| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 08/27/2008 | CN101251725A Aligning system, mark, method for lithographic device and lithographic device thereof |
| 08/27/2008 | CN101251724A Aligning system, method for lithographic device and lithographic device thereof |
| 08/27/2008 | CN101251723A Negative colorful photoresist degumming agent and method for preparing the same |
| 08/27/2008 | CN101251722A Positive photoresist striping liquid and method for making the same |
| 08/27/2008 | CN101251721A Developing spray nozzle structure and method for spraying developing solution |
| 08/27/2008 | CN101251720A Automatic developing apparatus and method |
| 08/27/2008 | CN101251719A Method for minimizing precipitation of developing reactant by reducing ph value mutation |
| 08/27/2008 | CN101251718A Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| 08/27/2008 | CN101251717A Micro-electronics apparatus and manufacture method thereof |
| 08/27/2008 | CN101251716A Photoresist composition, coating method thereof, method of forming organic film pattern using the same and display device fabricated thereby |
| 08/27/2008 | CN101251715A Photolithography method capable of improving graphical quality |
| 08/27/2008 | CN101251714A Method for making semi-penetrating reflecting film colourful optical filter |
| 08/27/2008 | CN101251713A Method for deep-UV lithography making T type gate |
| 08/27/2008 | CN101251712A Mask territory verification method in semiconductor fabrication process |
| 08/27/2008 | CN101251698A Liquid crystal display panel and method for making the same |
| 08/27/2008 | CN101251617A Method for manufacturing micro architecture body |
| 08/27/2008 | CN101249937A Method for processing micron/submicron sized block sample |
| 08/27/2008 | CN100414438C Exposure device |
| 08/27/2008 | CN100414437C Sun sensor optical mask and manufacturing method therefor |
| 08/27/2008 | CN100414367C Liquid crystal display structure and its producing method |
| 08/27/2008 | CN100413898C Polymeric compositions and uses therefor |
| 08/27/2008 | CN100413778C Micro-structure and its fabrication method |
| 08/26/2008 | US7418125 Position detection technique |
| 08/26/2008 | US7418124 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns |
| 08/26/2008 | US7417711 Lithographic apparatus and device manufacturing method |
| 08/26/2008 | US7417708 Extreme ultraviolet exposure apparatus and vacuum chamber |
| 08/26/2008 | US7417104 Porous film-forming composition, patterning process, and porous sacrificial film |
| 08/26/2008 | US7417016 Composition for the removing of sidewall residues |
| 08/26/2008 | US7416837 A curable protective coatings for reducing an edge roughness during forming a small and fine pattern |
| 08/26/2008 | US7416836 Developing solution for lithographic printing plate precursor and method for making lithographic printing plate |
| 08/26/2008 | US7416835 Image recording layer of negative working lithographic printing plate precursor; infrared sensitivity, storage stability, printing durability; compound which causes decarboxylation and/or dehydration by heat; radical initiator, ethylenically unsaturated monomer and infrared absorber |
| 08/26/2008 | US7416833 Photoresist undercoat-forming material and patterning process |
| 08/26/2008 | US7416832 A silicone resin is used as a base resin it is used in combination with a specific acid generator; mask linearity; capable of forming a resist pattern having good shape |
| 08/26/2008 | US7416830 positive-working, aqueous base developable photosensitive polybenzoxazole (PBO) precursor compositions of polyamides where the hydroxyl groups of the dihydroxydiamine monomer unit may be sulfonated with a quinonediazide, a diazonaphthoquinone photoactive compound, and a solvent; relief images |
| 08/26/2008 | US7416822 Resin and resin composition |
| 08/26/2008 | US7416821 Thermally cured undercoat for lithographic application |
| 08/26/2008 | US7416818 Switchable volume hologram materials and devices |
| 08/26/2008 | US7416762 Method of manufacturing lithographic printing plate |
| 08/26/2008 | US7416574 Filter apparatus, exposure apparatus, and device-producing method |
| 08/21/2008 | WO2008100143A1 Apparatus with plasma radiation source, method of forming a beam of radiation and lithographic apparatus |
| 08/21/2008 | WO2008099903A2 Fine pattern transfer material |
| 08/21/2008 | WO2008099869A1 Compound for photoacid generator, resist composition using the same, and pattern-forming method |
| 08/21/2008 | WO2008099795A2 Imprint method and imprint apparatus |
| 08/21/2008 | WO2008099732A1 Composition for forming cured film pattern, and method for producing cured film pattern by using the same |
| 08/21/2008 | WO2008099727A1 Α-substituted acrylate derivative and method for producing the same |
| 08/21/2008 | WO2008099725A1 Polymeric compound, resist composition, and method for formation of resist pattern |
| 08/21/2008 | WO2008099709A1 Positive-type photosensitive resin composition |
| 08/21/2008 | WO2008099655A1 Photosensitive resin composition and layered product |
| 08/21/2008 | WO2008099621A1 Composition for under-resist film formation and under-resist film formed from the same |
| 08/21/2008 | WO2008099620A1 Composition for antireflection film formation and method of forming resist pattern with the same |
| 08/21/2008 | WO2008078993A3 Lithographic apparatus and method of measuring contamination |
| 08/21/2008 | WO2008064859A3 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations |
| 08/21/2008 | WO2008059440A3 Double patterning for lithography to increase feature spatial density |
| 08/21/2008 | WO2008055054A3 Devices and methods for pattern generation by ink lithography |
| 08/21/2008 | US20080199817 Resist pattern forming method |
| 08/21/2008 | US20080199816 Method of Automatic Fluid Dispensing for Imprint Lithography Processes |
| 08/21/2008 | US20080199815 Forming projections in grooves between partitions and phosphor layers; increasing area where phosphor adheres; brightness |
| 08/21/2008 | US20080199812 Producing heat sensitive elements having pressure, abrasion, fingerprint and/or suction cup resistance; coating support with solution containing infrared absorbing agent, hydrophobic thermoplastic polymer particles, hydrophilic binder and polymer having siloxane and/or perfluoroalkyl monomeric units |
| 08/21/2008 | US20080199811 Photosensitive composition and two-photon absorption photorecording medium |
| 08/21/2008 | US20080199810 Reacting such as polyether sulfone or carbonyl having haloalkyl substituents with allyl alcoholate or allylphenolate; forming allyl ether groups capable of reacting with peroxide to form crosslinkable epoxy groups; thermal ink jet printing |
| 08/21/2008 | US20080199809 Light toughness and recording characteristics in short wavelength region; containing metallized phthalocyanine dye having absorption close to blue ray laser beam |
| 08/21/2008 | US20080199808 Light toughness and recording characteristics in short wavelength region; containing metallized phthalocyanine dye having absorption close to blue ray laser beam |
| 08/21/2008 | US20080199806 Reducing pitch between patterns by half; applying positive resist comprising acid generator and 7-oxanorbornane ring bearing acrylic copolymer with acid labile groups; heat treating and exposing to high energy radiation, second heat treatment with developer then crosslinking |
| 08/21/2008 | US20080199805 High resolution relief images; wide manufacturing latitude; photospeed; enhanced tunable oxygen plasma etch resistance |
| 08/21/2008 | US20080199804 Including free radical binder polymer containing functional group having dipole moment of 3.8 debye; laser computer controlled direct plate making without alkali development; sensitivity, printing durability |
| 08/21/2008 | US20080199782 photosensitive substituted azobenzene macromolecule haaving a photoisomerization group, and a polymerized or ligh or heat crosslinked reactive molecule having intrinsic birefringence |
| 08/21/2008 | US20080199665 Multilayer silver halide emulsion elements; transparent flexible support between photosensitive layers; imagewise exposure; conductive track patterns; printed circuits; display devices |
| 08/21/2008 | US20080199126 Method for Printing a Near Field Photoinduced Stable Structure, and Optical Fiber Tip for Implementing Same |
| 08/21/2008 | US20080198353 Projection Objective, Projection Exposure Apparatus and Reflective Reticle For Microlithography |
| 08/21/2008 | US20080198352 Optical Module for an Objective |
| 08/21/2008 | US20080198350 Multiple exposure method |
| 08/21/2008 | US20080197862 Proportional Variable Resistor Structures to Electrically Measure Mask Misalignment |
| 08/21/2008 | US20080197297 High repetition rate laser produced plasma EUV light source |
| 08/21/2008 | US20080197295 Device And Method For Producing Resist Profiled Elements |
| 08/21/2008 | US20080197294 Manufacturing method of circuit board |
| 08/21/2008 | DE112006001162T5 Verfahren zur Verbesserung der optischen Stabilität von dreidimensionalen, mikrogeformten Produkten A method for improving the optical stability of the three-dimensional, microporous shaped products |
| 08/21/2008 | DE102007016321B3 Structured resist layer manufacturing method for structuring e.g. reticle mask substrate, involves lithographically exposing resist layer covered with inorganic layer, and structuring resist layer by etching to form structured layer |
| 08/21/2008 | DE102007008448A1 Verfahren zur Herstellung von Spiegelfacetten für einen Facettenspiegel Process for the preparation of mirror facets for a faceted mirror |
| 08/21/2008 | DE102007007907A1 Verfahren zur Herstellung eines diffraktiven optischen Elements, nach einem derartigen Verfahren hergestelltes diffraktives optisches Element, Beleuchtungsoptik mit einem derartigen diffratkiven optischen Element, Mikrolithografie-Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik, Verfahren zum Herstellen eines mikroelektronischen Bauelements unter Verwendung einer derartigen Projektionsbelichtungsanlage sowie mit einem solchen Verfahren hergestelltes Bauelement A process for producing a diffractive optical element, produced according to such a method, a diffractive optical element, the illumination optics having such diffratkiven optical element microlithography projection exposure system manufactured with such an illuminating optical system, method for manufacturing a microelectronic device using such a projection exposure apparatus, and by such a method component part |
| 08/21/2008 | DE102007007719A1 Verfahren zur Strukturierung einer Schicht auf einem Substrat Process for structuring a layer on a substrate |
| 08/21/2008 | DE102005034890B4 Optisches System und Strahlaufweitungsanordnung mit Wellenfront-Korrekturflächen The optical system and beam expander assembly with wavefront correction surfaces |
| 08/20/2008 | EP1959303A1 Cleaning solution for semiconductor device or display device, and cleaning method |
| 08/20/2008 | EP1959302A2 Method for manufacturing a diffractive optical element and diffractive optical element manufactured according to a method of this type |
| 08/20/2008 | EP1959301A1 Spin coating device and method |
| 08/20/2008 | EP1959300A1 Resist composition and pattern forming method using the same |
| 08/20/2008 | EP1959299A2 Pattern replication with intermediate stamp |
| 08/20/2008 | EP1959298A2 Method for structuring a layer onto a substrate |
| 08/20/2008 | EP1959158A1 Method for customising an oscillation isolation system |
| 08/20/2008 | EP1959149A2 Air bearing taking high frequency resonances into account |
| 08/20/2008 | EP1958028A1 Developer solution and process for use |
| 08/20/2008 | EP1958027A1 Radiation system and lithographic apparatus |
| 08/20/2008 | EP1958026A1 Local control of heat flow to more accurately regulate machine temperatures |
| 08/20/2008 | EP1958025A2 Method for expelling gas positioned between a substrate and a mold |
| 08/20/2008 | EP1957457A1 Oxime ester photoinitiators |
| 08/20/2008 | EP1957418A1 Method for surface structuring of a glass product, glass product with structured surface and uses |
| 08/20/2008 | EP1957249A2 Method and system for double-sided patterning of substrates |
| 08/20/2008 | EP1828847B1 Three-dimensional structures for an ink jet printhead and relevant manufacturing process |
| 08/20/2008 | EP1721120A4 Method and system to measure characteristics of a film disposed on a substrate |
| 08/20/2008 | EP1700167B1 Lithography objective with replacement apparatus for an optical element and manufacturing method using the lithography objective |
| 08/20/2008 | EP1698481B1 Lithographic printing original plate and lithographic printing plate |