| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/18/2008 | CN101201422A Method for preparing pattern film by divesting method |
| 06/18/2008 | CN101200566A Photosensitive resin composition for forming organic insulating film and device using the same |
| 06/18/2008 | CN101200149A Method for forming embossed hologram |
| 06/18/2008 | CN100395874C Manufacture method of semiconductor device for improving photo resist remainder after etch |
| 06/18/2008 | CN100395869C Process for preventing heavy duty optical resistance from collapsing |
| 06/18/2008 | CN100395834C Multi-layer structure and method of drawing microscopic structure therein |
| 06/18/2008 | CN100395662C Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof |
| 06/18/2008 | CN100395661C Sucker, photoetching projective apparatus, method for producing sucker and component producing method |
| 06/18/2008 | CN100395645C Black-white cholesterol liquid crystal display and its producing method |
| 06/18/2008 | CN100395604C Array panel for liquid crystal display device and method of manufacturing the same |
| 06/18/2008 | CN100395598C Array substrate for liquid crystal display device and fabricating method of the same |
| 06/18/2008 | CN100395582C Projection optical system and pattern drawing device |
| 06/18/2008 | CN100395577C Latch of micro machinery optical switch and fabrication thereof |
| 06/18/2008 | CN100395273C Positive photoresist composition and method of forming resist pattern |
| 06/17/2008 | US7389155 Method and system for improved trajectory planning and execution |
| 06/17/2008 | US7388943 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 06/17/2008 | US7388696 Diffuser, wavefront source, wavefront sensor and projection exposure apparatus |
| 06/17/2008 | US7388653 Exposure mask and method for divisional exposure |
| 06/17/2008 | US7388650 Lithographic apparatus and device manufacturing method |
| 06/17/2008 | US7388649 Exposure apparatus and method for producing device |
| 06/17/2008 | US7388648 Lithographic projection apparatus |
| 06/17/2008 | US7388646 Use in optical applications such as immersion lithography; lower absorbance at wavelengths lower than 250 nm; free of chlorine atoms, even in end groups; made by oxidation of tetrafluoroethylene (TFE) in presence of dilute fluorine gas |
| 06/17/2008 | US7388307 Stage apparatus, plane motor, and device manufacturing method |
| 06/17/2008 | US7388220 EUV light source |
| 06/17/2008 | US7388217 Particle-optical projection system |
| 06/17/2008 | US7388172 System and method for cutting using a variable astigmatic focal beam spot |
| 06/17/2008 | US7387988 A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof. |
| 06/17/2008 | US7387871 Mask complementary multiple exposure technique |
| 06/17/2008 | US7387870 Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet |
| 06/17/2008 | US7387869 Method of forming pattern for semiconductor device |
| 06/17/2008 | US7387868 Treatment of a dielectric layer using supercritical CO2 |
| 06/17/2008 | US7387867 Manufacturing method of semiconductor integrated circuit device |
| 06/17/2008 | US7387866 Photolithography process using multiple anti-reflective coatings |
| 06/17/2008 | US7387865 mixture of sulfonium or iodonium acid generators and nonionic surfactants, used to form analysis apparatus on solid substrates |
| 06/17/2008 | US7387864 Donor element for thermal transfer |
| 06/17/2008 | US7387859 Method for measuring overlay shift |
| 06/17/2008 | US7387854 first mask is an isolated line pattern and dummy patterns, second pattern is positioned to completely cover the isolated line pattern on the wafer; remove the dummy patterns |
| 06/17/2008 | US7387812 Heat-curable resin composition |
| 06/17/2008 | US7387739 Mask and method of manufacturing the same, electroluminescent device and method of manufacturing the same, and electronic instrument |
| 06/17/2008 | US7387683 Discharging unit for discharging a photosensitive material, coater having the discharging unit, and apparatus for coating a photosensitive material having the coater |
| 06/17/2008 | US7387508 Compliant device for nano-scale manufacturing |
| 06/17/2008 | US7387455 Substrate processing device, substrate processing method, and developing device |
| 06/17/2008 | US7387395 Optical units |
| 06/17/2008 | US7386934 Double layer patterning and technique for milling patterns for a servo recording head |
| 06/12/2008 | WO2008070774A1 Directly photodefinable polymer compositions and methods thereof |
| 06/12/2008 | WO2008070087A2 Method for patterning a surface |
| 06/12/2008 | WO2008070060A2 Device manufacturing process utilizing a double pattering process |
| 06/12/2008 | WO2008069653A1 Shadowing electrodes for debris suppression in an euv source |
| 06/12/2008 | WO2008069211A1 Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus and device manufacturing method |
| 06/12/2008 | WO2008069159A1 Method for producing microlens |
| 06/12/2008 | WO2008069151A1 Exposure apparatus, exposure method, and device production method |
| 06/12/2008 | WO2008069047A1 Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin |
| 06/12/2008 | WO2008069014A1 Surface modifier for resist and method for the formation of resist patterns with the same |
| 06/12/2008 | WO2008068971A1 Positive resist composition for liquid immersion exposure and method of forming resist pattern |
| 06/12/2008 | WO2008068903A1 Copolymer for semiconductor lithography and process for producing the same |
| 06/12/2008 | WO2008068815A1 Electron beam exposure device |
| 06/12/2008 | WO2008068617A2 Photoactive compounds |
| 06/12/2008 | WO2008049844B1 High resolution imaging process using an in-situ image modifying layer |
| 06/12/2008 | WO2008024792B1 Low-k damage avoidance during bevel etch processing |
| 06/12/2008 | WO2008017449A3 Composite structure for microlithography and optical arrangement |
| 06/12/2008 | WO2006054243A3 Method for controlling an electric motor, control unit and electric motor |
| 06/12/2008 | US20080140342 Assessment and optimization for metrology instrument |
| 06/12/2008 | US20080139436 First cleaning step uses a cleaning/remover formulation, preferably a fluorine-containing compound such as ammonium fluoride; the second rinse step uses a basic compound such as an ammonium, oxoammonium or alkanolamine; optional solvents of water or organic solvent; effective residue removal; wafers |
| 06/12/2008 | US20080138747 Method for Forming a Photoresist Pattern |
| 06/12/2008 | US20080138746 Photoresists; lithography; antireflectivity |
| 06/12/2008 | US20080138745 Polyamic acids; spin coating, etching; heat resistance; photoresists |
| 06/12/2008 | US20080138744 Lithography; photoresists; semiconductors |
| 06/12/2008 | US20080138743 Laser sensitive lithographic printing plate having specific photopolymer composition |
| 06/12/2008 | US20080138742 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition |
| 06/12/2008 | US20080138741 Negative-working radiation-sensitive compositions and imageable materials |
| 06/12/2008 | US20080138718 irradiating a prescribed region of a recording layer included in a holographic optical recording medium with a first light to perform recording, the recording layer containing a three-dimensionally crosslinked polysilane and a photo-polymerizable compound, irradiating entire surface with 2nd light |
| 06/12/2008 | US20080138717 Color holographic optical element |
| 06/12/2008 | US20080138588 Generating an assist feature of a lithography mask by providing a layout for a material layer of a semiconductor device, the layout including a pattern for one feature of the semiconductor device; in the pattern for the feature where the assist feature extends completely through the pattern |
| 06/12/2008 | US20080138581 Masking high-aspect aspect ratio structures |
| 06/12/2008 | US20080138460 Multilayer nano imprint lithography |
| 06/12/2008 | US20080138177 Load lock and method for transferring objects |
| 06/12/2008 | US20080137183 8-Mirror microlithography projection objective |
| 06/12/2008 | US20080137056 Method for Processing Substrate, Exposure Method, Exposure Apparatus, and Method for Producing Device |
| 06/12/2008 | US20080137049 Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle |
| 06/12/2008 | US20080136993 Method of Forming a Cell Identification, Display Substrate and Display Device Having the Same |
| 06/12/2008 | US20080135842 Method For Manufacturing Array Board For Display Device |
| 06/12/2008 | US20080135204 Method and apparatus for production of a cast component |
| 06/12/2008 | US20080134962 Crystallization method and crystallization apparatus |
| 06/12/2008 | DE10319182B4 Verfahren und Anordnung zur Bestimmung der Fokusposition bei der Abbildung einer Probe Method and apparatus for determining the focal position in the imaging of a sample |
| 06/12/2008 | DE102007044633A1 Fotolithografie-Immersionsscanner und Verfahren zum Betreiben desselben The same photo lithographic immersion scanner and method of operating |
| 06/11/2008 | EP1930776A1 Process for producing 3-dimensional mold, process for producing microfabrication product, process for producing micropattern molding, 3-dimensional mold, microfabrication product, micropattern molding and optical device |
| 06/11/2008 | EP1930775A1 Rinsing liquid for lithography and method for resist pattern formation |
| 06/11/2008 | EP1930774A1 Scatterometer and focus analysis method |
| 06/11/2008 | EP1930773A1 Substrate support and lithographic process |
| 06/11/2008 | EP1930772A1 Projection objectives having mirror elements with reflective coatings |
| 06/11/2008 | EP1930771A1 Projection objectives having mirror elements with reflective coatings |
| 06/11/2008 | EP1930770A2 Imaging recording material and novel compound |
| 06/11/2008 | EP1930747A1 Optical device and method for manufacturing same |
| 06/11/2008 | EP1930382A1 Coating materials consisting of low- or medium-molecular organic compounds |
| 06/11/2008 | EP1930173A1 Photogravure engraving roll with cushioning layer and production method therefor |
| 06/11/2008 | EP1929374A2 Immersion optical lithography system having protective optical coating |
| 06/11/2008 | EP1929373A1 Dense opc |
| 06/11/2008 | EP1928929A1 Curable compositions containing dithiane monomers |
| 06/11/2008 | EP1794326A4 Use of photopolymerization for amplification and detection of a molecular recognition event |
| 06/11/2008 | EP1658622A4 Method and system for drying a substrate |