| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/19/2008 | WO2008072582A1 Inorganic-particle-containing resin composition, transfer film, and process for producing flat panel display member |
| 06/19/2008 | WO2008072502A1 Exposure method and apparatus, and device manufacturing method |
| 06/19/2008 | WO2008072457A1 Wide-angle optical system |
| 06/19/2008 | WO2008072447A1 Chemical amplification type positive photoresist composition for thick film and process for producing thick resist pattern |
| 06/19/2008 | WO2008071517A1 Device and method for wet treating plate-like-articles |
| 06/19/2008 | WO2008071305A1 Illuminating optical unit and projection exposure apparatus for microlithography |
| 06/19/2008 | WO2008071295A1 Calibrating method for a mask writer |
| 06/19/2008 | WO2008071269A1 Apparatus and method for mask metrology |
| 06/19/2008 | WO2008071078A1 Cleaning composition for removing photoresist |
| 06/19/2008 | WO2008071077A1 Cleaning compound for removing photoresist |
| 06/19/2008 | WO2008045520A3 Imprint lithography apparatus and methods |
| 06/19/2008 | WO2008037496A3 Projection objective for a microlithography apparatus with improved imaging properties and method for improving the imaging properties of the projection objective |
| 06/19/2008 | US20080146801 Method of processing substrate and chemical used in the same |
| 06/19/2008 | US20080145799 Substrate developing method, substrate processing method and developing solution supply nozzle |
| 06/19/2008 | US20080145798 Method of processing substrate and chemical used in the same |
| 06/19/2008 | US20080145797 Transfer wafer into single wafer wet clean module directly coupled to transfer chamber; clean with acoustic energy applied in a direction normal to wafer backside while frontside is kept dry; filter amine and ammonia vapors from transfer chamber; atmospheric and sub-atmospheric processing |
| 06/19/2008 | US20080145796 Two layers of photoresist; second layer chemically amplified resist of photosensitive diazonaphtoquinone and novolac resin; second resist layer possesses a transmission which first increases then decreases as exposure dose increases |
| 06/19/2008 | US20080145795 Substrate having electronic circuit; form ultra low-K dielectric layer having porogens on substrate; block incoming radiation from first region of dielectric layer; evaporate porogens from second region of dielectric layer with radiation; remove dielectric layer in the first region with developer |
| 06/19/2008 | US20080145794 Microelectronic circuits, micro-electromechanical systems; liquid is substantially transparent at a wavelength used for liquid immersion lithography; high-symmetric molecules; degree of polarization is larger than 0.9 of light incident in forward direction and is scattered in perpendicular direction |
| 06/19/2008 | US20080145790 Process for Production of Lithographic Printing Plates |
| 06/19/2008 | US20080145789 Method of making lithographic printing plates |
| 06/19/2008 | US20080145787 Topcoat compositions and methods of use thereof |
| 06/19/2008 | US20080145784 Polyhydric phenol base material, acid-dissociable, dissolution-inhibiting, increased alkali solubility under action of acid; acid generator on radiation exposure; high resolution resist pattern with a reduced level of roughness |
| 06/19/2008 | US20080145783 Acrylic copolymer binder resin, photoacid generator, solvent; excellent mechanical and thermal properties, high improved transmittance, superior insulating properties; organic insulating film using the photosensitive resin |
| 06/19/2008 | US20080145769 Entry acceptance unit takes measured dimension of transfer pattern; calculations of triaxial vector components at every position; flare electric field vector by polarization ratio of exposure tool; light intensity by adding electric field vector and flare, calculate sum of squares of triaxial components |
| 06/19/2008 | US20080145768 Form a mixing-generation resist film on mask; bake film to form mixing layer at interface between mask and film; developer solution of tetramethylammonium hydroxide; fine resist pattern by shrinking technique; suppress spot-like defects at low cost; semiconductor device |
| 06/19/2008 | US20080145766 Holographic recording medium |
| 06/19/2008 | US20080145765 Metal Identification Platelet and Method of Producing Thereof |
| 06/19/2008 | US20080145539 Reducing the spacing between adjacent photoresist patterns, by heating to shrink the overcoatings, control pattern dimensions; semiconductors, photolithographic |
| 06/19/2008 | US20080144246 Combination current sensor and relay |
| 06/19/2008 | US20080144146 Holographic data storage device and method of making |
| 06/19/2008 | US20080144043 Apparatus for wavefront detection |
| 06/19/2008 | US20080144031 Overlay target and measurement method using reference and sub-grids |
| 06/19/2008 | US20080144008 System For Positioning a Product |
| 06/19/2008 | US20080143994 Drive Method of Moving Body, Stage Unit, and Exposure Apparatus |
| 06/19/2008 | US20080143993 Illumination optical system and exposure apparatus |
| 06/19/2008 | US20080143984 Projection method including pupillary filtering and a projection lens therefor |
| 06/19/2008 | US20080143980 Substrate Processing Method, Exposure Apparatus, and Method For Producing Device |
| 06/19/2008 | US20080143019 Release surfaces, particularly for use in nanoimprint lithography |
| 06/19/2008 | US20080142680 Mold structure |
| 06/19/2008 | US20080142186 Method and apparatus for production of a cast component |
| 06/19/2008 | US20080142185 Method and apparatus for production of a cast component |
| 06/19/2008 | US20080142182 Method and apparatus for production of a cast component |
| 06/19/2008 | DE20023981U1 Kompakte Mehrstrahllaserlichtquelle zur Belichtung von Druckplatten Compact multi-beam laser light source for exposure of printing plates |
| 06/19/2008 | DE102007061194A1 Illumination system for extreme ultraviolet micro lithograph, has illumination optic for guiding illuminating light of radiation source into object field in object plane |
| 06/19/2008 | DE102006059823A1 Method for loading case aberration measurement of optical system, involves providing multi-channel measuring device for parallel production of aberration indicative measuring values for multiple field points |
| 06/19/2008 | DE102006059818A1 Belichtungsanlage Exposure system |
| 06/19/2008 | DE102006059436A1 Projection optics, particularly microscope, comprises objective and tubular optics where objective and tubular optics are formed as reflector optics, and tubular optics has two reflector surfaces |
| 06/19/2008 | DE102006059433A1 Calibration method for template writer, involves measuring existing deformation of former template during writing former template structure of former template with template writer, and distortion of former written template is also measured |
| 06/19/2008 | DE102006059431A1 Method for determining position of structure on carrier relative to reference point of carrier, involves preparing image with reference structure and receiving image of structure on carrier in known position relative to reference point |
| 06/19/2008 | DE102006059024A1 Projection exposure equipment for microlithography, has illuminating optical unit for illuminating object field in object plane and correction screen is arranged in or adjacent to aperture diaphragm plane of projection optical unit |
| 06/19/2008 | CA2672111A1 Hybrid cationic curable coatings |
| 06/18/2008 | EP1933371A1 Exposure apparatus, exposure method, and device production method |
| 06/18/2008 | EP1933205A1 Method of producing optimized setpoint data in a maskless lithography system and apparatus therefore. |
| 06/18/2008 | EP1932174A1 Oxidizing aqueous cleaner for the removal of post-etch residues |
| 06/18/2008 | EP1932062A1 Lithographic apparatus and method of controlling |
| 06/18/2008 | EP1932061A1 Device and method for influencing polarisation distribution in an optical system, in particular in a microlithography exposure system |
| 06/18/2008 | EP1932060A1 Negative photoresist for silicon koh etch without silicon nitride |
| 06/18/2008 | EP1932059A2 Contact lithography apparatus, system and method |
| 06/18/2008 | EP1931968A1 Equipment and method for monitoring an immersion lithography device |
| 06/18/2008 | EP1869696B1 Process for the formation of miniaturized getter deposits and getterdeposits so obtained |
| 06/18/2008 | EP1546221A4 PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY |
| 06/18/2008 | EP1474724A4 Halogenated anti-reflective coatings |
| 06/18/2008 | EP1060443B1 Improved modulator design for pattern generator |
| 06/18/2008 | CN101203810A Image position measuring apparatus and exposure apparatus |
| 06/18/2008 | CN101203809A Method and apparatus for a post exposure bake of a photoresist |
| 06/18/2008 | CN101203808A Photographic enhancement technique |
| 06/18/2008 | CN101203807A Photoresist film roll and method for manufacturing same |
| 06/18/2008 | CN101203806A Methods and devices for characterizing polarization of illumination system |
| 06/18/2008 | CN101203805A Thermal development system and method of using the same |
| 06/18/2008 | CN101203802A 2-dimensional image display device, illumination light source, and exposure illumination device |
| 06/18/2008 | CN101202286A Array substrate, display device, and method for manufacturing the array substrate |
| 06/18/2008 | CN101202268A Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method |
| 06/18/2008 | CN101202244A Method for removing photoresist graphical in forming process of dual embedded structure |
| 06/18/2008 | CN101202231A Method for manufacturing inlaid structure |
| 06/18/2008 | CN101201559A System and method for controlling horizontally and focusing automatically silicon slice platform of photo-etching machine |
| 06/18/2008 | CN101201558A Plasma degumming table adjustable piece-carrying body |
| 06/18/2008 | CN101201557A Detergent for cleaning thick film photoresist |
| 06/18/2008 | CN101201556A Photoresist detergent with low etching property |
| 06/18/2008 | CN101201555A Dual platform switching system for mask aligner silicon slice platform using conveyer structure |
| 06/18/2008 | CN101201554A Lithographic device manufacturing method, lithographic cell, and computer program product |
| 06/18/2008 | CN101201553A Illumination optical system, exposure apparatus, and exposure method |
| 06/18/2008 | CN101201552A Illumination optical system, exposure apparatus, and exposure method |
| 06/18/2008 | CN101201551A Illumination optical system, exposure apparatus, and exposure method |
| 06/18/2008 | CN101201550A Focusing method for mask aligner |
| 06/18/2008 | CN101201549A Device and method for focusing and leveling based on microlens array |
| 06/18/2008 | CN101201548A Measuring system and method for focusing and leveling |
| 06/18/2008 | CN101201547A Device and method for compensating thermal effect of lens |
| 06/18/2008 | CN101201546A Device for automatically focusing and leveling |
| 06/18/2008 | CN101201545A Pholithography and wafer forming by the same |
| 06/18/2008 | CN101201544A Semiconductor photolithography method |
| 06/18/2008 | CN101201543A Photo-curing ink-jet resist for printing circuit board and preparation method thereof |
| 06/18/2008 | CN101201542A Coating compositions for photolithography |
| 06/18/2008 | CN101201541A Method for forming organic layer pattern, organic layer pattern prepared by the same and organic memory devices comprising the pattern |
| 06/18/2008 | CN101201540A Method for preparing hydrogel tuning photon crystal using nanometer stamping technique |
| 06/18/2008 | CN101201538A Soft template with alignment mark |
| 06/18/2008 | CN101201537A Checking device for grey mask, manufacture method and pattern transprinting method thereof |
| 06/18/2008 | CN101201514A Electrostatic discharge protection element, liquid crystal display device having the same, and manufacturing method thereof |
| 06/18/2008 | CN101201452A Micro optical chip based on light fluid and preparation method thereof |
| 06/18/2008 | CN101201435A Method for preparing polymer vertical coupler |