| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/11/2008 | EP1060442B1 Pattern generator with improved address resolution |
| 06/11/2008 | EP0894262B1 Optical inspection device and lithographic apparatus provided with such a device |
| 06/11/2008 | CN101199240A Method of protecting a radiation source producing EUV-radiation and/or soft X-rays against short circuits |
| 06/11/2008 | CN101199038A Method and apparatus for removing organic film on substrate surface |
| 06/11/2008 | CN101198909A Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure |
| 06/11/2008 | CN101198908A Image processing device, image drawing device, and system |
| 06/11/2008 | CN101198907A Antireflective hardmask composition and methods for using same |
| 06/11/2008 | CN101198906A Positive resist composition for thin-film implantation process and method for forming resist pattern |
| 06/11/2008 | CN101198905A Positive resist composition and method for forming resist pattern |
| 06/11/2008 | CN101198904A Sub-micron decal transfer lithography |
| 06/11/2008 | CN101198903A Pattern replication with intermediate stamp |
| 06/11/2008 | CN101198902A Soft lithographic stamp with a chemically patterned surface |
| 06/11/2008 | CN101197385A Image sensor and method for manufacturing the same |
| 06/11/2008 | CN101197258A Method for multi-layer resist plasma etch |
| 06/11/2008 | CN101197257A Method for forming micro-pattern in a semiconductor device |
| 06/11/2008 | CN101197253A Coating and developing device, coating and developing method and storage medium |
| 06/11/2008 | CN101196695A Lithographic apparatus, device manufacturing method and computer program product |
| 06/11/2008 | CN101196694A Method to reduce mechanical wear of immersion lithography apparatus |
| 06/11/2008 | CN101196693A Silicon slice fixing part |
| 06/11/2008 | CN101196692A Exposure light source length control device used for producing color picture tube |
| 06/11/2008 | CN101196691A Method for improving metal connection defect of through hole |
| 06/11/2008 | CN101196690A Production method for shading mask plate and its application |
| 06/11/2008 | CN101196689A Hot rolling high fine aluminum plate substrate and its production method |
| 06/11/2008 | CN101196688A Photosensitive resin composition and spacer for liquid crystal panel |
| 06/11/2008 | CN101196687A Chemically amplified resist composition |
| 06/11/2008 | CN101196686A Photosensitive resin composition and use of the same |
| 06/11/2008 | CN101196685A Colored curable composition for color filter, color filter and process for producing the same |
| 06/11/2008 | CN101196684A Anti-corrosion and method for producing thin film pattern and LCD member using the same |
| 06/11/2008 | CN101196682A Mask plate territory for manufacturing connecting pore and its design method |
| 06/11/2008 | CN101196681A Detecting device, detecting method, manufacturing method and pattern transferring method for photomask |
| 06/11/2008 | CN101196680A Detecting device, detecting method, manufacturing method and pattern transferring method for photomask |
| 06/11/2008 | CN101196660A Liquid crystal display and method of manufacturing the same |
| 06/11/2008 | CN101196645A RGBW colorful color filter structure and its production method |
| 06/11/2008 | CN101196595A Production method for electric-controlled adjustable optical attenuator chip |
| 06/11/2008 | CN100394573C Position measurement technique |
| 06/11/2008 | CN100394554C Wet processing tank and fluid supply system for liquid crystal display production equipment |
| 06/11/2008 | CN100394547C Optical projecting processor, manufacture and products, thereby, cleaning apparatus and method for pollutant therefrom |
| 06/11/2008 | CN100394306C Preparation process of exposure registering mark for mixing and matching between electron beam and optical device |
| 06/11/2008 | CN100394305C Photo resistance pumping spraying, reconnaissance circuit and its system |
| 06/11/2008 | CN100394304C Calibration method for photoetching |
| 06/11/2008 | CN100394289C Liquid crystal display device and a manufacturing method of the same |
| 06/11/2008 | CN100394270C Method of manufacturing low substrate of LCD device |
| 06/11/2008 | CN100394221C Method for making colour-filter |
| 06/11/2008 | CN100393797C Optical material containing photocurable fluoropolymer and photocurable fluororesin composition |
| 06/10/2008 | US7386830 Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product |
| 06/10/2008 | US7385835 Membrane 3D IC fabrication |
| 06/10/2008 | US7385764 Objectives as a microlithography projection objective with at least one liquid lens |
| 06/10/2008 | US7385756 Catadioptric projection objective |
| 06/10/2008 | US7385700 Management system, apparatus, and method, exposure apparatus, and control method therefor |
| 06/10/2008 | US7385699 Apparatus and methods for detecting overlay errors using scatterometry |
| 06/10/2008 | US7385677 Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam |
| 06/10/2008 | US7385676 Mask set having separate masks to form different regions of integrated circuit chips, exposure system including the mask set with an aperture device, and method of using the mask set to expose a semiconductor wafer |
| 06/10/2008 | US7385675 Lithographic apparatus and device manufacturing method |
| 06/10/2008 | US7385674 Exposure apparatus and device manufacturing method |
| 06/10/2008 | US7385672 Exposure apparatus and method |
| 06/10/2008 | US7385671 High speed lithography machine and method |
| 06/10/2008 | US7385370 Driving apparatus, exposure apparatus, and device manufacturing method |
| 06/10/2008 | US7385212 Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus |
| 06/10/2008 | US7385209 Micromachining process, system and product |
| 06/10/2008 | US7385194 Charged particle beam application system |
| 06/10/2008 | US7385021 Sacrificial film-forming composition, patterning process, sacrificial film and removal method |
| 06/10/2008 | US7385009 Homopolymer or copolymers of 4-hydroxystyrene using blocking agentsfor hydroxyl group which is removed with halosilane compound ; narrow molecular weight distribution; photoresists |
| 06/10/2008 | US7384900 Composition and method for removing copper-compatible resist |
| 06/10/2008 | US7384730 Top coating composition for photoresist and method of forming photoresist pattern using same |
| 06/10/2008 | US7384729 Making mold for lithography, electroplating and molding by foming photoresist on one side of a transparent substrate covered on both sides with a mask; illuminating the backside of the substrate to expose the photoresist layer; removing the unexposed portion to form a patterned structure; metallization |
| 06/10/2008 | US7384728 First organic layer, silicon-containing sacrificial layer, and second organic layer; photolithographically patterning the 2nd organic layer and using it as a mask to etch the sacrificial layer; using the etched sacrificial layer as a mask to etch first organic layer; using product to etch the substrate |
| 06/10/2008 | US7384727 Semiconductor processing patterning methods |
| 06/10/2008 | US7384726 Resist collapse prevention using immersed hardening |
| 06/10/2008 | US7384725 System and method for fabricating contact holes |
| 06/10/2008 | US7384713 Exposure mask blank manufacturing method and exposure mask manufacturing method |
| 06/10/2008 | US7384712 Transferring pattern to substrate; holes surrounded by sheilding zones; forming semiconductors |
| 06/10/2008 | US7384710 Method of forming exposure mask pattern, exposure mask pattern, and method of producing semiconductor device |
| 06/10/2008 | US7384709 Outside the region of the storage medium to be written, the two-dimensional movement is registered and evaluated for position control of the write beam; position control signal constitutes time control with which the write beam can be intensity-controlled during its continuous scan |
| 06/10/2008 | US7384685 Compressible plate for flexographic printing and method for obtaining same |
| 06/10/2008 | US7384228 Insertion device, lithographic apparatus with said insertion device and device manufacturing method |
| 06/10/2008 | US7384149 Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| 06/10/2008 | US7383929 Anti-vibration technique |
| 06/05/2008 | WO2008067477A1 Non-slip masking product, and methods |
| 06/05/2008 | WO2008067237A1 Resolution enhancement in optical lithography via absorbance-modulation enabled multiple exposures |
| 06/05/2008 | WO2008066375A2 Process, apparatus and device |
| 06/05/2008 | WO2008066181A1 Immersion exposure device and exposure method, and device manufacturing method |
| 06/05/2008 | WO2008066101A1 Photosensitive heat curing-type resin composition and flexible printed wiring board |
| 06/05/2008 | WO2008066100A1 Pigment dispersion composition for black matrix and pigment dispersed resist composition for black matrix containing the same |
| 06/05/2008 | WO2008066019A1 Lithographic printing plate material |
| 06/05/2008 | WO2008066011A1 Positive radiation-sensitive resin composition and pattern forming method |
| 06/05/2008 | WO2008065977A1 Exposure method, pattern forming method, exposure device, and device manufacturing method |
| 06/05/2008 | WO2008065973A1 Method for finishing surface of preliminary polished glass substrate |
| 06/05/2008 | WO2008065944A1 Photosensitive siloxane composition, hardened film formed therefrom and device having the hardened film |
| 06/05/2008 | WO2008065905A1 Photosensitive resin composition, and flexible print circuit board using the same |
| 06/05/2008 | WO2008065827A1 Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern |
| 06/05/2008 | WO2008065821A1 Optical element, exposure unit utilizing the same and process for device production |
| 06/05/2008 | WO2008065755A1 Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution |
| 06/05/2008 | WO2008064880A1 Movable phase step micro mirror and a method for its manufacture |
| 06/05/2008 | WO2008064879A1 Movable phase step micro mirror having a multilayer substrate and a method for its manufacture |
| 06/05/2008 | WO2008064859A2 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations |
| 06/05/2008 | WO2008064845A1 Method of manufacturing a projection objective and projection objective manufactured by that method |
| 06/05/2008 | WO2008048491A3 Contact lithography apparatus, system and method |
| 06/05/2008 | WO2007087134A3 Optical beam steering and sampling apparatus and method |
| 06/05/2008 | WO2006088561A3 Method for treating a substrate with a high pressure fluid using a peroxide-based process chemistry |
| 06/05/2008 | US20080131821 Dual layer workpiece masking and manufacturing process |