| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/25/2008 | US20080233519 making a microlens array involves imaging a microstructure master blank; enable high volume production of optical microstructure end products for display, television and/or other applications |
| 09/25/2008 | US20080233518 Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition |
| 09/25/2008 | US20080233517 Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules |
| 09/25/2008 | US20080233516 Capable of laser exposure; chemical resistance and high press life even when printing using UV curable ink; use of a photopolymeriztion layer of a polymer having a sulfonamido group and a cyclic structure derived from maleimide, and further having a hydrophilic group in the molecule |
| 09/25/2008 | US20080233515 Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device |
| 09/25/2008 | US20080233514 Acrylic terpolymer with fluorosulfonamide-containing unit e.g. 2-trifluoromethanesulfonylaminoethyl methacrylate, a second unit having pendant acid labile group, and a third unit having a lactone moiety, and an acid generator; good etch resistance and dissolution properties; use making semiconductors |
| 09/25/2008 | US20080233513 Polymer (polyimide or polybenzoxazole precursor) having an acid functional group, a compound having substituent(s) derived from an amine functional group as chain extender, a photoreactive compound, and a solvent; surface protecting film or interlayer dielectric for semiconductor device |
| 09/25/2008 | US20080233512 In photolithography; prevents defects, prevent exposure failures |
| 09/25/2008 | US20080233493 partition walls excellent in the uniformity in thickness of the ink layer even when light exposure is low in the exposure step.A process for forming partition walls, which comprises a step of coating a substrate with a negative photosensitive composition containing a fluorinated polymer |
| 09/25/2008 | US20080233491 barrier film material includes, in addition to an alkali-soluble polymer, a multivalent carboxylic acid compound having a plurality of carboxyl groups or a multivalent alcohol compound. The multivalent carboxylic acid compound or the multivalent alcohol compound is adhered onto the surface of a resist |
| 09/25/2008 | US20080233361 Pattern-formed substrate, pattern-forming method, and die |
| 09/25/2008 | US20080232793 Dipping-type automatic developing apparatus and method for lithographic printing plates |
| 09/25/2008 | US20080231826 Uniform background radiation in maskless lithography |
| 09/25/2008 | US20080231825 Exposure Apparatus and method for producing device |
| 09/25/2008 | US20080231822 Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool |
| 09/25/2008 | US20080230959 Compositions for Dark-Field Polymerization and Method of Using the Same for Imprint Lithography Processes |
| 09/25/2008 | US20080230722 Integrated circuit and method including a patterning method |
| 09/25/2008 | DE10352740B4 Hilfsstrukturmerkmale mit einer unter der Auflösung liegenden Größe Auxiliary structural features with a sub-resolution size |
| 09/25/2008 | DE102008000790A1 Verfahren zum Verbessern von Abbildungseigenschaften eines optischen Systems sowie derartiges optisches System A method for improving the imaging properties of an optical system and such an optical system |
| 09/25/2008 | DE102007014587A1 Birefringent delay plate arrangement for production of e.g. LCD, has force application bar exhibiting number of twists, where two twists neighboring in longitudinal direction of bar are oriented opposite to each other |
| 09/25/2008 | DE102007013515A1 Method for fabricating nanoscale trench, involves fabricating nano-line on substrate, where substrate and nano-line is coated with material layer and layer of photoresist of certain thickness is applied on sacrificial layer |
| 09/24/2008 | EP1973147A1 Reflective mask blanc for euv lithography |
| 09/24/2008 | EP1973000A2 Dipping-type automatic developing apparatus and method for lithographic printing plates |
| 09/24/2008 | EP1972999A2 Foil trap and extreme ultraviolet light source device using the foil trap |
| 09/24/2008 | EP1972998A1 Silicon-containing resist underlying layer film forming composition for formation of photocrosslinking cured resist underlying layer film |
| 09/24/2008 | EP1972997A2 Nano-imprinting apparatus and method |
| 09/24/2008 | EP1972996A1 Method and device for generating a nanostructured disc |
| 09/24/2008 | EP1972641A2 Resist composition and pattern-forming method using same |
| 09/24/2008 | EP1972440A2 Negative lithographic printing plate precursor and lithographic printing method using the same |
| 09/24/2008 | EP1972438A1 Lithographic printing plate precursor and method of preparing lithographic printing plate |
| 09/24/2008 | EP1971899A2 Photolithographic systems and methods for producing sub-diffraction-limited features |
| 09/24/2008 | EP1971704A2 Polymer layer comprising silicone and at least one metal trace and a process of manufacturing the same |
| 09/24/2008 | EP1730773B1 Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof |
| 09/24/2008 | EP1627406B1 Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 09/24/2008 | EP1587847B8 Process for refining crude resin for electronic material |
| 09/24/2008 | EP1465877B1 Positive-working photoimageable bottom antireflective coating |
| 09/24/2008 | EP1057202B1 Method and device for exposing a substrate to light |
| 09/24/2008 | CN201122231Y Floating lifting balancing device of LCD exposure machine ball seat |
| 09/24/2008 | CN201122230Y Ultraviolet exposure machine |
| 09/24/2008 | CN101273443A Hydrogen treatment to improve photoresist adhesion and rework consistency |
| 09/24/2008 | CN101273304A Illuminator for a photolithography device |
| 09/24/2008 | CN101273303A Positive photosensitive resin composition |
| 09/24/2008 | CN101273302A Photomask and exposure method using same |
| 09/24/2008 | CN101272918A Photogravure reproduction roll with cushion layer and its manufacturing method |
| 09/24/2008 | CN101272912A Web pasting method |
| 09/24/2008 | CN101272911A Apparatus and method for manufacturing photosensitive laminate |
| 09/24/2008 | CN101271284A Veilling glare coefficient testing device of photo-etching machine object lens under mask lighting condition |
| 09/24/2008 | CN101271283A Veilling glare coefficient testing device of photo-etching machine object lens under point light source work condition |
| 09/24/2008 | CN101271282A Stage system and lithographic apparatus comprising such stage system |
| 09/24/2008 | CN101271281A Normalization alignment mark combination and its alignment method and alignment system |
| 09/24/2008 | CN101271280A Lithography method for forming a circuit pattern |
| 09/24/2008 | CN101271279A Exposure method and photomask for manufacturing plane display device |
| 09/24/2008 | CN101271278A Exposure machine and exposure technique |
| 09/24/2008 | CN101271277A Nozzle cleaning device |
| 09/24/2008 | CN101271276A System and method for replacing resist filter to reduce resist filter-induced wafer defects |
| 09/24/2008 | CN101271275A Horn net manufacturing technique by etching method |
| 09/24/2008 | CN101271274A Minute structure and information recording medium |
| 09/24/2008 | CN101271273A Chemically amplified resist composition |
| 09/24/2008 | CN101271272A Chemically amplified resist compositions |
| 09/24/2008 | CN101271271A Eurymeric photoresist |
| 09/24/2008 | CN101271270A Radiation sensitive resin composition, space body for liquid crystal display element and manufacturing method thereof |
| 09/24/2008 | CN101271269A Nano-imprinting apparatus and method |
| 09/24/2008 | CN101271268A Method and system for optimizing lithography focus and/or energy using a specially-designed optical critical dimension pattern |
| 09/24/2008 | CN101271267A Production method of exposure light shield and thin film graphic pattern layer |
| 09/24/2008 | CN101271214A Display equipment production method |
| 09/24/2008 | CN101270324A Semiconductor etch residue remover and cleansing compositions |
| 09/24/2008 | CN101270271A Disposal hologram image autogram film hot diversion adhesion agent and preparation method thereof |
| 09/24/2008 | CN100421532C Figure-forming method and wire-layout figure forming method, photoelectronic device and electronic apparatus |
| 09/24/2008 | CN100421222C Cleaning composition for semiconductor containing unsaturated dicarboxylic acid and ethylene urea and cleaning method |
| 09/24/2008 | CN100421221C Aqueous surfactant solution for developing coating film layer |
| 09/24/2008 | CN100421118C Distribution optimized method and optical shielding film, manufacture method of semiconductor device |
| 09/24/2008 | CN100421024C Photoetching device and device manufacturing method |
| 09/24/2008 | CN100421019C Method for producing liquid crystal display device substrate |
| 09/24/2008 | CN100421017C Thin-film transistor array substrate and its manufacturing method |
| 09/24/2008 | CN100421014C Reflective and semi-transmission type liquid crystal display device and producing method thereof |
| 09/24/2008 | CN100420989C Color cholesterol type LCD device and its mfg. method |
| 09/23/2008 | US7428685 Cyclic error compensation in interferometry systems |
| 09/23/2008 | US7428105 Objectives as a microlithography projection objective with at least one liquid lens |
| 09/23/2008 | US7428040 Lithographic apparatus and device manufacturing method |
| 09/23/2008 | US7428037 Optical component that includes a material having a thermal longitudinal expansion with a zero crossing |
| 09/23/2008 | US7428032 Horizontal electric field LCD TFT substrate having gate insulating layer of varying thickness and fabricating method thereof |
| 09/23/2008 | US7427857 Resistor structures to electrically measure unidirectional misalignment of stitched masks |
| 09/23/2008 | US7427529 Deposition of permanent polymer structures for OLED fabrication |
| 09/23/2008 | US7427477 Method of activating a silicon surface for subsequent patterning of molecules onto said surface |
| 09/23/2008 | US7427465 Printing plate is exposed with the radiation, deactivated, and then on-press developed with ink and/or fountain solution; deactivation of texposed plate allows handling of plate under regular office light or any other light without causing the hardening of the non-exposed areas of photosensitive layer |
| 09/23/2008 | US7427464 naphthol-dicyclopentadiene copolycondensate on a processable substrate as an antireflective film; shape of resist after patterning remains satisfactory |
| 09/23/2008 | US7427463 Photoresists with reduced outgassing for extreme ultraviolet lithography |
| 09/23/2008 | US7427374 Convection cooling techniques in selective deposition modeling |
| 09/23/2008 | US7427168 Developing method and developing unit |
| 09/23/2008 | CA2355749C 4-methylene-1,3-dioxolanes as cross-linking agents |
| 09/18/2008 | WO2008112713A1 Nanolithography with use of viewports |
| 09/18/2008 | WO2008111839A1 Device manufacturing method, lithographic apparatus and a computer program |
| 09/18/2008 | WO2008111629A1 Planar motor, positioning apparatus, exposure apparatus, and device manufacturing method |
| 09/18/2008 | WO2008111513A1 Physical developer, method of preparing conductive pattern, electromagnetic wave shielding material, fitter for plasma display and panel for plasma display |
| 09/18/2008 | WO2008111470A1 Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part |
| 09/18/2008 | WO2008111463A1 Coating solution for film formation, method for production of the coating solution, and method for production of semiconductor device |
| 09/18/2008 | WO2008111400A1 Method of coating application, coating application apparatus and computer readable storage medium |
| 09/18/2008 | WO2008111378A1 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process |
| 09/18/2008 | WO2008111251A1 Resist composition, method of forming resist pattern, and process for manufacturing electronic device |
| 09/18/2008 | WO2008111247A1 Photosensitive composition, photosensitive film, method for formation of permanent pattern, and print substrate |