| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/23/2014 | CN103941544A 一种光刻胶及其制作方法、使用方法 A photoresist and its production method, using methods |
| 07/23/2014 | CN103941543A 一种基于聚丙交酯多元醇的光敏树脂组合物及其制备方法和光敏树脂 Polylactide based polyol photosensitive resin composition and its preparation method and the photosensitive resin |
| 07/23/2014 | CN103941542A 一种防紫外线布料的制备方法 Preparation method of UV fabric |
| 07/23/2014 | CN103941483A 彩色滤光片柱状隔垫物形状矫正方法 Color filter columnar shape correction method spacer material |
| 07/23/2014 | CN103941329A 一种套嵌光纤光栅滤波器的制备方法 A nested preparation of fiber grating filters |
| 07/23/2014 | CN103941319A 一种全息凹面闪耀光栅的母板及其制备方法 Motherboard and preparation method holographic concave grating blazed |
| 07/23/2014 | CN103936641A 树枝状化合物,光刻胶组合物和制备电子设备的方法 The method of dendrimers, the photoresist composition and preparation of the electronic device |
| 07/23/2014 | CN102880017B 光刻胶用剥离液组合物及其制备和应用 Photoresist stripping liquid composition with its preparation and application |
| 07/23/2014 | CN102854752B 接近式曝光装置 Proximity exposure apparatus |
| 07/23/2014 | CN102819182B 光掩模基板及制造方法、光掩模制造方法和图案转印方法 A photomask substrate and a manufacturing method and a manufacturing method of a photomask pattern transfer method |
| 07/23/2014 | CN102786662B 含有重氮基团的高分子感光剂及其制备方法与光刻胶组合物 Diazo group containing polymeric photosensitive agent and preparation method and photoresist compositions |
| 07/23/2014 | CN102754029B 感光性树脂组合物、结构体的制造方法和液体排出头 The photosensitive resin composition, manufacturing method and the liquid discharge head of the structure |
| 07/23/2014 | CN102736402B 光掩模用基板、光掩模、光掩模制造方法及图案转印方法 A photomask substrate, a photomask, the photomask manufacturing method, and a pattern transfer method |
| 07/23/2014 | CN102543683B 光刻工艺的返工方法 Rework method lithography process |
| 07/23/2014 | CN102455602B 确定曝光条件和掩模图案的方法 To determine the exposure conditions and the mask pattern methods |
| 07/23/2014 | CN102455600B 检测晶片表面形貌的方法 Detection methods wafer surface topography |
| 07/23/2014 | CN102402141B 自参考干涉仪、对准系统和光刻设备 Since the reference interferometer, the alignment system and lithography equipment |
| 07/23/2014 | CN102171612B 感光性树脂组合物、使用其的物品以及负型图案形成方法 The photosensitive resin composition using the same type of items, and a negative pattern forming method |
| 07/23/2014 | CN102112438B 肟酯光敏引发剂 Oxime ester photoinitiator |
| 07/23/2014 | CN102099744B 光刻设备内的收集器装置的对准 Aligning the lithographic apparatus collector device |
| 07/23/2014 | CN101916051B 形成微电子结构的方法 The method of forming a microelectronic structure |
| 07/23/2014 | CN101846877B 掩模板制造方法、掩模制造方法、掩模板透明基片制造方法 Mask manufacturing method, a method of manufacturing a mask, the transparent mask substrate manufacturing method |
| 07/23/2014 | CN101720450B 对光学光刻系统中的扇区极化照明源进行建模的方法和设备 The optical lithography system of the sector polarized illumination source modeling method and apparatus |
| 07/23/2014 | CN101561634B 一种获取光刻机最佳参数的方法及装置 An optimal parameters obtained lithography method and apparatus |
| 07/23/2014 | CN101135849B 抗蚀覆盖膜形成材料、抗蚀图案形成方法、电子器件及其制造方法 The resist cover film-forming material, the resist pattern forming method and a manufacturing method of an electronic device |
| 07/22/2014 | US8788242 Pattern measurement apparatus |
| 07/22/2014 | US8786832 Shear-layer chuck for lithographic apparatus |
| 07/22/2014 | US8786831 Positioning apparatus |
| 07/22/2014 | US8786829 Exposure apparatus, exposure method, and device manufacturing method |
| 07/22/2014 | US8786828 Lithographic apparatus and device manufacturing method |
| 07/22/2014 | US8786827 Method and apparatus for measurement of exit pupil transmittance |
| 07/22/2014 | US8786826 Arrangement for actuating an element in a microlithographic projection exposure apparatus |
| 07/22/2014 | US8785989 Semiconductor constructions |
| 07/22/2014 | US8785895 Target supply apparatus, chamber, and extreme ultraviolet light generation apparatus |
| 07/22/2014 | US8785893 Extreme ultraviolet light source and positioning method of light focusing optical means |
| 07/22/2014 | US8785115 Photoresist removal method and patterning process utilizing the same |
| 07/22/2014 | US8785114 Method for manufacturing micro-structure |
| 07/22/2014 | US8785113 Method and materials for reverse patterning |
| 07/22/2014 | US8785112 Reticle defect correction by second exposure |
| 07/22/2014 | US8785111 Hydrophilic nanoporous materials |
| 07/22/2014 | US8785110 Liquid ejection head and method of manufacturing the same |
| 07/22/2014 | US8785109 Method of developing a lithographic printing plate including post heating |
| 07/22/2014 | US8785108 Structure for pattern formation, method for pattern formation, and application thereof |
| 07/22/2014 | US8785107 Lithographic printing plate precursor |
| 07/22/2014 | US8785106 Resist composition and method of forming resist pattern |
| 07/22/2014 | US8785105 Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method |
| 07/22/2014 | US8785104 Resist composition and pattern forming method using the same |
| 07/22/2014 | US8785103 Photosensitive novolac resin, positive photosensitive resin composition including same, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film |
| 07/22/2014 | US8785087 Pigment-dispersed composition, curable composition, color filter and production method thereof |
| 07/22/2014 | US8785085 Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 07/22/2014 | US8783181 Detecting an unsecured state of a mandrel |
| 07/17/2014 | WO2014108528A2 Polarization measuring device, lithography apparatus, measuring arrangement, and method for polarization measurement |
| 07/17/2014 | WO2014108385A1 Method of making a lithographic printing plate |
| 07/17/2014 | WO2014076009A3 Position measurement system, grating for a position measurement system and method |
| 07/17/2014 | US20140199638 Negative developing method and negative developing apparatus |
| 07/17/2014 | US20140199637 Pattern forming process |
| 07/17/2014 | US20140199636 Sub-diffraction-limited patterning and imaging via multi-step photoswitching |
| 07/17/2014 | US20140199634 Method of Measuring a Characteristic |
| 07/17/2014 | US20140199633 Process for producing liquid ejection head |
| 07/17/2014 | US20140199632 Patterning process, resist composition, polymer, and monomer |
| 07/17/2014 | US20140199631 Monomer, polymer, resist composition, and patterning process |
| 07/17/2014 | US20140199630 Sulfonium salt, resist composition and patterning process |
| 07/17/2014 | US20140199629 Sulfonium salt, resist composition, and patterning process |
| 07/17/2014 | US20140199628 Lithographic material stack including a metal-compound hard mask |
| 07/17/2014 | US20140199618 Methods of measuring overlay errors in area-imaging e-beam lithography |
| 07/17/2014 | US20140199617 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device |
| 07/17/2014 | US20140199543 Reflective optical element and optical system for euv lithography |
| 07/17/2014 | US20140199528 Method for producing pattern phase difference film, pattern phase difference film, and image display device |
| 07/17/2014 | US20140199518 Facile Large Area Periodic Sub-Micron Photolithography |
| 07/17/2014 | US20140199038 High refractive index cladding material and electro-optical polymer optical waveguide |
| 07/17/2014 | US20140198307 Interferometer system, lithography apparatus, and article manufacturing method |
| 07/17/2014 | US20140198306 Multilayer mirror, method of producing a multilayer mirror and lithographic apparatus |
| 07/17/2014 | US20140198285 Colored photosensitive composition, color filter and process for producing same, and liquid-crystal display device |
| 07/17/2014 | DE112012004378T5 Träger für lithografische Druckplatten und lichtempfindliche lithografische Negativ-Druckplatte Support for lithographic printing plates and photosensitive lithographic printing plate negative |
| 07/17/2014 | DE102013212957A1 Verfahren zur Entladung von Photolithographiemasken und Vorrichtung hierfür Process for the discharge of photolithography masks and apparatus therefor |
| 07/17/2014 | DE102013200394A1 Polarisationsmessvorrichtung, Lithographieanlage, Messanordnung, und Verfahren zur Polarisationsmessung Polarization measurement device lithography system, measuring system, and method for polarization measurement |
| 07/17/2014 | DE102013200368A1 Kollektorspiegeleinheit für die Halbleiterlithographie Collector mirror unit for semiconductor lithography |
| 07/16/2014 | EP2755088A1 Method of making a lithographic printing plate |
| 07/16/2014 | EP2755087A1 Flexographic printing original plate and water-developable photosensitive resin laminate |
| 07/16/2014 | EP2753981A1 Method of making a lithographic printing plate |
| 07/16/2014 | EP2753980A1 Support structure for wafer table |
| 07/16/2014 | EP2753979A1 Vibration isolation module and substrate processing system |
| 07/16/2014 | EP2753961A2 High aspect ratio structure and method for manufacturing the same |
| 07/16/2014 | CN203720804U 触控显示面板 Touch display panel |
| 07/16/2014 | CN203720531U 一种可改善pcb板开短路的溢流装置 One kind can improve the pcb board shorts open overflow device |
| 07/16/2014 | CN203720530U 一种三区显影机 A three-zone Developers |
| 07/16/2014 | CN203720529U 扫描曝光装置 The scanning exposure apparatus |
| 07/16/2014 | CN203720528U 光刻机偏振照明系统光瞳偏振态测量装置 Lithography polarized illumination system pupil polarization state measuring device |
| 07/16/2014 | CN203720527U 光罩夹具 Reticle clamp |
| 07/16/2014 | CN203720526U 掩模传输版库设备 Mask transmission version of the library |
| 07/16/2014 | CN203720525U 一种可控的万能光罩 A controlled universal mask |
| 07/16/2014 | CN103930969A 半导体制造用薄膜涂布装置 Coated with a thin film semiconductor manufacturing equipment |
| 07/16/2014 | CN103930829A 基板处理装置 The substrate processing apparatus |
| 07/16/2014 | CN103930828A 杂化光致抗蚀剂组合物和使用它的图案形成方法 Hybrid photoresist composition and a pattern forming method using it |
| 07/16/2014 | CN103930805A 在euv反射镜上制造由氧化硅构成的覆盖层的方法、euv反射镜和euv光刻设备 The method of producing a silicon oxide coating layer formed on a euv mirror, euv mirror and a lithographic apparatus euv |
| 07/16/2014 | CN103928395A 三维叠层半导体装置及其制造方法 A three-dimensional stack of semiconductor device and manufacturing method |
| 07/16/2014 | CN103927939A 图像显示装置的制造方法 The image display device manufacturing method |
| 07/16/2014 | CN103926809A 一种基板的制备方法 Method for preparing a substrate |
| 07/16/2014 | CN103926807A 一种硅片对准方法 One kind of wafer alignment method |
| 07/16/2014 | CN103926806A 一种实现光瞳偏振态任意分布的光刻照明系统设计方法 A lithographic illumination system design methodology pupil arbitrary distribution of the polarization state of realization |