| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/09/2008 | EP1942150A1 Siloxane resin composition and method for producing same |
| 07/09/2008 | EP1941324A2 Molecular resists based on functionalized polycarbocycles |
| 07/09/2008 | EP1941323A2 Imprint apparatus, imprint method, and mold for imprint |
| 07/09/2008 | EP1941322A1 Antimony-free photocurable resin composition and three dimensional article |
| 07/09/2008 | EP1941313A2 An optical system for illumination of an evanescent field |
| 07/09/2008 | EP1941018A2 Dynamic multi-purpose composition for the removal of photoresists and method for its use |
| 07/09/2008 | EP1940968A1 Pigment preparations based on diketopyrrolopyrroles |
| 07/09/2008 | EP1940748A2 Composite structure for microlithography and optical arrangement |
| 07/09/2008 | EP1483624B1 Photosensitive element for use as flexographic printing plate |
| 07/09/2008 | EP1341039B1 Photocurable and thermosetting resin composition |
| 07/09/2008 | EP1275518B1 Thermal transfer image receiving sheet |
| 07/09/2008 | CN201083963Y Photo-etching machine projection objective coma in situ detection system |
| 07/09/2008 | CN201083962Y Grating for wafer edge exposure |
| 07/09/2008 | CN201083961Y Direct-writing lithographic equipment with focusing device |
| 07/09/2008 | CN201083960Y Direct-writing lithographic equipment |
| 07/09/2008 | CN201083959Y Integrated type direct-writing lithographic equipment |
| 07/09/2008 | CN201083958Y Jet printing apparatus for mask process |
| 07/09/2008 | CN201083957Y All-solid-state infrared laser scanning exposure system for CTP plate performance evaluation |
| 07/09/2008 | CN101218546A Pattern forming method |
| 07/09/2008 | CN101218545A Pattern forming method |
| 07/09/2008 | CN101218544A Exposure method and apparatus |
| 07/09/2008 | CN101218543A Debris mitigation system with improved gas distribution |
| 07/09/2008 | CN101218542A Drawing method and device |
| 07/09/2008 | CN101218541A Photoresist composition for imaging thick films |
| 07/09/2008 | CN101218540A Positive photosensitive resin composition and process for pattern formation |
| 07/09/2008 | CN101218539A Photosensitive adhesive composition, and obtained adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part using the same |
| 07/09/2008 | CN101218538A Photosensitive resin composition, and photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma di |
| 07/09/2008 | CN101218263A Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use |
| 07/09/2008 | CN101218202A Calixresorcinarene compound, photoresist base comprising the same, and composition thereof |
| 07/09/2008 | CN101218109A Planographic printing plate material and method of forming visible image |
| 07/09/2008 | CN101218108A Original edition for lithographic printing |
| 07/09/2008 | CN101217105A Method for forming a fine pattern in a semiconductor |
| 07/09/2008 | CN101216685A Device and method for transferring pattern to substrate |
| 07/09/2008 | CN101216684A Spherical surface photolithography system with area differentiation |
| 07/09/2008 | CN101216683A Reverse illumination adjacent and contact nanometer lithographic equipment |
| 07/09/2008 | CN101216682A Projection optical system, exposure apparatus, and exposure method |
| 07/09/2008 | CN101216681A Machine vision dynamic calibration system and method |
| 07/09/2008 | CN101216680A Method for measuring Cube-Prism non-orthogonality angle and scale factor correct value |
| 07/09/2008 | CN101216679A Edge exposure device |
| 07/09/2008 | CN101216678A Photolithography equipment detecting device and method |
| 07/09/2008 | CN101216677A Method for detecting target position corresponding to designated lighting intensity value |
| 07/09/2008 | CN101216676A Light optics system for microlithography |
| 07/09/2008 | CN101216675A Single hole shape mark aligning signal processing method |
| 07/09/2008 | CN101216674A Detecting probe induced surface plasma resonance coupled photolithography method |
| 07/09/2008 | CN101216673A Stage device, exposure device, and device manufacturing method |
| 07/09/2008 | CN101216672A Flow jet device |
| 07/09/2008 | CN101216671A Polyester film for flexible printing plate |
| 07/09/2008 | CN101216670A Photosensitive resin composition for producing color filter and color filter for image sensor |
| 07/09/2008 | CN101216669A Photoresist composition and method for forming pattern of a semiconductor device |
| 07/09/2008 | CN101216668A SBQ aqueous sensitizing powder and its industrial synthesis method |
| 07/09/2008 | CN101216667A Photolithography method capable of enhancing space imaging alignment checking precision |
| 07/09/2008 | CN101216666A Manufacture method of master embodying rainbow holographic image and special-purpose holographic image |
| 07/09/2008 | CN101216665A Laser holographic molding press method for graph-text |
| 07/09/2008 | CN101216664A Method for producing equal edition breadth holographic moulding film and its molding device |
| 07/09/2008 | CN101216663A Backlight module accurate light guide thin film core production method |
| 07/09/2008 | CN101216600A Projection optical system, exposure apparatus, and exposure method |
| 07/09/2008 | CN101216599A Projection optical system, exposure apparatus and exposure method |
| 07/09/2008 | CN101216598A Projection optical system, exposure apparatus, and exposure method |
| 07/09/2008 | CN101216570A Colorful filters and method of manufacture and LCD device |
| 07/09/2008 | CN101216559A Off-axis measuring systems reference mark effective distance calibration method |
| 07/09/2008 | CN101215421A Radiation-sensitive resin composition |
| 07/09/2008 | CN101215369A Optical cured resin, photosensitive resin composition and preparation method thereof |
| 07/09/2008 | CN100401469C Substrate processing apparatus and substrate processing method |
| 07/09/2008 | CN100401193C Method for producing photoetching apparatus and parts |
| 07/09/2008 | CN100401192C Method for fabricating a structure for a microelectromechanical system (MEMS) device |
| 07/09/2008 | CN100401191C Exposure method, exposure equipment and its manufacture method |
| 07/09/2008 | CN100401190C 印刷电路板 A printed circuit board |
| 07/09/2008 | CN100401189C Photo-curable and thermosetting resin composition |
| 07/09/2008 | CN100401174C Liquid crystal display |
| 07/09/2008 | CN100401150C Method and apparatus for fabricating flat panel display |
| 07/09/2008 | CN100401145C Color cholesterol type LCD device and its manufacturing method |
| 07/09/2008 | CN100401113C Anti-glare film and image display device |
| 07/09/2008 | CN100400604C Pigment dispersion liquid, process for producing the same, colored resin composition, color filter and liquid crystal display |
| 07/09/2008 | CN100400555C Solidifiable composition material by ultraviolet light and application |
| 07/09/2008 | CN100400284C Lithographic printing method and presensitized plate |
| 07/09/2008 | CN100400180C Thin seam nozzle and substrate treating device |
| 07/08/2008 | US7398508 Eigen decomposition based OPC model |
| 07/08/2008 | US7397940 Object positioning method for a lithographic projection apparatus |
| 07/08/2008 | US7397550 Parts manipulation and inspection system and method |
| 07/08/2008 | US7397539 Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof |
| 07/08/2008 | US7397534 Exposure apparatus and device manufacturing method |
| 07/08/2008 | US7397532 Run-off path to collect liquid for an immersion lithography apparatus |
| 07/08/2008 | US7397531 Lithographic apparatus and device manufacturing method |
| 07/08/2008 | US7397040 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/08/2008 | US7396899 Chemical amplification type resist composition |
| 07/08/2008 | US7396885 A blends comprising an adduct of epoxidized phenolic resins with (meth)acrylic acid, a (meth)acrylates, a liquid epoxy resins and curing agents; noncracking, solder-resistance, corrosion resistance, durability |
| 07/08/2008 | US7396636 Segmented resist islands for photolithography on single sliders |
| 07/08/2008 | US7396635 Prevents meandering of the elongate base material conveyed with the rolls and also prevents entry of air bubbles in between a light-transparency protecting film and a photosensitive solder resist layer when the light-transparency protecting film is laminated on the photosensitive solder resist layer |
| 07/08/2008 | US7396634 For use as lithographic printing plate precursor |
| 07/08/2008 | US7396633 Damascene process; forming connectors; exposure; development; using acid generator, quencher and buffer |
| 07/08/2008 | US7396632 Non-absorbing substrate and light-to-heat conversion layer composed of a stack of layers having at least two dyads each of which has a nonabsorbing layer and an absorbing layer having the same optical absorption rate as other absorbing layers; total power absorbed by each dyad is essentially the same. |
| 07/08/2008 | US7396631 Aligning the donor film with a patterned receptor and a laser system, including placing donor film in intimate contact with the patterned receptor; imaging donor film with the laser system to cause imagewise transfer of transfer layer to atterned receptor; removing film; organic microelectronic devices |
| 07/08/2008 | US7396621 Exposure control method and method of manufacturing a semiconductor device |
| 07/08/2008 | US7396620 For photolithography; optimizing an exposure dose and focus in an exposure apparatus; controlling the optical constants (e.g. refractive index and/or the absorption coefficient) and/or coating thickness of the resist applied commonly to the test wafer and the mass-produced wafer |
| 07/03/2008 | WO2008079008A2 Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method |
| 07/03/2008 | WO2008078995A1 Lithographic apparatus, substrate table, and method for releasing a wafer |
| 07/03/2008 | WO2008078993A2 Lithographic apparatus and method of measuring contamination |
| 07/03/2008 | WO2008078992A1 Lithographic apparatus, substrate table, and method for enhancing substrate release properties |
| 07/03/2008 | WO2008078987A1 Assembly for blocking a beam of radiation |
| 07/03/2008 | WO2008078953A1 Black matrix high sensitive photoresist composition for liquid crystal display and black matrix prepared by using the same |