| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/04/2008 | US20080213679 Configuration prevents the substrate from conforming to the shape of the frame; photolithography; high precision pattern transfer |
| 09/04/2008 | US20080213677 Obtaining a relationship between the charge dose of the apparatus and the dimensional accuracy of the photomask pattern, determining the charge dose, forming the resist, determining the write condition for each pattern |
| 09/04/2008 | US20080213549 Photoresist composition, coating method thereof, method of forming organic film pattern using the same and display device fabricated thereby |
| 09/04/2008 | US20080213547 Composite Composition for Micropatterned Layers Having High Relaxation Ability, High Chemical Resistance and Mechanical Stability |
| 09/04/2008 | US20080213524 Method for Making Three-Dimensional Structures on a Substrate Having Micron Dimensions, and an Article of Manufacture Three-Dimensional Objects on a Substrate with Micron Dimensions |
| 09/04/2008 | US20080213130 Diagnostic-nanosensor and its use in medicine |
| 09/04/2008 | US20080212062 Exposure apparatus and method of manufacturing device |
| 09/04/2008 | US20080212058 Projection optical system, exposure apparatus, and device fabrication method |
| 09/04/2008 | US20080212056 Exposure Method, Exposure Apparatus, Method for Producing Device, and Method for Evaluating Exposure Apparatus |
| 09/04/2008 | US20080212053 Device manufacturing method, lithographic apparatus and device manufactured thereby |
| 09/04/2008 | US20080212052 Optical arrangement and projection exposure system for microlithography with passive thermal compensation |
| 09/04/2008 | US20080212048 Substrate processing method and substrate processing system |
| 09/04/2008 | US20080212047 Exposure apparatus, exposing method, and device fabricating method |
| 09/04/2008 | US20080212045 optical system with at least a semiconductor light source and a method for removing contaminations and/or heating the systems |
| 09/04/2008 | US20080212042 Circuit Breaker Arrangement in an Indicating Arrangement in an Electrically Powered Stapler |
| 09/04/2008 | US20080212017 Pixellized Transparent Optical Component Comprising an Absorbing Coating, Production Method Thereof and Use Thereof in an Optical Element |
| 09/04/2008 | US20080210888 Exposure apparatus, exposure method and device manufacturing method |
| 09/04/2008 | US20080210320 Microfabricated elastomeric valve and pump systems |
| 09/04/2008 | DE102008010123A1 Vielstrahl-Ablenkarray-Einrichtung für maskenlose Teilchenstrahl-Bearbeitung Multiple-beam Ablenkarray device for maskless particle beam processing |
| 09/04/2008 | DE102007010650A1 Lighting device for use with micro lithographic projection exposure system, has micro lens array arranged in light direction of propagation before light mixture system, where multiple micro lenses are arranged with periodicity |
| 09/04/2008 | DE102005056916B4 Verfahren zum Gestalten einer Überlagerungs-Markierung A method of designing an overlay mark |
| 09/04/2008 | DE102004057180B4 Photomasken mit Schattenelementen in denselben und dazugehörige Verfahren und Systeme Photomasks with shadow elements in the same and related methods and systems |
| 09/04/2008 | CA2679521A1 Hydroxamic esters as photoinitiators |
| 09/03/2008 | EP1965616A1 Glass substrate having circuit pattern and process for producing the same |
| 09/03/2008 | EP1965414A1 Exposure method, exposure apparatus, and method for manufacturing device |
| 09/03/2008 | EP1965411A2 Stage system and stage driving method for use in exposure apparatus |
| 09/03/2008 | EP1965259A2 Measurement apparatus, exposure apparatus, and device fabrication method |
| 09/03/2008 | EP1965258A1 Stage system and lithographic apparatus comprising such stage system |
| 09/03/2008 | EP1965257A1 Photoresist composition, coating method thereof, method of forming organic film pattern using the same and display device fabricated thereby |
| 09/03/2008 | EP1965256A1 Positive photosensitive resin composition, and semiconductor device and display using same |
| 09/03/2008 | EP1965255A1 Colored photosensitive composition, color filter and method for making the color filter |
| 09/03/2008 | EP1965228A1 Projection optical system, exposure apparatus, and device fabrication method |
| 09/03/2008 | EP1964892A2 Optical layer including µ-oxo-bridged boron-subphthalocyanine dimer |
| 09/03/2008 | EP1963924A1 Optical imaging device with determination of imaging errors |
| 09/03/2008 | EP1963923A2 Analysis device with an array of focusing microstructures |
| 09/03/2008 | EP1963922A1 Slm direct writer |
| 09/03/2008 | EP1963921A1 Projection objective of a microlithographic projection exposure apparatus |
| 09/03/2008 | EP1963920A1 Photosensitive sheets and method and apparatus for manufacturing the same |
| 09/03/2008 | EP1963919A2 Photoactive compounds |
| 09/03/2008 | EP1963903A2 Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations |
| 09/03/2008 | EP1963374A1 Oxime ester photoinitiators |
| 09/03/2008 | EP1743218B1 Photocurable compositions and flexographic printing plates comprising the same |
| 09/03/2008 | EP1675802B1 Method for patterning a substrate surface |
| 09/03/2008 | EP1483627B1 Scanning exposure apparatus and device manufacturing method using the same |
| 09/03/2008 | EP1441994A4 Fused silica having high internal transmission and low birefringence |
| 09/03/2008 | CN201110940Y Light blockage coating developing machine cold-hot plate cleaning tool |
| 09/03/2008 | CN101258581A Exposure apparatus, exposure method, and device production method |
| 09/03/2008 | CN101258447A Exposure apparatus |
| 09/03/2008 | CN101258446A Lithographic method |
| 09/03/2008 | CN101258445A Lithographic method |
| 09/03/2008 | CN101258444A Negative photoresist for silicon KOH etch without silicon nitride |
| 09/03/2008 | CN101258443A A method of building a sensor structure |
| 09/03/2008 | CN101258442A Pattern copy mask, focal distance fluctuation measuring method and apparatus, manufacture method for semiconductor device |
| 09/03/2008 | CN101258169A Radiation-sensitive resin composition and color filters |
| 09/03/2008 | CN101258018A Film forming composition for nanoimprinting and method for pattern formation |
| 09/03/2008 | CN101256986A Manufacturing method of LCD device and TFT completing substrate thereof |
| 09/03/2008 | CN101256551A Method and system for detecting photo mask, computer readable storage medium |
| 09/03/2008 | CN101256366A Photoresist stripping compound and method for using the same |
| 09/03/2008 | CN101256365A Lithographic apparatus and device manufacturing method |
| 09/03/2008 | CN101256364A Exposing device |
| 09/03/2008 | CN101256363A Pneumatic vacuum control system for silicon slice bench |
| 09/03/2008 | CN101256362A Method for establishing equivalent diffusion model of chemistry amplitude photoresist |
| 09/03/2008 | CN101256361A Light blocking agent |
| 09/03/2008 | CN101256360A Radiosensitive resin composition, laminated insulation film and micro lens, preparation method thereof |
| 09/03/2008 | CN101256359A Radiosensitive composition, colored filter and colored liquid crystal display element |
| 09/03/2008 | CN101256358A Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process |
| 09/03/2008 | CN101256357A Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process |
| 09/03/2008 | CN101256356A Radiation sensitive composition, color filter, black matrix and liquid crystal display device |
| 09/03/2008 | CN101256355A Compositions and processes for immersion lithography |
| 09/03/2008 | CN101256354A Moulding-die and method for manufacturing the same |
| 09/03/2008 | CN101256353A Photolithography thin film evoked by probe and preparation method thereof |
| 09/03/2008 | CN101256352A Protective film and bracket thereof |
| 09/03/2008 | CN101256351A Process for manufacturing special edition roller for PVC imitating drawnwork product |
| 09/03/2008 | CN101256350A Method and device for checking defect of grey level mask, method for manufacturing same, optical mask defect checking method and pattern trans-printing method |
| 09/03/2008 | CN101256349A Defect correction method and manufacturing method for grey level mask and grey level mask |
| 09/03/2008 | CN101255233A Silicon-containing polymer, process for producing the same, heat-resistant resin composition, and heat-resistant film |
| 09/03/2008 | CN100416950C Line narrowing unit with flexural grating mount |
| 09/03/2008 | CN100416771C Combined wet etching method and system for stacked films |
| 09/03/2008 | CN100416761C Method for verifying optical mask |
| 09/03/2008 | CN100416414C Method for drawing sub-micron ultraviolet luminous pattern on zinc oxide film |
| 09/03/2008 | CN100416413C Multi-channel developing liquid developing control signal monitoring system |
| 09/03/2008 | CN100416412C Silicon wafer platform height control system and method in projection type photoetching machine |
| 09/03/2008 | CN100416411C Lamp optical system and laser processing apparatus allocated with the same optical system |
| 09/03/2008 | CN100416410C Method for manufacturing device, and affset print projecting device |
| 09/03/2008 | CN100416409C Method for making electronic component using wet corrosion agent |
| 09/03/2008 | CN100416391C Liquid crystal display device and fabrication method thereof |
| 09/03/2008 | CN100416363C Jig for alignment film printing mask, apparatus and method for cleaning alignment film printing mask using the same |
| 09/02/2008 | US7421677 Illuminator controlled tone reversal printing |
| 09/02/2008 | US7421158 Holographically defined surface mask etching method and etched optical structures |
| 09/02/2008 | US7420752 Holding apparatus |
| 09/02/2008 | US7420670 Measuring instrument and method for operating a measuring instrument for optical inspection of an object |
| 09/02/2008 | US7420654 Method of varying dimensions of a substrate during nano-scale manufacturing |
| 09/02/2008 | US7420653 Lithographic projection apparatus, mirror, method of supplying a protective cap layer, device manufacturing method and device manufactured accordingly |
| 09/02/2008 | US7420652 Immersion lithography method and device for illuminating a substrate |
| 09/02/2008 | US7420651 Immersion exposure technique |
| 09/02/2008 | US7420194 Lithographic apparatus and substrate edge seal |
| 09/02/2008 | US7420188 Exposure method and apparatus for immersion lithography |
| 09/02/2008 | US7419945 Containing hydrogen peroxide, sulfolane, optionally tetramethylammonium hydroxide, and either trans-1,2-cyclohexanediamine tetraacetic acid or ethylenediaminetetrakis(methylene phosphonic acid); cleans copper residues, SiO2,and low- and high- kappa dielectrics |
| 09/02/2008 | US7419772 Impregnating silica with homopolymers, copolymers or block copolymers, then curing the polymers and selectively etching to form poromeric materials; integrated circuits; optics; membranes |
| 09/02/2008 | US7419771 Exposing resist on stubstrate an activating light source; baking resist followed by developing the resist to form a first resist pattern; baking the first resist pattern and developing the first resist pattern; dry trimming the second resist pattern to form a final resist pattern with reduced dimensions |