| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/24/2008 | DE102008006687A1 Optical system's image characteristics improving method for use as projection objective, involves deforming optical elements by mechanical force effect from mechanical manipulators and thermal effect from thermal manipulators, respectively |
| 07/24/2008 | DE102008005006A1 Projection optics for use in microlithography, has reflection surface of curved mirror configured as static free-form surface, where intersection of optical axis of refractive subunit with object plane is located in object field |
| 07/24/2008 | DE102008004817A1 Entwicklungsbearbeitungsvorrichtung Development processing device |
| 07/24/2008 | DE102008003916A1 Projection exposure apparatus for use in microlithography, has measuring device for measuring irradiance distribution, and evaluating device for determining respective angularly resolved irradiation distribution from radiation intensity |
| 07/24/2008 | DE102007062894A1 Lithographic projection lens has optical array of optical elements between object plane and image plane, and optical array has two correction elements for correcting aberration |
| 07/24/2008 | DE102007059258A1 Microlithographic projection exposure system has double-refractive delay system with time-delay element, which has component is made of optically positive uniaxial crystal material with optical crystal axis |
| 07/24/2008 | DE102007057054A1 Optical elements e.g. mirror, positioning device for e.g. microlithography object lens, has support unit and stop unit part exhibiting displacement supports that are detachable during active positioning |
| 07/24/2008 | DE102007004285A1 Optical element for microlithography, has vacuum-metalized anti-reflex coating with alternating layers, where part of layers has two briefringent sub-layers with curved optical axes to partially compensate angular dependency |
| 07/24/2008 | DE102005063460B4 Verfahren zur Prozesssteuerung Method for Process Control |
| 07/23/2008 | EP1947683A1 Exposure apparatus, exposure method and device manufacturing method |
| 07/23/2008 | EP1947682A1 Multilayer reflecting mirror, multilayer reflecting mirror manufacturing method, optical system, exposure apparatus and device manufacturing method |
| 07/23/2008 | EP1947514A2 Method for preparation of lithographic printing plate |
| 07/23/2008 | EP1947513A2 Continuous direct-write optical lithography |
| 07/23/2008 | EP1947512A2 Positioning apparatus |
| 07/23/2008 | EP1947511A1 Process for the manufacture of printing support for rollers for the printing of laminar materials, machine for implementing the process and the printing support for printing rollers |
| 07/23/2008 | EP1947510A1 Positive resist composition and method for forming resist pattern |
| 07/23/2008 | EP1947509A2 Pattern formation method |
| 07/23/2008 | EP1947157A1 Sealing material for flat panel display |
| 07/23/2008 | EP1946372A2 Methods and apparatus for designing and using micro-targets in overlay metrology |
| 07/23/2008 | EP1946356A1 Method and apparatus for isolative substrate edge area processing |
| 07/23/2008 | EP1946331A2 High power euv lamp system |
| 07/23/2008 | EP1946186A2 Microstructure synthesis by flow lithography and polymerization |
| 07/23/2008 | EP1946185A2 Novel positive photosensitive polybenzoxazole precursor compositions |
| 07/23/2008 | EP1511754B1 Multimer forms of mono- and bis-acylphosphine oxides |
| 07/23/2008 | EP1368413B1 Two-layer imageable element comprising thermally reversible polymers |
| 07/23/2008 | EP0968458B1 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars |
| 07/23/2008 | EP0939920B2 Planographic printing |
| 07/23/2008 | CN201091030Y Mask box and mask conveying box and supporting piece thereof |
| 07/23/2008 | CN201090993Y Container and cover cap thereof |
| 07/23/2008 | CN101228608A Maskless lithography system with improved reliability |
| 07/23/2008 | CN101228481A Method to remove resist, etch residue, and copper oxide from substrates having copper and low-K dielectric |
| 07/23/2008 | CN101228480A Patterning method |
| 07/23/2008 | CN101228479A Photopolymer composition suitable for lithographic printing plates |
| 07/23/2008 | CN101228478A Method for generating photo mask graphic data, photo mask generated by the data and manufacturing method of semiconductor device using the photo mask |
| 07/23/2008 | CN101228196A Photoresist composition and laminating body |
| 07/23/2008 | CN101227121A Production technology of oscillation ring |
| 07/23/2008 | CN101226875A Apparatus and method for processing substrate |
| 07/23/2008 | CN101226863A Method for manufacturing field radiated element spacer and substrate for spacer |
| 07/23/2008 | CN101226862A Method for preparation of photoelectric sensitivity conductive slurry |
| 07/23/2008 | CN101226346A Deciduating technique of photoresist as well as a first combination, a second combination and parting medium water solution used in said technique |
| 07/23/2008 | CN101226345A Device for installing and leveling photo-etching machine projection objective |
| 07/23/2008 | CN101226344A Apparatus and method for measuring optical system parameter |
| 07/23/2008 | CN101226343A Method for improving photolithography exposure energy homogeneity using grey level compensation |
| 07/23/2008 | CN101226342A Programmed control slow-starting high stabilization great current drive device |
| 07/23/2008 | CN101226341A 衬底支撑件和光刻工艺 A substrate support member and the photolithography process |
| 07/23/2008 | CN101226340A A scatterometer, a lithographic apparatus and a focus analysis method |
| 07/23/2008 | CN101226339A FIFO data storage system containing multiple capture channels and and method thereof |
| 07/23/2008 | CN101226338A Method for detecting calibration degree of scanning exposure machine |
| 07/23/2008 | CN101226337A Device and method for removing impurity on mask covered by protective membrane |
| 07/23/2008 | CN101226336A Method for forming a coating with a liquid, and method for manufacturing a semiconductor device |
| 07/23/2008 | CN101226335A Method for forming resist pattern, semiconductor device and production method thereof |
| 07/23/2008 | CN101226334A Mirror plane erosion carving gravure technique |
| 07/23/2008 | CN101226333A Curable composition, color filter using the same and manufactuirng method therefor, and solid image pickup element |
| 07/23/2008 | CN101226332A Method for manufacturing barrier wall slurry |
| 07/23/2008 | CN101226331A UV curable liquid pre-polymer, and liquid crystal display device using the same and manufacturing method thereof |
| 07/23/2008 | CN101226330A Colored photosensitive resin composition |
| 07/23/2008 | CN101226329A Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof |
| 07/23/2008 | CN101226328A Photosensitive resin composition for producing color filter and color filter for image sensor produced using the composition |
| 07/23/2008 | CN101226327A Method for manufacturing polyalcohol material pattern structure capable of transfer print |
| 07/23/2008 | CN101226316A Method for preparing substrate of LCD |
| 07/23/2008 | CN101226309A Photosensitive gap material for liquid crystal display device, manufacturing method thereof and liquid crystal display device |
| 07/23/2008 | CN101226299A Method for manufacturing colorful filter layer with light scattering effect |
| 07/23/2008 | CN101226274A Piezo-electricity driven deformable reflector and manufacturing method thereof |
| 07/23/2008 | CN101226272A 成像光学系统 The imaging optical system |
| 07/23/2008 | CN101225149A Epoxy modified novolac resin and photoresist composition obtained thereby |
| 07/23/2008 | CN101225143A Photosensitive macromolecular material and preparation method thereof |
| 07/23/2008 | CN100405570C Substrate processor |
| 07/23/2008 | CN100405559C Substrate etching method and etching disposal device |
| 07/23/2008 | CN100405544C Single-line arrangement development processing apparatus |
| 07/23/2008 | CN100405542C Method and system for forming a semiconductor device |
| 07/23/2008 | CN100405222C Seven freedom positioning mechanism |
| 07/23/2008 | CN100405221C Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
| 07/23/2008 | CN100405220C Acid-degradable resin compositions containing ketene-aldehyde copolymer |
| 07/23/2008 | CN100405194C Liquid crystal display and its producing method |
| 07/23/2008 | CN100405171C Optical guiding panel and its preparation and background module therewith |
| 07/23/2008 | CN100405167C Color light fictering substrate and manufacturing method thereof |
| 07/23/2008 | CN100405135C A device having a light-absorbing mask and a method for fabricating same |
| 07/23/2008 | CN100405119C Projection optical system, exposure apparatus and exposure method |
| 07/23/2008 | CN100405091C Pigment dispersion inhibitor |
| 07/23/2008 | CN100405087C Light conducting plate and manufacturing method thereof |
| 07/23/2008 | CN100405085C Method and device for producing optical module |
| 07/23/2008 | CN100404633C Liquid-repellent, alkali-resistant coating composition and coating suitable for pattern forming |
| 07/23/2008 | CN100404579C One-pack-type resin composition curable with combination of light and heat and use of the same |
| 07/23/2008 | CN100404573C Positive photoresist composition and method of forming resist pattern |
| 07/23/2008 | CN100404260C Coating method, liquid supplying head and liquid supplying apparatus |
| 07/22/2008 | US7403651 Multicolor images; forming laser sensitive layer; bleachable coloring layer; process control |
| 07/22/2008 | US7403649 System and method of providing mask defect printability analysis |
| 07/22/2008 | US7403338 Microlens for projection lithography and method of preparation thereof |
| 07/22/2008 | US7403266 Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 07/22/2008 | US7403263 Exposure apparatus |
| 07/22/2008 | US7403259 Lithographic processing cell, lithographic apparatus, track and device manufacturing method |
| 07/22/2008 | US7403216 Film exposure method and apparatus using liquid crystal display |
| 07/22/2008 | US7402849 Parallel, individually addressable probes for nanolithography |
| 07/22/2008 | US7402782 Baking device and baking method of baking a chemically amplified resist film containing an acid (H+) generator before exposure but after development |
| 07/22/2008 | US7402626 Top coat composition |
| 07/22/2008 | US7402552 Non-corrosive cleaning composition for removing plasma etching residues |
| 07/22/2008 | US7402486 Cylinder-type capacitor and storage device, and method(s) for fabricating the same |
| 07/22/2008 | US7402379 Resist exposure system and method of forming a pattern on a resist |
| 07/22/2008 | US7402378 Illuminating a phase shift mask including a pattern and a cyclic dummy pattern overlaid onto the pattern by making a part of the pattern to be resolved by effects of the dummy pattern thicker than the line width using light having a peak near an optical axis in an intensity distribution |
| 07/22/2008 | US7402377 Use of perfluoro-n-alkanes in vacuum ultraviolet applications |