Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2008
10/01/2008EP1975703A2 Mold structure, imprinting method using the same, magnetic recording medium and production method thereof
10/01/2008EP1975702A2 Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
10/01/2008EP1975701A2 Color filter and method for producing the same
10/01/2008EP1975700A2 Method of manufacturing wiring circuit board
10/01/2008EP1975227A1 Semiconductor etch residue remover and cleansing compositions
10/01/2008EP1974914A2 Lithographic printing plate precursor and method of preparing lithographic printing plate
10/01/2008EP1974243A1 System and method for absorbance modulation lithography
10/01/2008EP1974242A2 Method for chemical reduction of an oxidized contamination material, or reducing oxidation of a contamination material and a conditioning system for doing the same
10/01/2008EP1974241A1 Optically variable security device
10/01/2008EP1974236A2 Optical beam steering and sampling apparatus and method
10/01/2008EP1973748A2 Bragg diffracting security markers
10/01/2008EP1973719A2 Patterning substrates employing multiple chucks
10/01/2008EP1789850B1 Novel resist material and method for forming a patterned resist layer on a substrate
10/01/2008EP1654592B1 Measuring the effect of flare on line width
10/01/2008EP1616220A4 Maintaining immersion fluid under a lithographic projection lens
10/01/2008EP1341823B1 Surface-active photoinitiators
10/01/2008EP1119784A4 Diffraction grating and fabrication technique for same
10/01/2008CN101278381A Vertical profile fixing
10/01/2008CN101278377A Semiconductor substrate and method for manufacturing same
10/01/2008CN101278376A Multilayer reflecting mirror, multilayer reflecting mirror manufacturing method, optical system, exposure apparatus and device manufacturing method
10/01/2008CN101278375A Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method
10/01/2008CN101278239A Process for producing substrate with metal wiring
10/01/2008CN101278238A Immersion optical lithography system having protective optical coating
10/01/2008CN101278237A Structure and method for simultaneously determining an overlay accuracy and pattern placement error
10/01/2008CN101278236A Photosensitive resin composition and photosensitive element using the same
10/01/2008CN101278235A Photosensitive resin composition, photosensitive element, and method for manufacturing printed wiring board
10/01/2008CN101278234A Positive photosensitive resin composition
10/01/2008CN101277928A Radiation crosslinker
10/01/2008CN101276749A Method for producing transistor T type nano grid using once electron beam exposure
10/01/2008CN101276745A Coating and developing system, coating and developing method and storage medium
10/01/2008CN101276744A Coating and developing system, coating and developing method and storage medium
10/01/2008CN101276160A Focusing and leveling device for photo-etching machine as well as measuring method
10/01/2008CN101276159A Apparatus and method of polymer photoresist ultrasonic ageing effect
10/01/2008CN101276158A Method of forming resist pattern and semiconductor device manufactured with the same
10/01/2008CN101276157A Exposure device
10/01/2008CN101276156A Exposure device
10/01/2008CN101276155A Measurement system lithographic apparatus and measuring method
10/01/2008CN101276154A Lithographic apparatus and method
10/01/2008CN101276153A Exposure device
10/01/2008CN101276152A Drawing apparatus
10/01/2008CN101276151A Method and apparatus for measuring wafer surface flatness
10/01/2008CN101276150A Stepping repeat exposure device
10/01/2008CN101276149A Method for manufacturing hundred nano-scale electric solenoid or net-shaped structure
10/01/2008CN101276148A Apparatus for processing substrate
10/01/2008CN101276147A Compound for forming colored pattern, method of forming colored pattern, color filter, method of manufacturing the color filter and liquid crystal display element
10/01/2008CN101276146A Colored photosensitive resin composition, and color filter array and solid-state image pickup device using the same
10/01/2008CN101276145A Colored photosensitive resin composition, and color filter array and solid-state image pickup device using the same
10/01/2008CN101276144A Photosensitive resin composition, photosensitive resin transfer film, method of manufacturing photospacer and support for liquid crystal display device, and liquid crystal display device
10/01/2008CN101276143A Method and system for patterning a mask layer
10/01/2008CN101276141A Method and apparatus for performing model-based OPC for pattern decomposed feature
10/01/2008CN101276140A Defect modifying method of gray tone mask, manufacturing method of gray tone mask, gray tone mask; and pattern transfer print method
10/01/2008CN101276111A Liquid crystal display panel, manufacturing method thereof, and liquid crystal display device
10/01/2008CN101276079A Method for obtaining a transparent conductive film
10/01/2008CN100423200C Semiconductor manufacturing apparatus and pattern formation method
10/01/2008CN100423193C Semiconductor producing method for preventing crystal border film layer from stripping and interconnection wire producing method
10/01/2008CN100423192C Method and apparatus for multilayer photoresist dry development
10/01/2008CN100423191C Method and compositions for hardening photoresist in etching processes
10/01/2008CN100423189C Semiconductor device manufacturing method for preventing patterns from inclining in drying process
10/01/2008CN100423107C Method and apparatus for recycling ultraviolet curing resin, and method for manufacturing optical recording medium using that recycling method
10/01/2008CN100422856C Measuring method and correction method for illumination irregularity of exposure device
10/01/2008CN100422855C Lithographic apparatus and device manufacturing method and device made therefrom
10/01/2008CN100422854C Method for reducing lead wire figure by T-shaped photoresist pattern
10/01/2008CN100422853C Anticorrosion agent composition
10/01/2008CN100422851C Holographic projecting screen, producing method, system and application thereof
10/01/2008CN100422832C Liquid crystal display device and fabricating method thereof
10/01/2008CN100422807C Array substrate for liquid crystal display device and method of fabricating the same
10/01/2008CN100422689C Method for detecting tilted position of heat tie plate
10/01/2008CN100421933C Focusing control of photohead in one printing plate exposure device
10/01/2008CN100421778C Process for the recovery of surfactants
09/2008
09/30/2008US7430037 Reticle cassette and exposure apparatus using reticle cassette
09/30/2008US7429446 Resist pattern forming method and semiconductor device fabrication method
09/30/2008US7429445 Negative-working imageable elements and methods of use
09/30/2008US7429116 Projection objective and method for its manufacture
09/30/2008CA2430547C Process for manufacturing printing belts
09/25/2008WO2008115530A2 Polymer composition for preparing electronic devices by microcontact printing processes and products prepared by the processes
09/25/2008WO2008115372A1 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
09/25/2008WO2008115348A1 Processing positive-working imageable elements with high ph developers
09/25/2008WO2008115057A1 Stereolithography resin compositions and three-dimensional objects made therefrom
09/25/2008WO2008114881A1 Imprint method, chip production process, and imprint apparatus
09/25/2008WO2008114840A1 Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
09/25/2008WO2008114836A1 Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
09/25/2008WO2008114797A1 Positive type photosensitive polyimide precursor composition
09/25/2008WO2008114644A1 Resist pattern formation method, and resin composition capable of insolubilizing resist pattern
09/25/2008WO2008114635A1 Radiation-sensitive resin composition
09/25/2008WO2008114616A1 Cleaning composition and process for producing semiconductor device
09/25/2008WO2008114543A1 Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus
09/25/2008WO2008114422A1 Beam drawing device
09/25/2008WO2008114411A1 Material for formation of conductive anti-reflection film, method for formation of conductive anti-reflection film, method for formation of resist pattern, semiconductor device, and magnetic head
09/25/2008WO2008113605A2 Method for improving the imaging properties of an optical system and such an optical system
09/25/2008WO2008113341A1 Optical mounting and optical component comprising said type of optical mounting
09/25/2008WO2008096364A3 Method and system for measurng in patterned structures
09/25/2008WO2008060406A3 Method of preparing lithographic printing plates
09/25/2008WO2008048998A3 Strategy for control of recirculated exhaust gas to null turbocharger boost error
09/25/2008WO2007115105A3 Method for making an improved thin film solar cell interconnect using etch and deposition processes
09/25/2008WO2007040699A3 Method for attaching spacers in an emission display
09/25/2008US20080235652 Lithography method for forming a circuit pattern
09/25/2008US20080233730 Stacking a conductive layer, a hard mask layer, a metal-based hard mask layer, and an amorphous carbon pattern over a substrate;etching the metal-based hard mask layer using the C pattern as an etch mask, forming photoresist pattern
09/25/2008US20080233607 for the functional maintenance of cells, particularly anchorage-dependent cells; for the long term culture of hepatocytes in vitro
09/25/2008US20080233522 Via photomasks, photoresists; spin coating
09/25/2008US20080233521 Monomolecular silicon oxide film for immobilizing a target molecule can be simply formed position-selectively in manufacture; use of a chemically amplified positive resist of a copolymer where a content of hydroxyl group-containing monomer is 5 % or less which is patterned and later removed
1 ... 411 412 413 414 415 416 417 418 419 420 421 422 423 424 425 426 427 428 429 430 431 ... 1272