| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/30/2014 | CN103955118A 一种免胶片计算机直接制版设备及制版方法 A film CTP platemaking equipment and method for free |
| 07/30/2014 | CN103955117A 光刻机投影物镜波像差检测标记和检测方法 Lithography projection lens aberration detection labeling and detection methods |
| 07/30/2014 | CN103955116A 生产光敏性微粒的方法 Photosensitivity particle production methods |
| 07/30/2014 | CN103955115A 一种感光树脂组合物及彩色滤光片 One kind of a photosensitive resin composition and a color filter |
| 07/30/2014 | CN103955114A 一种锗晶体码盘分划工艺 One kind of germanium crystal code disk partition process |
| 07/30/2014 | CN103955113A 一种印刷制版设备及制版方法 A plate-making equipment and printing plate method |
| 07/30/2014 | CN103955112A 一种计算机成像直接制版设备及制版方法 A computer-to-plate imaging equipment and plate method |
| 07/30/2014 | CN103955111A 光掩模用基板组和光掩模组及显示装置的制造方法 Group photomask substrate and photomask group and a display device manufacturing method |
| 07/30/2014 | CN103955088A 一种高性能液晶光掩膜及其应用 A high-performance LCD photomask and its application |
| 07/30/2014 | CN103955087A 一种液晶光掩膜、其应用及制版装置 A liquid crystal photomask, its application and plate-making device |
| 07/30/2014 | CN103019044B 线路板曝光能量检测方法 PCB exposure energy detection method |
| 07/30/2014 | CN103019027B 从曝光结果改进光学邻近模拟的方法 The method improved results from the exposure optical proximity simulation |
| 07/30/2014 | CN102937777B 用于浸没式光刻机的气密封和气液隔离装置 For gas seal immersion lithography machines and gas-liquid isolation device |
| 07/30/2014 | CN102866601B 等离子显示屏剥离液及其制备方法与应用 Plasma screens separating liquid and its preparation method and application |
| 07/30/2014 | CN102759862B 光学邻近修正的方法 Optical proximity correction methods |
| 07/30/2014 | CN102736448B 直写式光刻系统中的图像灰度数据的压缩方法 Compression direct-write lithography system image gradation data |
| 07/30/2014 | CN102482240B 化合物及其制造方法、含有该化合物的射线敏感性组合物以及固化膜 Compound and its manufacturing method, comprising the radiation sensitive composition and a cured film of the compound |
| 07/30/2014 | CN102466984B 源、掩模和投影光学装置的优化 Optimization of the source, a mask and a projection optical device |
| 07/30/2014 | CN102279522B 滤色器用着色组合物及滤色器 The coloring composition for color filter and a color filter |
| 07/30/2014 | CN102221788B 流体处理结构、光刻设备和器件制造方法 A fluid handling structure, a lithographic apparatus and device manufacturing method |
| 07/30/2014 | CN102186815B 锍衍生物及其作为潜酸的用途 Sulfonium derivatives and their use as latent acids |
| 07/30/2014 | CN102074456B 减压干燥装置 Vacuum drying apparatus |
| 07/30/2014 | CN101971336B 三维六边形矩阵存储器阵列和制造方法 A three-dimensional hexagonal matrix memory array and method of manufacturing |
| 07/29/2014 | US8792086 Movable body drive method and movable body drive system, and pattern formation method and pattern formation apparatus |
| 07/29/2014 | US8792085 Lithographic apparatus, substrate table, and method for enhancing substrate release properties |
| 07/29/2014 | US8792084 Exposure apparatus, exposure method, and device manufacturing method |
| 07/29/2014 | US8792083 Seed light generation device, light source device, adjustment method thereof, light irradiation device, exposure device, and device manufacturing method |
| 07/29/2014 | US8792082 Illumination system for microlithography |
| 07/29/2014 | US8792080 Method and system to predict lithography focus error using simulated or measured topography |
| 07/29/2014 | US8792079 Exposure apparatus, exposure method, and device manufacturing method having encoders to measure displacement between optical member and measurement mount and between measurement mount and movable body |
| 07/29/2014 | US8791293 Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method |
| 07/29/2014 | US8791288 Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process |
| 07/29/2014 | US8790868 Method of forming resist pattern and negative tone-development resist composition |
| 07/29/2014 | US8790867 Methods of forming photolithographic patterns by negative tone development |
| 07/29/2014 | US8790866 Patterning process and resist composition |
| 07/29/2014 | US8790864 Method of improving print performance in flexographic printing plates |
| 07/29/2014 | US8790863 Electron beam processing with condensed ice |
| 07/29/2014 | US8790862 Photosensitive element having reinforcing particles and method for preparing a printing form from the element |
| 07/29/2014 | US8790861 Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer |
| 07/29/2014 | US8790860 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, method for preparing electronic device, and electronic device, each using the same |
| 07/29/2014 | US8790859 Photoresist composition and method of fabricating thin film transistor substrate |
| 07/29/2014 | US8790797 Spin injection source and manufacturing method thereof |
| 07/24/2014 | WO2014113245A1 Lithographic error reduction by pattern matching |
| 07/24/2014 | WO2014113070A1 Single reticle approach for multiple patterning technology |
| 07/24/2014 | WO2014111098A1 Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus |
| 07/24/2014 | WO2014044496A3 Method of calibrating a reluctance actuator assembly, reluctance actuator and lithographic apparatus comprising such reluctance actuator |
| 07/24/2014 | WO2013160026A3 Electrostatic clamp, lithographic apparatus and method |
| 07/24/2014 | US20140208278 Pattern selection for lithographic model calibration |
| 07/24/2014 | US20140205956 Method for forming resist pattern |
| 07/24/2014 | US20140205955 Method of forming tight-pitched pattern |
| 07/24/2014 | US20140205954 Method for forming patterns of semiconductor device by using mixed assist feature system |
| 07/24/2014 | US20140205953 Method for forming semiconductor device |
| 07/24/2014 | US20140205952 Methods of forming patterns for semiconductor device structures |
| 07/24/2014 | US20140205951 Thermal crosslinking accelerator, polysiloxane-containing resist underlayer film forming composition containing same, and patterning process using same |
| 07/24/2014 | US20140205950 Coating composition for duv filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method |
| 07/24/2014 | US20140205949 Photocurable resin composition and novel siloxane compound |
| 07/24/2014 | US20140205948 Self-imageable layer forming polymer and compositions thereof |
| 07/24/2014 | US20140205947 Pattern forming method, chemical amplification resist composition and resist film |
| 07/24/2014 | US20140205937 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 07/24/2014 | US20140205934 Single reticle approach for multiple patterning technology |
| 07/24/2014 | US20140205818 Methods of making patterned structures of materials, patterned structures of materials, and methods of using same |
| 07/24/2014 | US20140204359 Exposure method, exposure apparatus, exposure system and device manufacturing method |
| 07/24/2014 | US20140204358 Magnetic sensor calibration and servo for planar motor stage |
| 07/24/2014 | US20140204356 Arrangement for actuating an element in a microlithographic projection exposure apparatus |
| 07/24/2014 | US20140204355 Method for Exposing an Area on a Substrate to a Beam and Photolithographic System |
| 07/24/2014 | US20140204354 Method for controlling a motion of optical elements in lithography systems |
| 07/24/2014 | US20140204353 Exposure method, exposure apparatus, and device manufacturing method |
| 07/24/2014 | US20140202986 High aspect ratio patterning using near-field optical lithography with top surface imaging |
| 07/24/2014 | DE112012004495T5 Strukturierung mit hoher Wiedergabetreue unter Verwendung eines Fluorkohlenwasserstoff enthaltenden Polymers Patterning with high fidelity using a fluorocarbon-containing polymer |
| 07/24/2014 | DE102014207883A1 Maßstabsermittlung einer diffraktiven optischen Struktur Scale identification of a diffractive optical structure |
| 07/24/2014 | DE102014207865A1 Kippspiegelüberwachung Kippspiegelüberwachung |
| 07/24/2014 | DE102013201133A1 Optisches System einer mikrolithographischen Projektionsbelichtungsanlage The optical system of a microlithography projection exposure apparatus |
| 07/24/2014 | DE102013200961A1 Polarisationsmessvorrichtung für eine Projektionsbelichtungsanlage Polarization measurement device for a projection exposure apparatus |
| 07/23/2014 | EP2757417A1 Method for recycling wastewater produced by plate-making process |
| 07/23/2014 | EP2757416A1 Process for producing lithographic printing plate and lithographic printing plate |
| 07/23/2014 | EP2756354A1 Guidance for target processing tool |
| 07/23/2014 | EP2756353A1 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device |
| 07/23/2014 | CN203732881U 一种制版清胶装置 One kind of plate clear plastic device |
| 07/23/2014 | CN203732880U 一种平面制版除胶装置 A flat plate in addition to plastic device |
| 07/23/2014 | CN203732879U 一种去边液处理装置 One kind of fluid processing apparatus to edge |
| 07/23/2014 | CN203732878U 曝光设备中的透镜冷却装置 The exposure apparatus of a lens in the cooling device |
| 07/23/2014 | CN103946954A 采用包含氟代烃的聚合物的高保真构图 Fidelity patterning using a polymer containing fluorinated hydrocarbons |
| 07/23/2014 | CN103946750A 光刻设备、器件制造方法和计算机程序 Lithographic apparatus, device manufacturing method and computer program |
| 07/23/2014 | CN103946749A 目标定位装置 Target positioning device |
| 07/23/2014 | CN103946748A 热反应型抗蚀剂材料、模具的制造方法、模具、显影方法以及图案形成材料 The heat-reactive resist material, the manufacturing method for a mold, the mold, a developing method and a pattern forming material |
| 07/23/2014 | CN103946747A 负型感光性树脂组合物、分隔壁、黑色矩阵以及光学元件 A negative-type photosensitive resin composition, partition walls, a black matrix and an optical element |
| 07/23/2014 | CN103946262A 含羧基树脂、阻焊剂用树脂组合物和含羧基树脂的制造方法 Carboxyl group-containing resin, a solder resist resin composition and a method for producing carboxyl group-containing resin, |
| 07/23/2014 | CN103946254A 用于平版印刷应用的低聚糖/含硅嵌段共聚物 Oligosaccharides used in lithographic printing applications / silicon block copolymer |
| 07/23/2014 | CN103946204A 环状化合物、其制造方法、辐射敏感组合物及抗蚀图案形成方法 Cyclic compounds, manufacturing method, the radiation-sensitive composition and resist pattern-forming method |
| 07/23/2014 | CN103943565A 一种裸眼3d功能面板的制造方法 A method for producing a 3d naked eye function panel |
| 07/23/2014 | CN103943539A 基板的处理装置以及处理方法 Processing apparatus and a substrate processing method |
| 07/23/2014 | CN103943533A 密封对接装置 Sealed docking device |
| 07/23/2014 | CN103941552A 一种显影液在线回收循环利用装置及其使用方法 One kind of developer is online recycling apparatus and method of use recycling |
| 07/23/2014 | CN103941551A 一种曝光用掩模板、曝光设备及显示用基板的制作方法 An exposure mask, exposure apparatus and method of manufacturing the display substrate |
| 07/23/2014 | CN103941550A 一种智能化选择性目标尺寸调整方法 An intelligent resizing method selectively target |
| 07/23/2014 | CN103941549A 一种优化设计微反射镜阵列产生任意光刻照明光源的方法 An optimized design of micro mirror arrays generate arbitrary lighting lithography method |
| 07/23/2014 | CN103941548A 具有吸光层的感光层结构与使用感光层结构的光刻工艺 Photolithography process using a photosensitive layer structure and layer structure of the photosensitive layer having a light absorbing |
| 07/23/2014 | CN103941547A 硬掩模表面处理 Hard mask surface treatment |
| 07/23/2014 | CN103941546A 一种提高感光材料的曝光精度的方法 Method for improving the accuracy of the exposure method of the photosensitive material |
| 07/23/2014 | CN103941545A 蚀刻掩模用组合物及图案形成方法 The composition and the etching mask pattern forming method |