Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2008
08/07/2008WO2008092653A2 Illumination system of a microlithographic projection exposure apparatus
08/07/2008WO2008092555A1 Memory medium comprising a pixel-by-pixel written lithograph
08/07/2008WO2008073223A3 Negative-working radiation-sensitive compositions and imageable materials
08/07/2008WO2008073223A2 Negative-working radiation-sensitive compositions and imageable materials
08/07/2008WO2008072959A3 Radiation system and lithographic apparatus
08/07/2008WO2008072959A2 Radiation system and lithographic apparatus
08/07/2008WO2008044924A3 Cleaning method, apparatus and cleaning system
08/07/2008US20080189674 Data Generating Method, Data Generating Device, and Program
08/07/2008US20080188692 Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same
08/07/2008US20080188619 Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same
08/07/2008US20080188023 Forming thin film transistors on a substrate and connecting to pixel electrodes which are connected to a voltage-receiving pad, depositing an inorganic alignment layer covering the organic pattern on the first substrate, and then removing; simplified process over photolithography
08/07/2008US20080187874 Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
08/07/2008US20080187873 Configuring a gel pad; mounting a daughter stamper; placing the photoresist on a master stamper; randomizing a collimated UV light beam with a ultraviolet light diffuser to cure the photoresist; eliminating surface defects along the loading column and elastic propagation of any defects on the surface
08/07/2008US20080187872 Exposure apparatus
08/07/2008US20080187871 Pattern forming apparatus and method
08/07/2008US20080187870 Using a slit mask or a half-tone mask in order to form a channel of the thin film transistor; reduced manufacturing costs
08/07/2008US20080187869 Better exposure profiles for the resulting integrated circuits; improved chip yield; increased throughput by reducing the need to alter settings or switch reticles between exposures
08/07/2008US20080187866 Novel dyes and use thereof in imaging members and methods
08/07/2008US20080187865 Having aryl ketone methoxy functionality; reduced line edge roughness
08/07/2008US20080187864 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
08/07/2008US20080187863 Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition
08/07/2008US20080187862 Such as 7-benzothiazoly-9,9-didecyl-2,2-(N,N-diphenylamino)fluorene fluorophore with photoacid generator and binder; near infrared writable high density positive and negative random access memory; controlled in three dimensions; stability, response, fidelity; reduced complexity
08/07/2008US20080187861 Master Substrate and Method of Manufacturing a High-Density Relief Structure
08/07/2008US20080187860 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
08/07/2008US20080187859 Radiation-Sensitive Resin Composition
08/07/2008US20080187845 Lithographic method
08/07/2008US20080187843 Preventing damage of moisture resistant ring pattern by static electricity
08/07/2008US20080187842 Method and System For Wafer Inspection
08/07/2008US20080187841 Phase shift mask with two-phase clear feature
08/07/2008US20080186509 Measurement apparatus, exposure apparatus, and device fabrication method
08/07/2008US20080186495 Cylindrical waveguide biosensors
08/07/2008US20080186469 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system
08/07/2008US20080186466 Element for defocusing tm mode for lithography
08/07/2008US20080186465 Coupling apparatus, exposure apparatus, and device fabricating method
08/07/2008US20080186463 Exposure apparatus and device manufacturing method
08/07/2008US20080186459 Lithographic apparatus and device manufacturing method
08/07/2008US20080186454 Systems for displaying images and methods for fabricating the same
08/07/2008US20080185370 Heating apparatus and heating method
08/07/2008DE10344645B4 Verfahren zur Durchführung einer Doppel- oder Mehrfachbelichtung A method for performing a double or multiple exposure
08/07/2008DE10339514B4 Verfahren zur Belichtung eines Substrates A method for exposing a substrate
08/07/2008DE10320658B4 Polarisationszustandserfassungssystem, Lichtquelle und Belichtungsgerät Polarization state detecting system, light source and exposure apparatus
08/07/2008DE102008007387A1 Reflektives optisches Element für EUV-Lithographievorrichtungen The reflective optical element for EUV lithography devices
08/07/2008DE102008006913A1 Photosäuregenerator, Photoresistzusammensetzung mit selbigem und Musterbildungsverfahren mit selbiger Photoacid generator, photoresist composition with just that and pattern formation method with Selbiger
08/07/2008DE102005053751B4 Megaschall-Immersionslithografie-Belichtungs-Vorrichtung und Verfahren Megasonic immersion lithography exposure apparatus and method
08/07/2008DE102004004597B4 Verfahren zur Vermessung einer Struktur auf einem Halbleiterwafer mit einem Rasterelektronenmikroskop A method for measurement of a structure on a semiconductor wafer with a scanning electron microscope
08/06/2008EP1953812A1 Substrate support
08/06/2008EP1953806A1 Substrate processing method, photomask manufacturing method, photomask and device manufacturing method
08/06/2008EP1953805A1 Lighting optical system, exposure system, and exposure method
08/06/2008EP1953763A1 Scanning nanojet microscope and the operation method thereof
08/06/2008EP1953596A1 Positive type resist composition and resist pattern formation method using same
08/06/2008EP1953595A1 Radiation-sensitive resin composition
08/06/2008EP1953594A1 Flexo printing plate
08/06/2008EP1953593A1 Radiation-sensitive resin composition
08/06/2008EP1953578A1 Optical alignment tool and method of alignment
08/06/2008EP1953183A2 Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film
08/06/2008EP1953149A2 A heterocycle-containing onium salt
08/06/2008EP1953117A1 Scanning jet nanolithograph and the operation method thereof
08/06/2008EP1952201A2 Method of making a photopolymer printing plate
08/06/2008EP1951829A1 Water castable - water strippable top coats for 193 nm immersion lithography
08/06/2008EP1951512A1 Multilayer laminated structures
08/06/2008EP1951202A2 Isolated and fixed micro and nano structures and methods thereof
08/06/2008EP1846527B1 Multi-photon polymerizable pre-ceramic polymeric compositions
08/06/2008EP1709472B1 Catadioptric projection objective
08/06/2008EP1469037B1 Solvent-soluble block copolyimide composition and process for producing the same
08/06/2008EP1258060B1 Fast wavelength correction technique for a laser
08/06/2008EP0895706B2 Method and apparatus for generating x-ray or euv radiation
08/06/2008CN201097111Y Light cover box and light cover carrying box
08/06/2008CN201097110Y A measuring device for accurate aligning of up and down drone
08/06/2008CN201097109Y A precise motion platform
08/06/2008CN201097108Y Balanced vibration reduction precise positioning device
08/06/2008CN201097107Y Vertical micro-adjustment and gravity compensation machine
08/06/2008CN201097106Y Novel direct writing light recording device with focusing machine
08/06/2008CN201097105Y An automatic control and monitoring device for exhaust flow
08/06/2008CN201097104Y Full information presser
08/06/2008CN101238415A Lithographic apparatus and cleaning method therefor
08/06/2008CN101238414A Antireflective hardmask composition and its usage method
08/06/2008CN101238413A Antireflective hardmask composition and methods for using same
08/06/2008CN101238398A Method for manufacturing color filter, color filter and liquid crystal display
08/06/2008CN101236362A Photo-etching machine projection objective wave aberration on-line detection method
08/06/2008CN101236361A Protective hood for photomask and method for using the photomask
08/06/2008CN101236360A Method and apparatus for inspecting defects on mask
08/06/2008CN101236359A Inspection method and apparatus, lithographic apparatus, lithographic processing cell
08/06/2008CN101236358A Light source for exposure and exposure device using the same
08/06/2008CN101236357A Chemically amplified corrosion-resisitng agent composition
08/06/2008CN101236356A Photoresist composition, thin film patterning method using the same, and method of fabricating liquid crystal display using the same
08/06/2008CN101236355A Pattern transcription device and method of fabricating cliche for the same
08/06/2008CN101236323A Systems for displaying images and methods for fabricating the same
08/06/2008CN101236299A Sonic surface wave driven two-dimensional micro optical platform and method of manufacture
08/06/2008CN101236265A Optical sheet and method for fabricating the same
08/06/2008CN100409413C Processing method and processing system
08/06/2008CN100409320C Magnetic recording medium, recording/reproducing apparatus, and stamper
08/06/2008CN100409102C In-situ detection method for stray light in step scan projection mask aligner
08/06/2008CN100409101C Thick film photoresists and methods for use thereof
08/06/2008CN100409073C Alkali soluble resin, and composition containing the resin and capable of sensing optical activity
08/06/2008CN100409063C Light modulating engine
08/06/2008CN100409045C Polarization conversion element, lighting optical device, exposure system, and exposure method
08/05/2008US7409253 System and method for processing a substrate and program therefor
08/05/2008US7408716 Refractive projection objective for immersion lithography
08/05/2008US7408652 Device and method for the optical measurement of an optical system by using an immersion fluid
08/05/2008US7408631 Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask
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