| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 07/03/2008 | WO2008078686A1 Oxime ester compound and photopolymerization initiator comprising the compound |
| 07/03/2008 | WO2008078678A1 Oxime ester compound and photopolymerization initiator containing the compound |
| 07/03/2008 | WO2008078677A1 Composition for formation of antireflection film and pattern formation method using the same |
| 07/03/2008 | WO2008078676A1 Pattern forming method and photosensitive resin composition used therefor |
| 07/03/2008 | WO2008078660A1 Method for synthesis of hyperbranched polymer, hyperbranched polymer, resist composition, semiconductor integrated circuit, and method for production of semiconductor integrated circuit |
| 07/03/2008 | WO2008078622A1 Positive-working lithographic printing plate material and method for manufacturing lithographic printing plate using the positive-working lithographic printing plate material |
| 07/03/2008 | WO2008078620A1 Novel polyimide precursor composition, use thereof and production method thereof |
| 07/03/2008 | WO2008078509A1 Mask, mask stage, exposure apparatus, method of exposure and process for manufacturing device |
| 07/03/2008 | WO2008078483A1 Photosensitive resin composition, photosensitive element, method for resist pattern formation, and method for manufacturing printed wiring board |
| 07/03/2008 | WO2008078447A1 Photoresist composition and pattern formation method |
| 07/03/2008 | WO2008078410A1 Process for producing polymer for semiconductor lithography |
| 07/03/2008 | WO2008077746A2 Subwavelength imaging and irradiation with entangled particles |
| 07/03/2008 | WO2008058939A3 Uv-sensitive elements with triarylamine derivatives as sensitizers for ctp exposure |
| 07/03/2008 | WO2008049574A3 Method and apparatus for connecting an optical element to a mount |
| 07/03/2008 | WO2008047217A3 Antireflective coating compositions |
| 07/03/2008 | WO2008047217A2 Antireflective coating compositions |
| 07/03/2008 | WO2008042200A3 Acceleration sensor with redundant accelerometers |
| 07/03/2008 | WO2008035059A3 Exposure and patterning process for forming multi-layer resist structures |
| 07/03/2008 | US20080161520 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether |
| 07/03/2008 | US20080161217 Comprising: a fluoride source, an organic quaternary ammonium base, and a solvent selected from an organic solvent, water, and mixtures thereof; for removing silicon-based anti-reflective coatings/hardmask layers from microelectronics; etch selectivity |
| 07/03/2008 | US20080160895 Atmosphere control apparatus, device-manufacturing apparatus, device-manufacturing method, and exposure apparatus |
| 07/03/2008 | US20080160711 Contactless flash memory array |
| 07/03/2008 | US20080160638 Functionalized Microcantilever Sensor and Associated Method For Detection of Targeted Analytes |
| 07/03/2008 | US20080160461 Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer |
| 07/03/2008 | US20080160460 A crosslinked unsaturated aromatic-aldehyde resins based on comonomers of naphthalene substituted with a conjugated dienophile and naphthalene substituted with a an unsaturated dienophile; (dry) etch resistance; photolithography; multilayer thin film with high aspect ratio for image transfer; wafers |
| 07/03/2008 | US20080160459 A portion of a second resist patterned on a first resist layer is removed; etching the two resist layers and layer to be etched; fine patterns formed on thin resists; providing good adhesion and greater etch resistance of resist layer because entire thickness of the photoresist is not exposed |
| 07/03/2008 | US20080160458 A cell made by a double patterning process for printing dense lines involves applying a surface conditioning to the bottom anti-reflection coating which is applied to the clear area between lines of the first resist uncovered portion of the surface before providing the second layer to improve adhesion |
| 07/03/2008 | US20080160457 Apparatus and method for reducing defects |
| 07/03/2008 | US20080160455 Exposure Method, Method for Forming Projecting and Recessed Pattern, and Method for Manufacturing Optical Element |
| 07/03/2008 | US20080160454 Accurately shaped ink passage for precision droplet placement; coating negative photosensitive resin, exposing to controlled wavelength band of ultraviolet light to form discharge port then removing pattern |
| 07/03/2008 | US20080160452 Developer for light sensitive planographic printing plate material and manufacturing process of planographic printing plate employing the same |
| 07/03/2008 | US20080160451 Method for preparation of lithographic printing plate |
| 07/03/2008 | US20080160450 Method and Apparatus for Treating a Re-Imageable Printing Form, Machine for Processing Printing Material and Method for Treating a Surface Making Contact with Printing Material |
| 07/03/2008 | US20080160449 Photoresist polymer having nano-smoothness and etching resistance, and resist composition |
| 07/03/2008 | US20080160448 Including photoacid generator having positively charged sulfonium ion and negatively charged sulfonate ion with hydrophilic carboxylic group; uniform distribution in photoresist film |
| 07/03/2008 | US20080160447 Photopolymer Printing Plate Precursor |
| 07/03/2008 | US20080160444 Interlayer for Lithographic Printing Plates |
| 07/03/2008 | US20080160422 Lithographic mask and methods for fabricating a semiconductor device |
| 07/03/2008 | US20080160421 Hologram recording medium |
| 07/03/2008 | US20080160287 Plasmon resonance absorption; solid transparent substrate and a plurality of rod-shaped metallic fine particles on a nanometer scale arranged on the substrate at a constant interval in a fixed direction; two absorption maxima of spectra corresponding to two polarization directions for incident light |
| 07/03/2008 | US20080160256 Reduction of line edge roughness by chemical mechanical polishing |
| 07/03/2008 | US20080160225 Sensor Molecules Incorporating a Boronic Acid Sensor Group |
| 07/03/2008 | US20080158666 Photolithographed Micro-Mirror Well For 3D Tomogram Imaging of Individual Cells |
| 07/03/2008 | US20080158564 Monitoring a photolithographic process using a scatterometry target |
| 07/03/2008 | US20080158537 Optical switching in lithography system |
| 07/03/2008 | US20080158536 Optical switching in lithography system |
| 07/03/2008 | US20080158534 Assembly |
| 07/03/2008 | US20080158527 Processor unit with provision for automated control of processing parameters |
| 07/03/2008 | US20080158282 Method and Apparatus For Accurately Applying Structures to a Substrate |
| 07/03/2008 | US20080157404 Trench structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels |
| 07/03/2008 | US20080157260 High-z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels |
| 07/03/2008 | US20080157084 Mask device, method of fabricating the same, and method of fabricating organic light emitting display device using the same |
| 07/03/2008 | US20080156212 Hollow Cylindrical Printing Element |
| 07/03/2008 | DE202008004285U1 Bebilderungseinrichtung Imaging |
| 07/03/2008 | DE10339992B4 Verfahren zur Herstellung eines Strukturelements kritischer Abmessung bzw. einer Gateelektrode eines Feldeffekttransistors sowie Ätzsteuerung A process for producing a structural element of critical dimension or a gate electrode of a field effect transistor, and etching control |
| 07/03/2008 | DE102007062265A1 Projection lens for use in projection illumination system in semiconductor microlithography, has correction elements e.g. plane parallel plates, arranged in region, which is optically closed for pupil levels |
| 07/03/2008 | DE102007057626A1 Polierverfahren für im extremen ultraviolett arbeitende optische Elemente und mit dem Verfahren hergestellte Elemente Polishing process for extreme ultraviolet in the operating optical elements and produced by the process elements |
| 07/03/2008 | DE102007023411A1 Field illumination system for microlithographic projection exposure system, has illumination angle variation device influencing intensity and/or phase of light so that intensity contribution of raster units to total intensity is varied |
| 07/03/2008 | DE102006062480A1 Optical arrangement for use in projection exposure apparatus used for immersion lithography has hydrophobic coating comprising ultraviolet (UV) resistant layer that absorbs and reflects UV radiation at predetermined wavelength |
| 07/03/2008 | DE102005037764B4 Anordnung zur homogenen Beleuchtung eines Feldes Arrangement for homogeneous illumination of a field |
| 07/02/2008 | EP1939930A1 Article loading/unloading method and article loading/unloading device, exposure method and exposure apparatus, and method of manufacturing device |
| 07/02/2008 | EP1939692A2 Method for preparation of lithographic printing plate |
| 07/02/2008 | EP1939691A2 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method |
| 07/02/2008 | EP1939690A1 Lithographic apparatus and device manufacturing method |
| 07/02/2008 | EP1939689A1 Immersion fluid and method for producing microchips |
| 07/02/2008 | EP1939688A1 Composition for antireflection film formation, comprising product of reaction between isocyanuric acid compound and benzoic acid compound |
| 07/02/2008 | EP1939687A2 Polymerizable composition, lithographic printing plate precursor and lithographic printing method |
| 07/02/2008 | EP1939686A1 Holographic recording medium |
| 07/02/2008 | EP1938937A2 Method of manufacturing soft mold for shaping barrier rib, method of manufacturing barrier rib and lower panel, and plasma display panel |
| 07/02/2008 | EP1938365A2 Planarization of metal layer over photoresist |
| 07/02/2008 | EP1938150A2 Collector for lighting systems with a wavelength = 193 nm |
| 07/02/2008 | EP1938149A2 Low activation energy dissolution modification agents for photoresist applications |
| 07/02/2008 | EP1938148A1 An arrangement adapted to evaluate the intensity of or a changing in the intensity of an electro-magnetic beam or a bundle of beams |
| 07/02/2008 | EP1938081A1 Multifunctional probe array system |
| 07/02/2008 | EP1825331B1 Process for producing resist pattern and conductor pattern |
| 07/02/2008 | EP1551887A4 Fluorinated polymers, photoresists and processes for microlithography |
| 07/02/2008 | EP1295518B1 Process for thick film circuit patterning |
| 07/02/2008 | CN201081770Y Movable lens adjusting device |
| 07/02/2008 | CN201080989Y Piston air cylinder vibration damping device |
| 07/02/2008 | CN101213494A Drawing device and drawing method |
| 07/02/2008 | CN101213493A Photoresist developer and process for producing substrate with the use of the developer |
| 07/02/2008 | CN101213492A Substrate manufacturing method and exposure apparatus |
| 07/02/2008 | CN101213491A 感光性树脂组合物及粘合改良剂 The photosensitive resin composition and adhesion improver |
| 07/02/2008 | CN101213490A 感光性树脂组合物 The photosensitive resin composition |
| 07/02/2008 | CN101213169A Sulphonium salt initiators |
| 07/02/2008 | CN101213070A Rapid-prototyping method and radiation-hardenable composition of application thereto |
| 07/02/2008 | CN101211825A Image sensor fabricating method |
| 07/02/2008 | CN101211804A Detection system and method |
| 07/02/2008 | CN101211778A Method for preventing formation of organic bottom anti-reflection layer defect |
| 07/02/2008 | CN101211750A High polymer layer cleaning method |
| 07/02/2008 | CN101211125A Photoresist removeing method |
| 07/02/2008 | CN101211124A Coaxial aligning achromatic optical system |
| 07/02/2008 | CN101211123A Side lobe image searching method in lithography |
| 07/02/2008 | CN101211122A Screen painting method |
| 07/02/2008 | CN101211121A Immersion type photolithography system projecting system |
| 07/02/2008 | CN101211120A Immersion type photolithography system projecting system |
| 07/02/2008 | CN101211119A LCD device preparation method and mask used in the method |
| 07/02/2008 | CN101211118A LCD device preparation method and mask used in the method |
| 07/02/2008 | CN101211117A Multi-layer coating method, and planographic printing plate and manufacturing method thereof |
| 07/02/2008 | CN101211116A Method for forming photoresist layer |