| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/02/2008 | CN101211115A Method for evaluating development capability |
| 07/02/2008 | CN101211114A Modified type grid polycrystalline silicon mask layer removing method |
| 07/02/2008 | CN101211113A Chemically amplified corrosion-resisting agent composition |
| 07/02/2008 | CN101211112A Method of forming pattern |
| 07/02/2008 | CN101211111A Coloring phototonus resin composition |
| 07/02/2008 | CN101211110A Green photosensitive resin composition and color filter prepared therefrom |
| 07/02/2008 | CN101211109A Liquid crystal display device and fabrication method thereof |
| 07/02/2008 | CN101211105A Mold structure, patterning method using the same, and method of fabricating liquid crystal display device |
| 07/02/2008 | CN101211104A Method for manufacturing photomask and phase shift mask |
| 07/02/2008 | CN101211103A Manufacturing method for photo mask |
| 07/02/2008 | CN101211102A Apparatus for removing haze in photo mask and method for removing haze in a photo mask |
| 07/02/2008 | CN101211101A Method for using three-dimensional function for mask specification institution |
| 07/02/2008 | CN101210979A Photon crystal tunable filter and its manufacture method |
| 07/02/2008 | CN101210307A Mask device, method of fabricating the same, and method of fabricating organic light emitting display device using the same |
| 07/02/2008 | CN101209814A Method of fabricating nano structure, method of manufacturing magnetic disc, method of forming stamper, and method of generating base body |
| 07/02/2008 | CN101209169A Photo frame with three-dimensional effect and its manufacturing method |
| 07/02/2008 | CN100399534C Method and apparatus for corresponding to supporting table positioning substrate |
| 07/02/2008 | CN100399529C Detection apparatus and method for exposure device |
| 07/02/2008 | CN100399508C Semiconductor manufacturing method and an exposure mask |
| 07/02/2008 | CN100399499C Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems |
| 07/02/2008 | CN100399447C Manufacturing method of stamper master disc to produce optical recording medium |
| 07/02/2008 | CN100399342C Method and system for metrology diffraction signal adaptation for tool-to-tool matching |
| 07/02/2008 | CN100399194C Polar coordinate directly writing-in method and device based on micro optical array multiple spot exposure |
| 07/02/2008 | CN100399193C 掩模 Mask |
| 07/02/2008 | CN100399178C Method for making pixel structure |
| 07/02/2008 | CN100399145C Method for fabricating color filter array substrate |
| 07/02/2008 | CN100399139C Exposure machine and exposure system |
| 07/02/2008 | CN100399134C Method of manufacturing array substrate and thin film transistor array panel |
| 07/02/2008 | CN100399093C Leveling and focusing mechanism |
| 07/02/2008 | CN100399063C Projection lens for a microlithographic projection exposure apparatus |
| 07/02/2008 | CN100399058C An optical medium, an optical lens and a prism |
| 07/02/2008 | CN100398576C Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 07/02/2008 | CN100398575C Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 07/02/2008 | CN100398571C Organic anti-reflecting paint polymer, anti-reflecting paint compsns. and its preparation method |
| 07/02/2008 | CN100398304C Seamless master and method of making the same |
| 07/01/2008 | US7394584 System and method for calculating aerial image of a spatial light modulator |
| 07/01/2008 | US7394570 Method and apparatus for eliminating seams in screened image data for repetitive printing |
| 07/01/2008 | US7394526 Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method |
| 07/01/2008 | US7394524 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/01/2008 | US7394521 Lithographic apparatus and device manufacturing method |
| 07/01/2008 | US7394520 Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock |
| 07/01/2008 | US7394080 Mask superposition for multiple exposures |
| 07/01/2008 | US7393819 For stripping photoresists, cleaning residues |
| 07/01/2008 | US7393794 Pattern formation method |
| 07/01/2008 | US7393627 Sulfonium or halogenium salts for amplification photoresists; heat treating coating and exposing coating to high energy or electron beam through photomask; developing |
| 07/01/2008 | US7393623 Incorporation of markings in optical media |
| 07/01/2008 | US7393619 Method and lithographic structure for measuring lengths of lines and spaces |
| 07/01/2008 | US7393615 Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare |
| 07/01/2008 | US7393614 Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer |
| 07/01/2008 | US7393613 photoresists for semiconductors; photolithography |
| 07/01/2008 | US7393567 Adhering a compound that has both a free radical initiating moiety and a bonding moiety to a substrate; contacting the substrate with reaction product of a hydrophilic polymer and an unsaturated monomer; and patternwise exposing the substrate to light to form a region where a graft polymer is generated |
| 07/01/2008 | US7393515 O-nitrobenzyloxy- (or other hetero)-substituted ligand having a hydrolyzable group in which the phenyl ring substituted by a polyfluoroalkyl group: 4-(trimethoxysilyl)butyl 5-methoxy-2-nitro-4-(1H,1H-perfluoroalkoxy)benzyl ether; hydrophobic/hydrophilic pattern formed by photolithography |
| 07/01/2008 | US7393469 Reacting an alkyl or dialkyl substituted trialkoxysilane or dialkoxysilane with a silanediol (e.g., diphenylsilanediol or 1,3-Bis (3-hydroxypropyl)tetramethyldisiloxane) optionally with a coupling agent and/or a phosphor dopant; may be used in encapsulation of a light-emitting device or in wafer bonding |
| 07/01/2008 | US7393409 Method for making large-volume CaF2 single cystals with reduced scattering and improved laser stability, the crystals made by the method and uses thereof |
| 07/01/2008 | US7393404 Color filter, image display device and information communication equipment; pigment dispersing ability, transparency, fluidity and storage stability |
| 06/26/2008 | WO2008077048A2 Substrate processing apparatus and method |
| 06/26/2008 | WO2008075952A2 Reducing fast ions in a plasma radiation source having a second activation source |
| 06/26/2008 | WO2008075860A1 High etch resistant hardmask composition having antireflective properties, method for forming patterned material layer using the hardmask composition and semiconductor integrated circuit device produced using the method |
| 06/26/2008 | WO2008075749A1 Exposure method and apparatus and substrate holding apparatus |
| 06/26/2008 | WO2008075742A1 Maintenance method, exposure method and exposure device, and method for fabricating device |
| 06/26/2008 | WO2008075599A1 Electron lithography method |
| 06/26/2008 | WO2008075587A1 Method of treating rinsing wastewater from developing apparatus for photosensitive lithographic printing plate, method of development, and developing apparatus |
| 06/26/2008 | WO2008075575A1 Photosensitive element |
| 06/26/2008 | WO2008075564A1 Oxime ester compound, photopolymerization initiator, photopolymerizable composition, color filter, and liquid crystal display device |
| 06/26/2008 | WO2008075531A1 Photosensitive resin composition, photosensitive element, method for resist pattern formation, and method for manufacturing printed wiring board |
| 06/26/2008 | WO2008075495A1 Photosensitive resin composition for forming insulating film, hardened film thereof and electronic part having the same |
| 06/26/2008 | WO2008075451A1 Laser engravable printing original plate |
| 06/26/2008 | WO2008074796A1 Flexographic printing forme precursor for laser engraving |
| 06/26/2008 | WO2008074673A2 Optical system, in particular an illumination system or projection objective of a microlithographic projection exposure apparatus |
| 06/26/2008 | WO2008074503A1 Transmitting optical element |
| 06/26/2008 | WO2008037384A3 Projection exposure method and projection exposure system |
| 06/26/2008 | WO2008028458A3 Lithography method for producing a feature |
| 06/26/2008 | WO2008017490A3 Optical filter and method for the production of the same, and device for the examination of electromagnetic radiation |
| 06/26/2008 | WO2006104755A3 Pretreatment compositions |
| 06/26/2008 | US20080153991 Method of making carbon nanotube patterned film or carbon nanotube composite using carbon nanotubes surface-modified with polymerizable moieties |
| 06/26/2008 | US20080153301 Set of masks, method of generating mask data and method for forming a pattern |
| 06/26/2008 | US20080153242 Printed metal mask for UV, e-beam, ion-beam and X-ray patterning |
| 06/26/2008 | US20080153041 Exposure Method and Apparatus |
| 06/26/2008 | US20080153040 Cleaning using an ammonia aqueous solution of a surface exposed by removing an organic film containing silicon formed on the semiconductor wafer substrate, cleaning diluted fluorinated acid aqueous solution |
| 06/26/2008 | US20080153039 Manufacturing Method of Semiconductor Device |
| 06/26/2008 | US20080153038 Two groups of radiation sources, each group comprising at least one radiation source, wherein the radiation sources within each group emit radiation having the same intensity and spot size, different from intensity and spot size of radiation sources in other groups |
| 06/26/2008 | US20080153036 Patterns having high resolution; used for semiconductor microfabrication employing a lithography |
| 06/26/2008 | US20080153035 Antireflective Coating Compositions |
| 06/26/2008 | US20080153034 Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution |
| 06/26/2008 | US20080153032 Iodonium or sulfonium perfluorosulfonate or perfluorosulfonimide acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity |
| 06/26/2008 | US20080153031 Resist composition |
| 06/26/2008 | US20080153030 Resin comprising monomers of cyclopentyl- or cyclohexyl (meth)acrylate; hydroxyadamantyl (meth)acrylate; 3,8-epoxy-6-oxabicyclo[3.2.1]octyl (meth)acrylat;, and/or fluoroalkyl (meth)acrylate; ArF lithography; resolution; forms a pattern with high rectangularity |
| 06/26/2008 | US20080153012 Method of measuring the overlay accuracy of a multi-exposure process |
| 06/26/2008 | US20080153009 Exposure mask, optical proximity correction device, optical proximity correction method, manufacturing method of semiconductor device, and optical proximity correction program |
| 06/26/2008 | US20080152090 Euv Light Source |
| 06/26/2008 | US20080151268 Assessment and optimization for metrology instrument including uncertainty of total measurement uncertainty |
| 06/26/2008 | US20080151208 Real-Time Configurable Masking |
| 06/26/2008 | US20080151203 Exposure apparatus and device manufacturing method |
| 06/26/2008 | US20080151200 Exposure Apparatus and Device Manufacturing Method |
| 06/26/2008 | US20080149859 Irradiation Pattern Data Generation Method, Mask Fabrication Method, and Plotting System |
| 06/26/2008 | US20080149296 Method and apparatus for production of a cast component |
| 06/26/2008 | US20080149295 Method and apparatus for production of a cast component |
| 06/26/2008 | US20080149294 Method and apparatus for production of a cast component |
| 06/26/2008 | US20080149272 Surface Microstructuring Device |
| 06/26/2008 | US20080148977 Lithographic Printing Plate Precursor and Lithographic Printing Method |