| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/30/2008 | CN101233454A Polarization analyzer, polarization sensor and method for determining at least one polarization property and lithographic apparatus |
| 07/30/2008 | CN101233453A Composition and use thereof |
| 07/30/2008 | CN101233452A Photosensitive resin composition and cured article thereof |
| 07/30/2008 | CN101233435A Photosensitive resin composition for liquid crystal display element, color filter using the same, process for manufacture of the color filter, and liquid crystal display element |
| 07/30/2008 | CN101231947A Reflux processing method and method for manufacturing tft |
| 07/30/2008 | CN101231945A Method of manufacturing semiconductor device |
| 07/30/2008 | CN101231940A Method of manufacturing multilayer thin film pattern and display device |
| 07/30/2008 | CN101231936A Light source apparatus |
| 07/30/2008 | CN101231479A Imbibition type micro-imaging method and system as well as aligning method for closing plate thereof |
| 07/30/2008 | CN101231478A Developing apparatus |
| 07/30/2008 | CN101231477A Exposure apparatus and method for producing device |
| 07/30/2008 | CN101231476A Exposure apparatus and method for producing device |
| 07/30/2008 | CN101231475A Exposure system of photo-etching machine |
| 07/30/2008 | CN101231474A Non-mask write through photo-etching machine with ultrahigh strength LED light source |
| 07/30/2008 | CN101231473A Replication and transfer of microstructures and nanostructures |
| 07/30/2008 | CN101231472A Method of measurement, an inspection apparatus and a lithographic apparatus |
| 07/30/2008 | CN101231471A System for switching benches of photo-etching machine silicon slice benches by transition continue device |
| 07/30/2008 | CN101231470A Method for determining temperature distortion correcting parameter of lens array system apparatus |
| 07/30/2008 | CN101231469A Lustration membrane cleaning tablet for soakage type photolithography system, composition, direction and application thereof |
| 07/30/2008 | CN101231468A Radiation sensitive resin composition and color filter |
| 07/30/2008 | CN101231467A Cured composition, color filter and method for manufacturing the same |
| 07/30/2008 | CN101231466A Method for forming phototonus combination, direction distribution membrane and optical compensation membrane |
| 07/30/2008 | CN101231465A Two-layer film and method of forming pattern by using the same |
| 07/30/2008 | CN101231464A Photoacid generators, photoresist composition including the same and method of forming pattern using the same |
| 07/30/2008 | CN101231463A Method for making optical element base on ultraviolet stamping multiphase and continue relief structure |
| 07/30/2008 | CN101231462A Light scattering slice and preparation method thereof |
| 07/30/2008 | CN101231461A Method for manufacturing optical element |
| 07/30/2008 | CN101231460A Gray tone mask and method for manufacturing the same |
| 07/30/2008 | CN101231459A Light mask pattern for photolithography technique monitoring mark and uses thereof |
| 07/30/2008 | CN101231458A Grey mask and pattern transfer printing method |
| 07/30/2008 | CN101230243A Binder composition and photosensitive composition including the same |
| 07/30/2008 | CN101230226A New process of double-faced micro-shadow etching and components of protective coating thereof |
| 07/30/2008 | CN101230122A Anhydride modified alkyd resin and photoresist composition obtained thereby |
| 07/30/2008 | CN100407372C 压印方法及信息记录媒体制造方法 Imprint method and an information recording medium manufacturing method |
| 07/30/2008 | CN100407371C 曝光装置和器件加工方法 Exposure apparatus and device fabrication method |
| 07/30/2008 | CN100407370C 浸没式微影制程以及应用于浸没式微影制程的结构 Immersion lithography process and applied to immersion lithography process structure |
| 07/30/2008 | CN100407055C 生物电子carl:使用导电层之基材连结 Bioelectronic carl: Use a conductive layer of the base link |
| 07/30/2008 | CN100407054C 光刻装置和器件制造方法 Lithographic apparatus and device manufacturing method |
| 07/30/2008 | CN100407053C 用于微光刻法的照明系统 Method for microlithography illumination system |
| 07/30/2008 | CN100407052C 使用阴影心轴和偏轴曝光印制亚光刻图像 Use shadow mandrel and off-axis exposure image printed sublithographic |
| 07/30/2008 | CN100407049C 吸收紫外线的支撑层及包含该支撑层的苯胺印刷元件 The support layer and the ultraviolet absorbing flexographic printing element comprising the support layer, |
| 07/30/2008 | CN100407034C 薄膜晶体管、使用其的液晶显示器、以及其制造方法 A thin film transistor liquid crystal display using the same, and a manufacturing method thereof |
| 07/30/2008 | CN100406930C 全息元件 Holographic element |
| 07/30/2008 | CN100406481C Resist polymer and resist composition |
| 07/29/2008 | US7405810 Method and apparatus for positioning a substrate on a substrate table |
| 07/29/2008 | US7405808 Optical system, in particular illumination system, of a microlithographic projection exposure apparatus |
| 07/29/2008 | US7405807 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 07/29/2008 | US7405803 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
| 07/29/2008 | US7405802 Large field of view 2X magnification projection optical system for FPD manufacture |
| 07/29/2008 | US7405432 Exposure device, exposure method and method of manufacturing semiconductor device |
| 07/29/2008 | US7405414 Method and apparatus for patterning a workpiece |
| 07/29/2008 | US7405413 Arrangement for providing target material for the generation of short-wavelength electromagnetic radiation |
| 07/29/2008 | US7405308 polymerization catalysts such as 5-(2,4-dimethylphenyl) thianthrenium hexafluoroantimonate, used for polymerization of epoxy and vinyl ether monomers |
| 07/29/2008 | US7405035 Image-wise forming a region to initiate polymerization; graft polymerization by atom transfer radical polymerization; adhering a substance to hydrophilic or hydrophobic region of hydrophilic/hydrophobic pattern |
| 07/29/2008 | US7405034 Polymeric structures, particularly microstructures, and methods for making same |
| 07/29/2008 | US7405033 Method for manufacturing resist pattern and method for manufacturing semiconductor device |
| 07/29/2008 | US7405031 Lithographic apparatus and device manufacturing method |
| 07/29/2008 | US7405029 phenolic resin copolymer comprising monomers of p-xylene dimethylether, 4,4'-(9-fluorenylidene)diphenol including alkoxysilane group; etch resist photomask for microelectronic structures, storage stability, resistant to radiation at shorter wavelengths; semiconductor integrated circuit |
| 07/29/2008 | US7405028 Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography |
| 07/29/2008 | CA2351322C Method and apparatus for production of a cast component |
| 07/24/2008 | WO2008088076A1 Developing solution and method for production of finely patterned material |
| 07/24/2008 | WO2008087840A1 Radiation-sensitive resin composition for immersion exposure and method of forming photoresist pattern |
| 07/24/2008 | WO2008087827A1 Image forming optical system, exposure equipment and device manufacturing method |
| 07/24/2008 | WO2008087597A2 Device manufacturing method and lithographic apparatus |
| 07/24/2008 | WO2008087546A1 Antireflective coating compositions comprising solvent mixtures for photoresists |
| 07/24/2008 | WO2008086827A1 Projection exposure method and projection exposure system therefor |
| 07/24/2008 | WO2008066885A3 Method and system for detecting existence of an undesirable particle during semiconductor fabrication |
| 07/24/2008 | WO2008066885A2 Method and system for detecting existence of an undesirable particle during semiconductor fabrication |
| 07/24/2008 | WO2008056437A8 Copolymer for immersion lithography and compositions |
| 07/24/2008 | WO2008055110A3 Photonic crystal euv photoresists |
| 07/24/2008 | WO2008048215A3 Contact lithography apparatus, system and method |
| 07/24/2008 | WO2007148160A3 Method of multi-layer lithography |
| 07/24/2008 | WO2007118061A3 Nano-based gas diffusion media |
| 07/24/2008 | US20080176414 Systems and methods for inducing crystallization of thin films using multiple optical paths |
| 07/24/2008 | US20080176404 Method for fabricating semiconductor device |
| 07/24/2008 | US20080176348 Array substrate of liquid crystal display and fabrication method thereof |
| 07/24/2008 | US20080176172 Suction; rotation; sealing |
| 07/24/2008 | US20080176171 Photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to laser |
| 07/24/2008 | US20080176170 For forming pattern that prevents contamination within the exposure apparatus; lithography |
| 07/24/2008 | US20080176168 Chemically amplified resist composition |
| 07/24/2008 | US20080176167 Photopolymerization; polyimides; photomasks; wafers; sheets; films |
| 07/24/2008 | US20080176166 Resists for lithography |
| 07/24/2008 | US20080176152 Mask Patterns for Semiconductor Device Fabrication and Related Methods and Structures |
| 07/24/2008 | US20080176151 Dye-containing curable composition, color filter, and producing process thereof |
| 07/24/2008 | US20080176150 Exposure mask and method of forming pattern |
| 07/24/2008 | US20080176146 Permanent holograms with low light scattering loss and high diffraction efficiency; polymerizable compound, photoinitiator and organic fine particles |
| 07/24/2008 | US20080176145 Method for manufacturing holographic recording medium and method for manufacturing semiconductor device |
| 07/24/2008 | US20080176047 Liquid Composition for Immersion Lithography and Lithography Method Using the Same |
| 07/24/2008 | US20080176045 Method of Mapping Lithography Focus Errors |
| 07/24/2008 | US20080175467 System for accumulating exposure energy information of wafer and management method of mask for exposure utilizing exposure energy information of wafer accumulated with the system |
| 07/24/2008 | US20080175348 Nanometer-scale lithography using extreme ultraviolet/soft x-ray laser interferometry |
| 07/24/2008 | US20080174757 Imaging device in a projection exposure machine |
| 07/24/2008 | US20080174756 Source optimization for image fidelity and throughput |
| 07/24/2008 | US20080174755 Movable Stage Apparatus |
| 07/24/2008 | US20080174750 Apparatus configured to position a workpiece |
| 07/24/2008 | US20080174749 In-tool and Out-of-Tool Protection of Extreme Ultraviolet (EUV) Reticles |
| 07/24/2008 | US20080174046 Capillary Imprinting Technique |
| 07/24/2008 | US20080173339 Method for cleaning semiconductor device |
| 07/24/2008 | US20080173097 Sensor Component With a Cavity Housing and a Sensor Chip and Method for Producing the Same |
| 07/24/2008 | DE19614372B4 Verfahren und Vorrichtung zur Wärmebehandlung einer lichtempfindlichen lithographischen Druckplatte Method and apparatus for heat treatment of a photosensitive lithographic printing plate |