Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2008
10/02/2008WO2008117897A1 Cyclic siloxane compound and positive resist composition using the same
10/02/2008WO2008117867A1 Resist lower layer film composition and method for forming dual damascene structure
10/02/2008WO2008117808A1 Liquid recovery system and immersion exposure apparatus
10/02/2008WO2008117803A1 Pigment dispersion composition, photocurable composition, color filter, and method for producing color filter
10/02/2008WO2008117738A1 Photosensitive lithographic printing plate material developable with water
10/02/2008WO2008117696A1 Double-layered film and pattern-forming method using the same, resin composition for forming lower layer of double-layered film, and positive radiation-sensitive resin composition for forming upper layer of double-layered film
10/02/2008WO2008117693A1 Positive-working radiation-sensitive composition and method for resist pattern formation using the composition
10/02/2008WO2008117619A1 Photosensitive insulating resin composition
10/02/2008WO2008117358A1 Electron beam device
10/02/2008WO2008117308A2 Novel diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof
10/02/2008WO2008117197A1 Split axes stage design for semiconductor applications
10/02/2008WO2008116886A1 Correction of optical elements by means of correction light emitted in a flat manner
10/02/2008WO2008116627A1 Device for producing objects
10/02/2008WO2008116477A1 Microlithographic method
10/02/2008WO2008083197A3 Imaging post structures using x and y dipole optics and a single mask
10/02/2008WO2008072966A3 Plasma radiation source with axial magnetic field
10/02/2008WO2008055589A3 Method for determination of residual errors
10/02/2008WO2007119966A9 Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods
10/02/2008US20080244371 Method and device for data integrity checking
10/02/2008US20080242820 nanostructure polymeric particles produced by expanding a mixture of propellants, monomers and template selected from proteins and nucleic acids, through nozzles or appertures, and releasing the propellant from mixture in the form of a gas; composite particles used for targeted drug delivery or optics
10/02/2008US20080242575 Treating liquid for photoresist removal, and method for treating substrate
10/02/2008US20080242574 Stripping post etching residue from microelectronic devices without affecting underlying silicate materials and interconnect metals; fluoride containing compound in organic solvent
10/02/2008US20080242056 System and method for cutting using a variable astigmatic focal beam spot
10/02/2008US20080241952 Imaging device comprising thin film polymer matrix that undergoes change in response to contact with preferential substances
10/02/2008US20080241764 Lithographic Method
10/02/2008US20080241762 Photothermographic material and image forming method
10/02/2008US20080241761 Half-tone images; frequency modulation screening
10/02/2008US20080241759 Conductor circuit with determined pattern, photosensitive resin; irradiating with light source through photomask; development
10/02/2008US20080241758 Photoresist stripping solution and a method of stripping photoresists using the same
10/02/2008US20080241757 Multilayer coating for photoresist containing high molecular weight polymethyl methacrylate, then polydimethyl glutamide and lo wolecular weight polymethyl methacrylate; exposure; development
10/02/2008US20080241756 Bars, contact opening; design windows; forming latent images in photoresists; development
10/02/2008US20080241755 Contact metallization of carbon nanotubes
10/02/2008US20080241754 Free radical polymerization catalyst; absorbing infrared radiation; imaging at low energy
10/02/2008US20080241753 Mixture of polysilsesquioxane and acid generator
10/02/2008US20080241752 Mixture of a resin that is decomposable with acid and phenol compound ; acid generator; adjust solubility of alkali developer; exposure to actinic radiation ; aqueous solution containing tetramethylammonium hydroxide
10/02/2008US20080241751 Chemically amplified negative resist composition and patterning process
10/02/2008US20080241750 Generating an acid upon exposure to actinic radiation
10/02/2008US20080241749 Positive resist composition and pattern forming method using the same
10/02/2008US20080241747 Positive Resist Composition and Method of Forming Resist Pattern
10/02/2008US20080241746 Positive resist composition and pattern forming method
10/02/2008US20080241745 Negative resist composition and pattern forming method using the same
10/02/2008US20080241744 Mixture containing urea compound as photoinitiator; curing by exposure to laser light
10/02/2008US20080241743 Positive resist composition and pattern forming method using the same
10/02/2008US20080241742 Photoresists; using compound containing an orgaooxygen or organosulfur compound
10/02/2008US20080241740 Support with photosensitive layer; reduce contact angle of water drops
10/02/2008US20080241739 Lithographic printing plate precursor and method for preparing lithographic printing plate
10/02/2008US20080241738 Lithographic printing plate precursor and printing method
10/02/2008US20080241737 Resist composition and pattern-forming method using same
10/02/2008US20080241736 Resist composition and patterning process
10/02/2008US20080241735 Lithographic Process
10/02/2008US20080241713 Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
10/02/2008US20080241564 Depositing an active material on substrate; absorption of ultraviolet wavelength; photopolymerization; crosslinking; radiation transparent segment; exposure through photomask
10/02/2008US20080241489 Method of forming resist pattern and semiconductor device manufactured with the same
10/02/2008US20080241486 Liquid Crystal Display Device with Evaluation Patterns Disposed Thereon, and Method for Manufacturing the Same
10/02/2008US20080241484 Patterned Substrate and Method for Producing Same
10/02/2008US20080241403 Coating and developing system, coating and developing method and storage medium
10/02/2008US20080239276 Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method
10/02/2008US20080239275 Substrate holding apparatus, exposure apparatus, exposing method, and device fabricating method
10/02/2008US20080239274 Illumination optical system, exposure apparatus, and exposure method
10/02/2008US20080239273 Illumination system and polarizer for a microlithographic projection exposure apparatus
10/02/2008US20080239272 Reduced lens heating methods, apparatus, and systems
10/02/2008US20080239267 Exposure apparatus and exposure method for exposure apparatus
10/02/2008US20080239261 Run-off path to collect liquid for an immersion lithography apparatus
10/02/2008US20080239260 Exposure apparatus and device manufacturing method
10/02/2008US20080238318 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib
10/02/2008US20080237947 Actuator Arrangement for Active Vibration Isolation Using a Payload as an Inertial Reference Mass
10/02/2008US20080237049 Ion-implanted electroformed structural material and method of producing the structural material
10/02/2008US20080236427 Planographic printing plate, and apparatus and method for manufacturing the same
10/02/2008DE202008006193U1 Anordnung zur hochauflösenden Aufzeichnung eines computergespeicherten Rasterbildes auf einen ebenen lichtempfindlichen Aufzeichnungsträger Arrangement for high-resolution recording of a computer-stored raster image on a flat photosensitive carrier
10/02/2008DE112006002971T5 Verfahren zum Drucken von Kontakten auf einem Substrat A method for printing contacts on a substrate
10/02/2008DE102008016011A1 Korrektur optischer Elemente mittels flach eingestrahltem Korrekturlicht Correction of optical elements by means of flat irradiated light correction
10/02/2008DE102008015305A1 Verfahren zum maskenlosen Belichten mit Teilchenstrahlen A method for maskless exposure to particle beams
10/02/2008DE102008012693A1 Rotary sensor system for determining rotation angle position of rotary component i.e. plate cylinder of printing plate setter, has measuring plate connected with component over aligning bush for eccentricity adjustment of plate
10/02/2008DE102007015499A1 Effizienzsteigerung für die Lithographie von Kontaktdurchführungen und Kontakten unter Anwendung einer Doppelbelichtung auf der Grundlage von linienartigen Strukturelementen Increase efficiency for lithography of vias and contacts using a double exposure on the basis of line-like structure elements
10/02/2008DE102007015351A1 Procedure and device for accurate positioning of ion beam during simultaneous determination of its abrasion profile, comprise an arrangement of optically transparent carrier material, which is covered with optically opaque thin layer
10/01/2008EP1975983A2 Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus
10/01/2008EP1975980A1 Exposure device and fabrication method thereof
10/01/2008EP1975979A1 Coating apparatus and coating method
10/01/2008EP1975725A2 Standard image pattern, developer evaluation method for planographic printing plate using the standard image pattern, and quality control method for planographic printing plate using the standard image pattern
10/01/2008EP1975724A1 Lithographic apparatus and method
10/01/2008EP1975723A1 Lithographic Projection Apparatus and a Device Manufacturing Method using such Lithographic Projection Apparatus
10/01/2008EP1975722A2 Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
10/01/2008EP1975721A1 Lithographic apparatus and device manufacturing method
10/01/2008EP1975720A1 Laser light source device, exposure method, and device
10/01/2008EP1975719A2 Method of forming resist pattern and semiconductor device manufactured with the same
10/01/2008EP1975718A2 Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent
10/01/2008EP1975717A2 Positive resist compostion and pattern forming method using the same
10/01/2008EP1975716A2 Positive resist composition and pattern forming method
10/01/2008EP1975715A2 Positive resist composition and pattern forming method using the same
10/01/2008EP1975714A1 Positive resist composition and pattern forming method
10/01/2008EP1975713A2 Positive resist composition and pattern forming method using the same
10/01/2008EP1975712A2 Positive resist composition and pattern forming method using the same
10/01/2008EP1975711A1 Chemically amplified negative resist composition and patterning process
10/01/2008EP1975710A2 Plate-making method of lithographic printing plate precursor
10/01/2008EP1975709A1 Lithographic printing plate precursor and method of preparing lithographic printing plate
10/01/2008EP1975708A2 Lithographic printing plate precursor
10/01/2008EP1975707A1 Curable composition and planographic printing plate precursor
10/01/2008EP1975706A2 Lithographic printing plate precursor
10/01/2008EP1975705A2 Positive resist composition and pattern-forming method
10/01/2008EP1975704A2 Mold structure, imprinting method using the same, magnetic recording medium and production method thereof
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