| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 07/22/2008 | US7402376 (Meth)acrylated polyurethane containing carboxylic acid groups having an acid value of less than 10 mg KOH/g; alkali soluble polymer; photopolymerization initiator; and a photopolymerizable polyoxyethylene di(meth)acrylate with 10-40 repeating units; dry film used as photomask for sand blast processing |
| 07/22/2008 | US7402374 Exposing to an infrared laser a lithographic printing precursor having a photosensitive-thermosensitive layer containing an infrared absorbent and a discoloring material that undergoes color change upon exposure; developable on a printing press; good visibility |
| 07/22/2008 | US7402373 Irradiating a protective layer containing a 2 hydroxylarylbenzotriazole or a 2-hydroxybenzophenone photostabilizer and a polymer of an acrylic acid ester of branched alkyl, 1-alkoxyalkyll or 1-alkoxyalkylphenyl(alkyl) alcohol through a photomask, heating, developing, irradiating, heating, applying paste |
| 07/22/2008 | US7402372 CoPOLYMER OF a (METH)ACRYLATE ester with an alcoholic hydroxyl group, and polyoxypropylene glycol; improve alkali SOLUBILITY, hydroxy groups are protected; improve in resolution, depth of focus, suppression of scum and developing defects; photolithography in production of semiconductors |
| 07/22/2008 | US7402363 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 07/22/2008 | US7402362 Method and system for reducing and monitoring precipitated defects on masking reticles |
| 07/22/2008 | US7402273 Flash curing in selective deposition modeling |
| 07/22/2008 | US7401931 Apparatus for optical beam shaping and associated methods |
| 07/22/2008 | US7401549 Arrangement for transferring information/structures to wafers |
| 07/17/2008 | WO2008085510A1 High-speed substrate manipulator |
| 07/17/2008 | WO2008084853A1 Colored composition, color filter, and method for production of the color filter |
| 07/17/2008 | WO2008084786A1 Compound and radiation-sensitive composition |
| 07/17/2008 | WO2008084781A1 Photosensitive resin composition, photosensitive film, permanent mask resist, and method for producing the same |
| 07/17/2008 | WO2008084680A1 Reflective mask blanc for euv lithography |
| 07/17/2008 | WO2008084653A1 Binder resin for near-infrared absorbing film, and near-infrared absorbing filter using the same |
| 07/17/2008 | WO2008084645A1 Printing plate material |
| 07/17/2008 | WO2008084599A1 Photosensitive lithographic printing plate material |
| 07/17/2008 | WO2008084537A1 Electron gun and electron beam exposure device |
| 07/17/2008 | WO2008084520A1 Optical device, pattern generating apparatus, pattern generating method, exposure apparatus, exposure method and device manufacturing method |
| 07/17/2008 | WO2008061681A3 Illumination lens system for projection microlithography, and measuring and monitoring method for such an illumination lens system |
| 07/17/2008 | WO2008047587A3 Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element |
| 07/17/2008 | WO2008002980A3 Laser engraveable flexographic printing article |
| 07/17/2008 | WO2007144826A3 Pharmaceutical tablets with diffractive microstructure and compression tools for producing such tablets |
| 07/17/2008 | US20080171427 Eeprom memory cell with controlled geometrical features |
| 07/17/2008 | US20080171293 Stacks; photoresists; photolithography |
| 07/17/2008 | US20080171292 Methods for Providing a Confined Liquid for Immersion Lithography |
| 07/17/2008 | US20080171291 Photomasks; photoresists |
| 07/17/2008 | US20080171290 Resist material and nanofabrication method |
| 07/17/2008 | US20080171289 Planographic Printing Plate Material and Printing Process |
| 07/17/2008 | US20080171288 Negative-acting photolithographic printing plate with improved pre-burn performance |
| 07/17/2008 | US20080171287 Semiconductor such as IC, a circuit substrate of liquid crystal, thermal head, lithography of other photo-applications; for immersion exposure, which is suitable for exposure by an immersion-type projection exposure apparatus using a light source of of emitting far ultraviolet light |
| 07/17/2008 | US20080171286 Reactive near infrared absorbing polymeric particles, methods of preparation and uses thereof |
| 07/17/2008 | US20080171285 Transparent shield layer, impervious to developer immersion |
| 07/17/2008 | US20080171271 Photosensitive Resin Composition for Producing Color Filter and Color Filter for Image Sensor Produced Using the Composition |
| 07/17/2008 | US20080170215 Lithographic apparatus and device manufacturing method |
| 07/17/2008 | US20080170211 Immersion exposure technique |
| 07/17/2008 | US20080169081 Method and apparatus for production of a cast component |
| 07/17/2008 | US20080169004 Cleaning composition for semiconductor substrates |
| 07/17/2008 | DE10305270B4 Verfahren zum Entfernen einer vernetzten Epoxidharz-Struktur A method for removing a cross-linked epoxy resin structure |
| 07/16/2008 | EP1944841A2 Very narrow band injection seeded F2 lithography laser |
| 07/16/2008 | EP1944654A2 An exposure apparatus and an exposure method |
| 07/16/2008 | EP1944653A2 Illumination system of a microlithographic exposure system |
| 07/16/2008 | EP1944652A1 A method for operating a euv lithography apparatus, and a euv lithography apparatus |
| 07/16/2008 | EP1944651A2 Method for manufacturing a composite member |
| 07/16/2008 | EP1944339A2 Pigment compositions, colored compositions making use of the pigment compositions, and color filters |
| 07/16/2008 | EP1944324A1 Ic socket set |
| 07/16/2008 | EP1944174A1 Lithographic printing plate material, lithographic printing plate, method for preparing lithographic printing plate, and method for printing by lithographic printing plate |
| 07/16/2008 | EP1943561A1 Lithography system and projection method |
| 07/16/2008 | EP1943294A2 Silsesquioxane-titania hybrid polymers |
| 07/16/2008 | EP1943286A2 Polymer and compositions |
| 07/16/2008 | EP1880414A4 Method for resist strip in presence of regular low k and/or porous low k dielectric materials |
| 07/16/2008 | EP1631995B1 Manufacture of a polymer device |
| 07/16/2008 | EP1190434B1 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 07/16/2008 | EP1060543B1 MODULAR, NARROW-BAND KrF EXCIMER LASER |
| 07/16/2008 | CN101223483A Removing solution for photosensitive composition |
| 07/16/2008 | CN101223482A Process for producing resist composition, filtering apparatus, resist composition applicator, and resist composition |
| 07/16/2008 | CN101223481A Method for manufacturing internal cell structure, internal cell structure, and display device |
| 07/16/2008 | CN101223480A Lithographic printing original plate and image forming method employing it |
| 07/16/2008 | CN101223479A Process for producing positive-working resist composition, positive-working resist composition, and method for resist pattern formation |
| 07/16/2008 | CN101223478A Black paste composition, method of forming black matrix pattern by using the same, and the black matrix pattern formed |
| 07/16/2008 | CN101223477A Silver paste composition, method of forming conductive pattern by using the same, and the conductive pattern formed |
| 07/16/2008 | CN101223476A A method of nanopatterning, a cured resist film use therein, and an article including the resist film |
| 07/16/2008 | CN101223459A Optical scattering disk, use thereof, and wavefront measuring apparatus |
| 07/16/2008 | CN101223265A Release agent composition |
| 07/16/2008 | CN101223205A New organic bottom antireflective polymer compositions |
| 07/16/2008 | CN101221903A Production method of transistor T-shaped nano grid |
| 07/16/2008 | CN101221900A Reflowing process device and reflowing process method |
| 07/16/2008 | CN101221890A Method for forming semiconductor structure |
| 07/16/2008 | CN101221889A Method for forming graphic pattern |
| 07/16/2008 | CN101221875A Device for transforming exposure position of color picture tube |
| 07/16/2008 | CN101221377A Miniature constant temperature self-control experimental bench used for simple photo-etching and soft photo-etching |
| 07/16/2008 | CN101221376A Color dynamic selection method based on multi-period mark |
| 07/16/2008 | CN101221375A Machine vision system used for step photo-etching machine alignment system and its calibration method |
| 07/16/2008 | CN101221374A Device for correcting illumination homogeneity |
| 07/16/2008 | CN101221373A Device for correcting illumination homogeneity |
| 07/16/2008 | CN101221372A Photo-etching machine projecting objective even aberration original position detecting system and method thereof |
| 07/16/2008 | CN101221371A Device and method for detecting pattern positioning precision |
| 07/16/2008 | CN101221370A Silicon slice edge exposure system and its light intensity control method |
| 07/16/2008 | CN101221369A Automatic measuring method for heterogeneous light of photo-etching machine |
| 07/16/2008 | CN101221368A Real-time detecting and correcting device and method for position of object plane and image plane |
| 07/16/2008 | CN101221367A Photo-etching machine silicon slice bench double-bench switching system adopting cross slide rail |
| 07/16/2008 | CN101221366A 6-freedom micro-motion platform capable of isolating exterior vibration |
| 07/16/2008 | CN101221365A Method for improving alignment signal processing precision based on self-adapting correction treatment |
| 07/16/2008 | CN101221364A Lithographic apparatus, device manufacturing method and device |
| 07/16/2008 | CN101221363A Lithographic apparatus and device manufacturing method |
| 07/16/2008 | CN101221362A Method and apparatus to improve lithography throughput |
| 07/16/2008 | CN101221361A Pipeline pressure balancing system |
| 07/16/2008 | CN101221360A Lithographic printing plate material for CTP |
| 07/16/2008 | CN101221359A Metallic material reflection type micro-optical element processing method based on hot press printing technology |
| 07/16/2008 | CN101221358A Curved substrate multi-phase micro-optical element processing method based on flexible ultraviolet die mold |
| 07/16/2008 | CN101221357A Device for fabricating thin film pattern and method for fabricating thin film with the same |
| 07/16/2008 | CN101221280A Full reflection projection optical system |
| 07/16/2008 | CN101221279A Projection objectives having mirror elements with reflective coatings |
| 07/16/2008 | CN101221261A Miniature ultra-optical spectrum integrated optical filter and its production method |
| 07/16/2008 | CN101221260A Method for fabricating color filter array substrate |
| 07/16/2008 | CN101220927A Cover for shielding a portion of an arc lamp, arc lamp and etching device |
| 07/16/2008 | CN101220225A Light sensitive anti-solder ink composition, application and circuit board containing the same |
| 07/16/2008 | CN101220224A UV solidified alkali resistant etching ink composition and uses thereof |
| 07/16/2008 | CN101219427A Substrate processing device |
| 07/16/2008 | CN101219423A Kitchen garbage drying processor |