| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/13/2008 | EP1956433A1 Method for forming photoresist pattern, method for manufacturing display panel, and method for manufacturing display device |
| 08/13/2008 | EP1956432A1 Methods and systems for improved immersion lithographic processing |
| 08/13/2008 | EP1956431A1 Exposure apparatus, exposure method and device manufacturing method |
| 08/13/2008 | EP1956430A1 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process |
| 08/13/2008 | EP1956429A1 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process |
| 08/13/2008 | EP1956428A2 Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and cyanine dyes |
| 08/13/2008 | EP1955871A1 Product with concave-convex pattern on its surface and method of forming the concave-convex pattern |
| 08/13/2008 | EP1955115A1 Apparatus for recycling alkane immersion liquids and methods of employment |
| 08/13/2008 | EP1955114A1 Lithographic apparatus |
| 08/13/2008 | EP1955113A1 Combined stepper and deposition tool |
| 08/13/2008 | EP1955112A2 A method of patterning a thin film |
| 08/13/2008 | EP1955111A1 Photopolymer printing form with reduced processing time |
| 08/13/2008 | EP1954504A1 Imageable members with improved chemical resistance |
| 08/13/2008 | EP1954472A1 Technique for separating a mold from solidified imprinting material |
| 08/13/2008 | EP1954409A1 Method and apparatus for control of layer thicknesses by spin coating |
| 08/13/2008 | EP1899115A4 Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an euv light source |
| 08/13/2008 | EP1733001A4 Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers |
| 08/13/2008 | EP1660944B1 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 08/13/2008 | EP1630606B1 Positive photosensitive composition |
| 08/13/2008 | EP1616344B1 Creation of a permanent structure with high three-dimensional resolution |
| 08/13/2008 | EP1567913A4 A chucking system and method for modulating shapes of substrates |
| 08/13/2008 | EP1443042B1 Hybrid onium salt |
| 08/13/2008 | EP0951054B1 Aligner and method for exposure |
| 08/13/2008 | CN101243361A Work transfer apparatus, image forming apparatus provided with such work transfer apparatus, and work transfer method |
| 08/13/2008 | CN101243360A Projection objective having a high aperture and a planar end surface |
| 08/13/2008 | CN101243359A Image-projecting system, such as a projection objective of a microlithographic projection exposure apparatus |
| 08/13/2008 | CN101243127A Dual-wavelength positive-working radiation-sensitive elements |
| 08/13/2008 | CN101243028A Fluorine-containing adamantane derivative, fluorine-containing adamantane derivative having polymerizable group, and resin composition containing same |
| 08/13/2008 | CN101242954A Printing plate registration using a camera |
| 08/13/2008 | CN101241859A Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium |
| 08/13/2008 | CN101241847A Method for forming a film pattern having a reduced pattern size |
| 08/13/2008 | CN101241841A Removal of process residues on the backside of a substrate |
| 08/13/2008 | CN101241319A Machine vision aligning system possessing mask target hierarchy and its alignment method |
| 08/13/2008 | CN101241318A Exposure apparatus and method, and device fabricating method using the same |
| 08/13/2008 | CN101241317A Exposure apparatus and method for producing device |
| 08/13/2008 | CN101241316A Lithography device and its manufacture method |
| 08/13/2008 | CN101241315A Asymmetric-type phase shift grating marker and its uses in photo-etching machine objective lens aberration detection |
| 08/13/2008 | CN101241314A 6 freedom degree precision positioning station capable of compensating Z-direction position |
| 08/13/2008 | CN101241313A Lithographic equipment aligning system based on machine vision and alignment method |
| 08/13/2008 | CN101241312A Photo-etching machine image-forming quality on-site measurement method |
| 08/13/2008 | CN101241311A Superimposed motor based material transmission system possessing mask station function and its method |
| 08/13/2008 | CN101241310A Liquid sealing unit and immersion photolithography apparatus having the same |
| 08/13/2008 | CN101241309A Method for calibrating sub-nanometer critical dimension using pitch offset |
| 08/13/2008 | CN101241308A Immersion photolithography system and method for exposing substrate |
| 08/13/2008 | CN101241307A Levelling focusing mechanism possessing great stroke control function |
| 08/13/2008 | CN101241306A Hologram recording material, process for producing the same and hologram recording medium |
| 08/13/2008 | CN101241305A Pigment -type photosensitive material |
| 08/13/2008 | CN101241304A Waterfast environment-friendly type rotary screen stenciling photoresist |
| 08/13/2008 | CN101241303A Semiconductor device and methods for controlling its patterns |
| 08/13/2008 | CN101241302A Preparation method for improving mask critical size trend |
| 08/13/2008 | CN101241300A Method, computer readable medium, device manufacture method and mask for performing decomposition of a pattern |
| 08/13/2008 | CN101241264A Liquid crystal display device having improved light guide plate |
| 08/13/2008 | CN101241260A Optical film and process for manufacture thereof, and substrate structure using same and display panel |
| 08/13/2008 | CN101240996A Method for making high-temperature micrometre size speckle |
| 08/13/2008 | CN101240129A Ink-jet ink composition used for photosensitive plate fabrication and fabricating method thereof |
| 08/13/2008 | CN100410811C Photoresist removing method and apparatus thereof |
| 08/13/2008 | CN100410810C Plus photoresist composition and resist pattern forming method |
| 08/13/2008 | CN100410809C Method for evaluating the effects of multiple exposure processes in lithography |
| 08/13/2008 | CN100410808C Negative photoresists for short wavelength imaging |
| 08/13/2008 | CN100410756C Colour light filter base plate and producing method thereof |
| 08/13/2008 | CN100410725C Improved method and apparatus using an SLM |
| 08/13/2008 | CN100410724C Manufacturing method of making comb-teeth electrode pair |
| 08/13/2008 | CN100410689C Aperture diaphragm assembly for high power laser beams |
| 08/13/2008 | CN100410359C Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
| 08/13/2008 | CN100410082C Manufacturing method of antifalse seal |
| 08/12/2008 | US7411780 A polyurethane containing ethylene glycol and an ethylenically unsaturated group; the display member has a post-firing pattern without any defects |
| 08/12/2008 | US7411687 Speckle reduction method and system for EUV interferometry |
| 08/12/2008 | US7411678 Alignment apparatus, control method thereof, exposure apparatus and method of manufacturing semiconductor device by exposure apparatus controlled by the same control method |
| 08/12/2008 | US7411656 Optically polarizing retardation arrangement, and a microlithography projection exposure machine |
| 08/12/2008 | US7411655 Load-lock technique |
| 08/12/2008 | US7411653 Lithographic apparatus |
| 08/12/2008 | US7411652 Lithographic apparatus and device manufacturing method |
| 08/12/2008 | US7411651 PSM alignment method and device |
| 08/12/2008 | US7411650 Immersion photolithography system and method using microchannel nozzles |
| 08/12/2008 | US7411203 EUV light source |
| 08/12/2008 | US7411201 Projection objective for a microlithographic projection exposure apparatus |
| 08/12/2008 | US7411097 1-trifluoro-2-trifluoromethyl-4-mercaptoisobutanol; chain transfer agent in addition polymerization reactions; copolymers for lithographic coating films for photoresist films and anti-reflective coatings |
| 08/12/2008 | US7410902 with a sulfur-containing detergent that forms a protective film to prevent corrosion of aluminum wires; used in the manufacture of a highly integrated semiconductor with advanced scale-down; e.g. oxalic acid, ammonium sulfate, ultrapure water |
| 08/12/2008 | US7410818 Thin film transistor, liquid crystal display using thin film transistor, and method of manufacturing thin film transistor |
| 08/12/2008 | US7410749 Method of fabricating micro-lens and method of fabricating optical module using the method |
| 08/12/2008 | US7410748 Controlling wavelength for etching photomask; antireflectivity layer; stabilization of photoresist pattern over layer to be etched ; photolithography |
| 08/12/2008 | US7410747 Resin containing a specific alkoxyhydroxystyrene skeleton, which is insoluble or hardly soluble in an alkali developer and becomes soluble in an alkali developer, an acid generator and an organic base; use in ultramicrolithography; resolution, sensitivity, good pattern profile, line edge roughness |
| 08/12/2008 | US7410746 Polymerization initiator comprises a compound having only one naphthalimide structure; radial generator comprises a compound having two or more naphthalimide structures, which also functions as a crosslinking agent |
| 08/12/2008 | US7410736 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones |
| 08/12/2008 | US7410735 Method of characterization, method of characterizing a process operation, and device manufacturing method |
| 08/12/2008 | US7410732 Process for producing a mask |
| 08/12/2008 | US7410592 Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate |
| 08/12/2008 | US7410543 Substrate processing method |
| 08/12/2008 | US7410265 Focusing-device for the radiation from a light source |
| 08/07/2008 | WO2008094607A1 Spectrally controlled high energy density light source photopolymer exposure system |
| 08/07/2008 | WO2008094542A1 Contact lithography apparatus and method employing substrate deformation |
| 08/07/2008 | WO2008093856A1 Positive resist composition and pattern forming method using the positive resist composition |
| 08/07/2008 | WO2008093669A1 Photosensitive glass paste and chip part with multilayer wiring |
| 08/07/2008 | WO2008093643A1 Photosensitive element |
| 08/07/2008 | WO2008093547A1 Resin for printing plate material, and planographic printing plate material using the same |
| 08/07/2008 | WO2008093543A1 Hollow structure forming substrate, method of producing the same, and method of producing hollow structure using the same |
| 08/07/2008 | WO2008093534A1 Reflective mask blank for euv lithography |
| 08/07/2008 | WO2008093513A1 Crosslinkable polymer compound and photosensitive resin composition containing the same |
| 08/07/2008 | WO2008093507A1 Radiation-sensitive resin composition |
| 08/07/2008 | WO2008092707A1 Optical alignment tool and method of alignment |