| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/02/2008 | US7419770 Manufacturing method of optical device provided with resin thin film having micro-asperity pattern |
| 09/02/2008 | US7419769 For application onto a substrate of an electronic part, patterning, then plating to form a bump; alkali developable; protective devices |
| 09/02/2008 | US7419767 Photomasks; suppresses optical proximity effect to improve resolution; photolithography; semiconductors |
| 09/02/2008 | US7419766 Flexographic printing plate precursor and imaging method |
| 09/02/2008 | US7419765 Engraving a printing relief on a flexographic printing element that can be laser engraved, said element having a photochemically cross-linked relief layer, transparent and comprises oxidic, siliceous or zeolitic solid matter |
| 09/02/2008 | US7419763 Near-field exposure photoresist and fine pattern forming method using the same |
| 09/02/2008 | US7419761 Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same |
| 09/02/2008 | US7419760 Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern |
| 09/02/2008 | US7419759 Photoresist composition and method of forming a pattern using the same |
| 09/02/2008 | US7419758 Lithographic printing plate precursor and lithographic printing method |
| 09/02/2008 | US7419757 substrate; a light-to-heat conversion layer covering substrate; a transfer layer overlaying the light-to-heat conversion layer includes multiple micro or nanostructured features extending into transfer layer, a donor film is configured for transfer of a portion of transfer layer on receptor in pattern |
| 09/02/2008 | US7419549 Nozzle assembly for applying a liquid to a substrate |
| 09/02/2008 | US7418993 Method and apparatus for production of a cast component |
| 08/28/2008 | WO2008103776A2 Thermally cured underlayer for lithographic application |
| 08/28/2008 | WO2008103700A2 Process condition measuring device |
| 08/28/2008 | WO2008103258A1 Radiation-sensitive compositions and elements with basic development enhancers |
| 08/28/2008 | WO2008102990A1 Photo-sensitive resin composition for black matrix, black matrix produced by the composition and liquid crystal display including the black matrix |
| 08/28/2008 | WO2008102890A1 Photosensitive resin composition, cured film, protective film, insulating film and semiconductor device using the same, and display device |
| 08/28/2008 | WO2008102820A1 Composition for antireflective coating |
| 08/28/2008 | WO2008102758A1 Material for lithographic printing plate, method for manufacturing lithographic printing plate, and lithographic printing plate |
| 08/28/2008 | WO2008102689A1 Method of treating substrate and pre-wetting solvent for upper-film-forming material to be applied to surface of resist film |
| 08/28/2008 | WO2008102480A1 Fluorine-containing compound, resin composition, photosensitive transfer material, separation wall, method for separation wall formation, color filter, method for manufacturing the color filter, and display device |
| 08/28/2008 | WO2008102431A1 Process for producing photosensitive resin, photosensitive resin obtained by the process, and photosensitive resin composition |
| 08/28/2008 | WO2008102259A2 Antireflective coating composition based on a silicon polymer |
| 08/28/2008 | WO2008101676A2 Catadioptric projection objective |
| 08/28/2008 | WO2008101664A1 Optical element with multiple primary light sources |
| 08/28/2008 | WO2008101656A2 Method for producing facet mirrors and projection exposure apparatus |
| 08/28/2008 | WO2008072641A8 Exposure apparatus |
| 08/28/2008 | WO2008066375A3 Process, apparatus and device |
| 08/28/2008 | WO2008034636A3 Optical element and method |
| 08/28/2008 | US20080206828 Device For Introducing Substance Into Cell, Cell Clamping Device and Flow Path Forming Method |
| 08/28/2008 | US20080206687 Coating substrate with photoresist; measuring thickness; coating second substrate with photoresist; exposure to radiation; measure reflective spectra of actinic radiation |
| 08/28/2008 | US20080206685 Fine pattern on electronic device; high resolution; optics system for interference exposure; scanning |
| 08/28/2008 | US20080206682 Fabrication method of micro-lens and fabrication method of master for micro-lens |
| 08/28/2008 | US20080206681 Method for producing a structure on the surface of a substrate |
| 08/28/2008 | US20080206680 Coating comprises oligomer or resin of tris(hydroxyalkyl)isocyanurate or derivative on a substrate; baking to form an antireflective coating; photoresist covering; high dry etching rate; selectivity; semiconductors |
| 08/28/2008 | US20080206677 Hydrophilic support with multilayer alkali soluble resins |
| 08/28/2008 | US20080206676 Thermally cured underlayer for lithographic application |
| 08/28/2008 | US20080206675 Support with hydrophilic polymer bonded to support by crosslinking and image forming layer |
| 08/28/2008 | US20080206674 Substrate with hydrophilic surface, polymer soluble or swellable in aqueous alkaline developer and solvent |
| 08/28/2008 | US20080206673 Relief printing plate, and method for manufacturing electronic circuit pattern, organic electroluminescence device and organic electronic device by using the same |
| 08/28/2008 | US20080206671 Photosensitive acid generators ; photoresist imaged at short wavelengths |
| 08/28/2008 | US20080206670 Support with hydrophilic surface; photosensitive multilayer; exterior surface contains infrared radiation absorber and copolymer of acrylated ester and unsaturated acid |
| 08/28/2008 | US20080206669 Positive working resist composition and pattern forming method |
| 08/28/2008 | US20080206668 Negative resist composition and pattern forming method using the same |
| 08/28/2008 | US20080206667 High etch resistant underlayer compositions for multilayer lithographic processes |
| 08/28/2008 | US20080206666 Material For The Treatment Of Lithographic Substrates And Lithographic Printing Plates |
| 08/28/2008 | US20080206660 Colored photosensitive composition, color filter, and method for making the color filter |
| 08/28/2008 | US20080206658 Compositions Containing Anthraquinone Dyes |
| 08/28/2008 | US20080206657 Multilayer; substrate with light shielding film; measurement flatness; calibration |
| 08/28/2008 | US20080206656 Scattering bar OPC application method for sub-half wavelength lithography patterning |
| 08/28/2008 | US20080206654 Method for manufacturing semiconductor devices, and method for forming a pattern onto an exposure mask |
| 08/28/2008 | US20080204935 Original disk fabrication method, magnetic recording medium manufacturing method and magnetic recording medium |
| 08/28/2008 | US20080204695 EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated Environment |
| 08/28/2008 | US20080204693 Substrate Support Method |
| 08/28/2008 | US20080204691 Exposure apparatus, manufacturing system, and device manufacturing method |
| 08/28/2008 | US20080204687 Exposing method, exposure apparatus, device fabricating method, and substrate for immersion exposure |
| 08/28/2008 | US20080204686 Mask Structure for Manufacturing an Integrated Circuit by Photolithographic Patterning |
| 08/28/2008 | US20080204679 Lithographic apparatus and device manufacturing method |
| 08/28/2008 | US20080204678 Temperature effects on overlay accuracy |
| 08/28/2008 | US20080204677 Pattern forming method |
| 08/28/2008 | US20080204675 Coating/developing apparatus and pattern forming method |
| 08/28/2008 | US20080203590 Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same |
| 08/28/2008 | US20080203058 Substrate developing method and developing apparatus |
| 08/28/2008 | DE112006002626T5 Halbleitersubstrat und Verfahren zu dessen Herstellung Semiconductor substrate and process for its preparation |
| 08/28/2008 | DE112004001155T5 Positivresist - Zusammensetzung und Methode zur Bildung von Resistmustern unter Verwendung derselben Positive resist - Composition and method of forming resist patterns using the same |
| 08/28/2008 | DE10329360B4 Doppelbrechungsmessgerät, Spannungsentfernungseinrichtung, Polarimeter und Belichtungsgerät Birefringence meter, tension remover, polarimeter and exposure apparatus |
| 08/28/2008 | DE102007017004A1 Optical component used in micro-lithographic exposure and projection systems for producing highly integrated circuits consists of synthetic quartz glass containing hydroxyl groups and chemically bound nitrogen |
| 08/28/2008 | DE102007009334A1 Projection exposure system for microlithography, has reticle holder for arranging reticles, illumination lens having adjustable object field and swiveling drive to swivel object forming component |
| 08/28/2008 | DE102007009265A1 Verfahren und Vorrichtung zur photolithographischen Strukturierung in der Halbleitertechnologie Method and apparatus for photolithographic structuring in the semiconductor technology |
| 08/28/2008 | DE102007007910A1 Camera module lens module/lens holder parallel production method, involves providing recesses with different inner dimensions, so that base of recesses with larger lateral dimensions form passages in passage holes |
| 08/28/2008 | DE102006017894B4 Lichtmischeinrichtung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage Light mixing device, in particular for a microlithographic projection exposure apparatus |
| 08/28/2008 | DE102004015930B4 Verfahren zur lithographischen Projektion eines Musters von isolierten oder semi-isolierten Strukturelementen und Verwendung des Verfahrens zur Herstellung einer integrierten Schaltung A method of lithographic projection of a pattern of isolated or semi-isolated features and use of the method of manufacturing an integrated circuit |
| 08/27/2008 | EP1962329A1 Substrate holding device, exposure device, exposure method, and device fabrication method |
| 08/27/2008 | EP1962328A1 Liquid recovery member, exposure apparatus, exposure method, and device production method |
| 08/27/2008 | EP1962327A1 Washing liquid for photolithography, and method for washing exposure device using the same |
| 08/27/2008 | EP1962140A2 Lithographic apparatus immersion damage control |
| 08/27/2008 | EP1962139A1 Negative resist composition and pattern forming method using the same |
| 08/27/2008 | EP1962138A1 Systems and methods for UV lithography |
| 08/27/2008 | EP1962124A1 Holding apparatus for holding object, exposure apparatus including the holding apparatus, and device manufacturing method using the exposure apparatus |
| 08/27/2008 | EP1961789A1 Modified pigment products, dispersions thereof, and compositions comprising the same |
| 08/27/2008 | EP1961775A1 Fluorine-containing polymer, negative photosensitive composition and partition wall |
| 08/27/2008 | EP1961739A1 Novel compound, polymer, and resin composition |
| 08/27/2008 | EP1960837A2 Developable undercoating composition for thick photoresist layers |
| 08/27/2008 | EP1664923A4 Negative resist composition with fluorosulfonamide-containing polymer |
| 08/27/2008 | EP1625610B1 Plasma ashing apparatus comprising an endpoint detection system |
| 08/27/2008 | EP1509814A4 Acetal protected polymers and photoresists compositions thereof |
| 08/27/2008 | EP1402319B1 Material having a conductive pattern; and a material and method for making a conductive pattern |
| 08/27/2008 | CN201107547Y Metal light shield box |
| 08/27/2008 | CN201107546Y Metal light shield box and filtration apparatus thereof |
| 08/27/2008 | CN201107545Y Elevating decelerator of LCD exposure machine adsorption platform |
| 08/27/2008 | CN101253454A Photosensitive composition for volume hologram recording |
| 08/27/2008 | CN101253452A Active reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool |
| 08/27/2008 | CN101253451A A passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool |
| 08/27/2008 | CN101253450A Photopolymer printing plate precursor. |
| 08/27/2008 | CN101253449A Photosensitive resin composition and photosensitive element |
| 08/27/2008 | CN101253258A Aqueous solution and method for removing ionic contaminants from the surface of a workpiece |
| 08/27/2008 | CN101253054A Printing plate material and process for producing printing plate |
| 08/27/2008 | CN101252101A Method for making ultra-high power intelligent device using exposal field split joint technology |
| 08/27/2008 | CN101252078A Substrate processing apparatus and substrate processing method |