| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/18/2008 | WO2008111203A1 Resist composition, method of forming resist pattern, and process for manufacturing electronic device |
| 09/18/2008 | WO2008110512A1 Photocurable compositions for preparing abs-like articles |
| 09/18/2008 | WO2008110501A1 Projection lens for a microlithographic projection exposure system |
| 09/18/2008 | WO2008110358A1 Optimal rasterization for maskless lithography |
| 09/18/2008 | WO2008110216A1 Copper interconnection for flat panel display manufacturing |
| 09/18/2008 | WO2008110212A1 Optical imaging arrangement |
| 09/18/2008 | WO2008081994A3 Exposure apparatus, exposing method, and device fabricating method |
| 09/18/2008 | WO2008077746A3 Subwavelength imaging and irradiation with entangled particles |
| 09/18/2008 | WO2007140012A3 Immersion fluids for lithography |
| 09/18/2008 | WO2006044676A3 High resistivity compositions |
| 09/18/2008 | US20080227883 Storage stability obtained by storing oxime photopolymerization initiator with the polyepoxide separate from the carboxyl-containing resin and reactive diluent; protective coating for soldering printed circuits; tack-free dryness; no misting during thermal curing; photoresists; adhesion; curing depth |
| 09/18/2008 | US20080227678 Cleaning Liquid for Lithography and Method of Cleaning Therewith |
| 09/18/2008 | US20080227653 Expression monitoring by hybridization to high density oligonucleotide arrays |
| 09/18/2008 | US20080227038 Pattern formation method |
| 09/18/2008 | US20080227037 Resist lower layer film composition and patterning process using the same |
| 09/18/2008 | US20080227036 Forming photoreactive resin on sheet member soluble in water; exposing the resin selectively to radiation activating the photoreactivity; and dissolving the sheet member in water after the exposing step; stereolithography |
| 09/18/2008 | US20080227035 Method of producing an ink jet head and method of producing an electronic device |
| 09/18/2008 | US20080227034 Method of forming pattern of semiconductor device |
| 09/18/2008 | US20080227033 Includes a cross-linking agent including a monoacrylate; prevent film twisting, disconnection or detachment by minimizing stress on the patterned film during sintering, thereby minimizing modifications due to shrinkage |
| 09/18/2008 | US20080227032 Sulfonium or halogenium salts for amplification photoresists; heat treating coating and exposing coating to high energy or electron beam through photomask; developing |
| 09/18/2008 | US20080227031 4 hydroxyphenyl methacrylate-tert butyl acrylate-methyl methacrylate; useful as component of chemically amplified positive acting resists |
| 09/18/2008 | US20080227030 Combination of base additives including a room temperature solid base, and a liquid low vapor pressure base; for chromium-containing layers used in mask-making |
| 09/18/2008 | US20080227029 Conditioning of a Litho Strip |
| 09/18/2008 | US20080227028 Mixtures of functionalized polyhedral oligomeric silsesquioxanes derivatives; immersion photolithography; water insolubility, soluble in photoresist developer and casting solvents, leaching inhibition; resolution |
| 09/18/2008 | US20080227027 Overcoating substrate with photoresist , acid generator and antireflective coating; the acid that the acid-generating agent generates in the photoresist film upon exposure to light has a higher acidity than the fluorine-based acidic compound in the antireflective film |
| 09/18/2008 | US20080227026 Lithographic printing plate precursor |
| 09/18/2008 | US20080227025 Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin |
| 09/18/2008 | US20080227024 Polyamide resin comprising (hydroxy)dicarboxylic acid and (hydroxy)diamine monomers; a photosensitive agent; a thermo-acid generator; and a compound having at least one of an alkoxymethyl group and an acyloxymethyl group; heat resistance, shrinkage inhibition; lithography, semiconductors |
| 09/18/2008 | US20080226994 Negative curable composition, color filter, and method of producing the same |
| 09/18/2008 | US20080226152 Determining Image Blur in an Imaging System |
| 09/18/2008 | US20080225921 Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light |
| 09/18/2008 | US20080225259 Illumination system with variable adjustment of the illumination |
| 09/18/2008 | US20080225258 EUV illumination system having a folding geometry |
| 09/18/2008 | US20080225254 Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor device |
| 09/18/2008 | US20080225250 Exposure apparatus and method for producing device |
| 09/18/2008 | US20080225249 Exposure apparatus and method for producing device |
| 09/18/2008 | DE102008011761A1 Adjustment device for micro lithographic-projection illumination system, has auto collimation unit permitting adjustment accuracy, which is greater than specified value, where collimation unit is provided with light source and reflector |
| 09/18/2008 | DE102005002537B4 Vorrichtung für einen Strahl geladener Teilchen zum Messen eines Abbildungsvergrösserungsfehlers Device for a charged particle beam for measuring an imaging magnification error |
| 09/18/2008 | CA2678943A1 Nanolithography with use of viewports |
| 09/17/2008 | EP1970944A1 Exposure apparatus, exposure method, projection optical system and device manufacturing method |
| 09/17/2008 | EP1970941A2 Stage system and stage driving method for use in exposure apparatus |
| 09/17/2008 | EP1970764A2 Lithographic apparatus and method |
| 09/17/2008 | EP1970763A2 Lithographic apparatus and device manufacturing method |
| 09/17/2008 | EP1970762A1 Phenolic polymers and photoresists comprising same |
| 09/17/2008 | EP1970761A1 Photosensitive composition, and cured relief pattern production method and semiconductor device using the same |
| 09/17/2008 | EP1970760A1 Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin |
| 09/17/2008 | EP1970759A1 Negative curable composition, color filter, and method of producing the same |
| 09/17/2008 | EP1970758A2 Method for producing structure |
| 09/17/2008 | EP1970734A1 Space-variant liquid-crystal waveplate |
| 09/17/2008 | EP1970209A1 Lithographic printing plate material and printing method |
| 09/17/2008 | EP1969428A1 Projection objective with decentralized control |
| 09/17/2008 | EP1969427A1 Lithographic apparatus including a cleaning device and method for cleaning an optical element |
| 09/17/2008 | EP1969426A2 Photopolymer composition suitable for lithographic printing plates |
| 09/17/2008 | EP1969425A1 Light sensitive component for use in photoresists |
| 09/17/2008 | EP1969359A2 Biosensors and methods for making and using them |
| 09/17/2008 | EP1774404B1 Lithographic printing plates with high print run stability |
| 09/17/2008 | EP1642174B1 Exposure method and apparatus, exposure mask, and device manufacturing method |
| 09/17/2008 | EP1625580A4 Multi-layer structure and method of drawing microscopic structure therein |
| 09/17/2008 | EP1377853B1 Microlens for projection lithography and method of preparation thereof |
| 09/17/2008 | CN201117643Y Semiconductor component storage device and light shield storage device |
| 09/17/2008 | CN201117642Y Storage device for semiconductor component or mask |
| 09/17/2008 | CN101268609A Method for controlling an electric motor, control unit and electric motor |
| 09/17/2008 | CN101268542A Method and apparatus for isolative substrate edge area processing |
| 09/17/2008 | CN101268420A Exposure apparatus |
| 09/17/2008 | CN101268419A Composition for antireflection film formation, comprising product of reaction between isocyanuric acid compound and benzoic acid compound |
| 09/17/2008 | CN101268418A Photosensitive resin composition and cured object obtained therefrom |
| 09/17/2008 | CN101268151A Colored composition and photosensitive transfer material |
| 09/17/2008 | CN101268114A Curable compositions containing dithiane monomers |
| 09/17/2008 | CN101266951A Grid driving circuit for display device and method for making display device component |
| 09/17/2008 | CN101266950A Method of fabricating array substrate for liquid crystal display device |
| 09/17/2008 | CN101266922A Heat exchanging apparatus |
| 09/17/2008 | CN101266414A Liquid treatment device |
| 09/17/2008 | CN101266413A Illuminator for a lithographic apparatus and method |
| 09/17/2008 | CN101266412A Lithographic apparatus and method |
| 09/17/2008 | CN101266411A Two-dimensional coding normalization mask target combination and its alignment method and aligning system |
| 09/17/2008 | CN101266410A Method for confirming front feeding transfer function, lithographic apparatus and device manufacturing method |
| 09/17/2008 | CN101266409A Laser machining apparatus |
| 09/17/2008 | CN101266408A Laminating body, grafting film forming method using the same and forming method for grafting pattern |
| 09/17/2008 | CN101266407A Radiation sensitive composition for forming staining layer |
| 09/17/2008 | CN101266406A Radiation sensitive composition for forming staining layer |
| 09/17/2008 | CN101266405A Radiation sensitive resin composition, spacer for liquid crystal display panel, method of forming spacer for liquid crystal display panel and liquid crystal display panel |
| 09/17/2008 | CN101266404A Method for producing structure |
| 09/17/2008 | CN101266376A High quality and ultra large screen liquid crystal display device and production method thereof |
| 09/17/2008 | CN101266372A Pixel structure and method of manufacture |
| 09/17/2008 | CN101266366A LCD alignment method |
| 09/17/2008 | CN101266352A Touch control display panel, colorful filtering substrate and its manufacture method |
| 09/17/2008 | CN101266351A Liquid crystal display device and method of manufacturing the same |
| 09/17/2008 | CN101265368A Pigment dispersion composition, optical solidifying composition, color filter and manufacturing method thereof |
| 09/17/2008 | CN101265328A Method for preparing negative photosensitive polyimide based on 2,2-di[4-(2,4-diaminophenyloxy)phenyl]hexafluoropropane |
| 09/17/2008 | CN101264703A Method for manufacturing false-proof signet |
| 09/17/2008 | CN100420355C Figure-forming method and wire-layout figure forming method and photoelectronic device |
| 09/17/2008 | CN100419987C Substrate processing apparatus and substrate processing method |
| 09/17/2008 | CN100419985C Substrate carrier |
| 09/17/2008 | CN100419972C Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-K dielectric etch applications |
| 09/17/2008 | CN100419886C Pattern drawing apparatus, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium |
| 09/17/2008 | CN100419789C Layer arrangement provided with a structure producing a diffractive optical effect and a lens-type effect |
| 09/17/2008 | CN100419576C Equipment management system and method, semiconductor exposure apparatus and management method, method for mfg. semiconductor |
| 09/17/2008 | CN100419501C Apparatus and method for processing substrate |
| 09/17/2008 | CN100418947C Hybrid onium salt |
| 09/16/2008 | US7426712 Lithography simulation method and recording medium |