, residue free lithography; do not interact with the resist limiting interfacial mixing and contamination of resist by an outgassing product |
| 05/29/2008 | US20080124649 Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof |
| 05/29/2008 | US20080124648 Resist Pattern Forming Method, Supercritical Processing Solution For Lithography Process, And Antireflection Film Forming Method |
| 05/29/2008 | US20080124647 Transfer substrate, transfer method, and organic electroluminescent device manufacturing method |
| 05/29/2008 | US20080124633 Includes a mask substrate having patterns arranged at a pitch P; and a pellicle which protects the mask substrate; pellicle is configured so that transmittance of incident light of an incident angle theta is higher than transmittance of incident light of an incident angle 0 degrees |
| 05/29/2008 | US20080124524 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern |
| 05/29/2008 | US20080124490 Coating solution for forming wettability-varied pattern and method of producing pattern-formed body |
| 05/29/2008 | US20080123095 On-Chip Spectroscopy |
| 05/29/2008 | US20080123069 Projection Objective For a Microlithographic Projection Exposure Apparatus |
| 05/29/2008 | US20080123065 Method and device for manufacturing a hologram recording medium |
| 05/29/2008 | US20080123055 Exposure apparatus |
| 05/29/2008 | US20080122395 Driving apparatus, exposure apparatus, and device manufacturing method |
| 05/29/2008 | US20080121028 Scanning Probe Microscopy Inspection and Modification System |
| 05/29/2008 | DE19632122B4 Photovernetzende Kunstharzzusammensetzung deren Verwendung und daraus erhältliches vernetztes Produkt Photo-crosslinking resin composition whose use and resulting cross-linked product available |
| 05/29/2008 | DE102007055408A1 Illumination optics for use in microlithography projection illumination system, has place and time-dissolved detection device arranged such that device detects light intensity distribution based on light intensity distribution in plane |
| 05/29/2008 | DE102007055097A1 Scattered radiation measuring method for use in optical system, involves passing radiation from radiation source through mask, and measuring intensity of radiation passed through another mask with locally resolving detector |
| 05/29/2008 | DE102007055096A1 Optical characteristic determining method for illustrating optical system, involves determining image produced on image recording device in each relative position by device, where device is provided opposite to image plane |
| 05/29/2008 | DE102006056035A1 Beleuchtungsoptik für die EUV-Projektions-Mikrolithographie, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil Illumination optics for EUV projection microlithography, illumination system with an illumination optics, the projection exposure apparatus produced with such a lighting system, method for producing a microstructured component as well as by the process of micro-structured component |
| 05/29/2008 | DE102006054820A1 Positioning error correction process for structural element on substrate involves finding lateral position, comparing with preset one and applying light beam dose |
| 05/28/2008 | EP1926129A1 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method |
| 05/28/2008 | EP1926128A1 Exposure apparatus, method and process for producing device |
| 05/28/2008 | EP1926127A1 Exposure apparatus, exposure method, and device manufacturing method |
| 05/28/2008 | EP1925981A2 Lithographic apparatus, device manufacturing method and computer program product |
| 05/28/2008 | EP1925980A2 Positive type resisit composition and resisit pattern formation method using same |
| 05/28/2008 | EP1925979A1 Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition |
| 05/28/2008 | EP1925978A2 A method and a computer program for performing decomposition of a pattern for use in a DPT process and a mask |
| 05/28/2008 | EP1925609A1 Novel-co-initiators |
| 05/28/2008 | EP1924890A1 Optical system of a microlithographic exposure system |
| 05/28/2008 | EP1924889A1 Illuminator for a photolithography device |
| 05/28/2008 | EP1924888A1 Microlithography projection optical system, method for manufacturing a device and method to design an optical surface |
| 05/28/2008 | EP1924887A1 Photocurable compositions for preparing abs-like articles |
| 05/28/2008 | EP1554324B1 Polymer for heat-sensitive lithographic printing plate precursor |
| 05/28/2008 | EP1319247B1 Correction of overlay offset between inspection layers in integrated circuits |
| 05/28/2008 | CN201066434Y Ultra-large table astigmatism and exposure machine |
| 05/28/2008 | CN101189557A Permanent patterning method |
| 05/28/2008 | CN101189556A Exposure apparatus and exposure method |
| 05/28/2008 | CN101189555A Drawing device and method |
| 05/28/2008 | CN101189554A Image exposure device |
| 05/28/2008 | CN101189553A Conductive lithographic polymer and method of making devices using same |
| 05/28/2008 | CN101189552A Radiation-sensitive resin composition, layered product, and process for producing the same |
| 05/28/2008 | CN101189551A 固化性树脂组合物及其固化物 The curable resin composition and a cured product |
| 05/28/2008 | CN101189550A Photocuring/thermosetting resin composition, curing/setting product thereof and printed wiring board obtained using the same |
| 05/28/2008 | CN101187789A Formulation for removal of photoresist, etch residue and BARC |
| 05/28/2008 | CN101187788A Low etching relative thick photoresist cleaning liquor |
| 05/28/2008 | CN101187787A Low etching photoresist cleaning agent and its cleaning method |
| 05/28/2008 | CN101187786A Aluminum gate surface passivatation processing method and reaction device |
| 05/28/2008 | CN101187785A Lithographic method |
| 05/28/2008 | CN101187784A Lithographic method |
| 05/28/2008 | CN101187783A Focusing and leveling measuring system and its measuring method |
| 05/28/2008 | CN101187782A Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system |
| 05/28/2008 | CN101187781A Pattern describing device and pattern describing method |
| 05/28/2008 | CN101187780A Method for determining lens thermal deformation correctional parameter |
| 05/28/2008 | CN101187779A Method for monitoring defocusing of zero mark |
| 05/28/2008 | CN101187778A Photosensitive transfer printing material, color filtering sheet and displaying device |
| 05/28/2008 | CN101187777A Template for imprint lithography and imprint lithography method using same |
| 05/28/2008 | CN101187776A Method for transferring self-assembled dummy pattern to substrate |
| 05/28/2008 | CN101187765A Film transistor array substrate for liquid crystal display and manufacture thereof |
| 05/28/2008 | CN101187752A Colorful filter and its making method and LCD device |
| 05/28/2008 | CN101187713A Method for manufacturing products with birefringent pattern |
| 05/28/2008 | CN101186678A Acid-degradable resin compositions containing ketene-aldehyde copolymer |
| 05/28/2008 | CN100391220C Printing plate handling system |
| 05/28/2008 | CN100390956C Alignment stage apparatus |
| 05/28/2008 | CN100390938C Method for removal of material by polarized radiation and back side application of radiation |
| 05/28/2008 | CN100390935C Exposure apparatus and method for producing device |
| 05/28/2008 | CN100390931C Substrate processing device and method, and pattern forming method |
| 05/28/2008 | CN100390668C Sub-50nm graph exposuring method by negative chemical amplifying resist |