| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/20/2008 | EP1564232B1 Photosensitive resin composition and process for the formation of hydrogel |
| 08/20/2008 | EP1095393B1 System and method to correct for distortion caused by bulk heating in a substrate |
| 08/20/2008 | CN101248393A Developing solution and treatment method for photosensitive lithographic printing plate |
| 08/20/2008 | CN101248392A Optical imaging arrangement |
| 08/20/2008 | CN101248391A Lithographic coated-type underlayer film forming composition containing vinylnaphthalene resin derivative |
| 08/20/2008 | CN101248390A Positive photoresist composition, thick film photoresist laminate, method for producing thick film resist pattern, and method for producing connecting terminal |
| 08/20/2008 | CN101247964A Original plate for lithography, and resin composition for photosensitive layer in original plate for lithography |
| 08/20/2008 | CN101246833A Substrate position detecting method, substrate processing method and device |
| 08/20/2008 | CN101246317A Cleaning composition for semiconductor substrates |
| 08/20/2008 | CN101246316A Component-recoverable integrated circuit cleaning fluid |
| 08/20/2008 | CN101246315A Photoresist cleaning fluid composition and its application |
| 08/20/2008 | CN101246314A Silicon slice alignment signal collecting and processing system and processing method using the same |
| 08/20/2008 | CN101246313A Optical short distance amending method |
| 08/20/2008 | CN101246312A Recycling of large-size photomask substrate |
| 08/20/2008 | CN101246311A Photo resist air bubble eliminating system and method thereof |
| 08/20/2008 | CN101246310A Negative fluorine-contained photoresist composition and its application in polymer optical waveguide device |
| 08/20/2008 | CN101246309A Photoresist mask forming method |
| 08/20/2008 | CN101246308A Plastic film product pressure printing technology |
| 08/20/2008 | CN101246307A Method for manufacturing autogram template by semiconductor technology and autogram template manufactured by the same |
| 08/20/2008 | CN101246305A Graphic method |
| 08/20/2008 | CN101246285A Method for producing light sensitive spacer |
| 08/20/2008 | CN101246259A Minitype optical device and method for producing the same |
| 08/20/2008 | CN101246231A Semi-reflective semi-permeable colorful color filter |
| 08/20/2008 | CN101246230A Semi-permeable colorful color filter |
| 08/20/2008 | CN101246225A Aspheric lens structures and fabrication methods thereof |
| 08/20/2008 | CN100413112C Imaging device in a projection exposure facility |
| 08/20/2008 | CN100413027C Device manufacturing method |
| 08/20/2008 | CN100413026C Photomask, light spot detector and detecting method |
| 08/20/2008 | CN100413019C Substrate treating apparatus |
| 08/20/2008 | CN100412697C Method for manufacturing substrate for discrete track recording media and method for manufacturing discrete track recording media |
| 08/20/2008 | CN100412696C Band workpiece transporter |
| 08/20/2008 | CN100412695C Method for manufacturing offset printing apparatus and device |
| 08/20/2008 | CN100412632C Manufacturing method of array substrate of semi-reflection semi-penetration liquid crystal display |
| 08/19/2008 | US7415318 Method and apparatus for manufacturing semiconductor device |
| 08/19/2008 | US7414794 Optical arrangement of autofocus elements for use with immersion lithography |
| 08/19/2008 | US7414785 Ultraviolet polarization beam splitter with minimum apodization |
| 08/19/2008 | US7414759 Scanner linearity tester |
| 08/19/2008 | US7414713 Method of measuring focal point, instrument used therefor, and method of fabricating semiconductor device |
| 08/19/2008 | US7414701 Method and systems for total focus deviation adjustments on maskless lithography systems |
| 08/19/2008 | US7414240 Particle remover, exposure apparatus having the same, and device manufacturing method |
| 08/19/2008 | US7413849 Substituted benzene developing solvent for photopolymerizable printing plates |
| 08/19/2008 | US7413846 Fabrication methods and structures for micro-reservoir devices |
| 08/19/2008 | US7413845 use of a high activation energy chemically amplified photoresist (CARS) that is contacted with a low pH high saturation magnetic moment plating solution to form a magnetic head component that is essentially free of plating defects |
| 08/19/2008 | US7413844 Lithographic printing plate support and method of manufacturing the same |
| 08/19/2008 | US7413843 Sulfonamide compound, polymer compound, resist material and pattern formation method |
| 08/19/2008 | US7413831 for extreme ultraviolet light; lithography process for forming a circuit pattern; miniaturization of a transferred image possible |
| 08/19/2008 | US7413830 Lithograph with one-dimensional trigger mask and method of producing digital holograms in a storage medium |
| 08/19/2008 | US7413608 Crystallization apparatus, crystallization method, and phase shifter |
| 08/19/2008 | US7413586 In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles |
| 08/14/2008 | WO2008097495A1 Three-dimensional particles and related methods including interference lithography |
| 08/14/2008 | WO2008096835A1 Substrate processing method and coating/developing apparatus |
| 08/14/2008 | WO2008096782A1 Photosensitive resin composition, transfer film, and method of forming pattern |
| 08/14/2008 | WO2008096673A1 Photosensitive planographic printing plate material |
| 08/14/2008 | WO2008096601A1 Photosensitive polyimide resin composition |
| 08/14/2008 | WO2008096364A2 Method and system for measurng in patterned structures |
| 08/14/2008 | WO2008096263A2 Photoresist composition |
| 08/14/2008 | WO2008095994A1 Photopolymerizable flexographic printing elements and hard flexographic printing formes which are produced therefrom |
| 08/14/2008 | WO2008095801A2 Blue phthalocyanine pigment composition and its preparation |
| 08/14/2008 | WO2008095695A2 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus |
| 08/14/2008 | WO2008067394A3 Imprint lithography with improved substrate/mold separation |
| 08/14/2008 | WO2008039068A3 Radiation system and lithographic apparatus comprising the same |
| 08/14/2008 | WO2008030950A3 Method of mask making to prevent phase edge and overlay shift for chrome-less phase shifting mask |
| 08/14/2008 | WO2007016109A8 Imageable printing plate for on-press development |
| 08/14/2008 | US20080193883 Includes compound whose alkali-insoluble property is changed to an alkali-soluble property by an alkaline solution such as aqueous cesium sulfate or phosphoric acid solution; selectively irradiating the resist film through the barrier film (polylactone) with exposing light; lithography |
| 08/14/2008 | US20080193882 Forming intermediate layer pattern by etching intermediate film with first resist pattern used as a mask; high resolution attained by double patterning; treatment with acetic, formic, methansulfonic, or butanesulfonic acid; immersion lithography; crosslinking, annealing |
| 08/14/2008 | US20080193881 Writing a pattern by irradiating photosensitive material with a charged-particle beam; dividing pattern into X and Y segments; overlapping and writing with a half of the dose normally used; positional and dimensional accuracy; lithography, data processing |
| 08/14/2008 | US20080193880 Water Soluble Resin Composition and Method for Pattern Formation Using the Same |
| 08/14/2008 | US20080193879 Self-topcoating photoresist for photolithography |
| 08/14/2008 | US20080193878 Resist composition and pattern forming method using the same |
| 08/14/2008 | US20080193877 Curable, water soluble polymer comprising phenylalkyl vinyl ether derivative and comonomers of vinyl alcohol, vinyl acetate, vinyl acetal, acrylic acid, and/or methacrylic acid; water miscible solvent and crosslinking agent; forming interfacial layer on photoresist pattern; etching, masking, baking |
| 08/14/2008 | US20080193876 Solution comprising aqueous solution containing a water-soluble and/or alkali-soluble vinylimidazoline-vinylpyrrolidone type copolymer; and an aliphatic alcohol and/or alkyl-etherified compound; selectively exposing photoresist film through a mask pattern, heat treatment, and development |
| 08/14/2008 | US20080193875 First and second organic layers are both thicker than sacrificial layer and can be adjusted according to wavelengths of light sources used in exposure; by adjusting thicknesses of sacrificial and first organic layer, the composite photoresist structure is thick enough to block etching; photolithography |
| 08/14/2008 | US20080193874 Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography |
| 08/14/2008 | US20080193873 Changing light absorption by disruption of conjugation |
| 08/14/2008 | US20080193872 Compositions and processes for immersion lithography |
| 08/14/2008 | US20080193871 Positive Resist Composition For Immersion Exposure and Method of Forming Resist Pattern |
| 08/14/2008 | US20080193864 Masks for performing in-situ synthesis on probes, comprising light-transmitting regions and light-blocking regions, and a proportion of the light-transmitting regions is equal to or greater than 5% of a total proportion of the light-transmitting and light-blocking regions in each mask |
| 08/14/2008 | US20080193863 Mask having light-transmitting regions and light-blocking regions, each probe cell corresponding to a light-transmitting region or a light-blocking region, and a pattern of each light-transmitting region is corrected for an optical proximity effect |
| 08/14/2008 | US20080193858 Acrylic, styryl, methacrylic substituents of benzene rings joined through a ketone |
| 08/14/2008 | US20080193790 Drum For a Machine Producing a Patterned Nonwoven and Obtained Fabric |
| 08/14/2008 | US20080193718 Positive Photosensitive Resin Compositions, and Relief Patterns and Solid-State Image Sensors Made Thereof |
| 08/14/2008 | US20080192330 Preservation method of microcapsules for electrophoretic display devices and its applications |
| 08/14/2008 | US20080192313 Holographic memory and holographic recording apparatus |
| 08/14/2008 | US20080192257 Inspection apparatus and inspection method for pattern profile, and exposure apparatus |
| 08/14/2008 | US20080192226 Stage Unit, Exposure Apparatus, and Exposure Method |
| 08/14/2008 | US20080192221 Method for determining lithographic focus and exposure |
| 08/14/2008 | US20080192220 Method for adjusting a projection objective |
| 08/14/2008 | US20080192219 Lithographic apparatus and device manufacturing method |
| 08/14/2008 | US20080192216 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| 08/14/2008 | DE19964382B4 Verwendung einer Beschichtungszusammensetzung zur Herstellung einer nicht reflektierenden Beschichtung und Verfahren zur Herstellung der Beschichtungszusammensetzung Use of a coating composition for producing a non-reflective coating and methods for making the coating composition |
| 08/14/2008 | DE19907700B4 Polymermaterial für ein Photoresist, dieses enthaltende Photoresistzusammensetzung und Herstellungsverfahren hierfür Polymeric material for a photoresist containing it photoresist composition and manufacturing method thereof |
| 08/14/2008 | DE112006001768T5 Verwendung eines superkritischen Fluids zum Trocknen der Schreiben und zum Reinigen der Linsen in einer Immersionslithographie Using a supercritical fluid to dry the letter and for cleaning the lenses in an immersion lithography |
| 08/14/2008 | DE10361384B4 Strukturübertragung bei der Bauelementeherstellung Pattern transfer in the device fabrication |
| 08/14/2008 | DE10355264B4 Verfahren zur Verbesserung eines Simulationsmodells der photolithographischen Projektion A method for improving a simulation model of the photolithographic projection |
| 08/14/2008 | DE102007006378A1 Fotopolymerisierbare zylindrische endlos-nahtlose Flexodruckelemente und daraus hergestellte harte Flexodruckformen Photopolymerizable cylindrical endless-seamless flexographic printing and flexographic printing plates made therefrom hard |
| 08/14/2008 | DE102007005875A1 Optical element's e.g. multi mirror array, surface changes determining device for use during production of finely structured semiconductor component, has measuring illumination device to illuminate optical element with measuring rays bundle |
| 08/14/2008 | DE102005044141B4 Belichtungsgerät und Verfahren zum Betrieb eines Belichtungsgeräts An exposure apparatus and method for operating an exposure device |
| 08/14/2008 | DE102005030338B4 Verfahren zum Herstellen eines Flüssigkristalldisplays unter Verwendung eines Femotsekundenlaser-Dünnfilm-Ätzverfahrens A method of manufacturing a liquid crystal display using a thin film etching method Femotsekundenlaser |
| 08/14/2008 | CA2673741A1 Blue phthalocyanine pigment composition and its preparation |
| 08/13/2008 | EP1956434A2 Lithographic apparatus and methods for use thereof |