| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/16/2008 | US7426082 Catadioptric projection objective with geometric beam splitting |
| 09/16/2008 | US7426017 Focus test mask, focus measurement method and exposure apparatus |
| 09/16/2008 | US7426013 Exposure apparatus and device fabrication method |
| 09/16/2008 | US7425877 Lange coupler system and method |
| 09/16/2008 | US7425585 Photosensitive resin composition |
| 09/16/2008 | US7425407 Mastering microstructures through a substrate using negative photoresist and microstructure masters; computer displays monitors, projection televisions; photolithography; imaging by rotating cylindrical platform while concurrently rastering radiation beam through exterior layer to photosensitive layer |
| 09/16/2008 | US7425406 Lithographic printing plate precursor and lithographic printing method |
| 09/16/2008 | US7425405 Method for making a lithographic printing plate |
| 09/16/2008 | US7425404 Photoresist comprising resin that increases solubility in an alkali developer by action of acid; compound which generates acid when irradiated with actinic ray or radiation; fluorodihydroxy compound; and solvent; preventing pattern collapse |
| 09/16/2008 | US7425403 Coating a tris(hydroxyalkyl)isocyanurate containing reson on a substrate;baking to form antireflective coating; covering with a photoresist; high dry etching rate; selectivity; semiconductors |
| 09/16/2008 | US7425402 Hydrophilic support with coating containing infrared radiation absorber and developer soluble polymer |
| 09/16/2008 | US7425400 Planographic printing plate precursor |
| 09/16/2008 | US7425399 Composition for forming anti-reflective coating for use in lithography |
| 09/16/2008 | US7425396 Photolithography and transfer of circuits for optical images for semiconductors and patterns |
| 09/16/2008 | US7425347 Composition for forming anti-reflective coating for use in lithography |
| 09/12/2008 | WO2008109198A1 Anti-reflective coatings using vinyl ether crosslinkers |
| 09/12/2008 | WO2008108643A2 Removal of deposition on an element of a lithographic apparatus |
| 09/12/2008 | WO2008108423A1 Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method |
| 09/12/2008 | WO2008108406A1 Compound for photoresist, photoresist solution, and etching method using the photoresist solution |
| 09/12/2008 | WO2008108359A1 Solder resist, dry film thereof, cured product and printed wiring board |
| 09/12/2008 | WO2008108357A1 Photosensitive composition, solder resist and photosensitive dry film |
| 09/12/2008 | WO2008108253A2 Exposing method, exposure apparatus, device fabricating method, and substrate for immersion exposure |
| 09/12/2008 | WO2008108148A1 Precision positioning apparatus |
| 09/12/2008 | WO2008108123A1 Catadioptric projection optical system, projection optical device and scanning exposure device |
| 09/12/2008 | WO2008107304A2 Surface-modified nanoparticles comprising a cationic colorant for use in color filters |
| 09/12/2008 | WO2008107166A1 Method for cleaning an euv lithography device method for measuring the residual gas atmosphere and the contamination and euv lithography device |
| 09/12/2008 | WO2008107136A1 Method for measuring degassing and euv-lithography device and measuring assembly |
| 09/12/2008 | WO2008107025A1 Illumination system of a microlithographic projection exposure apparatus |
| 09/12/2008 | WO2008087597A3 Device manufacturing method and lithographic apparatus |
| 09/12/2008 | WO2008086282A3 Methods and systems for using electrical information for a device being fabricated on a wafer to perform one or more defect-related functions |
| 09/12/2008 | WO2008074673A3 Optical system, in particular an illumination system or projection objective of a microlithographic projection exposure apparatus |
| 09/12/2008 | WO2008072031A3 Apparatus for cooling |
| 09/12/2008 | WO2008071363A3 Hybrid cationic curable coatings |
| 09/12/2008 | WO2008071269A8 Apparatus and method for mask metrology |
| 09/12/2008 | WO2008014845A8 A method of applying a material on a substrate |
| 09/11/2008 | US20080222597 Photo mask, exposure method using the same, and method of generating data |
| 09/11/2008 | US20080221816 Data verification method, charged particle beam writing apparatus, and computer-readable storage medium with program |
| 09/11/2008 | US20080221709 Control method, control system, and program |
| 09/11/2008 | US20080220615 Method for producing self-aligned mask, articles produced by same and composition for same |
| 09/11/2008 | US20080220597 Photoresists and methods for use thereof |
| 09/11/2008 | US20080220381 Antireflection film composition and patterning process using the same |
| 09/11/2008 | US20080220380 Enhancing photoresist performance using electric fields |
| 09/11/2008 | US20080220379 Coating a photoresist onto a substrate;selectively exposure; baking in atmosphere containing moisture; replacing with atmosphere not containing moisture; development; suppression of variations in line width dimensions of resist patterns among the exposed substrates; semiconductors |
| 09/11/2008 | US20080220378 Ferrule for optical wave guide |
| 09/11/2008 | US20080220377 Row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction; semiconductors |
| 09/11/2008 | US20080220376 Determining a mask transmission function from a mask layout; modulation; obtaining an optical image of the mask layout using the modulated mask transmission function; applying second function; computer programs; data processing |
| 09/11/2008 | US20080220375 Forming an organic antireflection coating (ARC) layer on substrate having an amorphous carbon pattern; forming photoresist pattern on ARC layer; exposing photoresist pattern having defects to light source; removing by development without damaging the amorphous carbon pattern; alignment or overlay key |
| 09/11/2008 | US20080220374 Method and structure for improved alignment in mram integration |
| 09/11/2008 | US20080220372 comprising an alkali-soluble resins, photopolymerizable monomers, photoinitiators, solvents and a black pigments, having high photosensitivity and forms patterns with good smoothness of edge, high resolution and nonpeeling after development; high optical density; no white dot defect |
| 09/11/2008 | US20080220371 disulfoneamines as acid generators capable of generating an acid upon irradiation with actinic ray or radiation; use in making semiconductors, printed circuits; improve Post Exposure Bake temperature dependency and exposure latitude |
| 09/11/2008 | US20080220370 additional resin contains an oxime sulfonate group, which is insoluble in an alkali developer and becomes soluble in alkali developer by acid generating from acid generator; use in ultramicrolithography; resolution, sensitivity, good defocus latitude, good pattern profile, line edge roughness |
| 09/11/2008 | US20080220369 Chemically amplified resist composition |
| 09/11/2008 | US20080220368 minimize the refractive indices difference by using a high refractive index organic component and a low refractive index inorganic component; nontoxic, inexpensive, thermal decomposition; high resolution, high compactness by exposure to light only once; butyl methacrylate-methy methacrylate copolymer |
| 09/11/2008 | US20080220367 use for the recording layers of optical recording media; soluble in non-polar solvents, prevent aggregation and precipitation; high-speed rewritable recording media; claims are not match to the document |
| 09/11/2008 | US20080220352 Photoconductors containing chelating components |
| 09/11/2008 | US20080220344 Drawing Method and Apparatus |
| 09/11/2008 | US20080220339 Film Forming Photosensitive Materials for the Light Induced Generation of Optical Anisotrophy |
| 09/11/2008 | US20080220223 Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the same |
| 09/11/2008 | US20080220222 Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts |
| 09/11/2008 | US20080219805 Stage Device for a Vacuum Chamber |
| 09/11/2008 | US20080219562 System and Method for Calculating Aerial Image of a Spatial Light Modulator |
| 09/11/2008 | US20080218845 Electrophoretic display medium and method of forming the same |
| 09/11/2008 | US20080218726 Lithographic apparatus and device manufacturing method |
| 09/11/2008 | US20080218719 Exposure apparatus |
| 09/11/2008 | US20080218718 Lithographic apparatus and device manufacturing method |
| 09/11/2008 | US20080218717 Lithographic apparatus and device manufacturing method |
| 09/11/2008 | US20080218714 Exposure Method, Exposure Apparatus and Device Manufacturing Method |
| 09/11/2008 | US20080218711 Lithographic apparatus and device manufacturing method |
| 09/11/2008 | US20080218708 Exposure apparatus and method of manufacturing device |
| 09/11/2008 | US20080217322 Printing Plate Ovens |
| 09/11/2008 | DE102007057252A1 Verfahren zur Messung der Ausgasung in EUV-Lithographievorrichtungen sowie EUV-Lithographievorrichtung Method for measuring the outgassing in EUV lithography devices and EUV lithography apparatus |
| 09/11/2008 | DE102007009867A1 Abbildungsvorrichtung mit auswechselbaren Blenden sowie Verfahren hierzu Imaging device with replaceable diaphragm and method therefor |
| 09/10/2008 | EP1968057A2 Curable compositions |
| 09/10/2008 | EP1967904A1 Positive resist composition and pattern forming method using the same |
| 09/10/2008 | EP1967903A1 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib |
| 09/10/2008 | EP1967844A1 Surface plasmon resonance sensor and sensor chip |
| 09/10/2008 | EP1967011A2 Speckle reduction by angular scanning for laser projection displays |
| 09/10/2008 | EP1966653A2 Blended sensor system and method |
| 09/10/2008 | EP1966652A1 Immersion lithography apparatus and method of performing immersion lithography |
| 09/10/2008 | EP1966651A2 Interferometric lithography system and method used to generate equal path lengths of interfering beams |
| 09/10/2008 | EP1966255A1 Anti-reflective coatings |
| 09/10/2008 | EP1966251A1 Process for preparing stable photoresist compositions |
| 09/10/2008 | EP1965930A2 Method and system for using a two-phases substrate cleaning compound |
| 09/10/2008 | EP1835347A4 Image producing methods and image producing devices |
| 09/10/2008 | EP1716452B1 Method for providing a thin film having a chemical composition that is spatially structured on a micrometric or nanometric scale on a substrate |
| 09/10/2008 | EP1636826B1 Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure |
| 09/10/2008 | EP1551886B1 Fluorinated polymers useful as photoresists, and processes for microlithography |
| 09/10/2008 | EP1209524B1 Photosensitive structural body for flexographic printing plate |
| 09/10/2008 | EP1084454A4 Free-form nanofabrication using multi-photon excitation |
| 09/10/2008 | CN201112367Y Light shield case |
| 09/10/2008 | CN201112366Y Transfer container and conducting structure applied for the same |
| 09/10/2008 | CN201112365Y Containing chamber structure for transfer container |
| 09/10/2008 | CN101263432A Illumination system of a microlithographic exposure system |
| 09/10/2008 | CN101263431A Microelectronic substrate having removable edge extension element |
| 09/10/2008 | CN101263430A Microlithography projection optical system, method for manufacturing a device and method to design an optical surface |
| 09/10/2008 | CN101263429A Film-forming composition, method for pattern formation, and three-dimensional mold |
| 09/10/2008 | CN101263428A Photocurable compositions for preparing ABS-like articles |
| 09/10/2008 | CN101263427A Photosensitive coloring composition, color filter substrate and semitransmissive type liquid crystal display device |
| 09/10/2008 | CN101263426A Photosensitive composition comprising triazine-based photoactive compound containing oxime ester |
| 09/10/2008 | CN101263425A Pattern forming material, pattern forming apparatus and pattern forming method |