| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/26/2008 | DE19542658B4 Verfahren zur Herstellung einer Stanzform A process for producing a cutting die |
| 06/26/2008 | DE102007057797A1 Method for treatment of reproducible printing block, involves modifying surface acting as printing surface of printing block in nanoscopic area |
| 06/26/2008 | DE102007054287A1 Transmitting optical element for use in projection exposure system for microlithography, is made from polycrystalline material of magnesium spinel or lutetium aluminum garnet crystallites |
| 06/26/2008 | DE102007050456A1 Method for connecting crystalline optical element using holding element which is subjected for fixing crystalline optical element with retaining strength |
| 06/26/2008 | DE102007027985A1 Optisches System, insbesondere Beleuchtungseinrichtung oder Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage Optical system, in particular lighting device or projection objective of a microlithography projection exposure apparatus |
| 06/26/2008 | DE102006060720A1 Reducing roughness of surface of resist layer comprises treating layer with e.g. epoxy compound, where surface of the resist layer is modified and the surface roughness is decreased |
| 06/26/2008 | DE102006060180A1 Verfahren und Vorrichtung zum räumlich hochaufgelösten Abbilden einer mit einer Substanz markierten Struktur Method and apparatus for high spatial resolution imaging of a structure labeled with a substance |
| 06/26/2008 | DE102005009071B4 Verfahren zur Prozesssteuerung Method for Process Control |
| 06/25/2008 | EP1936953A2 A tdi detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus |
| 06/25/2008 | EP1936761A2 Tangential fan with cutoff assembly and vibration control for electric discharge laser |
| 06/25/2008 | EP1936665A1 Exposure device, exposure method, and device fabrication method |
| 06/25/2008 | EP1936438A1 Flexographic printing forme precursor for laser engraving |
| 06/25/2008 | EP1936421A1 Catadioptric optical system and catadioptric optical element |
| 06/25/2008 | EP1936420A2 Projection exposure methods and apparatus, and projection optical system |
| 06/25/2008 | EP1936419A2 Projection exposure methods and apparatus, and projection optical systems |
| 06/25/2008 | EP1935640A2 Printing plate and system using heat-decomposable polymers |
| 06/25/2008 | EP1935620A2 Optical modeling apparatus |
| 06/25/2008 | EP1934669A2 System to transfer a template transfer body between a motion stage and a docking plate |
| 06/25/2008 | EP1934655A1 Dynamic uv-exposure and thermal development of relief image printing elements |
| 06/25/2008 | EP1934654A1 Top antireflective coating composition with low refractive index at 193nm radiation wavelength |
| 06/25/2008 | EP1934653A2 Devices and methods for targeting printing plates and measuring dot coverage thereon |
| 06/25/2008 | EP1839088B1 Imprint reference template for multilayer or multipattern registration and method therefor |
| 06/25/2008 | EP1595250A4 System and method for cutting using a variable astigmatic focal beam spot |
| 06/25/2008 | EP1183737B1 Microlens for surface mount products |
| 06/25/2008 | EP1080392B1 Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography |
| 06/25/2008 | CN201077041Y Diffusion chip replacing device |
| 06/25/2008 | CN101208636A Toner and toner production process |
| 06/25/2008 | CN101208634A Frame data creation device, creation method, creation program, storage medium containing the program, and plotting device |
| 06/25/2008 | CN101208298A Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers |
| 06/25/2008 | CN101207037A Method for forming a pattern in the same with double exposure technology |
| 06/25/2008 | CN101206995A Method for monitoring crystal round pallet obliteration performance |
| 06/25/2008 | CN101206992A Even glue developing process process capable of economizing time and equipment improved structure |
| 06/25/2008 | CN101206688A Method of producing optimized setpoint data in a maskless lithography system and apparatus therefore. |
| 06/25/2008 | CN101206412A Decompression drying device |
| 06/25/2008 | CN101206411A Method for preparing sub-wavelength micro noy structure by forming using focused light |
| 06/25/2008 | CN101206410A Balance mass orientation system for workpiece platform |
| 06/25/2008 | CN101206409A Balance mass orientation system for workpiece platform |
| 06/25/2008 | CN101206408A Exposure data generating apparatus |
| 06/25/2008 | CN101206407A Method of photolithographic exposure |
| 06/25/2008 | CN101206406A Photolithography detection pattern and photolithography edition territory |
| 06/25/2008 | CN101206405A Chemically amplified resist composition |
| 06/25/2008 | CN101206404A Photosensitive resin composition containing inorganic particles, photosensitive film, pattern forming method and preparation method of flat display |
| 06/25/2008 | CN101206403A Photosensitive resin composition and organic insulating film produced using the same |
| 06/25/2008 | CN101206402A Photosensitive resin composition |
| 06/25/2008 | CN101206401A Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof |
| 06/25/2008 | CN101206400A Device and method for manufacturing photosensitive laminate |
| 06/25/2008 | CN101206399A Photosensitive resin composition for column spacers for liquid crystal display device, column spacers formed using the composition and display device comprising the column spacers |
| 06/25/2008 | CN101206398A Pigment dispersion composition for producing color filter and color filter for color imaging device produced using the same |
| 06/25/2008 | CN101206397A Photosensitive resin composition and method for manufacturing roasts obtained thereby |
| 06/25/2008 | CN101206396A Pattern forming method for photosensitive resin composition, color filter and method for making the same |
| 06/25/2008 | CN101206395A Image sensor and fabricating method thereof |
| 06/25/2008 | CN101206394A Exposure mask and method for fabricating semiconductor device using the same |
| 06/25/2008 | CN101206365A Liquid crystal display element and method of manufacturing same |
| 06/25/2008 | CN101206361A Liquid crystal display device and method of fabricating the same |
| 06/25/2008 | CN101206330A Color membrane substrate and production method thereof as well as LCD device |
| 06/25/2008 | CN101206325A Liquid crystal display device with photosensor and method of fabricating the same |
| 06/25/2008 | CN101206300A Projection optical system and projection exposure device |
| 06/25/2008 | CN101205291A Hard mask composition, process for forming material layer, and semiconductor integrated circuit device |
| 06/25/2008 | CN101205082A Process for producing titanium-containing metal oxide, hologram recording material, process for producing the same, and hologram recording medium |
| 06/25/2008 | CN101204880A Liquid discharging head and method for manufacturing same |
| 06/25/2008 | CN101204868A Method for treatment of reproducible printing block |
| 06/25/2008 | CN100397964C Positioning device for use in process for manufacturing multi-layer printed circuit board and its using method |
| 06/25/2008 | CN100397732C Modular, narrow-band KrF excimer laser |
| 06/25/2008 | CN100397572C Electronic beam focusing equipment and electronic beam projection micro shadow system using the same equipment |
| 06/25/2008 | CN100397555C Variable surface hot plate for improved bake uniformity of substrates |
| 06/25/2008 | CN100397404C Measuring method and correction method for illumination irregularity of exposure device |
| 06/25/2008 | CN100397224C Liquid crystal display device and fabricating method thereof |
| 06/25/2008 | CN100397223C Liquid crystal display device and fabricating method thereof |
| 06/25/2008 | CN100397220C Liquid crystal display device having patterned spacers and method of fabricating the same |
| 06/25/2008 | CN100397216C Manufacturing method of two-wine structure film transistor array |
| 06/25/2008 | CN100397190C Liquid crystal display device |
| 06/25/2008 | CN100397107C Method for fabricating color filter |
| 06/25/2008 | CN100397037C Method for calibration of a metrology stage |
| 06/25/2008 | CN100396945C Dynamic pressure bearing manufacturing method, dynamic pressure bearing, and dynamic pressure bearing manufacturing device |
| 06/24/2008 | US7391502 Lithographic apparatus, device manufacturing method, and method of manufacturing a component |
| 06/24/2008 | US7391501 Immersion liquids with siloxane polymer for immersion lithography |
| 06/24/2008 | US7391500 Light exposure apparatus and method of light exposure using immersion lithography with saturated cyclic hydrocarbon liquid |
| 06/24/2008 | US7391498 Technique of suppressing influence of contamination of exposure atmosphere |
| 06/24/2008 | US7391497 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
| 06/24/2008 | US7391496 Exposure apparatus |
| 06/24/2008 | US7391495 Stage apparatus, exposure system using the same, and device manufacturing method |
| 06/24/2008 | US7391036 Sample surface inspection apparatus and method |
| 06/24/2008 | US7390738 Fabrication of semiconductor devices using anti-reflective coatings |
| 06/24/2008 | US7390618 Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device |
| 06/24/2008 | US7390616 Method for post lithographic critical dimension shrinking using post overcoat planarization |
| 06/24/2008 | US7390615 Integrated circuit fuse and method of opening |
| 06/24/2008 | US7390614 Lithographic apparatus and device manufacturing method |
| 06/24/2008 | US7390613 Photoactive compounds |
| 06/24/2008 | US7390612 Copolymers of (meth)acrylic esters containing an adamantyl, 1,4-methanonaphthyl, 1,4:5,8-dimethanonaphthyl, 4,7-methanoindanyl, or 4,7-methanoisobenzofuranyl moiety as a dissolution inhibitor, an acid generator and a polar solvent; improved edge and surface smoothness, resolution and depth of focus range |
| 06/24/2008 | US7390609 have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoresists that comprise such polymers; component of resists imaged at short wavelengths |
| 06/24/2008 | US7390608 the polymer has a controlled ratio of silanol groups to Si atoms of 0.01 to 1.5., especially from trichlorosilanes with fluoroalcohol, fluoromethylsulfonamide, or fluorocarboxylic acid groups and a norbornane ring |
| 06/24/2008 | US7390365 Developing method, substrate treating method, and substrate treating apparatus |
| 06/24/2008 | US7389944 Edge remover having a gas sprayer to prevent a chemical solvent from splashing |
| 06/19/2008 | WO2008072966A2 Plasma radiation source with axial magnetic field |
| 06/19/2008 | WO2008072962A2 Radiation system and lithographic apparatus |
| 06/19/2008 | WO2008072651A1 Photobase generator and photocurable resin composition |
| 06/19/2008 | WO2008072647A1 Exposure apparatus and device fabrication method |
| 06/19/2008 | WO2008072641A1 Exposure apparatus |
| 06/19/2008 | WO2008072638A1 Negative electrode base member |
| 06/19/2008 | WO2008072624A1 Composition for forming resist foundation film containing low molecular weight dissolution accelerator |