| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/16/2008 | CN100403478C Plasma display screen barrier wall slurry |
| 07/16/2008 | CN100403169C Sulfoxide pyrolid(in)one alkanolamine cleaner composition |
| 07/16/2008 | CN100403168C Adhensive polymer, compounds and use of pptical imaging composition for negative imaging |
| 07/16/2008 | CN100403167C Pattern forming method and method for producing semiconductor device |
| 07/16/2008 | CN100403166C Photomask and method for forming pattern |
| 07/16/2008 | CN100403148C Transflective liquid crystal display device and method of fabricating the same |
| 07/16/2008 | CN100403145C Factory production working system and its operating method |
| 07/16/2008 | CN100403106C Semi-transmissive semi-reflective display and manufacturing method thereof, display manufacturing method |
| 07/16/2008 | CN100403097C Large size substrate and its producing method |
| 07/16/2008 | CN100403066C Anti-dizziness film and its manufacturing method and display device mounted with the anti-dizziness film |
| 07/16/2008 | CN100402850C Microfabricated elastomeric valve and pump systems |
| 07/16/2008 | CN100402538C Macromolecular polyacyl phosphine imide light initiating agent and its production |
| 07/16/2008 | CN100402163C Liquid treating device and method |
| 07/15/2008 | US7401010 Methods of forming radiation-patterning tools; carrier waves and computer readable media |
| 07/15/2008 | US7400839 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device |
| 07/15/2008 | US7400699 Illumination system with raster elements of different sizes |
| 07/15/2008 | US7400460 Method for connection of an optical element to a mount structure |
| 07/15/2008 | US7400381 Lithographic apparatus and device manufacturing method |
| 07/15/2008 | US7400380 Two-dimensional light-modulating nano/micro aperture array and high-speed nano pattern recording system utilized with the array |
| 07/15/2008 | US7400379 Apparatus for measuring an exposure intensity on a wafer |
| 07/15/2008 | US7399981 Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography |
| 07/15/2008 | US7399979 Exposure method, exposure apparatus, and method for producing device |
| 07/15/2008 | US7399978 Method and device for irradiating spots on a layer |
| 07/15/2008 | US7399843 Colorant-containing curable composition, color filter using the composition, and method for manufacturing the same |
| 07/15/2008 | US7399815 Photoresist film; low in light scattering and absorption and high in transparency |
| 07/15/2008 | US7399806 Free radical addition polymerization of adamantyl (meth)acrylate derivates using a chain transfer agent comprising N-aminodithiocarbamate derivative; patterning semiconductor wafers; lithographic transfer of image from thin film of photosensitive resist material |
| 07/15/2008 | US7399704 Fabrication method of a semiconductor device using liquid repellent film |
| 07/15/2008 | US7399582 Material for forming fine pattern and method for forming fine pattern using the same |
| 07/15/2008 | US7399581 Photoresist topcoat for a photolithographic process |
| 07/15/2008 | US7399579 Article including a metal atom precursor is disproportionally exposed to electromagnetic radiation in an amount and intensity sufficient to convert some of the precursor to elemental meta; additional conductive material may then be deposited onto the elemental metal to produce a microstructure |
| 07/15/2008 | US7399578 Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method |
| 07/15/2008 | US7399577 Halogenated oxime derivatives and the use thereof |
| 07/15/2008 | US7399576 Positive-working radiation-sensitive composition and elements |
| 07/15/2008 | US7399575 Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
| 07/15/2008 | US7399574 Multilayer laminate; black matrix, holography color pattern, forming pixel, protective coatings |
| 07/15/2008 | US7399572 Coating with photosensitive formulation containing thiol-compound; coating with precursor (polyamide) of polybenzoxazole, baking, exposure to actinic radiation, development to form uncured relief pattern; inhibit residue from forming when coated on a substrate |
| 07/15/2008 | US7399570 Water-soluble negative photoresist polymer and composition containing the same |
| 07/15/2008 | US7399558 Mask and manufacturing method thereof and exposure method |
| 07/15/2008 | US7399557 Writing pattern; data processing; etching masking film; removal segments of photoresists |
| 07/15/2008 | US7399424 Compositions for dissolution of low-k dielectric films, and methods of use |
| 07/15/2008 | US7399365 Plasma etching |
| 07/15/2008 | US7398812 Apparatus for thermal development having a removable support member |
| 07/15/2008 | CA2326128C Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography |
| 07/10/2008 | WO2008083197A2 Imaging post structures using x and y dipole optics and a single mask |
| 07/10/2008 | WO2008082942A2 High-z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels |
| 07/10/2008 | WO2008082000A1 Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure |
| 07/10/2008 | WO2008081996A2 Pigment-dispersed composition, curable composition, color filter and production method thereof |
| 07/10/2008 | WO2008081994A2 Exposure apparatus, exposing method, and device fabricating method |
| 07/10/2008 | WO2008081988A1 Curable composition, color filter, and manufacturing method of the same |
| 07/10/2008 | WO2008081963A1 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method |
| 07/10/2008 | WO2008081960A1 Projection optical apparatus, exposure method and device manufacturing method |
| 07/10/2008 | WO2008081895A1 Method for synthesis of hyperbranched polymer |
| 07/10/2008 | WO2008081894A1 Method for synthesis of core-shell-type hyperbranched polymer |
| 07/10/2008 | WO2008081832A1 Core-shell-type hyperbranched polymer, resist composition, method for production of semiconductor device, and semiconductor device |
| 07/10/2008 | WO2008081822A1 Polymer for resist, resist composition, and method for production of substrate having fine pattern formed thereon |
| 07/10/2008 | WO2008081768A1 Alicyclic structure-containing chloromethyl ether, polymerizable monomer for photoresist, and method for producing the same |
| 07/10/2008 | WO2008081746A1 Process for synthesis of hyperbranched polymer, hyperbranched polymer, resist compositions, semiconductor integrated circuits, and process for production of semiconductor integrated circuits |
| 07/10/2008 | WO2008081731A1 Positive-type resist composition and method for formation of resist pattern |
| 07/10/2008 | WO2008081679A1 Developer for photosensitive lithographic printing plate and process for producing lithographic printing plate with the use thereof |
| 07/10/2008 | WO2008081663A1 Fluorine-containing polymer compound and coating composition using the same |
| 07/10/2008 | WO2008080563A1 Optical element and illumination optics for microlithography |
| 07/10/2008 | WO2008080537A1 Lithographic projection lens |
| 07/10/2008 | WO2008080534A1 Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror |
| 07/10/2008 | WO2008080521A2 Immersion fluid and method for producing microchips |
| 07/10/2008 | WO2008063056A3 Gas analyzing system, lithographic apparatus and method of improving the sensitivity of a gas analyzing system |
| 07/10/2008 | WO2008015635A3 Photolithography |
| 07/10/2008 | WO2007136656A3 Colored masking for forming transparent structures |
| 07/10/2008 | WO2007120602A3 Double exposure photolithographic process |
| 07/10/2008 | US20080167210 removing solution for photosensitive composition for removal of a pigment-containing photosensitive composition, the solution comprising an alkyleneglycol monoalkyl ether and an aromatic hydrocarbon, |
| 07/10/2008 | US20080167202 Surface and site-specific polymerization by direct-write lithography |
| 07/10/2008 | US20080166860 Semiconductor device and manufacturing method thereof, liquid crystal television system, and el television system |
| 07/10/2008 | US20080166669 Creating patterned objects using a class of lithographic photoresist; for use with visible light and does not require a post-exposure bake step; acid generator, anthracene compound photosensitizer, lithography |
| 07/10/2008 | US20080166668 Laser mask and method of crystallization using the same |
| 07/10/2008 | US20080166666 Exposure of photopolymerizable composition to radiation; printable paste, electron field emitting film, triode, or display; light source or vacuum electronic |
| 07/10/2008 | US20080166665 Method for Forming a Fine Pattern in a Semicondutor Device |
| 07/10/2008 | US20080166664 forming a photoresist pattern on a wafer by exposure and development of a photoresist film; treating the surface of the photoresist pattern by using a resist solvent; and thermally flowing the treated photoresist pattern for shrinkage |
| 07/10/2008 | US20080166663 Using a developer containing no silicate; minimizes stains or spot-like contaminations at non-image portions |
| 07/10/2008 | US20080166662 Plate-Making Method of Planographic Printing Plate and Imagewise Exposure Device |
| 07/10/2008 | US20080166660 Chemically amplified resist composition |
| 07/10/2008 | US20080166659 Thermosetting resin; photosensitive compound and dual solvent system of differing boiling points for removal of first solvent while retaining second; high film speed, development contrast, sensitivity, resolution, substrate adhesion |
| 07/10/2008 | US20080166657 Resist composition for bulkhead formation, bulkhead of EL display device and EL display device |
| 07/10/2008 | US20080166656 Positive Photoresist Composition |
| 07/10/2008 | US20080166655 Resolution, sensitivity; forming rectangular, fine patterns; having acid dissociable, dissolution inhibiting component such as (4-oxo-2-adamantyloxy)methyl methacrylate containing copolymer |
| 07/10/2008 | US20080166638 Comprised of base resin, acrylic acid-3,3-dimethoxypropene copolymer, photoacid generator, organic base and solvent; reducing number of steps to perform etching and hard mask deposition |
| 07/10/2008 | US20080166568 Top coat material and use thereof in lithography processes |
| 07/10/2008 | US20080165668 Recording medium and information recording and reproducing method using the same |
| 07/10/2008 | US20080165368 Position detection apparatus and exposure apparatus |
| 07/10/2008 | US20080165338 Self-aligned, sub-wavelength optical lithography |
| 07/10/2008 | US20080165337 Laser system |
| 07/10/2008 | US20080164637 Release surfaces, particularly for use in nanoimprint lithography |
| 07/10/2008 | US20080164472 Method of patterning transparent conductive film, thin film transistor substrate using the same and fabricating method thereof |
| 07/10/2008 | US20080163769 System and method for patterning both sides of a substrate utilizing imprint lithography |
| 07/10/2008 | DE10350708B4 Verfahren zur Bestimmung eines Translationsfehlers eines Waferscanners bei der photolithographischen Strukturierung eines Halbleiterwafers A method for determining a translation error of a wafer scanner with the photolithographic patterning of a semiconductor wafer |
| 07/10/2008 | DE102004060721B4 Verfahren zur Auswahl von optischen Materialien A method of selecting optical materials |
| 07/10/2008 | DE102004008782B4 Verfahren zum Glätten von Flächen in Strukturen durch Nutzung der Oberflächenspannung Method for smoothing surfaces in structures by use of the surface tension |
| 07/09/2008 | EP1942573A1 Alignment apparatus and exposure apparatus using the same |
| 07/09/2008 | EP1942377A2 Plasma for resist removal and facet control of underlying features |
| 07/09/2008 | EP1942376A2 Method for reducing pattern dimension in a photoresist layer |
| 07/09/2008 | EP1942375A2 Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition |
| 07/09/2008 | EP1942374A1 Imprint process for producing structure |