| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/10/2008 | CN101263424A Photosensitive composition, transfer material, light shielding film and production method thereof, color filter for display device, substrate for display device, and display device |
| 09/10/2008 | CN101263423A Photosensitive composition, pattern-forming material, photosensitive laminate, apparatus for formation of pattern, and method for formation of pattern |
| 09/10/2008 | CN101262738A Printed circuit boards |
| 09/10/2008 | CN101262735A Printed circuit boards |
| 09/10/2008 | CN101261960A Method of producing liquid crystal display device including forming an align mark in an insulating mother substrate |
| 09/10/2008 | CN101261930A Process for wafer backside polymer removal and wafer front side scavenger plasma |
| 09/10/2008 | CN101261929A Process for wafer backside polymer removal by front side gas purge |
| 09/10/2008 | CN101261456A Exhaust device, substrate processing device incorporating same and exhaust method |
| 09/10/2008 | CN101261455A Device and method for photo-etching machine focusing system performance evaluation |
| 09/10/2008 | CN101261454A Method for accomplishing sub-wavelength interference photolithography utilizing multiple layer metal dielectric-coating structure |
| 09/10/2008 | CN101261453A Electron-beam exposure device film jacket library system |
| 09/10/2008 | CN101261452A Inspection method and apparatus, lithographic processing cell and device manufacturing method |
| 09/10/2008 | CN101261451A Photo-etching machine image-forming quality and workpiece station positioning accuracy measuring systems and measurement method |
| 09/10/2008 | CN101261450A Zero position automatically adjustable focusing and leveling measuring device and its usage method |
| 09/10/2008 | CN101261449A Grating ion beam etching optical on-line detection device and detection method |
| 09/10/2008 | CN101261448A Chemically amplified corrosion-resisting agent composition |
| 09/10/2008 | CN101261447A Phototonus resin composition |
| 09/10/2008 | CN101261446A Colouring phototonus composition for color filter, color filter, manufacturing method thereof and liquid crystal display device |
| 09/10/2008 | CN101261445A Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib |
| 09/10/2008 | CN101261444A Manufacture method for display panel possessing different substrate thickness difference |
| 09/10/2008 | CN101261443A Nanometer crystal graph transfer printing process and nanometer crystal graph material |
| 09/10/2008 | CN101261442A Device manufacturing method, computer program and lithographic apparatus |
| 09/10/2008 | CN101261439A Method for forming photoresist pattern, method for manufacturing display panel, and method for manufacturing display device |
| 09/10/2008 | CN101261410A LCD device including a reflection film having a convex-concave surface |
| 09/10/2008 | CN101261392A Touch control display panel, colourful filtering substrate and its manufacture method |
| 09/10/2008 | CN101261331A Self-supporting transmission metal grating based on nanometer stamping technology and its preparation method |
| 09/10/2008 | CN101260967A XYY precision positioning platform calibration method |
| 09/10/2008 | CN100418011C Method for the manufacture of micro structures |
| 09/10/2008 | CN100418010C Method for making period different holographic gratings on a semiconductor chip |
| 09/10/2008 | CN100417998C Tft array substrate and fabrication method thereof |
| 09/10/2008 | CN100417997C Method of manufacturing liquid crystal display device |
| 09/10/2008 | CN100417520C Method and device for manufacturing relief printing plate terminal for seamless printing |
| 09/09/2008 | US7424144 Method for checking periodic structures on lithography masks |
| 09/09/2008 | US7423805 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 09/09/2008 | US7423740 Reticle and optical characteristic measuring method |
| 09/09/2008 | US7423739 Method of and system for determining the aberration of an imaging system test object and detector for use with the method |
| 09/09/2008 | US7423733 Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device |
| 09/09/2008 | US7423731 Illumination optical system, exposure apparatus, and exposure method with polarized switching device |
| 09/09/2008 | US7423730 Lithographic apparatus |
| 09/09/2008 | US7423723 Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device |
| 09/09/2008 | US7423722 Lithographic apparatus and device manufacturing method |
| 09/09/2008 | US7423712 Transflective type liquid crystal display fabrication method with first half-tone mask for selectively removing insulating interlayer/transparent conductive layer and second half-tone mask for selectively removing insulating layer for uneven surface |
| 09/09/2008 | US7423275 Erosion mitigation for collector optics using electric and magnetic fields |
| 09/09/2008 | US7423097 Glycidyloxy groups-containing polybutadiene, mono-oxetane compound and cationic photoinitiator |
| 09/09/2008 | US7422974 Method of manufacturing electronic component mounting body, electronic component mounting body, and electro-optical device |
| 09/09/2008 | US7422841 Exposure control for phase shifting photolithographic masks |
| 09/09/2008 | US7422840 Apparatus and process for forming a printing form having a cylindrical support |
| 09/09/2008 | US7422839 Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern |
| 09/09/2008 | US7422837 titanocene compound, pyridine compound, and cyan compound; for lithographic printing plate precursor highly sensitive to oscillation wavelength semiconductor laser |
| 09/09/2008 | US7422836 Dissolution rate modifiers for photoresist compositions |
| 09/09/2008 | US7422830 Method for detecting failure of database patterns of photo mask |
| 09/04/2008 | WO2008106379A1 Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
| 09/04/2008 | WO2008106245A2 Method of forming soft lithographic molds with fluorine modified elastomers |
| 09/04/2008 | WO2008106010A1 Positive-working radiation-sensitive compositions and elements |
| 09/04/2008 | WO2008105552A1 Radiation-sensitive resin composition, spacer for liquid crystal display element, protective film, and method for producing spacer for liquid crystal display element or protective film |
| 09/04/2008 | WO2008105531A1 Pellicle frame apparatus, mask, exposure method, exposure apparatus and device manufacturing method |
| 09/04/2008 | WO2008105510A1 Volume hologram laminate manufacturing method |
| 09/04/2008 | WO2008105503A1 Processed substrates having water-repellent areas in patterns, process for production thereof, and process for production of members having patterms made of functional material films |
| 09/04/2008 | WO2008105440A1 Photoresist remover composition |
| 09/04/2008 | WO2008105390A1 Coating solution for image-forming layer for planographic printing plate material, method for production of planographic printing plate material, and planographic printing plate material |
| 09/04/2008 | WO2008105339A1 Printing plate material |
| 09/04/2008 | WO2008105293A1 Resin composition for micropattern formation and method of micropattern formation |
| 09/04/2008 | WO2008105266A1 Resist lower layer film forming composition for electron lithography |
| 09/04/2008 | WO2008105239A1 Positive photosensitive lithographic printing plate material |
| 09/04/2008 | WO2008105230A1 Material for lithographic printing plate |
| 09/04/2008 | WO2008105226A1 Work stage for exposure device, exposure method, and method of manufacturing structure body |
| 09/04/2008 | WO2008105129A1 Photosensitive resin composition, photosensitive transfer material, pixel barrier and method for forming the same, substrate with pixel barrier, color filter and method for producing the same, and display device |
| 09/04/2008 | WO2008104874A1 Process for making siloxane polymers |
| 09/04/2008 | WO2008104573A2 Hydrophilic coating |
| 09/04/2008 | WO2008104516A1 Imaging apparatus with replaceable shutters and method |
| 09/04/2008 | WO2008104436A1 Hydroxamic esters as photoinitiators |
| 09/04/2008 | WO2008104220A1 Optical imaging arrangement |
| 09/04/2008 | WO2008104192A1 Catadioptric projection objective with pupil correction |
| 09/04/2008 | WO2008083114A3 Hybrid mask and method of forming same |
| 09/04/2008 | US20080215295 Method Of Analysis, Exposure Apparatus, And Exposure Apparatus System |
| 09/04/2008 | US20080215275 Overlay Inspection System |
| 09/04/2008 | US20080214874 High yield acid catalyzed displacement etherification of 4-hydroxyphenylmethylcarbinol with methanol using ion exchange resin; synthesis of raw material for condensation polymerization production of uniquely linear, low molecular weight polymer |
| 09/04/2008 | US20080214422 Thinner composition and method of removing photoresist using the same |
| 09/04/2008 | US20080214412 Method and device for preparing and/or analyzing biochemical reaction carriers |
| 09/04/2008 | US20080214002 Cleaning solution and manufacturing method for semiconductor device |
| 09/04/2008 | US20080213912 Using electrophoretic-gel/gradient and micro-constricting microfluidic channels to extend relaxed segments of DNA |
| 09/04/2008 | US20080213706 Method and apparatus for thermal development having a removable support member |
| 09/04/2008 | US20080213705 Pattern exposure method and pattern exposure apparatus |
| 09/04/2008 | US20080213704 Rapid, accurate local flare measuring; ensures sufficient light quantity; increased opening size above sensor; semiconductors |
| 09/04/2008 | US20080213703 Imaging System With Mirror Group |
| 09/04/2008 | US20080213702 Forming self assembled monolayer with such as octadecyltrichlorosilane to promote oxide layer adhesion of vapor deposited polyethylenedioxythiophene |
| 09/04/2008 | US20080213701 Polymer for organic anti-reflective coating layer and composition including the same |
| 09/04/2008 | US20080213700 On-press development of high speed laser sensitive lithographic printing plates |
| 09/04/2008 | US20080213699 P-hydroxystyrene-alkyl alkacrylate copolymer in an organic solvent; good reproducibility, stability, fine patterning accuracy and uniform thickness; reduced line-edge roughness, high resolution |
| 09/04/2008 | US20080213698 Novel Colorant Compound and Method of Manufacturing the Same as Well as Blue Resist Composition for Use in Color Filter Containing the Same |
| 09/04/2008 | US20080213697 Namely, polyvinylthiophene; compatible with typical photoresists and have desired optical properties so that the underlayer can also be used as an antireflective coating; good mechanical properties and etch selectivity |
| 09/04/2008 | US20080213696 Addition of a phosphonate or phosphate compound to the coating containing a hydrophobic thermoplastic polymer particles and a hydrophilic binder significantly reduces the size and number of point defects occurring on the surface of a coated grained and anodized aluminum support; improved shelf life |
| 09/04/2008 | US20080213695 Chemically amplified resist composition |
| 09/04/2008 | US20080213694 Acid generator mixture is a diphenyl iodinium mesylate, tosylate or perfluorobutylsulfonate salt, a nonionic fluoroaliphatic polymer ester surfactant and N-methylpyrrolidone; solid phase synthesis of DNA, RNA, peptide nucleic acids, locked nucleic acids, or proteins for chips; photolithography |
| 09/04/2008 | US20080213693 Optical information recording medium |
| 09/04/2008 | US20080213692 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens |
| 09/04/2008 | US20080213691 Method to print photoresist lines with negative sidewalls |
| 09/04/2008 | US20080213690 Resist Material and Electron Beam Recording Resist Material |
| 09/04/2008 | US20080213689 Resist comprises a tuned photoacid generator concentration or a tuned quencher concentration; reduced capacity to destroy dies |
| 09/04/2008 | US20080213688 A support, an oxygen insulation layer, and a highly sensitive photosensitive layer; allows for preventing light fog under safelight; printed circuit boards and color filters for liquid crystal displays |