| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/05/2008 | US20080131820 applying a photoresist to a substrate surface, then exposing the photoresist to radiation through a photomask, baking and anddeveloping to remove the photoresist from regions of intermediate polarity or from both polar and apolar regions; photolithography |
| 06/05/2008 | US20080131819 Process For Producing Resist Pattern and Conductor Pattern |
| 06/05/2008 | US20080131818 Method for fabrication liquid crystal display device and diffraction mask therefor |
| 06/05/2008 | US20080131817 monitoring substrate comprising single-crystalline silicon, polycrystalline silicon, amorphous silicon or silicon oxide and a conditioning layer comprising hexamethyldisilazane, used with pattern-transferring system to transfer of the photomask's pattern to the photoresist layers; semiconductor |
| 06/05/2008 | US20080131816 irradiation of a polynuclear phenanthroline derivative such as (1,4-di(1,10-phenanthroline-2-yl)benzene layer between transparent counter electrodes, while controlling the radiation intensity, to form an emission pattern having contrast caused by the luminous brightness |
| 06/05/2008 | US20080131815 polyethersiloxane copolymers used as photoresists for forming semiconductor circuit patterns, using photolithography |
| 06/05/2008 | US20080131813 photoresists comprising polyvinylketone phenol and derivatives or copolymers with addition monomers having oxiranyl, oxetanyl, N-substituted maleimide and tricyclo[5.2.1.02,6]decanyl groups, capable of forming patterned films having solvent, water, acid, alkali and heat resistance; bonding strength |
| 06/05/2008 | US20080131811 Photoactive Compounds |
| 06/05/2008 | US20080131810 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity |
| 06/05/2008 | US20080131796 Method and test structure for estimating focus settings in a lithography process based on cd measurements |
| 06/05/2008 | US20080131793 Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using the same |
| 06/05/2008 | US20080131790 Structure Design and Fabrication on Photomask For Contact Hole Manufacturing Process Window Enhancement |
| 06/05/2008 | US20080131786 Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording |
| 06/05/2008 | US20080131626 Process for Preparing a Polymeric Relief Structure |
| 06/05/2008 | US20080131550 Mold and Molding Apparatus Using the Same |
| 06/05/2008 | US20080130145 Closing module for an optical arrangement |
| 06/05/2008 | US20080130109 Apparatus For Providing A Pattern Of Polarization |
| 06/05/2008 | US20080130076 Illumination system particularly for microlithography |
| 06/05/2008 | US20080130075 Hologram element, method for manufacturing the same, and hologram laser and optical pickup employing the hologram element |
| 06/05/2008 | US20080130074 Anti-Counterfeit Security and Methods for Its Production and Verification |
| 06/05/2008 | US20080130012 Device and method for the determination of imaging errors and microlithography projection exposure system |
| 06/05/2008 | US20080129970 Immersion Exposure System, and Recycle Method and Supply Method of Liquid for Immersion Exposure |
| 06/05/2008 | US20080128945 Mold and Molding Apparatus Using the Same |
| 06/05/2008 | US20080128924 Semiconductor Device Having In-Chip Critical Dimension and Focus Patterns |
| 06/05/2008 | US20080128636 Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system |
| 06/05/2008 | US20080127889 Method for patterning thin film, method and apparatus for fabricating flat panel display |
| 06/05/2008 | DE112005003638T5 Verfahren zur Erstellung von Fotomaskenstrukturdaten, mittels der Fotomaskenstrukturdaten erstellte Fotomaske und Verfahren zur Herstellung einer Halbleitervorrichtung mittels der Fotomaske Method for creating photo mask pattern data generated by the photo mask pattern data photomask and method for manufacturing a semiconductor device using the photomask |
| 06/05/2008 | DE102007058158A1 Projection exposure system e.g. step-and-scan system, for semiconductor lithography, has optical element e.g. lens, manipulated by actuator of manipulator e.g. Alvarez-element, where manipulator is designed in exchangeable manner |
| 06/05/2008 | DE102007056242A1 Pattern e.g. mask, writing device for use on target workpiece, has deflection plate to deflect electron beam with charged particles based on electron beam irradiation time, and aperture to block deflection of electron beam by plate |
| 06/05/2008 | DE102006057006A1 Fixed immersion lens i.e. projection object lens, for e.g. optical system, has transparent plate supporting diffractive structures on plate surface, where structures are designed as blaced area-coded effective medium structures |
| 06/05/2008 | DE102006056625A1 Lithography process's focus parameter adjustment evaluating method for forming and manufacturing of microstructure unit i.e. integrated circuit, involves evaluating specified focusing adjustment based on two measuring data |
| 06/04/2008 | EP1927893A2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| 06/04/2008 | EP1927892A1 Illumination lens for an EUV projection microlithography, projection exposure apparatus and method for manufacturing microstructured component |
| 06/04/2008 | EP1927891A1 Projection objective with conjugated pupils |
| 06/04/2008 | EP1927890A1 Method of manufacturing a projection objective and projection objective manufactured by that method |
| 06/04/2008 | EP1927889A1 Lithographic printing plate precursor |
| 06/04/2008 | EP1927462A1 Apparatus for applying a controlled force to an article |
| 06/04/2008 | EP1927032A2 Optical arrangement, in particular projection exposure apparatus for euv lithography, as well as reflective optical element with reduced contamination |
| 06/04/2008 | EP1927031A1 Microelectronic substrate having removable edge extension element |
| 06/04/2008 | EP1927030A1 Lithographic method |
| 06/04/2008 | EP1927029A1 Lithographic method |
| 06/04/2008 | EP1927028A2 Stamp comprising a nanostamping structure, device and method for the production thereof |
| 06/04/2008 | EP1587847B1 Process for refining crude resin for electronic material |
| 06/04/2008 | EP1397813B1 Hybrid optical component for x ray applications and method associated therewith |
| 06/04/2008 | EP1368412B1 Imageable element and composition comprising thermally reversible polymers |
| 06/04/2008 | EP1297385B1 Material and method for making an electroconductive pattern |
| 06/04/2008 | CN101194341A Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source |
| 06/04/2008 | CN101194209A Exposure device |
| 06/04/2008 | CN101194208A Method for multi-exposure beam lithography device |
| 06/04/2008 | CN101192555A Resin film evaluation method and method for manufacturing semiconductor device |
| 06/04/2008 | CN101192515A Method for forming a pattern of a semiconductor device |
| 06/04/2008 | CN101192012A Photoresist Stripping reaction chamber quartz tube mounting method |
| 06/04/2008 | CN101192011A System and method for self aligning etching |
| 06/04/2008 | CN101192010A Exposal machine carrying platform cleaning method and system |
| 06/04/2008 | CN101192009A Method for establishing OPC model |
| 06/04/2008 | CN101192008A Coating method and coating device |
| 06/04/2008 | CN101192007A Mask plate, mask plate layout design method and defect repairing method |
| 06/04/2008 | CN101192006A Chemically amplified positive resist composition |
| 06/04/2008 | CN101192005A Heat resisting negative photoresist preparation method |
| 06/04/2008 | CN101192004A Chemical processing-free negative graph photosensitive composition suitable for UV-CTP and planographic printing plate manufactured therefor and planographic printing plate manufacture method |
| 06/04/2008 | CN101192003A Photocurable organic material and method of fabricating array substrate for liquid crystal display device using the same |
| 06/04/2008 | CN101192002A Magnetism remote-controlled drive microstructure preparation method |
| 06/04/2008 | CN101192001A Welding-proof film forming method and photosensitive composition |
| 06/04/2008 | CN101192000A Central symmetry continuous microstructure diffraction element mask manufacture method |
| 06/04/2008 | CN101191999A Central symmetry continuous diffraction element mask microstructure graph transfer method |
| 06/04/2008 | CN101191997A Photomask and its manufacture method and pattern definition method |
| 06/04/2008 | CN101191996A Process for preparing light mask and optical adjacence correction repairing method |
| 06/04/2008 | CN101191967A Liquid crystal display device array substrate and its manufacture method |
| 06/04/2008 | CN101191900A Exposure device |
| 06/04/2008 | CN101191858A High reflectivity colorful filter and its manufacture method |
| 06/04/2008 | CN101191857A Film pattern layer and its making method thereof |
| 06/04/2008 | CN101190903A Oxetane-containing compound, photoresist composition having the same, method of preparing pattern, and inkjet print head |
| 06/04/2008 | CN101190723A Vessel for containing protection thin film components |
| 06/04/2008 | CN100392825C Method for removing etching residue on wafer surface |
| 06/04/2008 | CN100392821C Process for removing etching residue polymer |
| 06/04/2008 | CN100392813C Antireflective hardmask and uses thereof |
| 06/04/2008 | CN100392517C Suspension board with circuit |
| 06/04/2008 | CN100392516C Paste material, display device and manufacturing method for display device |
| 06/04/2008 | CN100392512C Structure releasing arrangement and method for preparing same |
| 06/04/2008 | CN100392444C Method for producing photon crystal and controllable defect therein |
| 06/03/2008 | US7382816 Two-stage laser pulse energy control device and two-stage laser system |
| 06/03/2008 | US7382815 Laser spectral engineering for lithographic process |
| 06/03/2008 | US7382540 Refractive projection objective |
| 06/03/2008 | US7382536 Objective with fluoride crystal lenses |
| 06/03/2008 | US7382527 EUV multilayer mirror with phase shifting layer |
| 06/03/2008 | US7382447 Method for determining lithographic focus and exposure |
| 06/03/2008 | US7382446 Aberration measuring method |
| 06/03/2008 | US7382440 Lithographic apparatus and device manufacturing method |
| 06/03/2008 | US7382437 Projection optical system, exposure apparatus and device fabricating method |
| 06/03/2008 | US7382436 Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/03/2008 | US7382434 Exposure apparatus and device manufacturing method |
| 06/03/2008 | US7381842 For resist applications; thermostability, storage stability; color filters |
| 06/03/2008 | US7381764 Radiation-curing binders containing carboxylic acid esters |
| 06/03/2008 | US7381694 Semiconductor substrate or chip; using mixture of carbon dioxide gas with ethylene, propylene, butylene carbonate with propylene glycol monomethyl ether acetate; pulsation fluids |
| 06/03/2008 | US7381519 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 06/03/2008 | US7381518 Suppport coated with recording layer composed of a water-insoluble and alkali-soluble resin and an infrared absorbent, and with an organic polymer on the other side, which is coated using a solvent; total amount of solvent remaining in the polymer layer is 10 mg per gram of the polymer or less. |
| 06/03/2008 | US7381517 infrared absorber is cyanine dye with an amide, urethane, urea, or a sulfonamide bond; radical generator, acid generator; radical polymerizable compound, acid crosslinker; recording layer of a negative lithographic printing plate precursor; direct infrared laser from digital signals; no dye deposit |
| 06/03/2008 | US7381516 Multiphoton photosensitization system |
| 06/03/2008 | US7381508 Correcting errors using step difference between insulating pattern and adjoining trench |
| 06/03/2008 | US7381507 Preparing photo-patterned mono- or polychromatic, polarizing films; polarizer can be placed on the interior substrate surface of the Liquid Crystal Display (LCD) cell |