| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/05/2008 | US7408622 Illumination system and polarizer for a microlithographic projection exposure apparatus |
| 08/05/2008 | US7408621 Projection exposure system |
| 08/05/2008 | US7408620 Exposure apparatus |
| 08/05/2008 | US7408616 Microlithographic exposure method as well as a projection exposure system for carrying out the method |
| 08/05/2008 | US7408615 Lithographic apparatus and device manufacturing method |
| 08/05/2008 | US7408155 Measuring method and its apparatus |
| 08/05/2008 | US7408013 Low-polydispersity photoimageable polymers and photoresists and processes for microlithography |
| 08/05/2008 | US7408011 Photoresists, fluoropolymers and processes for 157 nm microlithography |
| 08/05/2008 | US7408002 Photosensitive resin composition and process for the formation of hydrogel |
| 08/05/2008 | US7407739 Resist developer and resist pattern formation method using same |
| 08/05/2008 | US7407738 Applying alternating material layers on a ridge and then removing some of the alternating layers to expose edges; exposed edges can be of nearly arbitrary length and curvature; edges can be used to fabricate an array of nano-scale-width curved wires |
| 08/05/2008 | US7407737 Method for the production of photoresist structures |
| 08/05/2008 | US7407735 Precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing an (meth)acrylic ester compound with tert-amine group; sensitivity, printing durability, stain elimination property, dot reproduction, and sludge restraining property |
| 08/05/2008 | US7407734 Resist composition for electron beam or EUV |
| 08/05/2008 | US7407733 Photoresists; high substrate adhesion and high etching resistance but also high solubility for a resist solvent, semiconductors |
| 08/05/2008 | US7407731 of photosensitive polybenzoxazole (PBO) precursors, a mercapto compound of given formula such as 2-mercaptobenzoxazole to inhibit residue from forming, a photosensitive agent, a photoactive compound and solvent; electronics, relief images |
| 08/05/2008 | US7407730 Inspected by disposing dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing the portion of the mask pattern portion with the dummy inspection pattern portion |
| 08/05/2008 | US7407554 Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent |
| 08/05/2008 | US7406841 Glass-ceramic product with variably adjustable zero crossing of the CTE-T curve |
| 07/31/2008 | WO2008091114A1 Photo-curable composition having inherently excellent releasing property and pattern transfer property, method for transferring pattern using the composition and light recording medium having polymer pattern layer produced using the composition |
| 07/31/2008 | WO2008091014A2 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
| 07/31/2008 | WO2008090988A1 Optical element, exposure apparatus employing the optical element, and device manufacturing method |
| 07/31/2008 | WO2008090975A1 Support structure and exposure apparatus |
| 07/31/2008 | WO2008090942A1 Exposure method, exposure device, and micro device manufacturing method |
| 07/31/2008 | WO2008090827A1 Positive photosensitive resin composition |
| 07/31/2008 | WO2008090801A1 Projection exposure device and projection exposure method |
| 07/31/2008 | WO2008090769A1 Photosensitive resin composition and method for formation of resist pattern by using the same |
| 07/31/2008 | WO2008090768A1 Photosensitive resin composition and method of forming pattern from the same |
| 07/31/2008 | WO2008090669A1 Coating forming agent for pattern fining, and method for fine pattern formation using the same |
| 07/31/2008 | WO2008090668A1 Coating forming agent for pattern fining, and method for fine pattern formation using the same |
| 07/31/2008 | WO2008090640A1 Oxime compound, photosensitive composition, color filter, method for production of the color filter, and liquid crystal display element |
| 07/31/2008 | WO2008089990A2 Method for operating an immersion lithography apparatus |
| 07/31/2008 | WO2008089953A1 Method for improving imaging properties of an optical system, and optical system |
| 07/31/2008 | WO2008089898A1 Irradiation strength distribution measuring apparatus and method of measuring |
| 07/31/2008 | WO2008071347A3 Exposure apparatus |
| 07/31/2008 | WO2008071347A2 Exposure apparatus |
| 07/31/2008 | WO2008034582A3 Optical arrangement, in particular projection exposure apparatus for euv lithography, as well as reflective optical element with reduced contamination |
| 07/31/2008 | WO2008021894A3 Method and apparatus for monitoring and control of suck back level in a photoresist dispense system |
| 07/31/2008 | WO2008008521A3 Photosensitive conductive paste for electrode formation and electrode |
| 07/31/2008 | US20080182212 A cyan dye donor element having at least two cyan dyes dispersed in a ethyl cellulose binder; inkjet ink; improved photostability of dye diffusion or sublimation thermal transfer dyes |
| 07/31/2008 | US20080182211 Using a coating and developing apparatus and a connected aligner; reduced operator workloads; photolithography |
| 07/31/2008 | US20080182210 Using crystalline materials of a high refractive index while at the same time limiting the negative effects of intrinsic birefringence on the image-projection properties; cubic crystalline sapphires, spinels, and garnets; numerical aperture greater than 1 |
| 07/31/2008 | US20080182209 Method of Fabricating Semiconductor Device, and Developing Apparatus Using the Method |
| 07/31/2008 | US20080182207 Improved energy efficiency with simplified manufacturing process; a dielectric layer is formed over a light absorbing layer, selective exposure, forming a conductive film; televisions, video cameras, cellular phones, computers |
| 07/31/2008 | US20080182205 Polymerizable side chains of acrylic, vinyl, allylic or styrenic groups and alkylenoxy groups; image development without alkali development |
| 07/31/2008 | US20080182204 Photoresists comprising novolak resin blends |
| 07/31/2008 | US20080182203 (Phenyl or naphthyl)carbonylethyl tetramethylenesulfonium, phenyl tetramethylenesulfonium or triphenylsulfonium salts of an adamantyl, 4-10 carbon carbocyclic, or 7-oxabyicyclo[2.2.2]octan-1-yl-substituted 1-(carbonyloxy)-1,1-difluoroalkylsulfonic acid; uniform profile |
| 07/31/2008 | US20080182202 Photosensitive layer contains theophylline or uric acid, an acid labile compound, a triphenylsulfonium compound, an acryl resin with a fluoroalkyl group, and an infrared absorbing dye; high sensitivity and development even with a low pH developer or fatigue developer with low activity; scratch resistance |
| 07/31/2008 | US20080182201 Suitable for ultraviolet laser exposure; high sensitivity and storage stability, as well as excellent safelight properties; a photosensitive layer containing a hexaarylbiimidazole photopolymerization intiator, a (meth)acryloyl phosphate monomer, a UV absorbing chromen-2-one dye and a binder |
| 07/31/2008 | US20080182183 Reflective mask blank for euv lithography |
| 07/31/2008 | US20080182179 Gray tone mask and method for manufacturing the same |
| 07/31/2008 | US20080182177 forming the holographic recording layer between the first and substrate and the second substrate by facing the second substrate to the first substrate, and hardening the holographic recording layer by at least one of heat and light |
| 07/31/2008 | US20080182087 Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film |
| 07/31/2008 | US20080182082 Pattern forming method, electronic device manufacturing method and electronic device |
| 07/31/2008 | US20080182081 Polymer or Resist Pattern, and Metal Film Pattern, Metal Pattern and Plastic Mold Using the Same, and Fabrication Methods Thereof |
| 07/31/2008 | US20080182078 Photocurable Composition For Producing Cured Articles Having High Clarity And Improved Mechanical Properties |
| 07/31/2008 | US20080180783 Critical dimension control for photolithography for microelectromechanical systems devices |
| 07/31/2008 | US20080180688 System for measuring the image quality of an optical imaging system |
| 07/31/2008 | US20080180668 Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus |
| 07/31/2008 | US20080180647 Focus monitor mark, focus monitoring method, and device production method |
| 07/31/2008 | US20080180645 Immersion Photolithography System and Method Using Microchannel Nozzles |
| 07/31/2008 | US20080179709 Integrated circuit fuse |
| 07/31/2008 | US20080178906 Bare aluminum baffles for resist stripping chambers |
| 07/31/2008 | DE4307923B4 Plattenmaterial-Bearbeitungsvorrichtung Plate material processing apparatus |
| 07/31/2008 | DE19738607B4 Mikrospiegel und Verfahren zur Herstellung eines Mikrospiegels Micro-mirrors and method for the production of a micromirror |
| 07/31/2008 | DE10356177B4 Verfahren zur Herstellung einer Halbleitervorrichtung A process for producing a semiconductor device |
| 07/31/2008 | DE10354112B4 Verfahren und Anordnung zur Reparatur von Speicherchips mittels Mikro-Lithographie-Verfahren Method and apparatus for repairing memory chips using micro-lithography process |
| 07/31/2008 | DE10326223B4 Verfahren zur Strukturierung dünner Schichten mittels optischer Lithographie und Anordnung zur Durchführung der optischen Lithographie Method for patterning thin films using optical lithography and device for carrying out optical lithography |
| 07/31/2008 | DE10252051B4 Verfahren zur Herstellung einer Fotomaske A process for preparing a photomask |
| 07/31/2008 | DE102008006637A1 Optical integrator for an illumination system of a microlithography projection exposure installation, has two micro lenses with breaking surfaces, which has arc-shaped curves in cutting plane, which runs parallel to optical axis |
| 07/31/2008 | DE102007048025A1 Optical unit for changing polarization of electromagnetic radiation e.g. ultraviolet light, in optical system i.e. scanning microlithography system, has retardation plate producing local polarization change of electromagnetic radiation |
| 07/31/2008 | DE102007005203A1 Holder for optical element and for use with lithography objective, has actuator for indirectly moving optical element, where actuator is formed as bimorphes, piezoelectric element, and optical element takes up inner ring and outer ring |
| 07/31/2008 | DE102006060368B3 Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle Method and apparatus for stabilizing the average emitted radiation power of a pulsed radiation source operated |
| 07/31/2008 | DE102005002754B4 Phosphonosubstituierte Siloxane als Interlayer für Lithographie-Druckplatten Phosphono siloxanes as interlayer for lithographic printing plates |
| 07/31/2008 | DE10197137B4 Verfahren zur Herstellung von Mikrostrukturen A process for the fabrication of microstructures |
| 07/31/2008 | DE10045168B4 Mehrstrahl-Belichtungsverfahren A multi-beam exposure method |
| 07/31/2008 | CA2654973A1 Etching and hole arrays |
| 07/30/2008 | EP1950795A1 Exposure apparatus, exposure method and device manufacturing method |
| 07/30/2008 | EP1950794A1 Optical characteristic measuring method, exposure method, device manufacturing method, inspecting apparatus and measuring method |
| 07/30/2008 | EP1950793A1 Exposure apparatus and exposure method |
| 07/30/2008 | EP1950613A2 Laser drawing method and apparatus |
| 07/30/2008 | EP1950612A1 Exposure apparatus and method, and method for manufacturing device |
| 07/30/2008 | EP1950611A1 Method for depositing a polymer layer on a support surface comprising at least one hollow area |
| 07/30/2008 | EP1950610A1 Composition for forming upper film and method for forming photoresist pattern |
| 07/30/2008 | EP1950594A1 Imaging optical system, projection illumination unit for microlithography with such an optical system, method for manufacturing a microstructured component with such a projection illumination unit, microstructured component produced by the manufacturing method and use of such an optical system |
| 07/30/2008 | EP1950493A2 Light exposure apparatus and method of exposing a photosensitive composition using the apparatus |
| 07/30/2008 | EP1950190A1 Fluorine-containing adamantane derivative, fluorine-containing adamantane derivative having polymerizable group, and resin composition containing same |
| 07/30/2008 | EP1949147A1 Method of producing a diffraction grating element |
| 07/30/2008 | EP1948962A2 Vibration isolation system and method |
| 07/30/2008 | EP1948711A1 Cyclocarbonate-containing energy-curable compositions |
| 07/30/2008 | EP1948556A1 Hierarchical nanopatterns by nanoimprint lithography |
| 07/30/2008 | EP1782456A4 Exposure apparatus, exposure method, and exposure mask |
| 07/30/2008 | EP1754110B1 Projection objective for a microlithographic projection exposure apparatus |
| 07/30/2008 | EP1750175B1 Positive photosensitive composition |
| 07/30/2008 | EP1678466A4 Line profile asymmetry measurement |
| 07/30/2008 | EP1548802B1 Light conducting device |
| 07/30/2008 | EP1451629B1 Homogenizer |
| 07/30/2008 | EP1284866B1 Donor element comprising an aqueous dispersion |
| 07/30/2008 | CN101233456A 金属和电介质相容的牺牲性抗反射涂层清洗及去除组合物 Compatibility of the metal and the dielectric sacrificial anti-reflective coating composition for the cleaning and removal of |
| 07/30/2008 | CN101233455A Lithographic projection system and projection lens polarization sensor and method for measuring polarization state |