Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2014
07/16/2014CN103926805A 一种平面电动机驱动的粗微动一体掩模台 A planar micro-motor driven coarse one mask table
07/16/2014CN103926804A 一种用于深紫外光刻照明系统的chirp式复眼匀光单元 A deep-ultraviolet lithography illumination system chirp type compound eye dodging unit
07/16/2014CN103926803A 光刻机照明光源的描述方法 Lithography illumination light source described in the method
07/16/2014CN103926802A 光刻机光源与掩模的联合优化方法 Joint optimization methods lithography light source and mask
07/16/2014CN103926801A 投影光学系统 The projection optical system
07/16/2014CN103926800A 一种光刻投影物镜微位移控制的电路结构 Circuit structure for a lithographic projection lens micro-displacement control
07/16/2014CN103926799A 一种调焦调平测量方法 One kind focusing leveling measurement method
07/16/2014CN103926798A 一种消除导轨面形对套刻偏差影响的方法 A method for rail surface shape of the impact of the elimination of overlay error
07/16/2014CN103926797A 一种用于光刻装置的双面套刻系统及方法 A double-sided overlay system and method for a lithographic apparatus
07/16/2014CN103926796A 用于光刻的涂层材料和方法 Coating materials and methods for lithography
07/16/2014CN103926795A 光固化性组合物 The photocurable composition
07/16/2014CN103926794A 一种含有二苯甲酮衍生物光引发剂的光固化组合物 Benzophenone derivatives containing a photoinitiator in a photocurable composition agent
07/16/2014CN103926793A 一种薄膜面板的配方 A thin-film panels recipe
07/16/2014CN103926792A 热敏组合物和其用途 Thermosensitive composition and uses thereof
07/16/2014CN103926791A 固化性树脂组合物、其干膜和固化物以及使用它们的印刷电路板 The curable resin composition, the cured dry film, and the use thereof as well as a printed circuit board
07/16/2014CN103926790A 具有对准式自动脱模紫外纳米压印装置及方法 Having an alignment automatic stripping device and method for UV nanoimprint
07/16/2014CN103926789A 纳米压印模板、系统以及压印方法 Nano imprint template, the system and method of embossing
07/16/2014CN103926788A 压印版及其制作方法及压印版压印出的工件 Imprint and its production method and the print edition version of the imprint of the workpiece
07/16/2014CN103926707A 一种波导共振耦合表面等离子体光场的激发和调控方法 A waveguide resonance excitation and regulation methods coupled surface plasmon light field
07/16/2014CN103926683A 一种变焦光学系统 One kind of zoom optical system
07/16/2014CN103926677A 用于光刻照明系统光瞳测量的傅里叶变换物镜 Fourier lithography illumination system for measuring pupil conversion lens
07/16/2014CN103926671A 一种多自由度精密调整机构 A multi-DOF precision adjustment mechanism
07/16/2014CN103923426A 树脂组合物、固化膜、其形成方法、半导体元件及显示元件 The resin composition, cured film, method of forming a semiconductor device and a display device
07/16/2014CN103923251A 一种快干型丙烯酸酯聚合物及其制备方法 A fast drying acrylic polymer and its preparation method
07/16/2014CN102890402B 去除光感显影底部抗反射层缺陷的方法 Removing the light-sensitive bottom antireflective layer defects developing methods
07/16/2014CN102866596B 一种配装波纹管垂向解耦重力补偿器的微动台 One kind of vertical decoupling fitted bellows compensator micro gravity station
07/16/2014CN102866443B 形成取样光栅的方法以及制作激光二极管的方法 Sampling method for forming a grating, and a method of making a laser diode
07/16/2014CN102854741B 用于非平整衬底晶圆级纳米压印的复合软模具及制造方法 Composite soft mold and manufacturing methods for non-flat substrate wafer level nanoimprint
07/16/2014CN102819193B 决定具有最佳聚焦深度照明光源的方法 Determines the depth of focus has the best lighting method
07/16/2014CN102804065B 放射线敏感性树脂组合物 The radiation-sensitive resin composition
07/16/2014CN102789132B 具有固定结构的极紫外光光罩储存传送盒 EUV reticle storage transfer case with a fixed structure
07/16/2014CN102770806B 用于极紫外光刻的反射掩模及euv光刻设备 Reflection for EUVL mask and lithography equipment euv
07/16/2014CN102749808B 一种调焦调平测量装置 One kind focusing leveling measuring device
07/16/2014CN102741751B 感光性组合物，感光性膜，感光性层叠体，用于形成永久图案的方法以及印刷电路板 The method of the photosensitive composition, a photosensitive film, the photosensitive laminate for forming a permanent pattern of a printed circuit board, and
07/16/2014CN102736424B 物镜旋转的辅助装置 Auxiliary device rotating lens
07/16/2014CN102736420B 可动狭缝刀片 A movable slit blade
07/16/2014CN102707568B 多台阶器件结构底层表面的光刻方法 Multi-step photolithography bottom surface of the device structure
07/16/2014CN102707415B 光刻投影物镜 Lithographic projection lens
07/16/2014CN102707414B 光刻投影物镜 Lithographic projection lens
07/16/2014CN102566296B 一种光刻曝光系统集成装配方法 A lithographic exposure system integration method of assembly
07/16/2014CN102540778B 一种测量系统及使用该测量系统的光刻设备 A measuring system of the measuring system and the use of lithographic apparatus
07/16/2014CN102540744B 掩模对准探测装置及方法 Mask alignment detection device and method
07/16/2014CN102479687B 提高后层曝光工艺宽容度的方法 Methods to improve the layer after exposure process latitude
07/16/2014CN102419517B 一种基于双导轨双驱步进扫描的双工件台交换装置与方法 An apparatus and method based on dual-piece dual-rail two-step scan drive swap
07/16/2014CN102411264B 光刻机投影物镜温度均衡装置及均衡方法 Lithography projection objective and balanced method for temperature equalization device
07/16/2014CN102402126B 一种用于检测光刻过程中照明条件的结构及其检测方法 Structure and detection method for detecting the lighting conditions in the lithography process
07/16/2014CN102365590B 用于掩模板的快速交换装置中的共享的顺应性和掩模板平台 Means for the rapid exchange of the mask and the mask compliance shared platform
07/16/2014CN102289151B 涂敷方法和涂敷装置 Coating method and coating apparatus
07/16/2014CN102265219B 投射曝光设备中的光学元件的重力补偿 Projection exposure apparatus gravity compensation optical element
07/16/2014CN102262354B 多色调光掩模的制造方法和图案转印方法 The method of manufacturing a multi-tone mask and a pattern transfer method
07/16/2014CN102227458B 具有抗反射特性的下层组合物 Underlying composition having anti-reflective properties
07/16/2014CN102213918B 正型放射线敏感性组合物、层间绝缘膜及其形成方法 Positive-tone radiation-sensitive composition, and the interlayer insulating film forming method
07/16/2014CN102199119B 肟酯光引发剂 Oxime ester photoinitiator
07/16/2014CN102132209B 具有高热传导率的euv掩模版基底 Euv reticle substrate having a high thermal conductivity
07/16/2014CN102117020B 制备平版印刷版的方法 Method of preparing a lithographic printing plate
07/16/2014CN102096320B 着色感光性组合物、滤色器及其制造方法及液晶显示装置 The colored photosensitive composition, a color filter and manufacturing method thereof, and a liquid crystal display device
07/16/2014CN102047151B 辐射系统、辐射收集器、辐射束调节系统、用于辐射系统的光谱纯度滤光片以及用于形成光谱纯度滤光片的方法 A radiation system, the radiation collector, the radiation beam conditioning system for the spectral purity filter of the radiation system and the spectral purity filter is a method for forming
07/16/2014CN101923181B 防眩膜的制造方法、防眩膜及模具的制造方法 The method of manufacturing an anti-glare film, a method of manufacturing an anti-glare film and the mold
07/16/2014CN101826330B 带电路的悬挂基板及其制造方法 The method of manufacturing the suspension board with circuit
07/16/2014CN101813891B 光刻设备和器件制造方法 A lithographic apparatus and device manufacturing method
07/15/2014US8780341 Inspecting system for lens module
07/15/2014US8780329 Exposure apparatus, structure, method for setting up apparatus, and device manufacturing method having filling member formed by hardening liquid to support setting leg
07/15/2014US8780328 Illumination optical apparatus, exposure apparatus, and device manufacturing method
07/15/2014US8780327 Exposure apparatus and method for producing device
07/15/2014US8780325 Method for a lithographic apparatus
07/15/2014US8780323 Apparatus and method for recovering liquid droplets in immersion lithography
07/15/2014US8780322 Object with an improved suitability for a plasma cleaning treatment
07/15/2014US8780321 Lithographic apparatus and device manufacturing method
07/15/2014US8780320 Monitoring apparatus and method particularly useful in photolithographically processing substrates
07/15/2014US8779159 Compound or its tautomer, metal complex compound, colored photosensitive curing composition, color filter, and production
07/15/2014US8779021 Curable inks comprising diurethane gelators
07/15/2014US8778602 Single photoresist approach for high challenge photo process
07/15/2014US8778601 Methods of forming photolithographic patterns
07/15/2014US8778600 Method of manufacturing high resolution organic thin film pattern
07/15/2014US8778599 Method of producing ink ejection head
07/15/2014US8778598 Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion
07/15/2014US8778597 Long-chain alkylene-containing curable epoxy resin composition
07/15/2014US8778596 Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition
07/15/2014US8778595 Resist composition, method of forming resist pattern, and polymeric compound
07/15/2014US8778594 Resist composition and method for producing resist pattern
07/15/2014US8778593 Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition
07/15/2014US8778592 Positive resist composition and patterning process
07/15/2014US8778591 Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process
07/15/2014US8778590 Lithographic printing plate precursor
07/15/2014US8778577 Colored composition, colored cured film, color filter, method for producing color filter, liquid crystal display device, solid-state imaging device, and novel dipyrromethene metal complex compound or tautomer thereof
07/15/2014US8778574 Method for etching EUV material layers utilized to form a photomask
07/15/2014US8778235 Colorant multimer, colored curable composition, color filter and method for producing the same, and solid-state image sensor, image display device, liquid crystal display device and organic EL display with the color filter
07/15/2014US8778205 Processing method and processing system
07/10/2014WO2014106955A1 Composition, laminate, method for producing laminate, transistor, and method for producing transistor
07/10/2014WO2014106554A1 (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
07/10/2014WO2014106333A1 Method for destressing circuit board and device for destressing circuit board
07/10/2014WO2013090529A8 Near-infrared absorbing film composition for lithographic application
07/10/2014US20140193975 Composition for forming titanium-containing resist underlayer film and patterning process
07/10/2014US20140193757 Compositon for forming metal oxide-containing film and patterning process
07/10/2014US20140193756 Process for producing a liquid ejection head
07/10/2014US20140193755 Amplification Method For Photoresist Exposure In Semiconductor Chip Manufacturing
07/10/2014US20140193754 Compositions of neutral layer for directed self assembly block copolymers and processes thereof
07/10/2014US20140193753 Composition for forming a developable bottom antireflective coating
07/10/2014US20140193752 Stabilized acid amplifiers
07/10/2014US20140193749 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
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